专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08673407B2 Three dimensional engineering of planar optical structures 有权
标题翻译：平面光学结构三维工程
公开(公告)号：US08673407B2
公开(公告)日：2014-03-18
申请号：US11192159
申请日：2005-07-28
申请人： Xiangxin Bi , Elizabeth Anne Nevis , Ronald J. Mosso , Michael Edward Chapin , Shivkumar Chiruvolu , Sardar Hyat Khan , Sujeet Kumar , Herman Adrian Lopez , Nguyen Tran The Huy , Craig Richard Horne , Michael A. Bryan , Eric Euvrard
发明人： Xiangxin Bi , Elizabeth Anne Nevis , Ronald J. Mosso , Michael Edward Chapin , Shivkumar Chiruvolu , Sardar Hyat Khan , Sujeet Kumar , Herman Adrian Lopez , Nguyen Tran The Huy , Craig Richard Horne , Michael A. Bryan , Eric Euvrard
IPC分类号： C23C16/04 , C23C16/22 , C23C16/40 , C23C16/455 , C23C16/48
CPC分类号： H01S3/0632 , H01S3/0635 , H01S3/0637 , H01S3/0941 , H01S3/176 , H01S3/2308
摘要： Three dimensional optical structures are described that can have various integrations between optical devices within and between layers of the optical structure. Optical turning elements can provide optical pathways between layers of optical devices. Methods are described that provide for great versatility on contouring optical materials throughout the optical structure. Various new optical devices are enabled by the improved optical processing approaches.
摘要翻译：描述了三维光学结构，其可以在光学结构的层内和层之间的光学器件之间具有各种集成。光学旋转元件可以提供光学装置的层之间的光学路径。描述了在整个光学结构中轮廓化光学材料方面具有很大通用性的方法。通过改进的光学处理方法可以实现各种新的光学器件。

2. 发明授权

US07378330B2 Cleaving process to fabricate multilayered substrates using low implantation doses 有权
标题翻译：使用低植入剂量制造多层底物的切割过程
公开(公告)号：US07378330B2
公开(公告)日：2008-05-27
申请号：US11392452
申请日：2006-03-28
申请人： Francois J. Henley , Michael A. Bryan , William G. En
发明人： Francois J. Henley , Michael A. Bryan , William G. En
IPC分类号： H01L21/76 , H01L21/4763 , H01L29/00 , H01L23/44
CPC分类号： H01L21/76251 , H01L21/26506 , H01L21/76254
摘要： A method of forming substrates, e.g., silicon on insulator, silicon on silicon. The method includes providing a donor substrate, e.g., silicon wafer. The method also includes forming a cleave layer on the donor substrate that contains the cleave plane, the plane of eventual separation. In a specific embodiment, the cleave layer comprising silicon germanium. The method also includes forming a device layer (e.g., epitaxial silicon) on the cleave layer. The method also includes introducing particles into the cleave layer to add stress in the cleave layer. The particles within the cleave layer are then redistributed to form a high concentration region of the particles in the vicinity of the cleave plane, where the redistribution of the particles is carried out in a manner substantially free from microbubble or microcavity formation of the particles in the cleave plane. That is, the particles are generally at a low dose, which is defined herein as a lack of microbubble or microcavity formation in the cleave plane. The method also includes providing selected energy to the donor substrate to cleave the device layer from the cleave layer at the cleave plane, whereupon the selected energy is applied to create a controlled cleaving action to remove the device layer from a portion of the cleave layer in a controlled manner.
摘要翻译：一种形成衬底的方法，例如绝缘体上的硅，硅上的硅。该方法包括提供施主衬底，例如硅晶片。该方法还包括在供体基底上形成含有切割平面的切割层，最终分离的平面。在具体实施方案中，包含硅锗的切割层。该方法还包括在切割层上形成器件层（例如外延硅）。该方法还包括将颗粒引入裂解层以在切割层中增加应力。然后将切割层内的颗粒重新分布以形成在解理面附近的颗粒的高浓度区域，其中颗粒的再分布以基本上不含微孔中的微泡或微腔形成的方式进行劈平面也就是说，颗粒通常为低剂量，其在本文中定义为在解理面中缺乏微泡或微腔形成。该方法还包括向施主衬底提供所选择的能量以在解理面从裂解层切割器件层，由此施加所选择的能量以产生受控的切割作用，以将器件层从切割层的一部分去除受控的方式。

