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1. 发明授权

US07723194B2 Semiconductor device having silicide layers and method of fabricating the same 有权
标题翻译：具有硅化物层的半导体器件及其制造方法
公开(公告)号：US07723194B2
公开(公告)日：2010-05-25
申请号：US12167906
申请日：2008-07-03
申请人： Jeong-Min Choi , Tae-Hong Ha
发明人： Jeong-Min Choi , Tae-Hong Ha
IPC分类号： H01L21/336
CPC分类号： H01L21/823443 , H01L21/76224 , H01L21/823418 , H01L21/823481 , H01L29/665 , H01L29/6656
摘要： Some embodiments include an isolation layer defining an active region of a substrate, a gate pattern formed on the active region, and source/drain regions formed in the active region. Sidewall spacers are formed on sidewalls of the gate pattern, and a blocking insulation layer is formed on the isolation layer and on a portion of the active region neighboring the isolation layer. A silicide layer is formed on source/drain regions between the blocking insulation layer and the sidewall spacers. Some embodiments include defining an active region of a substrate using an isolation layer, forming a gate pattern on the active region, implanting impurities into the active region, and forming a spacer insulation layer on a surface of the substrate with the gate pattern. A region of the spacer insulation layer becomes thinner the closer it is to the gate pattern. Other embodiments are described in the claims.
摘要翻译：一些实施例包括限定衬底的有源区的隔离层，形成在有源区上的栅极图案以及形成在有源区中的源/漏区。侧壁间隔件形成在栅极图案的侧壁上，并且隔离层形成在隔离层上以及与隔离层相邻的一部分有源区上。在阻挡绝缘层和侧壁间隔件之间的源极/漏极区域上形成硅化物层。一些实施例包括使用隔离层限定衬底的有源区，在有源区上形成栅极图案，将杂质注入有源区，以及在栅极图案的衬底的表面上形成间隔绝缘层。间隔绝缘层的区域越靠近栅极图案变薄。在权利要求中描述了其它实施例。

2. 发明申请

US20080073717A1 Semiconductor devices having substrate plug and methods of forming the same 审中-公开
标题翻译：具有基板插头的半导体器件及其形成方法
公开(公告)号：US20080073717A1
公开(公告)日：2008-03-27
申请号：US11785676
申请日：2007-04-19
申请人： Tae-Hong Ha , Jong-Mil Youn , Hoon Lim , Hoo-Sung Cho , Jae-Hun Jeong
发明人： Tae-Hong Ha , Jong-Mil Youn , Hoon Lim , Hoo-Sung Cho , Jae-Hun Jeong
IPC分类号： H01L27/06 , H01L21/02
CPC分类号： H01L27/0688 , H01L21/743
摘要： A semiconductor device includes a device isolation layer disposed in a substrate and defining an active region, a first gate pattern on the active region, a first insulating layer on the substrate and the first gate pattern, a first body region on the first insulating layer, and a first substrate plug extending from the substrate into the first insulating layer, the first substrate plug penetrating the device isolation layer and contacting the substrate under the device isolation layer.
摘要翻译：半导体器件包括设置在衬底中并限定有源区的器件隔离层，有源区上的第一栅极图案，衬底上的第一绝缘层和第一栅极图案，第一绝缘层上的第一体区，以及从所述基板延伸到所述第一绝缘层中的第一基板插塞，所述第一基板插塞穿透所述器件隔离层并且在所述器件隔离层下面接触所述基板。

3. 发明授权

US6149144A Movable work bench 失效
标题翻译：可移动工作台
公开(公告)号：US6149144A
公开(公告)日：2000-11-21
申请号：US249244
申请日：1999-02-11
申请人： Tae-Hong Ha
发明人： Tae-Hong Ha
IPC分类号： B66F5/02 , B25H1/00 , B25H1/16 , F16M11/28 , F16M11/42 , B66F3/00
CPC分类号： F16M11/42 , B25H1/0007 , B25H1/16 , F16M11/046 , F16M11/18 , F16M11/245 , Y10S254/16
摘要： A movable work bench used in repairing a transmission of a vehicle is provided, in which it is possible to control a desired height of the work bench, make fine adjustments for keeping the balance of the transmission supported on the work bench, and easily move the work bench due to the conditions of a working area. The movable work bench comprises a moving body installed at a lower portion of the work bench, a housing having one end mounted on a central portion and another end to which a cap is installed, an elevating means installed in the housing, a driving means mounted on a part of the elevating means for lifting and lowering the elevating means, and a supporting body safely supporting the transmission and lifted and lowered through the operation of the elevating means.
摘要翻译：提供了用于修理车辆变速器的可动工作台，其中可以控制工作台的期望高度，进行微调以保持支撑在工作台上的变速器的平衡，并且容易地移动由于工作区的条件，工作台。可移动工作台包括安装在工作台的下部的移动体，具有安装在中心部分上的一端和安装有盖的另一端的壳体，安装在壳体中的升降装置，安装在其上的驱动装置在用于提升和降低升降装置的升降装置的一部分上，以及通过升降装置的操作安全地支撑变速器并升降的支撑体。

