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1. 发明授权

US09274252B2 Polycarbonate resin composition 有权
标题翻译：聚碳酸酯树脂组合物
公开(公告)号：US09274252B2
公开(公告)日：2016-03-01
申请号：US13390190
申请日：2010-08-11
申请人： Noriyuki Kato , Hiroki Furuhashi , Shu Yoshida , Kazuaki Kaneko , Keiichi Kameyama
发明人： Noriyuki Kato , Hiroki Furuhashi , Shu Yoshida , Kazuaki Kaneko , Keiichi Kameyama
IPC分类号： C08L69/00 , G02B1/04 , C08G64/02
CPC分类号： G02B1/041 , C08G64/0208 , C08L69/00 , C08L2205/02 , C08L2666/18
摘要： To provide a polycarbonate resin composition having a high Abbe's number, high strength and excellent stainability.Disclosed is a polycarbonate resin composition prepared by blending a polycarbonate resin (A) prepared by forming carbonate bonds in tricyclo[5.2.1.02,6]decanedimethanol with a diester or phosgene, and a weight-averaged molecular weight (Mw) of the polycarbonate resin (A) being equal to or more than 25,000, and a polycarbonate resin (B) prepared by reacting 2,2-bis(4-hydroxyphenyl)propane and phosgene, and weight-averaged molecular weight (Mw) of the polycarbonate resin (B) being equal to or more than 30,000, wherein a ratio thereof, 100×(A)/((A)+(B)), is from 1 to 99% by weight.
摘要翻译：提供具有高阿贝数，高强度和优异染色性的聚碳酸酯树脂组合物。公开了通过将通过在三环[5.2.1.0 2,6]癸二甲醇中形成碳酸酯键制备的聚碳酸酯树脂（A）与二酯或光气共混制备的聚碳酸酯树脂组合物和聚碳酸酯树脂的重均分子量（Mw）（A）等于或大于25,000，和通过2,2-双（4-羟基苯基）丙烷和光气反应制备的聚碳酸酯树脂（B）和聚碳酸酯树脂（B）的重均分子量（Mw））等于或大于30,000，其中100×（A）/（（A）+（B））的比例为1至99重量％。

2. 发明申请

US20120116000A1 POLYCARBONATE RESIN COMPOSITION, AND PROCESS FOR PRODUCING MOLDED PRODUCTS AND OPTICAL LENS USING THE SAME 审中-公开
标题翻译：聚碳酸酯树脂组合物，以及使用其制造模制产品和光学镜片的方法
公开(公告)号：US20120116000A1
公开(公告)日：2012-05-10
申请号：US13263021
申请日：2010-04-05
申请人： Shu Yoshida , Noriyuki Kato , Hiroki Furuhashi , Kazuaki Kaneko , Keiichi Kameyama
发明人： Shu Yoshida , Noriyuki Kato , Hiroki Furuhashi , Kazuaki Kaneko , Keiichi Kameyama
IPC分类号： C08K5/13
CPC分类号： C08G64/1608 , C08G64/0208 , C08K5/103 , C08K5/13 , C08K5/1345 , G02B1/041 , C08L69/00
摘要： To provide a thermoplastic polymer composition excellent in molding.Disclosed is a thermoplastic polymer composition comprising A) a polycarbonate copolymer which is produced according to a melt method without adding any quencher, which comprises constitution units of (1) and (2), B) a mold release which is a partial ester formed of a C10-20 monovalent fatty acid and glycerol, and C) a hindered phenol antioxidant.
摘要翻译：提供成型性优异的热塑性聚合物组合物。公开了一种热塑性聚合物组合物，其包含A）聚碳酸酯共聚物，其根据熔体法而不添加任何猝灭剂，其包含（1）和（2）的构成单元，B）脱模剂，其为由 C10-20单价脂肪酸和甘油，和C）受阻酚抗氧化剂。

