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1. 发明授权

US08727708B2 Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component 有权
标题翻译：反射装置，连通管，排气泵，排气系统，清洁系统的方法，用于实施该方法的存储介质存储程序，基板处理装置和颗粒捕获部件
公开(公告)号：US08727708B2
公开(公告)日：2014-05-20
申请号：US13047370
申请日：2011-03-14
申请人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
发明人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
IPC分类号： F04D29/70 , F04D19/04
CPC分类号： F04D19/042 , F04D29/701 , F05D2260/607 , Y10T137/794
摘要： A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要翻译：能够防止颗粒渗入处理室的反射装置。反射装置设置在连通管中。连通管允许基板处理装置和排气泵的处理室彼此连通。排气泵具有至少一个旋转叶片。反射装置包括至少一个反射表面。至少一个反射表面被定向到排气泵。

2. 发明授权

US08134134B2 Particle attachment preventing method and substrate processing apparatus 有权
标题翻译：粒子附着防止方法和基板处理装置
公开(公告)号：US08134134B2
公开(公告)日：2012-03-13
申请号：US12612990
申请日：2009-11-05
申请人： Takahiro Murakami
发明人： Takahiro Murakami
IPC分类号： G21G5/00
CPC分类号： H01J37/32871 , H01J37/32091 , H01J37/32165 , H01J37/32477
摘要： In a particle attachment preventing method in a substrate processing apparatus, an electron density control power supplied from the second power supply is adjusted such that an electron density above the substrate gets lower than during a plasma processing, for a preset short period of time after the plasma processing is ended, and a bias power supplied from the first power is maintained for the preset short period of time. The second power supply is a high frequency power supply for supplying a high frequency power having a frequency that is higher than that of the bias power, and in said adjusting of the electron density control power, the high frequency power supplied from the second power supply is lowered as compared with that during the plasma processing.
摘要翻译：在基板处理装置中的粒子附着防止方法中，调整从第二电源供给的电子密度控制电力，使得基板上方的电子密度低于等离子体处理期间的电子密度，在预定的短时间段之后等离子体处理结束，并且从预设的短时间段维持从第一功率提供的偏置功率。第二电源是用于提供具有高于偏置功率的频率的高频功率的高频电源，并且在所述电子密度控制功率的调整中，从第二电源提供的高频功率与等离子体处理期间相比降低。

3. 发明授权

US08072420B2 Input device equipped with illumination mechanism 有权
标题翻译：输入设备配有照明机构
公开(公告)号：US08072420B2
公开(公告)日：2011-12-06
申请号：US11946239
申请日：2007-11-28
申请人： Takahiro Murakami
发明人： Takahiro Murakami
IPC分类号： G09G5/00 , G06F3/041 , H01H9/00
CPC分类号： G06F3/044
摘要： A light guide member and a sensor that constitute a front light mechanism are bonded with a bonded sheet. A double-sided adhesive tape is provided on each surface of the bonded sheet. A repairing material is printed on a surface of the sensor so as to fill concave portions provided between the adjacent X-electrodes. This substantially increases the contact area with the double-sided adhesive tape, and increases the bonding strength between the light guide member and the sensor.
摘要翻译：构成前灯机构的导光构件和传感器用接合片粘合。在粘合片的每个表面上设置双面胶带。将修复材料印刷在传感器的表面上，以便填充设置在相邻X电极之间的凹部。这大大增加了与双面胶带的接触面积，并增加了导光部件和传感器之间的接合强度。

4. 发明申请

US20060262072A1 Coordinate input device and terminal device having the same 审中-公开
标题翻译：具有相同的坐标输入装置和终端装置
公开(公告)号：US20060262072A1
公开(公告)日：2006-11-23
申请号：US11436371
申请日：2006-05-17
申请人： Takahiro Murakami , Hiroshi Shigetaka
发明人： Takahiro Murakami , Hiroshi Shigetaka
IPC分类号： G09G3/36
CPC分类号： G06F3/041 , G06F3/044
摘要： A coordinate input unit is composed of a sensor as a means for detecting a manipulating state on a manipulation surface A manipulated by a coordinate indicator and a front light as an illumination means disposed on the sensor to illuminate the manipulation surface A. When the manipulation surface of the coordinate input device is illuminated, the light emitted from an LED is transmitted in a light introduction plate, emerged from a prism surface, changes its direction by being reflected on a reflection plate, and is directed to the manipulation surface. With this operation, the manipulation surface is illuminated.
摘要翻译：坐标输入单元由作为用于检测由坐标指示器操作的操作面A上的操作状态的传感器和作为设置在传感器上的照明装置的前灯照亮操作面A的装置构成。当操作面坐标输入装置被照亮时，从光发射的光在光导入板中透射，从棱镜面出射，通过在反射板上反射而改变其方向，并被引导到操作面。通过该操作，操作面被照亮。

