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1. 发明授权

US09046786B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US09046786B2
公开(公告)日：2015-06-02
申请号：US13604296
申请日：2012-09-05
申请人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
发明人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译：微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。位移机构改变衍射光学元件的相互空间排列。在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。这使得可以以简单的方式生产连续可变的照明设置。

2. 发明申请

US20130057844A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20130057844A1
公开(公告)日：2013-03-07
申请号：US13604296
申请日：2012-09-05
申请人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
发明人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
IPC分类号： G03B27/72
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

3. 发明授权

US08537335B2 Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system 有权
标题翻译：用于微光刻投影曝光装置的照明系统，包括这种照明系统的微光刻投影曝光装置和光学系统
公开(公告)号：US08537335B2
公开(公告)日：2013-09-17
申请号：US12917956
申请日：2010-11-02
申请人： Markus Schwab , Michael Layh , Markus Deguenther , Artur Hoegele
发明人： Markus Schwab , Michael Layh , Markus Deguenther , Artur Hoegele
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)
摘要翻译：一种用于利用来自初级光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变地调节的瞳孔成形单元，用于接收来自主光源的光并且用于产生可变地调节的二维强度分布照明系统的瞳孔成形表面。瞳孔成形单元具有傅里叶光学系统，用于将通过傅立叶光学系统的入射面进入的入射束束转换成从傅立叶光学系统的出射平面离开的出射光束束。傅里叶光学系统具有焦距fFOS和在沿着光轴的入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，其中（L / fFOS）<1/6。

4. 发明申请

US20110102758A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS COMPRISING SUCH AN ILLUMINATION SYSTEM, AND FOURIER OPTICAL SYSTEM 有权
标题翻译：用于微型投影曝光装置的照明系统，包含这种照明系统的微型投影曝光装置和四光源系统
公开(公告)号：US20110102758A1
公开(公告)日：2011-05-05
申请号：US12917956
申请日：2010-11-02
申请人： Markus Schwab , Michael Layh , Markus Deguenther , Artur Hoegele
发明人： Markus Schwab , Michael Layh , Markus Deguenther , Artur Hoegele
IPC分类号： G03B27/54
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)
摘要翻译：一种用于利用来自初级光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变地调节的瞳孔成形单元，用于接收来自主光源的光并且用于产生可变地调节的二维强度分布照明系统的瞳孔成形表面。瞳孔成形单元具有傅里叶光学系统，用于将通过傅立叶光学系统的入射面进入的入射束束转换成从傅立叶光学系统的出射平面离开的出射光束束。傅里叶光学系统具有焦距fFOS和在沿着光轴的入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，其中（L / fFOS）<1/6。

5. 发明授权

US10114293B2 Illumination system and projection objective of a mask inspection apparatus 有权
公开(公告)号：US10114293B2
公开(公告)日：2018-10-30
申请号：US13587077
申请日：2012-08-16
申请人： Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
发明人： Heiko Feldmann , Erik Matthias Sohmen , Joachim Stuehler , Oswald Gromer , Ulrich Mueller , Michael Layh , Markus Schwab
IPC分类号： G03F7/20 , G01N21/956 , G03F1/84
摘要： An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

6. 发明授权

US07847921B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

7. 发明申请

US20090040495A1 ILLUMINATION SYSTEM INCLUDING AN OPTICAL FILTER 审中-公开
标题翻译：包括光学滤波器的照明系统
公开(公告)号：US20090040495A1
公开(公告)日：2009-02-12
申请号：US12058173
申请日：2008-03-28
申请人： Markus Schwab
发明人： Markus Schwab
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70191
摘要： An illumination system including an optical element, such as an optical filter, which can influence the optical properties of radiation impinging thereon is disclosed. Such a filter can have a variably adjustable absorption. The illumination system is employed for instance within a lithography apparatus. A method for the production of microelectronic components and an optical element influencing the optical properties of radiation impinging thereon are also disclosed.
摘要翻译：公开了一种照明系统，其包括可以影响照射在其上的辐射的光学性质的诸如滤光器的光学元件。这样的过滤器可以具有可变地调节的吸收。照明系统例如在光刻设备中使用。还公开了一种用于制造微电子部件的方法和影响其上照射的辐射的光学性质的光学元件。

8. 发明申请

US20060146304A1 Method of manufacturing a miniaturized device 有权
标题翻译：制造小型化装置的方法
公开(公告)号：US20060146304A1
公开(公告)日：2006-07-06
申请号：US11294860
申请日：2005-12-05
申请人： Markus Schwab , Aksel Goehnermeier , Toralf Gruner , Tammo Uitterdijk
发明人： Markus Schwab , Aksel Goehnermeier , Toralf Gruner , Tammo Uitterdijk
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译：使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

9. 发明授权

US08767181B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US08767181B2
公开(公告)日：2014-07-01
申请号：US12946380
申请日：2010-11-15
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

10. 发明授权

US08178314B2 Pyrimidines reacting with O6-alkylguanine-DNA alkyltransferase fusion protein and method for detecting protein 有权
标题翻译：与O6-烷基鸟嘌呤-DNA烷基转移酶融合蛋白反应的嘧啶和检测蛋白质的方法
公开(公告)号：US08178314B2
公开(公告)日：2012-05-15
申请号：US11918936
申请日：2006-04-25
申请人： Maik Kindermann , Markus Schwab
发明人： Maik Kindermann , Markus Schwab
IPC分类号： C12Q1/48 , C09B29/52
CPC分类号： C07D239/47 , C07D405/12 , C07D495/04
摘要： The invention relates to pyrimidines suitable as substrates for O6-alkylguanine-DNA alkyltransferases (AGT) of formula (I) wherein R1 is hydrogen, lower alkyl, halogen, cyano, trifluoromethyl or azido; R2 is a linker; and L is a label or a plurality of same or different labels. The invention further relates to methods of transferring a label from pyrimidines of formula (I) to O6-alkylguanine-DNA alkyltransferases (AGT) and AGT fusion proteins.
摘要翻译：本发明涉及适合作为式（I）的O6-烷基鸟嘌呤-DNA烷基转移酶（AGT）的底物的嘧啶，其中R 1是氢，低级烷基，卤素，氰基，三氟甲基或叠氮基; R2是连接体; L是标签或多个相同或不同的标签。本发明还涉及将标记从式（I）的嘧啶转移到O6-烷基鸟嘌呤-DNA烷基转移酶（AGT）和AGT融合蛋白的方法。

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