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1. 发明授权

US5504596A Exposure method and apparatus using holographic techniques 失效
标题翻译：使用全息技术的曝光方法和装置
公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
IPC分类号： G03F7/20 , G03H1/00 , G03H1/26
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译：使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

2. 发明授权

US5528390A Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques 失效
标题翻译：用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置
公开(公告)号：US5528390A
公开(公告)日：1996-06-18
申请号：US461105
申请日：1995-06-05
申请人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
发明人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
IPC分类号： G03F7/20 , G03H1/00 , G03H1/04 , G03H1/20
CPC分类号： G03F7/70058 , G03H1/0005 , G03H1/0408 , G03H2001/0094 , G03H2001/0491 , G03H2260/12
摘要： An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques. The apparatus comprises support means for holding a hologram recording plate at a predetermined position both during recording operation and reconstructing operation, a first illuminating optical system for introducing a light beam from a coherent light source to a mask and irradiating a subject beam produced from the mask into the recording plate, a second illuminating optical system for irradiating the light beam from the coherent light source as a reference beam into the recording plate, a carrier apparatus for disposing during reconstructing operation a substrate at the position of the mask in place of the mask, a third illuminating optical system for irradiating a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate, and a controller for selectively controlling the first, second and third illuminating optical systems to put an at least selected one of them into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.
摘要翻译：一种用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置。该装置包括用于在记录操作和重建操作期间将全息图记录板保持在预定位置的支撑装置，用于将来自相干光源的光束引入到掩模并照射由掩模产生的被摄体光束的第一照明光学系统将用于将来自相干光源的光束作为参考光束照射到记录板中的第二照明光学系统，用于在重建操作期间在掩模的位置处置换基板以代替掩模的载体设备第三照明光学系统，用于将具有参考光束的共轭光束照射到通过记录操作形成全息图的记录板中，以在基板的光敏表面上形成全息图像，并且控制器，用于选择性地控制第一，第二和第三照明光学系统，其中最少选择的一个进入操作状态，以便将固定光束照射到记录板中以固定全息图。

3. 发明授权

US5774240A Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques 失效
标题翻译：用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置
公开(公告)号：US5774240A
公开(公告)日：1998-06-30
申请号：US441802
申请日：1995-05-16
申请人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
发明人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
IPC分类号： G03F7/20 , G03H1/00 , G03H1/20
CPC分类号： G03F7/70058 , G03H1/0005 , G03H1/0408 , G03H2001/0094 , G03H2001/0491 , G03H2260/12
摘要： An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate uses holographic techniques. The apparatus includes support for holding a hologram recording plate at a predetermined position during both a recording operation and a reconstructing operation. A first illuminating optical system introduces a light beam from a coherent light source to a mask and irradiates a subject beam produced from the mask into the recording plate. A second illuminating optical system irradiates the light beam from a coherent light source as a reference beam into the recording plate, a carrier apparatus disposes during the reconstructing operation, a substrate at the position of the mask, in place of the mask. A third illuminating optical system for irradiates a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by the recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate. A controler for for selectively controlling the first, second and third illuminating optical systems puts an at least a selected one of the optical system into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.
摘要翻译：用于将掩模图案再现到基板的光敏表面上的曝光装置使用全息技术。该装置包括在记录操作和重建操作期间将全息图记录板保持在预定位置的支撑件。第一照明光学系统将来自相干光源的光束引入到掩模，并将从掩模产生的被摄体光束照射到记录板中。第二照明光学系统将来自相干光源的光束作为参考光束照射到记录板中，载体设备在重建操作期间将掩模的位置处的基板代替掩模。第三照明光学系统，用于将具有参考光束的共轭光束照射到通过记录操作形成全息图的记录板中，以在基板的光敏表面上形成全息图像。用于选择性地控制第一，第二和第三照明光学系统的控制器将光学系统中的至少一个所选择的一个放入操作状态，以便将固定光束照射到记录板中以固定全息图。

4. 发明授权

US08704431B2 Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method 有权
标题翻译：放电灯，光源装置，曝光装置和曝光装置的制造方法
公开(公告)号：US08704431B2
公开(公告)日：2014-04-22
申请号：US13462454
申请日：2012-05-02
申请人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
发明人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
IPC分类号： H01J61/52
CPC分类号： F21V19/006 , G03F7/70016 , H01J5/56 , H01J61/523 , H01J61/822
摘要： A light source apparatus is equipped with a discharge lamp, which has a glass tube that forms a light emitting part and a base member that is coupled thereto, and a mounting apparatus that holds the discharge lamp via the base member. Therein, the base member has a flange part that contacts positioning plate of the mounting apparatus, and a fixed part that is urged with a pressing force that presses the flange part to the positioning plate. Furthermore, the mounting apparatus has a fixing arm that urges the fixed part by a compression coil spring.
摘要翻译：光源装置配备有放电灯，其具有形成发光部的玻璃管和与其连接的基座部件，以及通过基座部件保持放电灯的安装装置。其特征在于，所述基座部件具有与所述安装装置的定位板接触的凸缘部以及将所述凸缘部压向所述定位板的按压力而被推压的固定部。此外，安装装置具有通过压缩螺旋弹簧推压固定部的固定臂。

5. 发明申请

US20110043784A1 OBJECT MOVING APPARATUS, OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS, OBJECT INSPECTING APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：对象移动装置，对象处理装置，曝光装置，对象检查装置和装置制造方法
公开(公告)号：US20110043784A1
公开(公告)日：2011-02-24
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , B65G47/00 , B65G43/00
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

6. 发明授权

US07372544B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US07372544B2
公开(公告)日：2008-05-13
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32 , G03B27/42 , G03B27/44 , G03B27/54
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

7. 发明申请

US20070216885A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20070216885A1
公开(公告)日：2007-09-20
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

8. 发明授权

US5920378A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5920378A
公开(公告)日：1999-07-06
申请号：US853389
申请日：1997-05-09
申请人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
发明人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70791 , G03F9/70
摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
摘要翻译：投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。大型感光板的曝光是可能的，而不会增加平板台面行程的长度。使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。多个离轴型板对准系统用于观察多个基准标记。

9. 发明授权

US5798822A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5798822A
公开(公告)日：1998-08-25
申请号：US950964
申请日：1997-10-15
申请人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
发明人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
IPC分类号： G03F7/207 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7026
摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.
摘要翻译：一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

10. 发明授权

US5657130A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US5657130A
公开(公告)日：1997-08-12
申请号：US408714
申请日：1995-03-22
申请人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
发明人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70358 , G03F7/70791 , G03F9/70
摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.
摘要翻译：在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

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