3. 发明授权

US06788866B2 Layer materials and planar optical devices 有权
标题翻译：层材料和平面光学器件
公开(公告)号：US06788866B2
公开(公告)日：2004-09-07
申请号：US09931977
申请日：2001-08-17
申请人： Michael A. Bryan
发明人： Michael A. Bryan
IPC分类号： G02B610
CPC分类号： G02B6/132 , G02B6/105 , G02B6/12004 , G02B6/122 , G02B6/134
摘要： Structures include a substrate with a release layer on the surface of the substrate and a uniform material over the release layer. The release layer generally includes powders or partly sintered powders. In some embodiments the uniform material is an optical material, which can be a glass. The optical material can be mechanically decoupled fro the substrate such that the optical material is stress free. The release layer can function as a transfer layer for transferring the uniform material to another substrate of separating the uniform material to create a freestanding structure. The release layer can be formed by the deposition of a material with a higher sintering temperature than powders used to form the uniform material. In other embodiments, a heating step is performed to preserve the release layer while consolidating powders on top into the uniform material.
摘要翻译：结构包括在基材表面上具有剥离层的基材和在脱模层上的均匀材料。释放层通常包括粉末或部分烧结的粉末。在一些实施例中，均匀的材料是可以是玻璃的光学材料。光学材料可以被机械地从衬底分离，使得光学材料是无应力的。释放层可以用作转移层，用于将均匀的材料转移到分离均匀材料的另一个基底以产生独立结构。释放层可以通过沉积具有比用于形成均匀材料的粉末更高的烧结温度的材料形成。在其他实施方案中，进行加热步骤以保持释放层，同时将粉末顶部固定在均匀材料中。

4. 发明授权

US06513564B2 Nozzle for cleaving substrates 失效
公开(公告)号：US06513564B2
公开(公告)日：2003-02-04
申请号：US09808814
申请日：2001-03-14
申请人： Michael A. Bryan , James K. Kai
发明人： Michael A. Bryan , James K. Kai
IPC分类号： B32B3500
CPC分类号： B32B43/006 , B28D5/0011 , B28D5/0023 , B28D5/0064 , B28D5/0082 , Y10T29/49821 , Y10T29/49822 , Y10T83/364 , Y10T156/1374 , Y10T156/1928
摘要： A cleaving tool provides pressurized gas to the edge of a substrate in combination with a sharpened edge to cleave the substrate at a selected interface. The edge of the tool is tapped against the perimeter of a substrate, such as a bonded substrate, and a burst of gas pressure is then applied at approximately the point of contact with the edge of the tool. The combination of mechanical force and gas pressure separates the substrate into two halves at a selected interface, such as a weakened layer in a donor wafer.

5. 发明授权

US06263941B1 Nozzle for cleaving substrates 失效
标题翻译：用于切割基材的喷嘴
公开(公告)号：US06263941B1
公开(公告)日：2001-07-24
申请号：US09370958
申请日：1999-08-10
申请人： Michael A. Bryan , James K. Kai
发明人： Michael A. Bryan , James K. Kai
IPC分类号： B32B3500
CPC分类号： B32B43/006 , B28D5/0011 , B28D5/0023 , B28D5/0064 , B28D5/0082 , Y10T29/49821 , Y10T29/49822 , Y10T83/364 , Y10T156/1374 , Y10T156/1928
摘要： A cleaving tool provides pressurized gas to the edge of a substrate in combination with a sharpened edge to cleave the substrate at a selected interface. The edge of the tool is tapped against the perimeter of a substrate, such as a bonded substrate, and a burst of gas pressure is then applied at approximately the point of contact with the edge of the tool. The combination of mechanical force and gas pressure separates the substrate into two halves at a selected interface, such as a weakened layer in a donor wafer.
摘要翻译：切割工具将加压气体与锋利的边缘组合地提供到基底的边缘，以在选定的界面处切割基底。将工具的边缘与衬底的周边（例如键合衬底）相接合，然后在大约与工具边缘的接触点处施加气体压力脉冲。机械力和气体压力的组合将基板在选定的界面（例如施主晶片中的弱化层）分离成两半。

