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    • 1. 发明授权
    • Scanning probe microscope and sample observing method using the same
    • 扫描探针显微镜及使用其的样品观察方法
    • US08695110B2
    • 2014-04-08
    • US13586754
    • 2012-08-15
    • Toshihiko NakataMasahiro WatanabeTakashi InoueKishio HidakaMotoyuki Hirooka
    • Toshihiko NakataMasahiro WatanabeTakashi InoueKishio HidakaMotoyuki Hirooka
    • G01Q70/00G01Q70/16G01N13/00
    • G01Q60/18G01Q60/22
    • In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    • 在使用孔径探针的近场扫描显微镜中,实际上孔径形成的上限为至多几十nm。 在使用散射探针的近场扫描显微镜中,由于外部照明光作为背景噪声,分辨能力被限制在至多几十nm。 此外,通过探针的损伤或磨损,测量再现性被严重降低。 可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据,同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品 通过将nm级圆柱形结构与nm级微粒组合,并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。
    • 3. 发明申请
    • SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME
    • 扫描探针显微镜和使用其的样品观察方法
    • US20100064396A1
    • 2010-03-11
    • US12523369
    • 2008-02-26
    • Toshihiko NakataMasahiro WatanabeTakashi InoueKishio HidakaMotoyuki Hirooka
    • Toshihiko NakataMasahiro WatanabeTakashi InoueKishio HidakaMotoyuki Hirooka
    • G01Q60/18G01Q60/24
    • G01Q60/18G01Q60/22
    • In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    • 在使用孔径探针的近场扫描显微镜中,实际上孔径形成的上限为至多几十nm。 在使用散射探针的近场扫描显微镜中,由于外部照明光作为背景噪声,分辨能力被限制在至多几十nm。 此外,通过探针的损伤或磨损,测量再现性被严重降低。 可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据,同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品 通过将nm级圆柱形结构与nm级微粒组合,并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。