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1. 发明授权

US5671544A Substrate drying apparatus and substrate drying method 失效
标题翻译：基材干燥装置和基材干燥方法
公开(公告)号：US5671544A
公开(公告)日：1997-09-30
申请号：US697132
申请日：1996-08-20
申请人： Kenji Yokomizo , Hiroshi Tanaka , Shori Mokuo , Teruomi Minami
发明人： Kenji Yokomizo , Hiroshi Tanaka , Shori Mokuo , Teruomi Minami
IPC分类号： H01L21/304 , F26B21/14 , H01L21/00 , F26B21/06
CPC分类号： H01L21/67034 , F26B21/145
摘要： A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatment liquid, a receiving container, provided below the object containing region, for receiving water removed from the object with use of the evaporated treatment liquid, an exhaust pipe, attached to the container, for exhausting the water from the container to the outside of the process bath, and a cooling device, provided above the object containing region of the process bath, for condensing the evaporated treatment liquid, wherein the exhaust pipe has a valve and a branch pipe branched from the exhaust pipe such that the branch pipe is closer to the container than the valve is.
摘要翻译：基材干燥装置包括具有含有待处理物体的被检体容纳区域的处理槽，含有挥发性处理液的处理液含有区域和蒸发处理液的加热部件，设置在物体的下方的接收容器用于接收使用所述蒸发处理液从所述物体除去的水;附接到所述容器的用于将水从所述容器排出到所述处理槽的外部的排气管，以及设置在所述容器的上方的冷却装置用于使蒸发的处理液冷凝的排出管，其特征在于，所述排气管具有从所述排气管分支的阀和分支管，使得所述分支管比所述阀更靠近所述容器。

2. 发明授权

US5575079A Substrate drying apparatus and substrate drying method 失效
标题翻译：基材干燥装置和基材干燥方法
公开(公告)号：US5575079A
公开(公告)日：1996-11-19
申请号：US330793
申请日：1994-10-28
申请人： Kenji Yokomizo , Hiroshi Tanaka , Shori Mokuo , Teruomi Minami
发明人： Kenji Yokomizo , Hiroshi Tanaka , Shori Mokuo , Teruomi Minami
IPC分类号： H01L21/304 , F26B21/14 , H01L21/00 , F26B21/06
CPC分类号： H01L21/67034 , F26B21/145
摘要： A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatment liquid, a receiving container, provided below the object containing region, for receiving water removed from the object with use of the evaporated treatment liquid, an exhaust pipe, attached to the container, for exhausting the water from the container to the outside of the process bath, and a cooling device, provided above the object containing region of the process bath, for condensing the evaporated treatment liquid, wherein the exhaust pipe has a valve and a branch pipe branched from the exhaust pipe such that the branch pipe is closer to the container than the valve is.
摘要翻译：基材干燥装置包括具有含有待处理物体的被检体容纳区域的处理槽，含有挥发性处理液的处理液含有区域和蒸发处理液的加热部件，设置在物体的下方的接收容器用于接收使用所述蒸发处理液从所述物体除去的水;附接到所述容器的用于将水从所述容器排出到所述处理槽的外部的排气管，以及设置在所述容器的上方的冷却装置用于使蒸发的处理液冷凝的排出管，其特征在于，所述排气管具有从所述排气管分支的阀和分支管，使得所述分支管比所述阀更靠近所述容器。

3. 发明申请

US20080223411A1 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20080223411A1
公开(公告)日：2008-09-18
申请号：US12073364
申请日：2008-03-04
申请人： Shori Mokuo
发明人： Shori Mokuo
IPC分类号： B08B3/04
CPC分类号： H01L21/67028 , B08B3/048 , H01L21/67057 , H01L21/67086 , Y10S134/902
摘要： A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate held by the processing unit; a processing bath capable of simultaneously accommodating a plurality of substrates, the processing bath storing a process liquid into which a substrate is immersed so as to be processed, the process liquid being circulatingly supplied to the processing bath; and a transfer unit that simultaneously transfers substrates whose number is less than the number of substrate that can be accommodated in the processing bath. The transfer unit transfers, at least, to the processing bath in which the process liquid is stored. A substrate is processed with the use of at least one of the processing unit and the processing bath.
摘要翻译：提供了一种简化结构的基板处理装置，其能够减少所使用的处理液体的量和抑制处理液体的温度变化。基板处理装置包括：处理单元，其保持一个基板并处理由处理单元保持的基板; 能够同时容纳多个基板的处理槽，所述处理槽容纳处理液，所述处理液浸渍到所述处理液中以进行处理，所述处理液循环地供给到所述处理槽; 以及转印单元，其同时传送数量小于可以容纳在处理槽中的基板的数量的基板。传送单元至少转移到其中存储处理液体的处理槽。使用处理单元和处理槽中的至少一个来处理基板。

