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    • 3. 发明申请
    • Method of fabricating an organic thin film transistor and method of surface treatment for gate insulating layer
    • 制造有机薄膜晶体管的方法和栅极绝缘层的表面处理方法
    • US20110086467A1
    • 2011-04-14
    • US12656331
    • 2010-01-26
    • Cheng Wei ChouHsiano Wen ZanJenn-Chang HwangChung Hwa WangLi Shiuan TsaiWen Chieh Wang
    • Cheng Wei ChouHsiano Wen ZanJenn-Chang HwangChung Hwa WangLi Shiuan TsaiWen Chieh Wang
    • H01L51/40
    • H01L51/001H01L51/0097H01L51/0545
    • A method of fabricating an organic thin film transistor is disclosed, which comprises steps of (S1) forming a gate electrode on a substrate; (S2) forming a gate insulating layer on the gate electrode; (S3) providing a gas on the surface of the gate insulating layer to form hydrophobic molecules on the surface of the gate insulating layer; (S4) forming an organic semiconductor layer, a source electrode, and a drain electrode over the gate insulating layer having hydrophobic molecules thereon, wherein the gas of step (S3) is at least one selected from the group consisting of halogen-substituted hydrocarbon, un-substituted hydrocarbon, and the mixtures thereof. The method of the present invention utilizes gases comprising carbon or fluorine atom to perform surface treatment on the surface of the gate insulating layer, therefore the hydrophobic character of the surface of the gate insulating layer can be enhanced and the electrical properties of the OTFT can be improved. Also, a method of surface treatment for the gate insulating layer is disclosed.
    • 公开了一种制造有机薄膜晶体管的方法,其包括以下步骤:(S1)在基板上形成栅电极; (S2),在所述栅电极上形成栅极绝缘层; (S3)在所述栅极绝缘层的表面上提供气体以在所述栅极绝缘层的表面上形成疏水性分子; (S4)在其上具有疏水分子的栅绝缘层上形成有机半导体层,源电极和漏电极,其中步骤(S3)的气体是选自卤素取代的烃, 未取代的烃,及其混合物。 本发明的方法利用包含碳或氟原子的气体在栅极绝缘层的表面上进行表面处理,因此可以提高栅极绝缘层表面的疏水性,并且可以使OTFT的电性能 改进。 此外,公开了一种用于栅绝缘层的表面处理方法。
    • 5. 发明授权
    • Method of fabricating an organic thin film transistor and method of surface treatment for gate insulating layer
    • 制造有机薄膜晶体管的方法和栅极绝缘层的表面处理方法
    • US08110433B2
    • 2012-02-07
    • US12656331
    • 2010-01-26
    • Cheng Wei ChouHsiao Wen ZanJenn-Chang HwangChung Hwa WangLi Shiuan TsaiWen Chieh Wang
    • Cheng Wei ChouHsiao Wen ZanJenn-Chang HwangChung Hwa WangLi Shiuan TsaiWen Chieh Wang
    • H01L21/40
    • H01L51/001H01L51/0097H01L51/0545
    • A method of fabricating an organic thin film transistor is disclosed, which comprises steps of (S1) forming a gate electrode on a substrate; (S2) forming a gate insulating layer on the gate electrode; (S3) providing a gas on the surface of the gate insulating layer to form hydrophobic molecules on the surface of the gate insulating layer; (S4) forming an organic semiconductor layer, a source electrode, and a drain electrode over the gate insulating layer having hydrophobic molecules thereon, wherein the gas of step (S3) is at least one selected from the group consisting of halogen-substituted hydrocarbon, un-substituted hydrocarbon, and the mixtures thereof. The method of the present invention utilizes gases comprising carbon or fluorine atom to perform surface treatment on the surface of the gate insulating layer, therefore the hydrophobic character of the surface of the gate insulating layer can be enhanced and the electrical properties of the OTFT can be improved. Also, a method of surface treatment for the gate insulating layer is disclosed.
    • 公开了一种制造有机薄膜晶体管的方法,其包括以下步骤:(S1)在基板上形成栅电极; (S2),在所述栅电极上形成栅极绝缘层; (S3)在所述栅极绝缘层的表面上提供气体以在所述栅极绝缘层的表面上形成疏水性分子; (S4)在其上具有疏水分子的栅绝缘层上形成有机半导体层,源电极和漏电极,其中步骤(S3)的气体是选自卤素取代的烃, 未取代的烃,及其混合物。 本发明的方法利用包含碳或氟原子的气体在栅极绝缘层的表面上进行表面处理,因此可以提高栅极绝缘层表面的疏水性,并且可以使OTFT的电性能 改进。 此外,公开了一种用于栅绝缘层的表面处理方法。