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1. 发明申请

US20120081538A1 PATTERN INSPECTION APPARATUS 审中-公开
标题翻译：图案检查装置
公开(公告)号：US20120081538A1
公开(公告)日：2012-04-05
申请号：US13242655
申请日：2011-09-23
申请人： Riki Ogawa , Masatoshi Hirono , Takeshi Nishizaka , Ryoichi Hirano , Ikunao Isomura , Kazuto Matsuki , Fumio Ozaki
发明人： Riki Ogawa , Masatoshi Hirono , Takeshi Nishizaka , Ryoichi Hirano , Ikunao Isomura , Kazuto Matsuki , Fumio Ozaki
IPC分类号： H04N7/18
CPC分类号： G01N21/956
摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.
摘要翻译：该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内，自动对焦机构控制单元停止自动对焦机构。

2. 发明申请

US20100247085A1 AUTOMATIC FOCUS ADJUSTING MECHANISM AND OPTICAL IMAGE ACQUISITION APPARATUS 有权
标题翻译：自动调焦机构和光学图像采集装置
公开(公告)号：US20100247085A1
公开(公告)日：2010-09-30
申请号：US12729307
申请日：2010-03-23
申请人： Masataka Shiratsuchi , Yoshinori Honguh , Masatoshi Hirono , Riki Ogawa , Shinji Sugihara
发明人： Masataka Shiratsuchi , Yoshinori Honguh , Masatoshi Hirono , Riki Ogawa , Shinji Sugihara
IPC分类号： G03B13/00
CPC分类号： G03B13/00
摘要： In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.
摘要翻译：在自动聚焦调节机构中，将具有图案化表面的测试样品安装在安装台上，并且将通过形成在场停止器中的狭缝的光束施加到测试样品的图案化表面。从测试样品反射的光束被分成两段光束。在分段光束的光路上设置聚焦调节孔径，具有形成菱形的各个孔。穿过菱形孔的分段光束的量由光接收单元检测。基于检测到的光量之差，通过焦点调节单元来控制安装台的位置。

3. 发明授权

US08004655B2 Automatic focus adjusting mechanism and optical image acquisition apparatus 有权
标题翻译：自动调焦机构和光学图像采集装置
公开(公告)号：US08004655B2
公开(公告)日：2011-08-23
申请号：US12729307
申请日：2010-03-23
申请人： Masataka Shiratsuchi , Yoshinori Honguh , Masatoshi Hirono , Riki Ogawa , Shinji Sugihara
发明人： Masataka Shiratsuchi , Yoshinori Honguh , Masatoshi Hirono , Riki Ogawa , Shinji Sugihara
IPC分类号： G03B27/34
CPC分类号： G03B13/00
摘要： In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.
摘要翻译：在自动聚焦调节机构中，将具有图案化表面的测试样品安装在安装台上，并且将通过形成在场停止器中的狭缝的光束施加到测试样品的图案化表面。从测试样品反射的光束被分成两段光束。在分段光束的光路上设置聚焦调节孔径，具有形成菱形的各个孔。穿过菱形孔的分段光束的量由光接收单元检测。基于检测到的光量之差，通过焦点调节单元来控制安装台的位置。

