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1. 发明申请

US20080277383A1 APPARATUS FOR REMOVING DEBRIS FROM THE CUTTING GAP OF A WORK PIECE ON A WIRE ELECTRONIC DISCHARGE MACHINE AND METHOD THEREFOR 审中-公开
标题翻译：用于从线性电子放电机上的工作片的切割面移除锯齿的装置及其方法
公开(公告)号：US20080277383A1
公开(公告)日：2008-11-13
申请号：US11747404
申请日：2007-05-11
申请人： Michael Sandlin , Frank Froncillo
发明人： Michael Sandlin , Frank Froncillo
IPC分类号： B23H1/04
CPC分类号： B23H7/101 , B23H1/10 , B23H7/36
摘要： A debris removal system for a wire electronic discharge machining (WEDM) apparatus has a fluid source. A pressurization device is coupled to the fluid source to pressurize a fluid from the fluid source. At least one fluid delivery nozzle is coupled to the pressurize device. The at least one fluid delivery nozzle is positioned behind a wire electrode of the WEDM apparatus and approximately perpendicular to the wire electrode to inject the pressurized fluid directly into an active cutting area between the wire and work piece.
摘要翻译：用于线电子放电加工（WEDM）装置的碎屑去除系统具有流体源。加压装置联接到流体源以对来自流体源的流体加压。至少一个流体输送喷嘴连接到加压装置。至少一个流体输送喷嘴定位在WEDM装置的线电极的后面并且大致垂直于线电极，以将加压流体直接注入到线和工件之间的主动切割区域中。

2. 发明授权

US06404500B1 Colorimeter apparatus and related process 失效
标题翻译：比色计仪器及相关流程
公开(公告)号：US06404500B1
公开(公告)日：2002-06-11
申请号：US09236827
申请日：1999-01-25
申请人： David J. Schneider , Gary L Claypoole , Johnny Michael Sandlin
发明人： David J. Schneider , Gary L Claypoole , Johnny Michael Sandlin
IPC分类号： G01N2159
CPC分类号： G01J3/46 , G01J3/0272 , G01J3/501 , G01N21/274
摘要： The disclosure of this invention relates to calorimeters and a process for operating a colorimeter. The colorimeter of the disclosure is controlled by a microprocessor which evaluates a predetermined radiation absorption curve for each sample. This is to be contrasted with the prior art wherein the test on a given sample evaluates only radiation absorption concentration points which are evaluated by the microprocessor. The colorimeter gives more accurate readings as a result of the fact that an absorption curve and its parameters are evaluated for each sample. The calorimeter uses multiple LEDs as a radiation source. The microprocessor further controls other functions of the colorimeter. A separate microprocessor may be used to control these other functions. The calorimeter and process of this invention are also useful in the analysis of samples for turbidity.
摘要翻译：本发明的公开涉及量热计和操作色度计的方法。本公开的比色计由微处理器控制，微处理器评估每个样品的预定辐射吸收曲线。这与现有技术形成对照，其中给定样品上的测试仅评估由微处理器评估的辐射吸收浓度点。由于对每个样品评估吸收曲线及其参数的事实，色度计给出更准确的读数。量热仪使用多个LED作为辐射源。微处理器进一步控制色度计的其他功能。可以使用单独的微处理器来控制这些其他功能。本发明的量热计和方法在分析浊度样品时也是有用的。

3. 发明授权

US07229588B2 Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal 有权
标题翻译：使用快速固化的合金粉末和元素Pt金属制造的机械合金化的贵金属磁性溅射靶
公开(公告)号：US07229588B2
公开(公告)日：2007-06-12
申请号：US10755229
申请日：2004-01-13
申请人： Michael Sandlin , Bernd Kunkel , Willy Zhang , Phillip Corno
发明人： Michael Sandlin , Bernd Kunkel , Willy Zhang , Phillip Corno
IPC分类号： B22F3/12 , C23C14/34
CPC分类号： C23C14/14 , C23C14/3414 , H01F41/183
摘要： A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'ing to densify the powder into the alloy.
摘要翻译：具有多相的钴 - 铬 - 硼 - 铂溅射靶合金。该合金可以包括Cr，B，Ta，Nb，C，Mo，Ti，V，W，Zr，Zn，Cu，Hf，O，Si或N.该合金是通过将Pt粉末与钴 - 硼母合金，球磨粉末和HIP'ing以将粉末致密化成合金。

4. 发明授权

US07175802B2 Refurbishing spent sputtering targets 失效
标题翻译：翻新废溅射靶
公开(公告)号：US07175802B2
公开(公告)日：2007-02-13
申请号：US10243948
申请日：2002-09-16
申请人： Michael Sandlin , Wenjun Zhang , Bernd Kunkel
发明人： Michael Sandlin , Wenjun Zhang , Bernd Kunkel
IPC分类号： C23C14/34 , B22F7/00
CPC分类号： B22F7/062 , B22F2007/068 , B22F2998/10 , C23C14/3414 , B22F3/1208 , B22F3/15
摘要： Spent sputtering targets are refurbished by filling the depleted region of the target with new sputter material using a hot isostatic pressing or HIP'ing technique.
摘要翻译：通过使用热等静压或HIP'ing技术，用新的溅射材料填充靶的耗尽区域来重新喷涂溅射靶。

5. 发明授权

US06797137B2 Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidfied alloy powders and elemental Pt metal 有权
标题翻译：使用快速固化的合金粉末和元素Pt金属制造机械合金化的贵金属磁性溅射靶
公开(公告)号：US06797137B2
公开(公告)日：2004-09-28
申请号：US09832181
申请日：2001-04-11
申请人： Michael Sandlin , Bernd Kunkel , Willy Zhang , Phillip Corno
发明人： Michael Sandlin , Bernd Kunkel , Willy Zhang , Phillip Corno
IPC分类号： C23C1434
CPC分类号： C23C14/14 , C23C14/3414 , H01F41/183
摘要： A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'ing to densify the powder into the alloy.
摘要翻译：具有多相的钴 - 铬 - 硼 - 铂溅射靶合金。该合金可以包括Cr，B，Ta，Nb，C，Mo，Ti，V，W，Zr，Zn，Cu，Hf，O，Si或N.该合金是通过将Pt粉末与钴 - 硼母合金，球磨粉末和HIP'ing将粉末致密化成合金。

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