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    • 6. 发明授权
    • Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    • 电介质膜结构,使用电介质膜结构的压电致动器和喷墨头
    • US07938515B2
    • 2011-05-10
    • US12389710
    • 2009-02-20
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • B41J2/045
    • B41J2/14233H01L41/0973H01L41/316
    • The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, 1′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.
    • 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:u =(Cc / Ca)×(Wa / Wc)(1)其中,Cc是介电膜的(001')面的峰的计数 平面外X射线衍射测量(这里,1'是选择为Cc变为最大的自然数); Ca是In平面X射线衍射测定中的电介质膜的(h'00)面的峰值的计数数(这里,h'是选择为Cc变为最大的自然数); Wc是外平面摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; Wa是In平面摇摆曲线X射线衍射测定中的电介质膜的(h'00)面的峰值的半值宽度。