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    • 6. 发明授权
    • Optical materials with selected index-of-refraction
    • 具有折射率折射率的光学材料
    • US07437047B2
    • 2008-10-14
    • US11796798
    • 2007-04-30
    • Michael A. BryanNobuyuki Kambe
    • Michael A. BryanNobuyuki Kambe
    • G02B6/10H01L21/00
    • G02B6/13G02B6/124G02B6/125Y10T428/25
    • Photosensitive optical materials are used for establishing more versatile approaches for optical device formation. In some embodiments, unpatterned light is used to shift the index-of-refraction of planar optical structures to shift the index-of-refraction of the photosensitive material to a desired value. This approach can be effective to produce cladding material with a selected index-of-refraction. In additional embodiments gradients in index-of-refraction are formed using photosensitive materials. In further embodiments, the photosensitive materials are patterned within the planar optical structure. Irradiation of the photosensitive material can selectively shift the index-of-refraction of the patterned photosensitive material. By patterning the light used to irradiate the patterned photosensitive material, different optical devices can be selectively activated within the optical structure.
    • 光敏光学材料用于建立用于光学器件形成的更通用的方法。 在一些实施例中,使用未图案的光来移动平面光学结构的折射率以将感光材料的折射率移动到期望值。 这种方法可以有效地生产具有选定的折射率的包层材料。 在另外的实施例中,使用光敏材料形成折射率折射率。 在另外的实施例中,感光材料在平面光学结构内图案化。 感光材料的照射可以选择性地移动图案化感光材料的折射率。 通过图案化用于照射图案化感光材料的光,可以在光学结构内选择性地激活不同的光学器件。
    • 8. 发明授权
    • Optical materials with selected index-of-refraction
    • 具有折射率折射率的光学材料
    • US07224882B2
    • 2007-05-29
    • US10620176
    • 2003-07-15
    • Michael A. BryanNobuyuki Kambe
    • Michael A. BryanNobuyuki Kambe
    • G02B6/00H01L21/00
    • G02B6/13G02B6/124G02B6/125Y10T428/25
    • Photosensitive optical materials are used for establishing more versatile approaches for optical device formation. In some embodiments, unpatterned light is used to shift the index-of-refraction of planar optical structures to shift the index-of-refraction of the photosensitive material to a desired value. This approach can be effective to produce cladding material with a selected index-of-refraction. In additional embodiments gradients in index-of-refraction are formed using, photosensitive materials. In further embodiments, the photosensitive materials are patterned within the planar optical structure. Irradiation of the photosensitive material can selectively shift the index-of-refraction of the patterned photosensitive material. By patterning the light used to irradiate the patterned photosensitive material, different optical devices can be selectively activated within the optical structure.
    • 光敏光学材料用于建立用于光学器件形成的更通用的方法。 在一些实施例中,使用未图案的光来移动平面光学结构的折射率以将感光材料的折射率移动到期望值。 这种方法可以有效地生产具有选定的折射率的包层材料。 在另外的实施例中,使用感光材料形成折射率折射率。 在另外的实施例中,感光材料在平面光学结构内图案化。 感光材料的照射可以选择性地移动图案化感光材料的折射率。 通过图案化用于照射图案化感光材料的光,可以在光学结构内选择性地激活不同的光学器件。
    • 9. 发明授权
    • Modulator manufacturing process and device
    • 调制器制造工艺及装置
    • US06211991B1
    • 2001-04-03
    • US09098192
    • 1998-06-16
    • Michael A. Bryan
    • Michael A. Bryan
    • G02F103
    • G02F1/1341G02F1/0305G02F1/061G02F1/133365G02F1/1334
    • An improved method and resulting device 10 for fabricating an electro-optical modulator material. The technique includes providing a substrate 509, which has a top surface. A first layer of electrode material 501 is defined overlying the top surface. The method also includes applying a transfer sheet 400, having an electro-optical material 405, to the first layer of electrode material 501, where the electro-optical material is affixed to the first layer of electrode material. A step of removing (e.g., peeling) 801 the transfer sheet from the electro-optical material is included. The removing step leaves a substantial portion of the electro-optical modulator material intact and affixed to the first layer of electrode material. This method generally uses less steps and provides a higher quality element than pre-existing techniques.
    • 一种用于制造电光调制器材料的改进方法和所得装置10。 该技术包括提供具有顶表面的基底509。 电极材料501的第一层被限定在顶表面上。 该方法还包括将具有电光材料405的转印片400施加到电极材料501的第一层上,其中电光材料固定在第一层电极材料上。 包括从电光材料去除(例如剥离)801转印片的步骤。 去除步骤使电光调制器材料的大部分完好无损地固定在第一层电极材料上。 该方法通常使用较少的步骤,并提供比先前存在的技术更高质量的元素。