4. 发明授权

US08229206B2 Photomask inspection method 有权
标题翻译：光掩模检查方法
公开(公告)号：US08229206B2
公开(公告)日：2012-07-24
申请号：US12546963
申请日：2009-08-25
申请人： Masatoshi Hirono
发明人： Masatoshi Hirono
IPC分类号： G06K9/00 , G01N21/00 , G01N21/86 , G01V8/00
CPC分类号： G06T7/0004 , G06T2207/10056 , G06T2207/30148
摘要： A photomask inspection method that identifies a foreign particle such as dirt on a photomask with high sensitivity by suppressing erroneous identification due to an influence of noise is provided. The photomask inspection method includes acquiring image data of a photomask having regions with different layer structures on a surface thereof, creating inverted image data by subtracting the image data from pixel value data of the regions, creating offset inverted image data by raising pixel values of the inverted image data by a fixed amount, creating normalized correlation image data by computing a normalized correlation of the offset inverted image data and an offset Gaussian distribution-type kernel, and identifying foreign particles by comparing the normalized correlation image data and a predetermined threshold.
摘要翻译：提供了一种光掩模检查方法，其通过抑制由于噪声的影响而导致的错误识别，以高灵敏度识别光掩模上的杂质等杂质。光掩模检查方法包括获取具有在其表面上具有不同层结构的区域的光掩模的图像数据，通过从区域的像素值数据中减去图像数据来产生反转的图像数据，通过提高偏移反转的图像数据，反转图像数据固定量，通过计算偏移反转图像数据和偏移高斯分布型核心的归一化相关性，通过比较归一化相关图像数据和预定阈值来识别外来粒子，从而产生归一化相关图像数据。

5. 发明授权

US07403142B2 Optical quantizing unit and optical A/D converter 失效
公开(公告)号：US07403142B2
公开(公告)日：2008-07-22
申请号：US11525842
申请日：2006-09-25
申请人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
发明人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
IPC分类号： H03M1/00
CPC分类号： G02F7/00 , G02F3/02
摘要： An optical quantizing unit includes an optical divider dividing 1st optical pulses to be quantized and sending the divided 1st optical pulses into a plurality of paths; a plurality of optical filters passing with different transmittances the divided 1st optical pulses; and an optical threshold filter sequentially receiving the 1st optical pulses, and sending 2nd optical pulses when light intensities of the 1st optical pulses are above a preset threshold value.

6. 发明申请

US20070077522A1 Optical recording medium, method for reproducing information and optical information reproducing apparatus 审中-公开
标题翻译：光记录介质，再现信息的方法和光信息再生装置
公开(公告)号：US20070077522A1
公开(公告)日：2007-04-05
申请号：US11526863
申请日：2006-09-26
申请人： Yasuhiro Satoh , Sumio Ashida , Masatoshi Hirono
发明人： Yasuhiro Satoh , Sumio Ashida , Masatoshi Hirono
IPC分类号： G11B7/24
CPC分类号： G11B7/252 , G11B7/2403 , G11B7/24038 , G11B7/246 , G11B7/2533 , G11B7/2534 , G11B7/2535 , G11B7/259 , G11B2007/24312 , G11B2007/24314 , G11B2007/24316 , G11B2007/25706 , G11B2007/25708 , G11B2007/2571 , G11B2007/25711 , G11B2007/25713 , G11B2007/25715 , G11B2007/25716
摘要： An optical recording medium includes a plurality of information layers and an absorption variation layer. Information is recorded in the plurality of information layers. The absorption variation layer is disposed between respective two adjacent information layers. Light transmittance of each absorption variation layer varies in accordance with light applied thereto.
摘要翻译：光记录介质包括多个信息层和吸收变化层。信息被记录在多个信息层中。吸收变化层设置在相邻的两个相邻信息层之间。每个吸收变化层的透光率根据施加于其上的光而变化。

7. 发明授权

US07935460B2 Mask blank for EUV exposure and mask for EUV exposure 有权
标题翻译： EUV暴露的掩护空白和EUV暴露的掩码
公开(公告)号：US07935460B2
公开(公告)日：2011-05-03
申请号：US12209380
申请日：2008-09-12
申请人： Masatoshi Hirono
发明人： Masatoshi Hirono
IPC分类号： G03F1/00 , B32B17/10
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , Y10T428/31616
摘要： Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is provided on the substrate and reflects EUV light, and an absorbent layer which is provided on the reflecting layer and absorbs EUV light. Reflectance of light at a wavelength between 150 nm and 300 nm is greater at the absorbent layer than that of the reflecting layer. The mask for EUV exposure can be manufactured by processing this mask blank for EUV exposure.
摘要翻译：提供用于EUV曝光的掩模和用于制造EUV曝光的掩模板，以提高紫外线检查光的对比度并提高掩模的检查性能。用于EUV曝光的掩模空白包括基板，设置在基板上并反射EUV光的反射层，以及设置在反射层上并吸收EUV光的吸收层。在吸收层处，150nm至300nm波长处的光的反射率大于反射层的反射率。用于EUV曝光的掩模可以通过处理该掩模空白来进行EUV曝光来制造。

