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    • 5. 发明申请
    • Rotary Substrate Processing System
    • 旋转底材加工系统
    • US20130192761A1
    • 2013-08-01
    • US13754733
    • 2013-01-30
    • Joseph YudovskyRalf HofmannJeonghoon OhLi-Qun XiaToshiaki FujitaPravin K. NarwankarNag B, PatibandlaSrinivas SatyaBanqiu Wu
    • Joseph YudovskyRalf HofmannJeonghoon OhLi-Qun XiaToshiaki FujitaPravin K. NarwankarNag B, PatibandlaSrinivas SatyaBanqiu Wu
    • C23C16/54B05C13/00
    • C23C16/54B05C13/00C23C16/45551
    • A substrate processing system for processing multiple substrates is provided and generally includes at least one processing platform and at least one staging platform. Each substrate is positioned on a substrate carrier disposed on a substrate support assembly. Multiple substrate carriers, each is configured to carry a substrate thereon, are positioned on the surface of the substrate support assembly. The processing platform and the staging platform, each includes a separate substrate support assembly, which can be rotated by a separate rotary track mechanism. Each rotary track mechanism is capable of supporting the substrate support assembly and continuously rotating multiple substrates carried by the substrate carriers and disposed on the substrate support assembly. Each substrate is thus processed through at least one shower head station and at least one buffer station, which are positioned at a distance above the rotary track mechanism of the processing platform. Each substrate can be transferred between the processing platform and the staging platform and in and out the substrate processing system.
    • 提供了一种用于处理多个基板的基板处理系统,并且通常包括至少一个处理平台和至少一个分段平台。 每个衬底位于设置在衬底支撑组件上的衬底载体上。 多个衬底载体,每个被配置为在其上承载衬底,位于衬底支撑组件的表面上。 处理平台和分段平台各自包括单独的基板支撑组件,其可以通过单独的旋转轨道机构旋转。 每个旋转轨道机构能够支撑基板支撑组件并且连续旋转由基板载体承载并且设置在基板支撑组件上的多个基板。 因此,每个基板通过至少一个淋浴喷头站和至少一个缓冲站进行处理,所述至少一个缓冲站位于处理平台的旋转轨道机构上方的距离处。 每个基板可以在处理平台和分段平台之间传送并进出基板处理系统。
    • 7. 发明申请
    • CARBON-BASED ULTRACAPACITOR
    • 基于碳的超声波消毒器
    • US20100189881A1
    • 2010-07-29
    • US12360328
    • 2009-01-27
    • Nag B. Patibandla
    • Nag B. Patibandla
    • B05D5/12
    • H01G9/058H01G9/016H01G11/34H01G11/46H01G11/50H01G11/86Y02E60/13
    • A method of manufacturing a high surface area per unit weight carbon electrode includes providing a substrate, depositing a carbon-rich material on the substrate to form a film, and after the depositing, activating the carbon-rich material to increase the surface area of the film of carbon-rich material. Due to the activation process being after deposition, this method enables use of low cost carbon-rich material to form a carbon electrode in the capacitor. The electrode may be used in capacitors, ultracapacitors and lithium ion batteries. The substrate may be part of the electrode, or it may be sacrificial—being consumed during the activation process. The carbon-rich material may include any of carbonized material, carbon aerogel and metal oxides, such as manganese and ruthenium oxide. The activation may include exposing the carbon-rich material to carbon dioxide at elevated temperature, in the range of 300 to 900 degrees centigrade. This method may be used to make both symmetric and asymmetric ultracapacitors.
    • 制造每单位重量碳电极的高表面积的方法包括提供衬底,在衬底上沉积富碳材料以形成膜,并且在沉积之后,激活富含碳的材料以增加表面积 富含碳的材料的薄膜。 由于沉积后的活化过程,这种方法使得能够使用低成本的富碳材料在电容器中形成碳电极。 电极可用于电容器,超级电容器和锂离子电池。 衬底可以是电极的一部分,或者它可以在激活过程中被牺牲消耗。 富碳材料可以包括碳化材料,碳气凝胶和金属氧化物中的任何一种,例如锰和氧化钌。 活化可以包括在300-900摄氏度的高温下将富碳材料暴露于二氧化碳。 该方法可用于制造对称和非对称超级电容器。