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1. 发明授权

US08345219B2 Method and apparatus for setting an illumination optical unit 有权
标题翻译：设置照明光学单元的方法和装置
公开(公告)号：US08345219B2
公开(公告)日：2013-01-01
申请号：US13469240
申请日：2012-05-11
申请人： Joachim Hartjes , Stig Bieling , Artur Hoegele
发明人： Joachim Hartjes , Stig Bieling , Artur Hoegele
IPC分类号： G03B27/68 , G03B27/54 , G03B27/32 , G03B27/52 , G03B27/42
CPC分类号： G03F7/70091 , G03F7/70133 , G03F7/70141 , G03F7/70266
摘要： A method for setting an illumination optical unit involves determining an actual value of an intensity-weighted illumination parameter of the illumination optical unit for multiple field points and for multiple illumination angles. The influence of a deformation of at least one of the optical surfaces of the illumination optical unit on the at least one illumination parameter is then determined. A desired value of the illumination parameter is then predefined. A desired form of the at least one optical surface is determined so that the actual value of the illumination parameter corresponds to the desired value of the illumination parameter within predefined limits. Finally, the optical surface is deformed with the aid of at least one actuator so that an actual form of the optical surface corresponds to the desired form.
摘要翻译：用于设置照明光学单元的方法包括确定用于多个场点和多个照明角度的照明光学单元的强度加权照明参数的实际值。然后确定照明光学单元的至少一个光学表面的变形对至少一个照明参数的影响。然后预定义所需的照明参数值。确定至少一个光学表面的期望形式，使得照明参数的实际值对应于预定义限度内的照明参数的期望值。最后，光学表面借助于至少一个致动器变形，使得光学表面的实际形式对应于所需的形式。

2. 发明授权

US08395754B2 Illumination optical unit for EUV microlithography 有权
标题翻译：用于EUV微光刻的照明光学单元
公开(公告)号：US08395754B2
公开(公告)日：2013-03-12
申请号：US12949478
申请日：2010-11-18
申请人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
发明人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
IPC分类号： G03B27/54 , G03B27/68 , G03B27/52
CPC分类号： G03F7/70233 , G02B5/09 , G03F7/70075 , G03F7/70116 , G03F7/702
摘要： An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field.
摘要翻译：用于EUV微光刻的照明光学单元包括具有多个第一反射小面元件的第一光学元件和具有多个第二反射小面元件的第二光学元件。来自多个第一反射小面元件的每个第一反射小平面元件具有相应的最大数目的不同位置，其限定与第一小面元件相关联的组合 - 由第二反射小面元件组成，其中该组由所有第二小面元件在照明光学单元的操作期间，第一刻面元件将辐射引导到其不同位置。所述多个第二反射小面元件形成多个不相交组，其中所述组中的每一个和所述组中的每一个包含至少两个第二小面元件，并且不存在属于同一组的组的两个第二小面元素。这种结构使得可以提供照明光学单元，该照明光学单元可用于在物场的位置处提供大量不同的取决于角度的强度分布。

3. 发明授权

US08294877B2 Illumination optical unit for projection lithography 有权
标题翻译：用于投影光刻的照明光学单元
公开(公告)号：US08294877B2
公开(公告)日：2012-10-23
申请号：US13368430
申请日：2012-02-08
申请人： Johannes Wangler , Markus Deguenther , Stig Bieling
发明人： Johannes Wangler , Markus Deguenther , Stig Bieling
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70058
摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.
摘要翻译：用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。照明光学单元的瞳孔面镜具有多个光瞳面。瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

4. 发明申请

US20130057844A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20130057844A1
公开(公告)日：2013-03-07
申请号：US13604296
申请日：2012-09-05
申请人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
发明人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
IPC分类号： G03B27/72
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

5. 发明申请

US20120206704A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 有权
标题翻译：投影光刻照明光学单元
公开(公告)号：US20120206704A1
公开(公告)日：2012-08-16
申请号：US13368430
申请日：2012-02-08
申请人： Johannes Wangler , Markus Deguenther , Stig Bieling
发明人： Johannes Wangler , Markus Deguenther , Stig Bieling
IPC分类号： G03B27/54
CPC分类号： G03F7/70058
摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.
摘要翻译：用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。照明光学单元的瞳孔面镜具有多个光瞳面。瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

6. 发明授权

US09046786B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US09046786B2
公开(公告)日：2015-06-02
申请号：US13604296
申请日：2012-09-05
申请人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
发明人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译：微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。位移机构改变衍射光学元件的相互空间排列。在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。这使得可以以简单的方式生产连续可变的照明设置。

7. 发明申请

US20120300195A1 METHOD AND APPARATUS FOR SETTING AN ILLUMINATION OPTICAL UNIT 有权
标题翻译：用于设置照明光学单元的方法和装置
公开(公告)号：US20120300195A1
公开(公告)日：2012-11-29
申请号：US13469240
申请日：2012-05-11
申请人： Joachim Hartjes , Stig Bieling , Artur Hoegele
发明人： Joachim Hartjes , Stig Bieling , Artur Hoegele
IPC分类号： G01B9/00
CPC分类号： G03F7/70091 , G03F7/70133 , G03F7/70141 , G03F7/70266
摘要： A method for setting an illumination optical unit involves determining an actual value of an intensity-weighted illumination parameter of the illumination optical unit for multiple field points and for multiple illumination angles. The influence of a deformation of at least one of the optical surfaces of the illumination optical unit on the at least one illumination parameter is then determined. A desired value of the illumination parameter is then predefined. A desired form of the at least one optical surface is determined so that the actual value of the illumination parameter corresponds to the desired value of the illumination parameter within predefined limits. Finally, the optical surface is deformed with the aid of at least one actuator so that an actual form of the optical surface corresponds to the desired form.
摘要翻译：用于设置照明光学单元的方法包括确定用于多个场点和多个照明角度的照明光学单元的强度加权照明参数的实际值。然后确定照明光学单元的至少一个光学表面的变形对至少一个照明参数的影响。然后预定义所需的照明参数值。确定至少一个光学表面的期望形式，使得照明参数的实际值对应于预定义限度内的照明参数的期望值。最后，光学表面借助于至少一个致动器变形，使得光学表面的实际形式对应于所需的形式。

8. 发明申请

US20110141445A1 ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY 有权
标题翻译： EUV微光学照明光学单元
公开(公告)号：US20110141445A1
公开(公告)日：2011-06-16
申请号：US12949478
申请日：2010-11-18
申请人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
发明人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
IPC分类号： G03B27/54
CPC分类号： G03F7/70233 , G02B5/09 , G03F7/70075 , G03F7/70116 , G03F7/702
摘要： An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field.
摘要翻译：用于EUV微光刻的照明光学单元包括具有多个第一反射小面元件的第一光学元件和具有多个第二反射小面元件的第二光学元件。来自多个第一反射小面元件的每个第一反射小平面元件具有相应的最大数目的不同位置，其限定与第一小面元件相关联的组合 - 由第二反射小面元件组成，其中该组由所有第二小面元件在照明光学单元的操作期间，第一刻面元件将辐射引导到其不同位置。所述多个第二反射小面元件形成多个不相交组，其中所述组中的每一个和所述组中的每一个包含至少两个第二小面元件，并且不存在属于同一组的组的两个第二小面元素。这种结构使得可以提供照明光学单元，该照明光学单元可用于在物场的位置处提供大量不同的取决于角度的强度分布。

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