3. 发明授权

US08026336B2 Polycarbonate resin composition and method of producing the same 有权
标题翻译：聚碳酸酯树脂组合物及其制造方法
公开(公告)号：US08026336B2
公开(公告)日：2011-09-27
申请号：US12706550
申请日：2010-02-16
申请人： Noriyuki Kato , Yoshinori Isahaya , Shu Yoshida , Jun Hagiwara , Kazuaki Kaneko , Keiichi Kameyama
发明人： Noriyuki Kato , Yoshinori Isahaya , Shu Yoshida , Jun Hagiwara , Kazuaki Kaneko , Keiichi Kameyama
IPC分类号： C08G64/00 , C08G63/02
CPC分类号： C08J5/18 , C08G64/0208 , C08J2369/00 , G02B1/041 , C08L69/00
摘要： The present invention relates to a polycarbonate resin composition which comprises a polycarbonate resin having the repeating unit that is represented by the following general formula (1) and a hydroxyl group at terminal thereof and has the concentration of the terminal hydroxyl group of 1000 ppm or more.
摘要翻译：本发明涉及一种聚碳酸酯树脂组合物，其包含具有由以下通式（1）表示的重复单元和末端羟基并具有1000ppm以上的末端羟基的聚碳酸酯树脂。

4. 发明授权

US07944677B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US07944677B2
公开(公告)日：2011-05-17
申请号：US12666748
申请日：2008-09-10
申请人： Yoshiki Aruga , Eitarou Morimoto , You Tanaka , Kazuaki Kaneko
发明人： Yoshiki Aruga , Eitarou Morimoto , You Tanaka , Kazuaki Kaneko
IPC分类号： H01T23/00
CPC分类号： H01L21/6833 , C23C14/50 , C23C14/541 , H01L21/6875 , H02N13/00
摘要： An electrostatic chuck includes a dielectric board having an upper surface on which a plurality of projections for supporting a substrate on top surfaces and recesses surrounding the projections are formed, an electrode formed inside the dielectric board, and an external power supply which applies a voltage to the electrode. The dielectric board includes a conductor film formed on at least the top surface of each projection, and has a three-dimensional structure which causes the conductor film to generate a Johnson-Rahbeck force between the substrate and conductor film when a voltage is applied to the electrode.
摘要翻译：静电卡盘包括：电介质板，具有上表面，在其上形成有多个突起，用于在上表面上支撑基板，围绕突起形成凹槽;形成在电介质板内部的电极;以及外部电源，电极。电介质板包括形成在每个突起的至少顶表面上的导体膜，并且具有三维结构，当将电压施加到基板和导体膜时，导致导体膜在基板和导体膜之间产生约翰逊 - 拉贝克力电极。

5. 发明申请

US20100024723A1 SUBSTRATE ALIGNMENT APPARATUS AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：基板对准装置和基板处理装置
公开(公告)号：US20100024723A1
公开(公告)日：2010-02-04
申请号：US12501827
申请日：2009-07-13
申请人： Masami Hasegawa , Kazuaki Kaneko
发明人： Masami Hasegawa , Kazuaki Kaneko
IPC分类号： B05C13/00 , C23F1/00
CPC分类号： H01L21/68742 , H01J37/32743 , H01L21/68 , H01L21/681
摘要： A substrate alignment apparatus for aligning a substrate with a reference point, comprises a plurality of columns configured to rotate about rotation axes parallel to respective axial directions thereof, a driving mechanism configured to synchronously rotate the plurality of columns through an identical angle in an identical direction, a detector configured to detect an amount of positional deviation of the substrate from the reference point, and support pins which are located on upper surfaces of the plurality of columns while being spaced apart from respective rotation axes of the plurality of columns, and are configured to support the substrate, wherein the substrate is aligned by synchronously rotating the plurality of columns through the identical angle in the identical direction by the driving mechanism based on the amount of positional deviation detected by the detector.
摘要翻译：一种用于使衬底与参考点对准的衬底对准装置，包括：多个列，其被构造成绕其平行于其轴向方向的旋转轴线旋转;驱动机构，其构造成使多个柱沿相同方向同步旋转相同的角度检测器，被配置为检测基板与参考点的位置偏移量，以及支撑销，其位于多个列的上表面上，同时与多个列的相应旋转轴线间隔开，并且被配置以支撑基板，其中通过基于由检测器检测到的位置偏差的量，通过驱动机构使多个列在相同方向上同步旋转相同的角度来对准基板。