4. 发明授权

US6022185A Substrate transferring device 失效
标题翻译：基板转印装置
公开(公告)号：US6022185A
公开(公告)日：2000-02-08
申请号：US761520
申请日：1996-12-09
申请人： Shori Mokuo
发明人： Shori Mokuo
IPC分类号： G02F1/13 , H01L21/302 , H01L21/3065 , H01L21/677 , H01L21/68 , B66C23/00
CPC分类号： H01L21/67742
摘要： A substrate transferring device including a pair of support arms for supporting LCD substrates substantially horizontally, expandable multi-joint link mechanisms for moving the support arms in a horizontal plane, a first motor for extending and retracting the link mechanisms, a rotary base on which the link mechanisms are mounted, and a second motor for rotating the rotary base, wherein one of the support arms is provided so that an LCD substrate supported by the support arm is, at least partially, overlapped with an LCD substrate supported by the other support arm when the link mechanism is retracted.
摘要翻译：一种基板传送装置，包括用于大致水平地支撑LCD基板的一对支撑臂，用于在水平平面中移动支撑臂的可扩展多关节连杆机构，用于延伸和缩回连杆机构的第一马达，旋转基座，连接机构，以及用于旋转旋转底座的第二电动机，其中，一个支撑臂设置成使得由支撑臂支撑的LCD基板至少部分地与由另一个支撑臂支撑的LCD基板重叠当链接机构缩回时。

5. 发明授权

US06954585B2 Substrate processing method and apparatus 有权
标题翻译：基板加工方法及装置
公开(公告)号：US06954585B2
公开(公告)日：2005-10-11
申请号：US10725372
申请日：2003-12-03
申请人： Shori Mokuo
发明人： Shori Mokuo
IPC分类号： F26B19/00 , F27B17/00 , F27D5/00
CPC分类号： F27B17/0025
摘要： A method for heating a wafer to a predetermined temperature, the wafer being held by a holding unit and being accommodated in a processing container equipped with a heater. The wafer is heated to a processing temperature while positioning the wafer at an adjacent position that results form making the wafer approach the heating surface of the heater. After heating the wafer to the predetermined temperature, the wafer is separated from the flat bottom surface of the container body to a processing position. In this state, a processing chamber of the processing container is supplied with a processing fluid, while the holding unit and the heater are relatively moved close to and apart from each other intermittently or continuously. Accordingly, it is possible to quickly heat the substrate to a processing temperature while supplying the substrate with the processing fluid uniformly. This improves throughout and the homogenization in processing.
摘要翻译：一种用于将晶片加热至预定温度的方法，所述晶片由保持单元保持并容纳在装有加热器的处理容器中。将晶片加热到处理温度，同时将晶片定位在使得晶片接近加热器的加热表面的相邻位置。在将晶片加热到预定温度之后，将晶片从容器主体的平坦底表面分离到处理位置。在这种状态下，处理容器的处理室被供给处理流体，同时保持单元和加热器间歇地或连续地相对移动彼此靠近和分开。因此，能够使衬底在处理液体均匀地供给衬底的同时快速加热到处理温度。这在整个过程中得到改善和加工中的均质化。