8. 发明申请

US20070166044A1 Optical quantizing unit and optical A/D converter 失效
标题翻译：光学量化单元和光学A / D转换器
公开(公告)号：US20070166044A1
公开(公告)日：2007-07-19
申请号：US11525842
申请日：2006-09-25
申请人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
发明人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
IPC分类号： H04B10/12
CPC分类号： G02F7/00 , G02F3/02
摘要： An optical quantizing unit includes an optical divider dividing 1st optical pulses to be quantized and sending the divided 1st optical pulses into a plurality of paths; a plurality of optical filters passing with different transmittances the divided 1st optical pulses; and an optical threshold filter sequentially receiving the 1st optical pulses, and sending 2nd optical pulses when light intensities of the 1st optical pulses are above a preset threshold value.
摘要翻译：一个光学量化单元包括一个分频器，用于分割要量化的1个光脉冲，并将分开的1个<！ - SIPO - >光脉冲发送到多个路径中; 多个光滤波器，通过不同的透射率，分开的1 光脉冲; 以及光阈值滤波器，其顺序地接收第一<！ - SIPO - >光脉冲，并且当第一<！ - SIPO - >光脉冲的光强度为高于预设阈值。

9. 发明授权

US07671771B2 Optical quantizing unit and optical A/D converter 失效
标题翻译：光学量化单元和光学A / D转换器
公开(公告)号：US07671771B2
公开(公告)日：2010-03-02
申请号：US12155174
申请日：2008-06-02
申请人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
发明人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
IPC分类号： H03M1/00
CPC分类号： G02F7/00 , G02F3/02
摘要： An optical quantizing unit includes an optical divider dividing 1st optical pulses to be quantized and sending the divided 1st optical pulses into a plurality of paths; a plurality of optical filters passing with different transmittances the divided 1st optical pulses; and an optical threshold filter sequentially receiving the 1st optical pulses, and sending 2nd optical pulses when light intensities of the 1st optical pulses are above a preset threshold value.
摘要翻译：光量化单元包括分频器，用于分割要量化的第一光脉冲，并将分割的第一光脉冲发送到多个路径; 多个通过不同透射率的光滤波器分配的第一光脉冲; 以及光阈值滤波器，其顺序地接收第一光脉冲，并且当第一光脉冲的光强度高于预设阈值时发送第二光脉冲。

10. 发明申请

US20080297391A1 Optical quantizing unit and optical a/d converter 失效
标题翻译：光学量化单元和光学a / d转换器
公开(公告)号：US20080297391A1
公开(公告)日：2008-12-04
申请号：US12155174
申请日：2008-06-02
申请人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
发明人： Masatoshi Hirono , Takahiro Suzuki , Hideki Ito , Takeshi Morino
IPC分类号： H03M1/12
CPC分类号： G02F7/00 , G02F3/02
摘要： An optical quantizing unit includes an optical divider dividing 1st optical pulses to be quantized and sending the divided 1st optical pulses into a plurality of paths; a plurality of optical filters passing with different transmittances the divided 1st optical pulses; and an optical threshold filter sequentially receiving the 1st optical pulses, and sending 2nd optical pulses when light intensities of the 1st optical pulses are above a preset threshold value.
摘要翻译：光量化单元包括分频器，用于分割要量化的第一光脉冲，并将分割的第一光脉冲发送到多个路径; 多个通过不同透射率的光滤波器分配的第一光脉冲; 以及光阈值滤波器，其顺序地接收第一光脉冲，并且当第一光脉冲的光强度高于预设阈值时发送第二光脉冲。

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