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    • 5. 发明申请
    • Method for Producing Cyclic Silane Using Concentration Method
    • US20170203970A1
    • 2017-07-20
    • US15326634
    • 2015-07-14
    • Thin Film Electronics ASA
    • Yuichi GOTOKentaro NAGAIMasahisa ENDOGun SON
    • C01B33/04
    • C01B33/04
    • There is provided a cyclic silane having high purity, particularly cyclopentasilane having high purity, and a composition containing a polysilane obtained by polymerization of the cyclic silane which a highly conductive and good silicon thin film is formed by applying the composition in a form of a coating-type polysilane composition to a substrate, followed by baking. A method for producing a cyclic silane of Formula (3): (SiH2)n   Formula (3) (wherein n is an integer of 4 to 6) comprising an (A) step of reacting a cyclic silane compound of Formula (1): (SiR1R2)n   Formula (1) (wherein R1 and R2 are each a hydrogen atom, a C1-6 alkyl group, or an optionally substituted phenyl group, and n is an integer of 4 to 6) with hydrogen halide in cyclohexane in the presence of aluminum halide to obtain a solution containing a cyclic silane compound of Formula (2): (SiR3R4)n   Formula (2) (wherein R3 and R4 are each a halogen atom, and n is an integer of 4 to 6), and then distilling the solution to obtain a cyclic silane compound of Formula (2), and a (B) step of dissolving the cyclic silane compound of Formula (2) in an organic solvent, and reducing the cyclic silane compound of Formula (2) with hydrogen or lithium aluminum hydride. The distillation at the (A) step may be carried out at a temperature of 40 to 80° C. under a reduced pressure of 0 to 30 Torr.