6. 发明授权

US06573482B2 Heating device, liquid processing apparatus using the heating device and method of detecting failure thereof 有权
公开(公告)号：US06573482B2
公开(公告)日：2003-06-03
申请号：US09923816
申请日：2001-05-01
申请人： Shori Mokuo
发明人： Shori Mokuo
IPC分类号： H05B102
CPC分类号： H05B1/0233 , G05D23/1909 , H01L21/67051
摘要： A liquid processing apparatus includes a liquid processing unit 30 for supplying objects to be processes, such as wafers W, with a processing liquid for liquid processing, a processing-liquid supplying unit 100 for supplying heated processing liquids 12a, 12b to the liquid processing unit 30 and a heating unit 200 for heating the liquids 12a, 12b up to a predetermined temperature. The heating unit 200 has a heater 16 for heating the liquids 12a, 12b, a power supply circuit for supplying the heater 16 with electricity, a temperature sensor 14 and a temperature regulator 13 both forming an output control unit for controlling an output from a power source 20 to the heater 16, a solid state relay 19 for switching on/off the operation of the power supply circuit by signals from the temperature regulator 13, and failure detecting units. The failure detecting units include a contact monitor 1 for monitoring an ON/OFF contact 32 in a power switch 21, a primary-side signal detecting monitor 2 for detecting ON/OFF signals from the temperature regulator 13 to the solid state relay 19, and a secondary output voltage detecting monitor 4 for detecting secondary-side ON/OFF signals of the solid state relay 19, providing a heating device capable of determining the cause of failure finely and also the liquid processing apparatus using the heating device, which is used for applying a designated liquid processing to various kinds of substrates, for example, semiconductor wafers, LCD substrates, etc.

7. 发明授权

US5406092A Apparatus and method using optical sensors recessed in channel walls for detector substrates in a support 失效
标题翻译：使用凹陷在通道壁中的光学传感器来检测支撑件中的基板的装置和方法
公开(公告)号：US5406092A
公开(公告)日：1995-04-11
申请号：US138077
申请日：1993-10-20
申请人： Shori Mokuo
发明人： Shori Mokuo
IPC分类号： B08B11/04 , G01V8/20 , H01L21/00 , H01L21/304 , H01L21/67 , G01N21/86 , G01V9/04
CPC分类号： H01L21/67057 , Y10S414/136
摘要： A semiconductor wafer-detecting apparatus is provided with a main support body formed of synthetic resin. A pair of substantially-parallel longitudinal channels and a plurality of substantially-parallel transverse channels are formed in the main support body. The longitudinal channels are located away from each other by a predetermined distance, and the transverse channels are arranged at intervals corresponding to the intervals at which wafers are arranged. Between the adjacent transverse channels, a plurality of pairs of holding portions are defined such that each pair is associated with the longitudinal channels. A pair of light-emitting elements and a pair of light-receiving elements are alternately arranged with reference to the holding portions. The light-emitting elements of each pair have their light-emitting faces oriented in opposite directions; likewise, the light-receiving elements of each pair have their light-receiving faces oriented in opposite directions. The light-emitting elements of each pair and associated light-receiving elements jointly constitute respective optical sensors. The presence or absence of a wafer is determined by detecting whether or not light is shielded between the light-emitting and light-receiving elements of each optical sensor.
摘要翻译：半导体晶片检测装置设置有由合成树脂形成的主支撑体。在主支撑体中形成一对基本上平行的纵向通道和多个基本上平行的横向通道。纵向通道彼此远离预定距离，并且横向通道以对应于晶片布置的间隔的间隔布置。在相邻横向通道之间，限定多对保持部分，使得每对保持部分与纵向通道相关联。一对发光元件和一对光接收元件相对于保持部交替地配置。每对发光元件的发光面朝相反方向取向; 同样地，每对的受光元件的光接收面朝向相反的方向。每对发光元件和相关联的光接收元件共同构成相应的光学传感器。通过检测每个光学传感器的发光元件和光接收元件之间是否屏蔽光来确定晶片的存在或不存在。

