专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07639863B2 Die-to-database photomask defect detection using region data to modify inspection thresholds 有权
标题翻译：使用区域数据对数据库光掩模缺陷进行检测，以修改检测阈值
公开(公告)号：US07639863B2
公开(公告)日：2009-12-29
申请号：US11284186
申请日：2005-11-22
申请人： Ikunao Isomura
发明人： Ikunao Isomura
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus, including an optical image acquiring unit that acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates design image data based on a design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus further includes a comparing unit that inputs region image data generated based on information of a region pattern which is input to the pattern inspection apparatus. The information of the region pattern represents a predetermined region and is formed in the same format as that of information of the design pattern. The comparing unit compares the optical image data with the design image data based on the region image data.
摘要翻译：一种图案检查装置，包括获取要检查的目标板的光学图像数据的光学图像获取单元，所述目标板形成为图案。图案检查装置还包括设计图像数据生成单元，其基于用作目标板的图案形成的基础的设计图案来生成设计图像数据。图案检查装置还包括比较单元，其输入基于输入到图案检查装置的区域图案的信息生成的区域图像数据。区域图案的信息表示预定区域，并且形成为与设计图案的信息相同的格式。比较单元基于区域图像数据将光学图像数据与设计图像数据进行比较。

2. 发明授权

US07551767B2 Pattern inspection apparatus 有权
标题翻译：图案检验仪
公开(公告)号：US07551767B2
公开(公告)日：2009-06-23
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动地取出模具数据的检查区域，对比方法。

3. 发明授权

US07359546B2 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US07359546B2
公开(公告)日：2008-04-15
申请号：US11072317
申请日：2005-03-07
申请人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
发明人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01R31/311 , G03F1/84 , G06T2207/30148
摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.
摘要翻译：缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为第三像素数据具有较高的值。

4. 发明申请

US20060018530A1 Pattern inspecting method 失效
公开(公告)号：US20060018530A1
公开(公告)日：2006-01-26
申请号：US11175360
申请日：2005-07-07
申请人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
发明人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.

5. 发明申请

US20120307043A1 INSPECTION APPARATUS AND METHOD 审中-公开
标题翻译：检查装置和方法
公开(公告)号：US20120307043A1
公开(公告)日：2012-12-06
申请号：US13440080
申请日：2012-04-05
申请人： Hiroteru AKIYAMA , Ikunao Isomura
发明人： Hiroteru AKIYAMA , Ikunao Isomura
IPC分类号： H04N7/18
CPC分类号： G01N21/95607 , G01N2021/95615
摘要： An inspection apparatus and method comprising a unit for acquiring an optical image of an object to be inspected by irradiating the object with light, wherein the unit includes a line sensor comprising a plurality of sensors linearly arranged in a row, a generating unit for generating a reference image from design data of the object to be inspected, a comparing unit for comparing the optical image with the reference image, a unit for storing data of three lines acquired by the line sensor, and calculating differences between a gradation value of a pixel on a center line and each gradation value of the eight pixels adjacent to the pixel determining if the pixel is a defect if all of the eight differences of the adjacent pixels are more than a predetermined threshold.
摘要翻译：一种检查装置和方法，包括：用于通过用光照射所述物体来获取待检查物体的光学图像的单元，其中所述单元包括线阵列，所述线传感器包括以行直线排列的多个传感器;生成单元，参考图像，用于将光学图像与参考图像进行比较，比较单元，用于存储由线传感器获取的三条线的数据，以及计算像素的灰度值之间的差异中心线和与像素相邻的八个像素的每个灰度值，如果相邻像素的所有八个差都超过预定阈值，则确定像素是否是缺陷。

6. 发明授权

US07630535B2 Die-to-die photomask defect detection using region data to modify inspection thresholds 有权
标题翻译：使用区域数据进行死模光掩模缺陷检测，以修改检查阈值
公开(公告)号：US07630535B2
公开(公告)日：2009-12-08
申请号：US11276426
申请日：2006-02-28
申请人： Ikunao Isomura
发明人： Ikunao Isomura
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.
摘要翻译：一种图案检查装置，其将与待检查的同一目标板的多个部分光学图像数据进行比较，所述目标板形成为图案，包括光学图像数据获取单元，其获取待检查的目标板的光学图像数据以及比较多个部分光学图像数据的比较电路。在比较电路中，输入基于表示预定区域的区域图案的信息生成的区域图像数据，并且当将多个部分光学图像数据彼此进行比较时，参照输入区域图像数据改变判定基准，决定目标板上是否存在缺陷。

7. 发明授权

US07421109B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US07421109B2
公开(公告)日：2008-09-02
申请号：US10642760
申请日：2003-08-19
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00 , G01B11/00 , G01J1/10
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
摘要翻译：一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同成像装置。

8. 发明申请

US20070071307A1 PATTERN INSPECTION APPARATUS, PATTERN INSPECTION METHOD AND PROGRAM 有权
标题翻译：模式检查装置，模式检查方法和程序
公开(公告)号：US20070071307A1
公开(公告)日：2007-03-29
申请号：US11276426
申请日：2006-02-28
申请人： Ikunao ISOMURA
发明人： Ikunao ISOMURA
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.
摘要翻译：一种图案检查装置，其将与待检查的同一目标板的多个部分光学图像数据进行比较，所述目标板形成为图案，包括光学图像数据获取单元，其获取待检查的目标板的光学图像数据以及比较多个部分光学图像数据的比较电路。在比较电路中，输入基于表示预定区域的区域图案的信息生成的区域图像数据，并且当将多个部分光学图像数据彼此进行比较时，参照输入区域图像数据改变判定基准，决定目标板上是否存在缺陷。

9. 发明申请

US20050213084A1 Mask-defect inspecting apparatus 有权
标题翻译：掩模缺陷检查装置
公开(公告)号：US20050213084A1
公开(公告)日：2005-09-29
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL）以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。

10. 发明授权

US10578560B2 Inspection apparatus and method for detecting false defects 有权
公开(公告)号：US10578560B2
公开(公告)日：2020-03-03
申请号：US13440080
申请日：2012-04-05
申请人： Hiroteru Akiyama , Ikunao Isomura
发明人： Hiroteru Akiyama , Ikunao Isomura
IPC分类号： H04N7/18 , G01N21/956
摘要： An inspection apparatus and method comprising a unit for acquiring an optical image of an object to be inspected by irradiating the object with light, wherein the unit includes a line sensor comprising a plurality of sensors linearly arranged in a row, a generating unit for generating a reference image from design data of the object to be inspected, a comparing unit for comparing the optical image with the reference image, a unit for storing data of three lines acquired by the line sensor, and calculating differences between a gradation value of a pixel on a center line and each gradation value of the eight pixels adjacent to the pixel determining if the pixel is a defect if all of the eight differences of the adjacent pixels are more than a predetermined threshold.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式