5. 发明申请

US20050184637A1 Envelope for a flat panel display and flat panel display employing the envelope 审中-公开
标题翻译：用于平板显示器的信封和采用信封的平板显示器
公开(公告)号：US20050184637A1
公开(公告)日：2005-08-25
申请号：US11044455
申请日：2005-01-28
申请人： Tsunehiko Sugawara , Takahiro Murakami
发明人： Tsunehiko Sugawara , Takahiro Murakami
IPC分类号： H01J1/30 , H01J11/02 , H01J29/02 , H01J29/86 , H01J31/12 , H01J23/12
CPC分类号： H01J31/123 , H01J29/862 , H01J2329/861 , H01J2329/862
摘要： An envelope for e.g. FED has spacerless structure while increase of the mass due to increase of the thickness of glass is suppressed. Further, the handling of conductors connected to emitters can be easy. An envelope for a flat panel display comprising a glass envelope and a support member for preventing deformation, wherein the glass envelope comprises a front glass and a rear glass, and the support member comprises a rim, bridges and a rear plate. The front glass comprises a face portion for displaying an image and a skirt portion is extended to the rear glass so that a hermetical seal is kept by the contact of a seal edge portion at the end of the skirt portion to the rear glass, the rim supports outer peripheries of outer surfaces of the skirt portion and the face portion, the rear plate is fixed to the rear glass to support the rear glass, and the rim and the rear plate are connected via a plurality of bridges.
摘要翻译：一个信封。 FED具有无间隙结构，同时由于玻璃的厚度增加而增加了质量。此外，连接到发射器的导体的处理可以容易。一种用于平板显示器的信封，包括玻璃外壳和用于防止变形的支撑构件，其中玻璃外壳包括前玻璃和后玻璃，并且支撑构件包括边缘，桥和后板。前玻璃包括用于显示图像的面部分，并且裙部延伸到后玻璃，使得通过裙部的端部处的密封边缘部分与后玻璃的接触来保持气密密封，边缘支撑裙部外表面的外周和面部，后板固定在后玻璃上以支撑后玻璃，并且边缘和后板通过多个桥连接。

6. 发明授权

US06229281B1 Packed battery examining apparatus 失效
标题翻译：封装电池检查装置
公开(公告)号：US06229281B1
公开(公告)日：2001-05-08
申请号：US09446127
申请日：2000-04-07
申请人： Hiroyuki Tatsumi , Toshiaki Okuma , Tatsuya Fuchizaki , Takahiro Murakami
发明人： Hiroyuki Tatsumi , Toshiaki Okuma , Tatsuya Fuchizaki , Takahiro Murakami
IPC分类号： H01M1046
CPC分类号： H01M10/4257 , G01R31/3004 , H01M2/1022 , H01M10/4285 , H01M10/48
摘要： A controller comprises means for transmitting to an interface device, when predetermined data for examination must be acquired from a communication and charge or discharge controller in a packed battery which is an examination object in the step of performing examination processing, a communication command for acquiring the data for examination, the interface device comprises means for converting, when it receives the communication command from the controller, the received communication command into protocol data corresponding to a communication protocol used for communication with the packed battery which is an examination object, means for transmitting the obtained protocol data to the communication and charge or discharge controller in the packed battery which is an examination object, and means for receiving the data for examination which has been fed from the communication and the charge or discharge controller in the packed battery and transmitting the data for examination to the controller.
摘要翻译：控制器包括用于发送到接口设备的装置，当在执行检查处理的步骤中作为检查对象的打包电池中的通信和充电或放电控制器必须获取用于检查的预定数据时，用于检查的数据，接口装置包括用于当接收到来自控制器的通信命令时将接收到的通信命令转换为与用作与检查对象的打包电池进行通信的通信协议相对应的协议数据的装置，用于发送获取的作为检查对象的包装电池中的通信和充电或放电控制器的协议数据，以及用于接收从通信中馈送的检查数据和包装电池中的充电或放电控制器的装置，数据进行检查控制器。

7. 发明授权

US5326951A Push button switch 失效
标题翻译：按钮开关
公开(公告)号：US5326951A
公开(公告)日：1994-07-05
申请号：US3173
申请日：1993-01-12
申请人： Takahiro Murakami
发明人： Takahiro Murakami
IPC分类号： H01H1/029 , H01H1/24 , H01H1/40 , H01H1/50 , H01H1/64 , H01H13/52 , H01H13/785 , H01H13/14
CPC分类号： H01H13/785 , H01H1/029 , H01H13/52 , H01H1/242 , H01H1/403 , H01H1/50 , H01H1/64 , H01H2013/525 , H01H2201/032 , H01H2235/014
摘要： A push button switch comprises a housing having an opening at the top and provided with a fixed contact member at the inner bottom, a stem supported to be vertically movable in and with respect to the housing, and an elastic member being capable of buckling and having one end attached to near a lower end of the stem and the other end attached to near the inner bottom of the housing, the elastic member being positioned in the housing to extend diagonally and urging the stem upward by its own resilient force. A high degree of reliability is ensured with the simple structure and a good click feeling is provided.
摘要翻译：按钮开关包括在顶部具有开口并在内部底部设置有固定接触构件的壳体，被支撑为可在壳体中并相对于壳体垂直移动的杆，以及弹性构件，其能够弯曲并具有一端连接到杆的下端附近，另一端附接到壳体的内底附近，弹性构件定位在壳体中以对角地延伸并且通过其自身的弹性力向上推动杆。通过简单的结构确保高可靠性，并且提供良好的咔嗒感。