6. 发明申请

US20090283976A1 SUBSTRATE HOLDING APPARATUS 审中-公开
标题翻译：基板保持装置
公开(公告)号：US20090283976A1
公开(公告)日：2009-11-19
申请号：US12432098
申请日：2009-04-29
申请人： Kazuaki Kaneko , Yoh Tanaka , Masayoshi Ikeda , Yohsuke Shibuya
发明人： Kazuaki Kaneko , Yoh Tanaka , Masayoshi Ikeda , Yohsuke Shibuya
IPC分类号： B23Q3/15 , B23Q3/00
CPC分类号： H01L21/6831 , H01L21/67103 , H01L21/68728 , Y10T279/23 , Y10T279/34
摘要： A substrate holding apparatus comprises a substrate holding mechanism configured to hold a substrate; a heating mechanism; and a heat-conductive member which is interposed between the substrate holding mechanism and the heating mechanism to be in contact therewith and conducts heat generated by the heating mechanism to the substrate holding mechanism, wherein the heat-conductive member has a recessed section that opens to the substrate.
摘要翻译：基板保持装置包括：基板保持机构，其构造成保持基板; 加热机构; 以及介于所述基板保持机构和所述加热机构之间以与其接触的导热构件，其将由所述加热机构产生的热量传导到所述基板保持机构，其中，所述导热构件具有：底物。

7. 发明申请

US20080053614A1 Surface Processing Apparatus 审中-公开
标题翻译：表面处理设备
公开(公告)号：US20080053614A1
公开(公告)日：2008-03-06
申请号：US11845135
申请日：2007-08-27
申请人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
发明人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
IPC分类号： C23F1/00 , C23C16/00 , H01L21/306
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/45572 , C23C16/5096 , H01J37/3244
摘要： A surface processing apparatus includes a process chamber including a gas ejection mechanism; an exhaust for exhausting the inside of said process chamber; and a gas supply for supplying a gas to the gas ejection mechanism. The gas ejection mechanism includes a a first gas distribution mechanism for distributing the gas into a cooling or heating mechanism, including a gas distribution plate placed in the frame member, the gas distribution plate having a plurality of holes that extend therethrough, the cooling or heating mechanism having multiple gas passages that extend therethrough, the plate having a number of outlets to eject the gas into the process chamber, wherein there are more outlets in the plate than there are gas passages, and the plate is fixed to a second gas distribution mechanism with a clamping member.
摘要翻译：表面处理装置包括：处理室，包括气体喷射机构; 用于排出所述处理室内部的废气; 以及用于向气体喷射机构供给气体的气体供给。气体喷射机构包括：第一气体分配机构，用于将气体分配到冷却或加热机构中，包括布置在框架构件中的气体分配板，气体分配板具有多个穿过其延伸的孔，冷却或加热机构具有延伸穿过其中的多个气体通道，所述板具有多个出口以将气体喷射到处理室中，其中板中的出口多于具有气体通道的多个出口，并且板被固定到第二气体分配机构，其具有夹紧构件。

8. 发明申请

US20080014363A1 Electro-Static Chucking Mechanism and Surface Processing Apparatus 审中-公开
标题翻译：静电吸盘机构和表面处理设备
公开(公告)号：US20080014363A1
公开(公告)日：2008-01-17
申请号：US11779169
申请日：2007-07-17
申请人： Yasumi SAGO , Masayoshi IKEDA , Kazuaki KANEKO , Hiroki DATE
发明人： Yasumi SAGO , Masayoshi IKEDA , Kazuaki KANEKO , Hiroki DATE
IPC分类号： H05C1/00
CPC分类号： H01L21/6831 , C23C16/4586 , H01J2237/2001
摘要： This invention presents an ESC mechanism for chucking an object electro-statically on a chucking surface, comprising a stage having a dielectric block of which surface is the chucking surface, and a chucking electrode provided in the dielectric block. A temperature controller is provided with the stage for controlling temperature of the object. A chucking power source to apply voltage to the chucking electrode is provided so that the object is chucked. The chucking surface has concaves of which openings are shut by the chucked object. A heat-exchange gas introduction system that introduces heat-exchange gas into the concaves is provided. The concaves include a heat-exchange concave for promoting heat-exchange between the stage and the object under increased pressure, and a gas-diffusion concave for making the introduced gas diffuse to the heat-exchange concave. The gas-diffusion concave is deeper than the heat-exchange concave. This invention also presents a surface processing apparatus, comprising a process chamber in which a surface of an object is processed, and the electro-static chucking mechanism of the same composition.
摘要翻译：本发明提供一种用于将电子静电夹持在夹持表面上的ESC机构，包括具有表面为夹持表面的介质块的台和设置在该介质块中的夹持电极。温度控制器设置有用于控制物体的温度的台。提供用于向夹持电极施加电压的夹持电源，以便夹持该物体。卡盘表面具有通过夹持物体关闭开口的凹陷。提供了将热交换气体引入凹部的热交换气体导入系统。凹部包括用于在增压下促进台与物体之间的热交换的热交换凹部，以及用于使引入的气体扩散到热交换凹部的气体扩散凹部。气体扩散凹部比热交换凹部深。本发明还提供了一种表面处理装置，其包括处理物体的表面的处理室和相同组成的静电夹持机构。

