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    • 5. 发明授权
    • Semiconductor laser device and fabrication method thereof
    • 半导体激光器件及其制造方法
    • US06954477B2
    • 2005-10-11
    • US10821342
    • 2004-04-09
    • Shiro UchidaTsuyoshi Tojo
    • Shiro UchidaTsuyoshi Tojo
    • H01S5/042H01S5/22H01S5/00
    • H01S5/22H01S5/0425H01S5/2213
    • A method of fabricating a ridge-waveguide type semiconductor laser device having a large half-value width and a high kink level is provided. First, an effective refractive index difference Δn between an effective refractive index neff1 of the ridge and an effective refractive index neff2 of a portion on each of both sides of the ridge is taken as Δn=neff1−neff2, and a ridge width is taken as W. On such an assumption, constants “a”, “b”, “c”, and “d” of the following three equations are set on X-Y coordinates (X-axis: W, Y-axis: Δn) The first equation is expressed by Δn≦a×W+b, where “a” and “b” are constants determining a kink level. The second equation is expressed by W≧c, where “c” is a constant specifying a minimum ridge width at the time of formation of the ridge. The third equation is expressed by Δn≧d, where “d” is a constant specified by a desired half-width value θpara. Then at least either of a kind and a thickness of an insulating film, a thickness of an electrode film on the insulating film, and a kind and a thickness of a portion, located on each of both the sides of the ridge, of the upper cladding layer is set in such a manner that a combination of Δn and W satisfies the above three equations.
    • 提供一种制造具有大的半值宽度和高扭结等级的脊 - 波导型半导体激光器件的方法。 首先,脊的两侧的部分的有效折射率nλef​​f1 <! - SIPO - >的有效折射率差值Deltan, 被取为Deltan = n eff1 eff2 ,并且脊宽度取为W.在这样的假设下,常数“a”,“b”,“c 在XY坐标(X轴:W,Y轴:Deltan)上设置以下三个方程的“d”和“d”。第一方程由Deltan <= axW + b表示,其中“a”和“b” 是确定扭结水平的常数。 第二方程用W> = c表示,其中“c”是指定形成脊时的最小脊宽度的常数。 第三个方程由Deltan> = d表示,其中“d”是由期望的半角值θ指定的常数。 然后,将绝缘膜的种类和厚度,绝缘膜上的电极膜的厚度和位于隆起的两侧的每一侧上的部分的种类和厚度中的至少一个,上部 以如下方式设置包层:Deltan和W的组合满足上述三个等式。
    • 6. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US06721342B2
    • 2004-04-13
    • US10342984
    • 2003-01-15
    • Yoshifumi YabukiTsuyoshi Tojo
    • Yoshifumi YabukiTsuyoshi Tojo
    • H01S304
    • H01S5/4031H01S5/0014H01S5/0224H01S5/02252H01S5/02276H01S5/02469H01S5/02476H01S5/32341
    • Disclosed is an array type semiconductor laser device including a plurality of semiconductor laser chips each of which has an active layer for forming a light emitting point, wherein the semiconductor laser chips are arrayed on the same substrate in such a manner as to be spaced from each other at intervals. In this laser device, an array configuration of the semiconductor laser chips is specified such that a gap between arbitrary adjacent two laser chips located inwardly from both outermost laser chips positioned at both the edges of the semiconductor laser device is wider than a gap between each of said outermost laser chips and an LD chip adjacent thereto. This laser device is advantageous in reducing the effect of thermal interference mutually exerted on the laser chips, thereby ensuring a thermal uniformity over the entire laser chips.
    • 公开了一种阵列型半导体激光器件,其包括多个半导体激光器芯片,每个半导体激光器芯片具有用于形成发光点的有源层,其中半导体激光器芯片以与每个半导体激光器芯片间隔开的方式排列在同一基板上 其他的间隔。 在该激光装置中,规定了半导体激光芯片的阵列结构,使得位于半导体激光装置的两端的两个最外侧的激光芯片的位于内侧的任意相邻的两个激光芯片之间的间隙宽于 所述最外面的激光芯片和与其相邻的LD芯片。 该激光装置有利于减少相互施加在激光芯片上的热干扰的影响,从而确保整个激光芯片的热均匀性。
    • 7. 发明授权
    • Semiconductor device, its manufacturing method and substrate for manufacturing a semiconductor device
    • 半导体装置及其制造方法以及半导体装置的制造用基板
    • US06455342B2
    • 2002-09-24
    • US09840199
    • 2001-04-23
    • Toshimasa KobayashiTsuyoshi Tojo
    • Toshimasa KobayashiTsuyoshi Tojo
    • H01L2100
    • H01L33/0095H01L29/045H01L33/007H01S5/0201H01S5/0202H01S5/0213H01S5/32341
    • It is intended to provide a semiconductor device, its manufacturing method and substrate for manufacturing the semiconductor device which ensures that good cleavable surfaces be made stably in a semiconductor layer under precise control upon making edges of cleaves surfaces in the semiconductor layer stacked on a substrate even when the substrate is non-cleavable, difficult to cleave or different in cleavable orientation from the semiconductor layer. A semiconductor layer 2 made of III-V compound semiconductors is stacked to form a laser structure on a sapphire substrate 1. In selective locations other than the location of a ridge stripe portion 11 and a mesa portion 12 along a portion of a semiconductor layer 2 where a cavity edge 3 should be made, namely, in locations at opposite sides of the mesa portion 12, stripe-shaped cleavage-assist grooves 4 are made to extend in parallel to the (11-20)-oriented surface of the semiconductor layer 2, and the semiconductor layer 2 and the sapphire substrate 1 are cleaved from the cleavage-assist groove 4 to make the cavity edge 3 made up of the cleavable surface of the semiconductor layer 2.
    • 旨在提供一种用于制造半导体器件的半导体器件,其制造方法和用于制造半导体器件的衬底,其确保了在半导体层中的层叠在衬底上的裂纹表面的边缘上,在精确控制下,在半导体层中稳定地制备良好的可切割表面 当衬底不可切割时,难以从半导体层切割或不同于可切割取向。 层叠由III-V族化合物半导体构成的半导体层2,以在蓝宝石基板1上形成激光结构。在沿着半导体层2的一部分的棱条部11和台面部12的位置以外的选择位置 其中应当制造空腔边缘3,即在台面部分12的相对侧的位置处,条形切割辅助槽4被制成平行于半导体层的(11-20)取向的表面延伸 2,并且半导体层2和蓝宝石衬底1从解理辅助槽4断裂,以形成由半导体层2的可切割表面构成的空腔边缘3。