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1. 发明授权

US09059226B2 Substrate treatment apparatus 有权
标题翻译：基板处理装置
公开(公告)号：US09059226B2
公开(公告)日：2015-06-16
申请号：US13415438
申请日：2012-03-08
申请人： Ryo Muramoto
发明人： Ryo Muramoto
IPC分类号： B08B3/04 , H01L21/677 , H01L21/67
CPC分类号： H01L21/67742 , H01L21/67028 , H01L21/67051 , H01L21/67766
摘要： The substrate treatment apparatus includes a first substrate transport robot having a hand which holds a substrate, a second substrate transport robot having a hand which holds the substrate, and a hand cleaning unit which cleans the hand of the first substrate transport robot and the hand of the second substrate transport robot. The hand cleaning unit is configured to be accessible by the hand of the first substrate transport robot and the hand of the second substrate transport robot, and is disposed above or below a substrate transfer place at which the substrate is transferred between the first and second substrate transport robots.
摘要翻译：基板处理装置包括具有保持基板的手的第一基板输送机器人，具有保持基板的手的第二基板输送机器人，以及清洗第一基板输送机器人的手和第一基板输送机器人的手的手清洁单元第二基板运输机器人。手动清洁单元被构造成可以由第一基板传送机器人的手和第二基板传送机器人的手接近，并且设置在基板传送位置的上方或下方，其中基板在第一和第二基板之间传送运输机器人

2. 发明授权

US08851821B2 Substrate processing apparatus and substrate conveying apparatus for use in the same 有权
标题翻译：基板处理装置和基板输送装置
公开(公告)号：US08851821B2
公开(公告)日：2014-10-07
申请号：US12557097
申请日：2009-09-10
申请人： Ichiro Mitsuyoshi , Ryo Muramoto
发明人： Ichiro Mitsuyoshi , Ryo Muramoto
IPC分类号： H01L21/677 , B65G49/06 , H01L21/673 , H01L21/687
CPC分类号： B65G59/02 , B65G25/04 , B65G49/061 , B65G49/067 , H01L21/67313 , H01L21/67766 , H01L21/67781 , H01L21/68707 , Y10S414/138
摘要： A substrate processing apparatus includes a substrate processing section that processes a plurality of substrates assuming a vertical posture in a batch manner; a first traversing mechanism that laterally moves a first traverse holding portion along a first traversing path between a substrate transfer position and a substrate delivery position; a second traversing mechanism that laterally moves a second traverse holding portion along a second traversing path disposed below the first traversing path between the substrate transfer position and the substrate delivery position; an elevation mechanism that raises and lowers an elevation holding portion in the substrate transfer position; and a main transfer mechanism that conveys a plurality of substrates assuming a vertical posture in a batch manner between the substrate delivery position and the substrate processing section, the first and second traverse holding portions, and the elevation holding portion each holds a plurality of substrates assuming a vertical posture in a batch manner.
摘要翻译：基板处理装置包括：基板处理部，其以分批方式处理呈垂直姿势的多个基板; 第一横动机构，其横向移动第一横动保持部分沿着基板转移位置和基板输送位置之间的第一横向路径; 第二横动机构，其沿着设置在所述基板转印位置与所述基板输送位置之间的所述第一横动路径下方的第二横动路径横向移动第二横动保持部; 升降机构，其升高并降低所述基板转印位置的高度保持部; 以及主传送机构，其在基板传送位置和基板处理部之间间歇地传送多个垂直姿势的基板，第一和第二横移保持部以及仰角保持部分分别保持多个基板，垂直姿势。

3. 发明申请

US20080216880A1 SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理设备
公开(公告)号：US20080216880A1
公开(公告)日：2008-09-11
申请号：US12043561
申请日：2008-03-06
申请人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
发明人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
IPC分类号： B08B13/00
CPC分类号： H01L21/67781 , H01L21/67075 , H01L21/67766 , Y10S134/902
摘要： A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates in vertical postures between the transfer and substrate delivery positions.
摘要翻译：基板处理装置包括：容器保持器，其容纳用于容纳垂直堆叠在水平姿势中的多个基板的容器;基板处理部，其对垂直方向上水平堆叠的多个基板进行处理;主输送机构，其将多个基板水平地堆叠在在基板输送位置和基板处理部之间的垂直姿势，相对于容器进出多个基板的搬入/退出机构，并且在水平姿势和垂直姿势之间改变多个基板的姿势，以及在传送位置从承载/离开机构接收和传送垂直姿势的多个基板的副传送机构，在基板传送位置处从主传送机构接收并传送多个基板至主传送机构的垂直姿势，并且传送在转移和底物递送位置之间的垂直姿势中具有多个基底。

4. 发明申请

US20130051967A1 SUBSTRATE INVERTING APPARATUS, SUBSTRATE HANDLING METHOD, AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：基板反转装置，基板处理方法和基板处理装置
公开(公告)号：US20130051967A1
公开(公告)日：2013-02-28
申请号：US13556528
申请日：2012-07-24
申请人： Ryo MURAMOTO
发明人： Ryo MURAMOTO
IPC分类号： H01L21/68
CPC分类号： H01L21/68707
摘要： A substrate inverting apparatus includes a plurality of first lower guides supporting a substrate in a horizontal orientation by contact of first lower inclined portions with a peripheral edge portion of the substrate, a plurality of first upper guides that, by contact of first upper inclined portions with the peripheral edge portion of the substrate, clamp the substrate in cooperation with the plurality of first lower guides, a guide moving mechanism that moves the plurality of first upper guides and first lower guides horizontally, and a guide rotating unit that inverts the substrate by rotating the plurality of first upper guides and first lower guides around a horizontally extending inversion axis.
摘要翻译：一种基板翻转装置，包括：多个第一下引导件，其通过第一下倾斜部分与基板的周缘部分接触而水平定向地支撑基板;多个第一上引导件，其通过第一上倾斜部分与所述基板的周边部分与所述多个第一下引导件协作地夹持所述基板;水平地移动所述多个第一上引导件和所述第一下引导件的引导移动机构;以及引导旋转单元，其通过旋转来使所述基板反转多个第一上引导件和第一下引导件围绕水平延伸的反转轴线。