9. 发明授权

US06911673B2 Light emitting diode device 失效
标题翻译：发光二极管装置
公开(公告)号：US06911673B2
公开(公告)日：2005-06-28
申请号：US10375048
申请日：2003-02-28
申请人： Kazuaki Kaneko
发明人： Kazuaki Kaneko
IPC分类号： H01L33/20 , H01L33/30 , H01L33/38 , H01L27/15
CPC分类号： H01L33/20
摘要： Light emitting diode (LED) device has a P-type GaAlAs cladding layer, a P-type GaAlAs active layer, an N-type GaAlAs cladding layer and a circular electrode formed in sequence on a P-type GaAs substrate and mesa etched. An area of a PN contact surface between the P-type active layer and the N-type cladding layer is between 0.053 mm2 and 0.058 mm2 which allows qualification criteria of the LED device for communications to be easily satisfied.
摘要翻译：发光二极管（LED）器件具有P型GaAlAs包覆层，P型GaAlAs有源层，N型GaAlAs包层和在P型GaAs衬底上顺序形成的圆形电极和台面蚀刻。 P型有源层和N型覆层之间的PN接触面的面积为0.053mm 2〜0.058mm 2，这允许用于通信的LED设备易于满足。

10. 发明申请

US20050093428A1 Semiconductor light-emitting device 有权
标题翻译：半导体发光装置
公开(公告)号：US20050093428A1
公开(公告)日：2005-05-05
申请号：US10969015
申请日：2004-10-21
申请人： Kazuaki Kaneko , Hiroshi Umeda , Kazuaki Sasaki , Junichi Nakamura
发明人： Kazuaki Kaneko , Hiroshi Umeda , Kazuaki Sasaki , Junichi Nakamura
IPC分类号： H01L33/14 , H01L33/30 , H01L33/38 , H01L33/40 , H01L33/62 , H05B33/00 , H05B33/14
CPC分类号： H01L33/145 , H01L2224/48463 , H01L2924/3025 , H01L2924/00
摘要： A semiconductor light-emitting device includes: a semiconductor substrate; a light-emitting layer formed on the semiconductor substrate; a current-blocking layer formed on a part of the light-emitting layer for restricting light-emission; a current-spreading layer formed on the current-blocking layer and the other part of the light-emitting layer; a front electrode formed on the current-spreading layer; and a rear electrode formed on a rear side of the semiconductor substrate. The current-blocking layer is composed of a central region and an outer region which surrounds the central region via a part of the current-spreading layer, so that a light-emitting region that appears on a front surface of the device has an annular shape. The front electrode and the central region of the current-blocking layer are opposed to each other.
摘要翻译：半导体发光器件包括：半导体衬底; 形成在所述半导体基板上的发光层; 形成在用于限制发光的发光层的一部分上的电流阻挡层; 形成在电流阻挡层和发光层的另一部分上的电流扩散层; 形成在电流扩展层上的前电极; 以及形成在半导体基板的后侧的后电极。电流阻挡层由中心区域和外部区域构成，该区域通过电流扩展层的一部分围绕中心区域，使得出现在器件的前表面上的发光区域具有环形形状。电流阻挡层的前电极和中心区域彼此相对。

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