4. 发明授权

US5172462A Spring compression device 失效
标题翻译：弹簧压缩装置
公开(公告)号：US5172462A
公开(公告)日：1992-12-22
申请号：US864643
申请日：1992-04-07
申请人： Tae-Hong Ha
发明人： Tae-Hong Ha
IPC分类号： B25B27/30 , B60G15/07
CPC分类号： B60G15/07 , B25B27/304 , B60G2206/921 , B60G2206/931 , Y10T29/53622
摘要： Disclosed herein is an improved device for speedily compressing a shock absorber spring employed in a vehicle suspension system and minimizing any twisting of the spring during the compression operation. The spring compression device comprises a hollow post, a housing detachably attached to the hollow post and having a clamp for gripping a shock absorber unit, a sliding bar movably mounted in the housing downward or upward, a pair of arcuate swing arms rotatably pivoted at a bracket of the sliding bar and a pair of inverted U-shaped arcuate grippers for clamping the absorber spring and slidably attached to end regions of the swing arms.
摘要翻译：本文公开了一种改进的装置，用于快速压缩在车辆悬架系统中使用的减震器弹簧并且在压缩操作期间使弹簧的任何扭转最小化。弹簧压缩装置包括中空柱，可拆卸地附接到中空柱的壳体，并具有用于夹持减震器单元的夹具，可向下或向上移动地安装在壳体中的滑动杆，一对可旋转地枢转在滑动杆的支架和用于夹紧吸收器弹簧并可滑动地附接到摆臂的端部区域的一对倒U形弓形夹具。

5. 发明授权

US10633056B2 Bicycle with automatic transmission 有权
公开(公告)号：US10633056B2
公开(公告)日：2020-04-28
申请号：US15946267
申请日：2018-04-05
申请人： Min Soo Ha , Jinsu Ha , Tae Hong Ha
发明人： Min Soo Ha , Jinsu Ha , Tae Hong Ha
IPC分类号： B62M11/16 , F16H3/54 , F16H37/04 , B62M9/02
CPC分类号： B62M11/16 , B62M9/02 , F16H3/54 , F16H37/04 , F16H2200/2005 , F16H2200/2035 , F16H2200/2064 , F16H2200/2094
摘要： Provided is a bicycle with an automatic transmission, and more particularly, a bicycle with an automatic transmission for enabling rapid and smooth gearshifting from a low speed to a high speed or from a high speed to a low speed.

6. 发明申请

US20120108058A1 METHODS OF FORMING LAYERS ON SUBSTRATES 有权
标题翻译：在基体上形成层的方法
公开(公告)号：US20120108058A1
公开(公告)日：2012-05-03
申请号：US13269243
申请日：2011-10-07
申请人： TAE HONG HA , WINSOR LAM , TZA-JING GUNG , JOUNG JOO LEE
发明人： TAE HONG HA , WINSOR LAM , TZA-JING GUNG , JOUNG JOO LEE
IPC分类号： H01L21/768
CPC分类号： H01L21/76843 , C23C14/046 , C23C14/345 , H01L21/2855 , H01L21/76858 , H01L21/76865 , H01L21/76873
摘要： Methods for forming layers on a substrate are provided herein. In some embodiments, methods of forming layers on a substrate disposed in a process chamber may include depositing a barrier layer comprising titanium within one or more features in the substrate; and sputtering a material from a target in the presence of a plasma formed from a process gas by applying a DC power to the target, maintaining a pressure of less than about 500 mTorr within the process chamber, and providing up to about 5000 W of a substrate bias RF power to deposit a seed layer comprising the material atop the barrier layer.
摘要翻译：本文提供了在基板上形成层的方法。在一些实施例中，在设置在处理室中的衬底上形成层的方法可以包括在衬底的一个或多个特征内沉积包含钛的阻挡层; 在通过向目标施加DC电力的情况下，在由处理气体形成的等离子体存在下溅射材料，在处理室内保持小于约500mTorr的压力，并提供高达约5000W的衬底偏置射频功率以在阻挡层顶上沉积包含该材料的晶种层。