6. 发明授权

US07164818B2 Integrated gradient index lenses 有权
标题翻译：积分渐变指数镜头
公开(公告)号：US07164818B2
公开(公告)日：2007-01-16
申请号：US10138754
申请日：2002-05-03
申请人： Michael A. Bryan , Elizabeth Anne Nevis
发明人： Michael A. Bryan , Elizabeth Anne Nevis
IPC分类号： G02B6/32
CPC分类号： G02B6/12004 , G02B6/12002 , G02B6/1245 , G02B6/132 , G02B6/32 , G02B2006/12102
摘要： Gradient index lenses are described that are integrated within a planar optical structure. The gradient index lens is optically coupled to a planar optical waveguide. In some embodiments, the gradient index lens with variation in index-of-refraction in one dimension is within an optical fiber. The optical fiber includes cladding at least along the edges of the central plane of the gradient index lens. Methods for forming the integrated structures are described. Further optical structures involving the gradient index lenses are also described.
摘要翻译：描述了集成在平面光学结构内的渐变折射率透镜。梯度折射率透镜光学耦合到平面光波导。在一些实施例中，在一个维度上具有变化的折射率的渐变折射率透镜在光纤内。光纤包括至少沿着渐变折射率透镜的中心平面的边缘的包层。描述形成集成结构的方法。还描述了涉及梯度折射率透镜的其它光学结构。

7. 发明授权

US07039264B2 Multilayered optical structures 失效
公开(公告)号：US07039264B2
公开(公告)日：2006-05-02
申请号：US10420343
申请日：2003-04-22
申请人： Michael A. Bryan , Xiangxin Bi
发明人： Michael A. Bryan , Xiangxin Bi
IPC分类号： G02B6/12 , G02B6/02 , G02B6/00 , B32B9/00
CPC分类号： G02B6/12002 , B32B9/04 , C03B19/1415 , C03B19/1423 , C03B19/1484 , C03B37/01413 , C03B37/0142 , C03B37/01486 , C03B37/027 , C03B2203/34 , C03B2205/40 , C03B2207/02 , C03B2207/34 , C03B2207/66 , C03B2207/85 , C04B35/14 , C04B2235/3201 , C04B2235/3203 , C04B2235/3215 , C04B2235/3217 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3232 , C04B2235/3234 , C04B2235/3244 , C04B2235/3251 , C04B2235/3258 , C04B2235/3287 , C04B2235/3293 , C04B2235/3294 , C04B2235/3296 , C04B2235/3298 , C04B2235/3409 , C04B2235/3418 , C04B2235/3463 , C23C16/483 , C23C26/00 , G02B6/02042 , G02B6/13 , G02B6/132 , G02B2006/12147 , G02B2006/1215 , G02B2006/12176 , Y02P40/57
摘要： Monolithic optical structures include a plurality of layer with each layer having an isolated optical pathway confined within a portion of the layer. The monolithic optical structure can be used as an optical fiber preform. Alternatively or additionally, the monolithic optical structure can include integrated optical circuits within one or more layers of the structure. Monolithic optical structures can be formed by performing multiple passes of a substrate through a flowing particle stream. The deposited particles form an optical material following consolidation. Flexible optical fibers include a plurality of independent light channels extending along the length of the optical fiber. The fibers can be pulled from an appropriate preform.

