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    • 4. 发明申请
    • Plasma processing apparatus and method
    • 等离子体处理装置及方法
    • US20060238132A1
    • 2006-10-26
    • US11391325
    • 2006-03-29
    • Masayuki KitamuraMasaki HirayamaTadahiro Ohmi
    • Masayuki KitamuraMasaki HirayamaTadahiro Ohmi
    • H01J7/24
    • H01J37/32229H01J37/32192
    • A plasma processing apparatus that passes a microwave, which is introduced into a waveguide, through a slot and propagates the microwave to a dielectric, converts a predetermined gas supplied into a processing chamber into plasma, and applies plasma processing to a substrate, in which a plurality of the waveguides are disposed side by side, a plurality of dielectrics are provided for each of the waveguides, and one slot, or two or more slots is or are provided for each of the dielectrics, is provided. The area of each of the dielectrics can be made extremely small, and a microwave can be reliably propagated into the entire surface of the dielectric. A thin support member that supports the dielectric can be used, a uniform electromagnetic field can be formed in an entire area above the substrate, and uniform plasma can be generated in the processing chamber.
    • 将通过槽引入波导中的微波通过微波传播到电介质的等离子体处理装置将供给到处理室的规定气体转换为等离子体,并对基板进行等离子体处理,其中 多个波导并排设置,为每个波导提供多个电介质,并且为每个电介质提供一个槽或两个或更多个槽。 可以使每个电介质的面积非常小,并且可以将微波可靠地传播到电介质的整个表面。 可以使用支撑电介质的薄的支撑构件,可以在基板上方的整个区域中形成均匀的电磁场,并且可以在处理室中产生均匀的等离子体。
    • 5. 发明授权
    • Radiation temperature measuring method and radiation temperature measuring system
    • 辐射温度测量方法和辐射温度测量系统
    • US06488407B1
    • 2002-12-03
    • US09527243
    • 2000-03-17
    • Masayuki KitamuraEisuke MorisakiNobuaki TakahashiTakashi Shigeoka
    • Masayuki KitamuraEisuke MorisakiNobuaki TakahashiTakashi Shigeoka
    • G01J500
    • G01J5/0003G01J5/0007G01J5/08G01J5/0818G01J5/0887G01J5/0896G01J2005/0051G01J2005/0077
    • The present invention intends to improve the accuracy of temperature measurement when measuring the temperature of a semiconductor wafer by a radiation thermometer on the basis of the idea of virtual blackbody simulated by multiple reflection of light. A system includes a wafer (W), a circular reflector 1 of a radius R disposed opposite to the wafer (W), and a probe (2) disposed in a through hole formed in the reflector (1). The probe (2) is a through hole. The radiation intensity of radiation passed the through hole is determined by image data provided by a CCD camera disposed behind the back surface of the reflector (1). An error in measured radiation intensity of radiation falling the probe (2) due to light that enters a space between the wafer (W) and the reflector (1) and a space between the reflector (1) and the probe (2) and light leaks from the same spaces is corrected, the emissivity of the wafer (W) is calculated and the temperature of the wafer (W) is determined.
    • 本发明旨在通过基于由多次反射光模拟的虚拟黑体的想法,通过辐射温度计测量半导体晶片的温度来提高温度测量的精度。 系统包括晶片(W),与晶片(W)相对设置的半径为R的圆形反射器1和设置在形成于反射器(1)中的通孔中的探针(2)。 探针(2)是通孔。 通过通孔的辐射的辐射强度由设置在反射器(1)的后表面后面的CCD照相机提供的图像数据确定。 由于进入晶片(W)和反射器(1)之间的空间的光以及反射器(1)和探针(2)之间的空间以及光线(2)引起的探测器(2)的测量辐射强度的误差 校正相同空间的泄漏,计算晶片的发射率(W),并确定晶片(W)的温度。
    • 9. 发明申请
    • TAPE HEATER AND METHOD FOR MANUFACTURING THE SAME
    • 胶带加热器及其制造方法
    • US20090242548A1
    • 2009-10-01
    • US12410642
    • 2009-03-25
    • Kenji IidaKeiichi FukudaAkira SasakiDaisaku SekiEmico TaguchiMasayuki Kitamura
    • Kenji IidaKeiichi FukudaAkira SasakiDaisaku SekiEmico TaguchiMasayuki Kitamura
    • H05B3/34D04B1/22
    • H05B3/345H05B3/347H05B3/58H05B2203/016H05B2203/017Y10T29/49002
    • The present invention relates to a tape heater including: at least one flexible fabric base formed from a heat-resistant thread, the at least one flexible fabric base including a first fabric base part and a second fabric base part; and a heater member, in which the heater member is interposed between the first fabric base part and the second fabric base pan. Since the heater member is interposed between the fabric base(s), the tape heater of the present invention exhibits superior flexibility and stretchability and is superior in easily being wrapped around a pipe, as well as reliably protecting the heater member. Further, tape heaters can be continually manufactured, so long as weaving or knitting of the fabric base(s) is caused to proceed while the heater member is interposed between the fabric base(s), to thus join the fabric base(s). Hence, enhancement of production efficiency and prevention of an increase in production cost can be attained.
    • 带加热器技术领域本发明涉及一种带式加热器,包括:由耐热螺纹形成的至少一个柔性织物基底,所述至少一个柔性织物基底包括第一织物基部和第二织物基部; 以及加热器构件,其中加热器构件插入在第一织物基部和第二织物底盘之间。 由于加热件插在织物基底之间,所以本发明的带状加热器显示出优异的柔韧性和拉伸性,并且易于缠绕在管子上而且可靠地保护加热器部件。 此外,只要在加热器构件插入织物基底之间进行织物基底的织造或编织,从而连接织物基底,就可以连续地制造带加热器。 因此,可以提高生产效率并防止生产成本的增加。