7. 发明申请

US20110315319A1 PRE-CLEAN CHAMBER WITH REDUCED ION CURRENT 审中-公开
标题翻译：具有降低离子电流的前清洁室
公开(公告)号：US20110315319A1
公开(公告)日：2011-12-29
申请号：US13166213
申请日：2011-06-22
申请人： JOHN C. FORSTER , TAE HONG HA , MURALI K. NARASIMHAN , XINYU FU , ARVIND SUNDARRAJAN , XIAOXI GUO
发明人： JOHN C. FORSTER , TAE HONG HA , MURALI K. NARASIMHAN , XINYU FU , ARVIND SUNDARRAJAN , XIAOXI GUO
IPC分类号： B08B5/00
CPC分类号： H01J37/32082
摘要： Apparatus for processing substrates are disclosed herein. In some embodiments, a substrate processing system may include a process chamber having a first volume to receive a plasma and a second volume for processing a substrate; a substrate support disposed in the second volume; and a plasma filter disposed in the process chamber between the first volume and the second volume such that a plasma formed in the first volume can only flow from the first volume to the second volume through the plasma filter. In some embodiments, the substrate processing system includes a process kit coupled to the process chamber, wherein the plasma filter is disposed in the process kit.
摘要翻译：本文公开了用于处理衬底的装置。在一些实施例中，衬底处理系统可以包括具有接收等离子体的第一体积和用于处理衬底的第二体积的处理室; 设置在所述第二体积中的基板支撑件; 以及设置在第一体积和第二体积之间的处理室中的等离子体过滤器，使得形成在第一体积中的等离子体仅能够通过等离子体过滤器从第一体积流到第二体积。在一些实施例中，衬底处理系统包括耦合到处理室的处理套件，其中等离子体过滤器设置在处理套件中。

8. 发明授权

US07311295B2 Cylinder apparatus for hydraulic lift jack with transmission 失效
标题翻译：液压提升千斤顶带传动装置的气缸装置
公开(公告)号：US07311295B2
公开(公告)日：2007-12-25
申请号：US11259360
申请日：2005-10-27
申请人： Tae-Hong Ha
发明人： Tae-Hong Ha
IPC分类号： B66F3/22
CPC分类号： B66F3/26 , B66F3/22 , B66F3/42 , B66F5/04
摘要： A cylinder apparatus is provided for a hydraulic lift jack with a transmission device so that the ascending velocity is high with no load and the ascending velocity is low when there is a load. The cylinder apparatus includes a lifting mechanism for moving an upper plate up and down by the hydraulic pressure in the hydraulic cylinders and a fluid pumping mechanism for in-taking the oil stored in the oil tank and pumping the oil to the outside. The cylinder apparatus also includes a piston installed to move reciprocally within the main hydraulic cylinder, and a pumping transmission mechanism including a transmission control for controlling the pumping volume of the oil so that the ascending velocity can be controlled progressively. An oil pressure removing portion removes the pressure of the piston so that the pumping mechanism then can supply a little volume of oil.
摘要翻译：为具有传动装置的液压提升千斤顶设置一个气缸装置，使得无负载时上升速度高，并且当存在负载时上升速度较低。气缸装置包括用于通过液压缸中的液压上下移动上板的提升机构和用于吸入存储在油箱中的油并将油泵送到外部的流体泵送机构。气缸装置还包括安装成在主液压缸内往复运动的活塞，以及泵送传动机构，其包括用于控制油的泵送容积的传动控制，从而能够逐渐控制上升速度。油压去除部分去除活塞的压力，使得泵送机构然后可以供应少量的油。

9. 发明申请

US20180297666A1 BICYCLE WITH AUTOMATIC TRANSMISSION 审中-公开
公开(公告)号：US20180297666A1
公开(公告)日：2018-10-18
申请号：US15946267
申请日：2018-04-05
申请人： Min Soo HA , Jinsu HA , Tae Hong HA
发明人： Min Soo HA , Jinsu HA , Tae Hong HA
IPC分类号： B62M11/16 , F16H3/54 , F16H37/04 , B62M9/02
摘要： Provided is a bicycle with an automatic transmission, and more particularly, a bicycle with an automatic transmission for enabling rapid and smooth gearshifting from a low speed to a high speed or from a high speed to a low speed.

10. 发明授权

US08476162B2 Methods of forming layers on substrates 有权
标题翻译：在基材上形成层的方法
公开(公告)号：US08476162B2
公开(公告)日：2013-07-02
申请号：US13269243
申请日：2011-10-07
申请人： Tae Hong Ha , Winsor Lam , Tza-Jing Gung , Joung Joo Lee
发明人： Tae Hong Ha , Winsor Lam , Tza-Jing Gung , Joung Joo Lee
IPC分类号： H01L21/44
CPC分类号： H01L21/76843 , C23C14/046 , C23C14/345 , H01L21/2855 , H01L21/76858 , H01L21/76865 , H01L21/76873
摘要： Methods for forming layers on a substrate are provided herein. In some embodiments, methods of forming layers on a substrate disposed in a process chamber may include depositing a barrier layer comprising titanium within one or more features in the substrate; and sputtering a material from a target in the presence of a plasma formed from a process gas by applying a DC power to the target, maintaining a pressure of less than about 500 mTorr within the process chamber, and providing up to about 5000 W of a substrate bias RF power to deposit a seed layer comprising the material atop the barrier layer.
摘要翻译：本文提供了在基板上形成层的方法。在一些实施例中，在设置在处理室中的衬底上形成层的方法可以包括在衬底的一个或多个特征内沉积包含钛的阻挡层; 在通过向目标施加DC电力的情况下，在由处理气体形成的等离子体存在下溅射材料，在处理室内保持小于约500mTorr的压力，并提供高达约5000W的衬底偏置射频功率以在阻挡层顶上沉积包含该材料的晶种层。

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