8. 发明授权

US5221631A Method of fabricating a thin film transistor having a silicon carbide buffer layer 失效
标题翻译：制造具有碳化硅缓冲层的薄膜晶体管的方法
公开(公告)号：US5221631A
公开(公告)日：1993-06-22
申请号：US669425
申请日：1991-03-15
申请人： Hiroyuki Ikeda , Osamu Shimada , Teruo Uchida , Takahiro Murakami
发明人： Hiroyuki Ikeda , Osamu Shimada , Teruo Uchida , Takahiro Murakami
IPC分类号： H01L29/786
CPC分类号： H01L29/78687 , H01L29/78669
摘要： A method of making a thin film transistor is described incorporating the steps of forming a gate electrode, a layer of insulating material, a layer of buffer material, a layer of semiconductor material, a source electrode and drain electrode. The invention reduces the problem of variation in threshold voltage of thin film transistors due to external stress such as the gate voltage or temperature.
摘要翻译：描述制造薄膜晶体管的方法，其包括形成栅电极，绝缘材料层，缓冲材料层，半导体材料层，源电极和漏电极的步骤。本发明减少了由于诸如栅极电压或温度的外部应力引起的薄膜晶体管的阈值电压的变化的问题。

9. 发明授权

US08574446B2 Apparatus and method for plasma processing 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US08574446B2
公开(公告)日：2013-11-05
申请号：US12536137
申请日：2009-08-05
申请人： Tamotsu Morimoto , Takahiro Murakami
发明人： Tamotsu Morimoto , Takahiro Murakami
IPC分类号： H01L21/00 , C23F1/00 , B44C1/22
CPC分类号： H01J37/32568 , H01J37/32082
摘要： At the time of plasma igniting or during plasma processing, only optimizing the distance between electrodes in each case caused a limitation to the prevention of charging damage. To resolve this, a novel plasma processing method employs a plasma processing apparatus which includes an upper electrode to which first high-frequency power is applied, a lower electrode to which second high-frequency power is applied, and a lift mechanism for controlling the spacing between the upper and lower electrodes. The first high-frequency power is applied to the upper electrode to cause plasma igniting. The method is adapted to make the spacing between the upper and lower electrodes larger at least at the time of plasma extinction than during plasma processing of a wafer on the lower electrode.
摘要翻译：在等离子体点火或等离子体处理时，仅在每种情况下优化电极之间的距离会对防止充电损坏造成限制。为了解决这个问题，一种新颖的等离子体处理方法采用等离子体处理装置，其包括施加第一高频功率的上电极，施加第二高频电力的下电极和用于控制间隔的升降机构在上下电极之间。将第一高频功率施加到上电极以引起等离子体点火。该方法适于使得上等电极和下电极之间的间隔至少在等离子体消光时比在下电极上的晶片的等离子体处理期间更大。

10. 发明申请

US20120241412A1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 审中-公开
标题翻译：等离子体加工设备和等离子体处理方法
公开(公告)号：US20120241412A1
公开(公告)日：2012-09-27
申请号：US13428624
申请日：2012-03-23
申请人： Takahiro MURAKAMI
发明人： Takahiro MURAKAMI
IPC分类号： B44C1/22 , H01L21/3065 , B05C9/00
CPC分类号： H01J37/32862 , B08B7/0035 , C23C16/4405 , H01J37/32009 , H01J37/32495 , H01J37/32587 , H01J37/3288 , H01J2237/022
摘要： In a plasma processing apparatus for performing a plasma process on a substrate, a damage on a surface of a mounting table can be suppressed without using a dummy wafer when cleaning an inside of the plasma processing apparatus. Upon the completion of a plasma etching process, a surface of the susceptor 3 is exposed, and an inside of a vacuum chamber 1 of the plasma etching apparatus is cleaned by plasma P. Thus, reaction products A adhering to the inside of the vacuum chamber 1 are removed. Here, a DC voltage is applied to the plasma P during the cleaning process. As a result, while obtaining high-density plasma P, the ion energy can be reduced, so that the cleaning process can be performed effectively while suppressing damage on the surface of the susceptor 3.
摘要翻译：在用于在基板上进行等离子体处理的等离子体处理装置中，在清洗等离子体处理装置的内部时，可以抑制在安装台的表面上的损坏而不使用伪晶片。等离子体蚀刻工艺完成后，露出基座3的表面，用等离子体P清洗等离子体蚀刻装置的真空室1的内部。因此，附着在真空室内部的反应产物A 1被删除。这里，在清洁处理期间，向等离子体P施加直流电压。结果，在获得高密度等离子体P的同时，可以降低离子能量，从而能够有效地进行清洗处理，同时抑制基座3的表面的损伤。

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