5. 发明申请

US20120234364A1 SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理设备
公开(公告)号：US20120234364A1
公开(公告)日：2012-09-20
申请号：US13415438
申请日：2012-03-08
申请人： Ryo MURAMOTO
发明人： Ryo MURAMOTO
IPC分类号： B08B7/04 , B08B3/04
CPC分类号： H01L21/67742 , H01L21/67028 , H01L21/67051 , H01L21/67766
摘要： The substrate treatment apparatus includes a first substrate transport robot having a hand which holds a substrate, a second substrate transport robot having a hand which holds the substrate, and a hand cleaning unit which cleans the hand of the first substrate transport robot and the hand of the second substrate transport robot. The hand cleaning unit is configured to be accessible by the hand of the first substrate transport robot and the hand of the second substrate transport robot, and is disposed above or below a substrate transfer place at which the substrate is transferred between the first and second substrate transport robots.
摘要翻译：基板处理装置包括具有保持基板的手的第一基板输送机器人，具有保持基板的手的第二基板输送机器人，以及清洗第一基板输送机器人的手和第一基板输送机器人的手的手清洁单元第二基板运输机器人。手动清洁单元被构造成可以由第一基板传送机器人的手和第二基板传送机器人的手接近，并且设置在基板传送位置的上方或下方，其中基板在第一和第二基板之间传送运输机器人

6. 发明授权

US08033288B2 Substrate treatment apparatus 有权
标题翻译：基板处理装置
公开(公告)号：US08033288B2
公开(公告)日：2011-10-11
申请号：US12043561
申请日：2008-03-06
申请人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
发明人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
IPC分类号： B08B3/04
CPC分类号： H01L21/67781 , H01L21/67075 , H01L21/67766 , Y10S134/902
摘要： A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates in vertical postures between the transfer and substrate delivery positions.
摘要翻译：基板处理装置包括：容器保持器，其容纳用于容纳垂直堆叠在水平姿势中的多个基板的容器;基板处理部，其对垂直方向上水平堆叠的多个基板进行处理;主输送机构，其将多个基板水平地堆叠在在基板输送位置和基板处理部之间的垂直姿势，相对于容器进出多个基板的搬入/退出机构，并且在水平姿势和垂直姿势之间改变多个基板的姿势，以及在传送位置从承载/离开机构接收和传送垂直姿势的多个基板的副传送机构，在基板传送位置处从主传送机构接收并传送多个基板至主传送机构的垂直姿势，并且传送在转移和底物递送位置之间的垂直姿势中具有多个基底。

7. 发明申请

US20100068014A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CONVEYING APPARATUS FOR USE IN THE SAME 有权
标题翻译：基板加工装置和基板输送装置
公开(公告)号：US20100068014A1
公开(公告)日：2010-03-18
申请号：US12557097
申请日：2009-09-10
申请人： Ichiro Mitsuyoshi , Ryo Muramoto
发明人： Ichiro Mitsuyoshi , Ryo Muramoto
IPC分类号： H01L21/67 , B65G37/00 , B65G49/00 , B65G47/00 , H01L21/683 , H01L21/68 , H01L21/677
CPC分类号： B65G59/02 , B65G25/04 , B65G49/061 , B65G49/067 , H01L21/67313 , H01L21/67766 , H01L21/67781 , H01L21/68707 , Y10S414/138
摘要： A substrate processing apparatus includes a substrate processing section that processes a plurality of substrates assuming a vertical posture in a batch manner; a first traversing mechanism that laterally moves a first traverse holding portion along a first traversing path between a substrate transfer position and a substrate delivery position; a second traversing mechanism that laterally moves a second traverse holding portion along a second traversing path disposed below the first traversing path between the substrate transfer position and the substrate delivery position; an elevation mechanism that raises and lowers an elevation holding portion in the substrate transfer position; and a main transfer mechanism that conveys a plurality of substrates assuming a vertical posture in a batch manner between the substrate delivery position and the substrate processing section, the first and second traverse holding portions, and the elevation holding portion each holds a plurality of substrates assuming a vertical posture in a batch manner.
摘要翻译：基板处理装置包括：基板处理部，其以分批方式处理呈垂直姿势的多个基板; 第一横动机构，其横向移动第一横动保持部分沿着基板转移位置和基板输送位置之间的第一横向路径; 第二横动机构，其沿着设置在所述基板转印位置与所述基板输送位置之间的所述第一横动路径下方的第二横动路径横向移动第二横动保持部; 升降机构，其升高并降低所述基板转印位置的高度保持部; 以及主传送机构，其在基板传送位置和基板处理部之间间歇地传送多个垂直姿势的基板，第一和第二横移保持部以及仰角保持部分分别保持多个基板，垂直姿势。

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