专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08395754B2 Illumination optical unit for EUV microlithography 有权
标题翻译：用于EUV微光刻的照明光学单元
公开(公告)号：US08395754B2
公开(公告)日：2013-03-12
申请号：US12949478
申请日：2010-11-18
申请人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
发明人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
IPC分类号： G03B27/54 , G03B27/68 , G03B27/52
CPC分类号： G03F7/70233 , G02B5/09 , G03F7/70075 , G03F7/70116 , G03F7/702
摘要： An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field.
摘要翻译：用于EUV微光刻的照明光学单元包括具有多个第一反射小面元件的第一光学元件和具有多个第二反射小面元件的第二光学元件。来自多个第一反射小面元件的每个第一反射小平面元件具有相应的最大数目的不同位置，其限定与第一小面元件相关联的组合 - 由第二反射小面元件组成，其中该组由所有第二小面元件在照明光学单元的操作期间，第一刻面元件将辐射引导到其不同位置。所述多个第二反射小面元件形成多个不相交组，其中所述组中的每一个和所述组中的每一个包含至少两个第二小面元件，并且不存在属于同一组的组的两个第二小面元素。这种结构使得可以提供照明光学单元，该照明光学单元可用于在物场的位置处提供大量不同的取决于角度的强度分布。

2. 发明申请

US20110141445A1 ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY 有权
标题翻译： EUV微光学照明光学单元
公开(公告)号：US20110141445A1
公开(公告)日：2011-06-16
申请号：US12949478
申请日：2010-11-18
申请人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
发明人： Martin Endres , Sebastian Doern , Stig Bieling , Marc Kirch
IPC分类号： G03B27/54
CPC分类号： G03F7/70233 , G02B5/09 , G03F7/70075 , G03F7/70116 , G03F7/702
摘要： An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field.
摘要翻译：用于EUV微光刻的照明光学单元包括具有多个第一反射小面元件的第一光学元件和具有多个第二反射小面元件的第二光学元件。来自多个第一反射小面元件的每个第一反射小平面元件具有相应的最大数目的不同位置，其限定与第一小面元件相关联的组合 - 由第二反射小面元件组成，其中该组由所有第二小面元件在照明光学单元的操作期间，第一刻面元件将辐射引导到其不同位置。所述多个第二反射小面元件形成多个不相交组，其中所述组中的每一个和所述组中的每一个包含至少两个第二小面元件，并且不存在属于同一组的组的两个第二小面元素。这种结构使得可以提供照明光学单元，该照明光学单元可用于在物场的位置处提供大量不同的取决于角度的强度分布。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式