8. 发明授权

US5911232A Ultrasonic cleaning device 失效
标题翻译：超声波清洗装置
公开(公告)号：US5911232A
公开(公告)日：1999-06-15
申请号：US921328
申请日：1997-08-29
申请人： Shori Mokuo , Keiji Taguchi , Shigenori Kitahara
发明人： Shori Mokuo , Keiji Taguchi , Shigenori Kitahara
IPC分类号： B06B1/18 , B08B3/12 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67057 , B08B3/12
摘要： Disclosed is an ultrasonic cleaning device including a cleaning tank containing a semiconductor wafer W and pure water, and a plurality of vibrating plates provided with the cleaning tank. The vibrating plates are electric distortion transducers. By controlling the output phases of oscillators that vibrate the plates with a single oscillating source, the output phases of the oscillation sources can be matched. This enables uniform sound pressure distribution. Consequently, ultrasonic interference between vibrating plates can be eliminated. Uniform sound pressure distribution makes it possible to obtain a uniform particle removal rate, thereby improving cleaning efficiency.
摘要翻译：公开了一种包括含有半导体晶片W和纯水的清洗槽的超声波清洗装置和设置有清洗槽的多个振动板。振动板是电变形传感器。通过控制用单个振荡源振荡板的振荡器的输出相位，可以匹配振荡源的输出相位。这使得均匀的声压分布。因此，可以消除振动板之间的超声干扰。均匀的声压分布使得可以获得均匀的颗粒去除速率，从而提高清洁效率。

9. 发明授权

US5845660A Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus 失效
标题翻译：基板洗涤和干燥装置，基板清洗方法和基板清洗装置
公开(公告)号：US5845660A
公开(公告)日：1998-12-08
申请号：US761752
申请日：1996-12-05
申请人： Naoki Shindo , Yuuji Kamikawa , Shori Mokuo , Yoshio Kumagai
发明人： Naoki Shindo , Yuuji Kamikawa , Shori Mokuo , Yoshio Kumagai
IPC分类号： H01L21/00 , B08B3/10
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.
摘要翻译：一种基板清洗和干燥装置，其特征在于，包括用于保持晶片的处理部，向所述处理部引入用于将所述晶片干燥的处理液和用于干燥所述晶片的蒸气，用于将所述溶液导入所述处理部的供给排出口，用于从多种溶液中选择一种的溶液供给机构，具有用于产生干燥产生蒸气的加热器的干燥蒸汽发生部，具有用于从处理部快速排出溶液的开口的排出溶液机构，电阻率检测装置用于检测处理溶液的电阻率值;以及控制器，用于基于由电阻率检测装置检测的电阻率值来控制对处理部分的溶液的供应。

10. 发明授权

US5319216A Substrate detector with light emitting and receiving elements arranged in staggered fashion and a polarization filter 失效
标题翻译：具有以交错方式布置的发光和接收元件的基板检测器和偏振滤光器
公开(公告)号：US5319216A
公开(公告)日：1994-06-07
申请号：US105166
申请日：1993-08-12
申请人： Shori Mokuo , Yoichi Deguchi , Mitsuo Nishi , Shinji Tadakuma
发明人： Shori Mokuo , Yoichi Deguchi , Mitsuo Nishi , Shinji Tadakuma
IPC分类号： G01V8/20 , G01V9/04
CPC分类号： G01V8/20 , Y10S414/138
摘要： A substrate detector device comprises a boat or chuck for holding substrates, a light emitting section having a plurality of light emitting elements, arranged side by side, for respectively applying light beams to the substrates, a light receiving section, facing the light emitting section and having a plurality of light receiving elements, for receiving light beams passed through the substrates, the light receiving elements arranged side by side so as not face the light emitting elements, a polarization filter provided on optical axes of the respective optical beams incident on the light receiving elements, a memory for storing, as reference data, an amount of light received by a receiving element which has been measured in advance when a light beam is applied to a substrate in a state where no other substrate is present on either side of the substrate, and controller for discriminating the presence, the number, and the state of arrangement of the substrates on the holding means based on the reference data and measured data based on the amount of light received by the light receiving elements after a light beam scattered by the substrate to be detected and a light beam wraparound substrates adjacent thereto are removed by the polarization filter.
摘要翻译：基板检测器装置包括用于保持基板的船或卡盘，具有并排布置的用于分别向基板施加光束的多个发光元件的发光部分，面向发光部分的光接收部分，以及具有多个光接收元件，用于接收通过基板的光束，并排设置为不面对发光元件的光接收元件，设置在入射到光的各个光束的光轴上的偏振滤光器接收元件，用于存储作为参考数据的存储器，由接收元件接收的光量，该接收元件在将光束施加到基板上时已经预先测量到，在不存在其它基板的状态下基板和控制器，用于基于保持装置识别基板的布置的存在，数量和状态基于由被检测基板散射的光束和与其相邻的光束环绕基板之后的光接收元件所接收的光量的基准数据和测量数据被偏振滤光器去除。

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