8. 发明授权

US06458723B1 High temperature implant apparatus 有权
标题翻译：高温植入装置
公开(公告)号：US06458723B1
公开(公告)日：2002-10-01
申请号：US09594464
申请日：2000-06-14
申请人： Francois J. Henley , Michael A. Bryan , William G. En
发明人： Francois J. Henley , Michael A. Bryan , William G. En
IPC分类号： H01L2126
CPC分类号： H01L21/67103 , H01J2237/2001 , H01J2237/31701
摘要： An ion implantation apparatus and method. The apparatus has a vacuum chamber and an ion beam generator to generate an ion beam in the vacuum chamber. The apparatus also has an implant wheel (10), in the vacuum chamber, having a plurality of circumferentially distributed substrate holding positions. Each of the substrate holding positions comprises a substrate holder (17), which includes an elastomer overlying the substrate holder (17) and a thermal insulating material (71) (e.g., quartz, silicon, ceramics, and other substantially non-compliant materials) overlying the elastomer (72). The present thermal insulating material increases a temperature of a substrate as it is implanted.
摘要翻译：一种离子注入装置及方法。该装置具有真空室和离子束发生器，以在真空室中产生离子束。该设备还具有植入轮（10），其在真空室中具有多个周向分布的衬底保持位置。每个基板保持位置包括基板保持器（17），其包括覆盖基板保持器（17）的弹性体和绝热材料（例如石英，硅，陶瓷和其他基本上不顺从的材料）覆盖弹性体（72）。本发明的绝热材料在植入时增加了基板的温度。

9. 发明授权

US06213050B1 Enhanced plasma mode and computer system for plasma immersion ion implantation 有权
标题翻译：用于等离子体浸没离子注入的增强等离子体模式和计算机系统
公开(公告)号：US06213050B1
公开(公告)日：2001-04-10
申请号：US09201933
申请日：1998-12-01
申请人： Wei Liu , Michael A. Bryan , Ian S. Roth
发明人： Wei Liu , Michael A. Bryan , Ian S. Roth
IPC分类号： H01L2100
CPC分类号： H01J37/32412 , H01J37/32431
摘要： A novel plasma treatment system (200) including one or more novel computer codes. These codes provide a high density plasma for plasma immersion ion implantation applications.
摘要翻译：一种新颖的等离子体处理系统（200），包括一个或多个新的计算机代码。这些代码提供了用于等离子体浸没离子注入应用的高密度等离子体。

10. 发明授权

US6054235A Color filter repair method 失效
标题翻译：彩色滤光片修复方法
公开(公告)号：US6054235A
公开(公告)日：2000-04-25
申请号：US925895
申请日：1997-09-08
申请人： Michael A. Bryan , C. Wade Sheen
发明人： Michael A. Bryan , C. Wade Sheen
IPC分类号： B23K26/06 , G01N21/94 , G02B5/20 , G02F1/1335
CPC分类号： G01N21/94 , B23K26/066 , G02B5/201 , Y10S430/146
摘要： A technique including a method 300, 400 and apparatus 200 for repairing a color filter assembly 1 for a flat panel display using a high intensity light source means. The technique provides a color filter assembly having an anomaly. The technique uses a step of directing a high intensity light source 203 through an aperture opening at the anomaly to selectively ablate a portion of the anomaly. These features remove the portion of the anomaly while preventing a possibility of substantial damage to other portions of the color filter assembly surrounding the anomaly.
摘要翻译：一种包括方法300,400和装置200的技术，用于使用高强度光源装置修复用于平板显示器的滤色器组件1。该技术提供了具有异常的滤色器组件。该技术使用将高强度光源203引导通过异常处的开口开口以选择性地消融异常的一部分的步骤。这些特征去除异常部分，同时防止可能对围绕异常的滤色器组件的其它部分造成实质损坏。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式