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1. 发明申请

US20100284121A1 ELECTROSTATIC CHUCK 有权
标题翻译：静电卡
公开(公告)号：US20100284121A1
公开(公告)日：2010-11-11
申请号：US12666748
申请日：2008-09-10
申请人： Yoshiki Aruga , Eitarou Morimoto , You Tanaka , Kazuaki Kaneko
发明人： Yoshiki Aruga , Eitarou Morimoto , You Tanaka , Kazuaki Kaneko
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , C23C14/50 , C23C14/541 , H01L21/6875 , H02N13/00
摘要： An electrostatic chuck includes a dielectric board having an upper surface on which a plurality of projections for supporting a substrate on top surfaces and recesses surrounding the projections are formed, an electrode formed inside the dielectric board, and an external power supply which applies a voltage to the electrode. The dielectric board includes a conductor film formed on at least the top surface of each projection, and has a three-dimensional structure which causes the conductor film to generate a Johnson-Rahbeck force between the substrate and conductor film when a voltage is applied to the electrode.
摘要翻译：静电卡盘包括：电介质板，具有上表面，在其上形成有多个突起，用于在上表面上支撑基板，围绕突起形成凹槽;形成在电介质板内部的电极;以及外部电源，电极电介质板包括形成在每个突起的至少顶表面上的导体膜，并且具有三维结构，当将电压施加到基板和导体膜时，导致导体膜在基板和导体膜之间产生约翰逊 - 拉贝克力电极。

2. 发明授权

US07944677B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US07944677B2
公开(公告)日：2011-05-17
申请号：US12666748
申请日：2008-09-10
申请人： Yoshiki Aruga , Eitarou Morimoto , You Tanaka , Kazuaki Kaneko
发明人： Yoshiki Aruga , Eitarou Morimoto , You Tanaka , Kazuaki Kaneko
IPC分类号： H01T23/00
CPC分类号： H01L21/6833 , C23C14/50 , C23C14/541 , H01L21/6875 , H02N13/00
摘要： An electrostatic chuck includes a dielectric board having an upper surface on which a plurality of projections for supporting a substrate on top surfaces and recesses surrounding the projections are formed, an electrode formed inside the dielectric board, and an external power supply which applies a voltage to the electrode. The dielectric board includes a conductor film formed on at least the top surface of each projection, and has a three-dimensional structure which causes the conductor film to generate a Johnson-Rahbeck force between the substrate and conductor film when a voltage is applied to the electrode.
摘要翻译：静电卡盘包括：电介质板，具有上表面，在其上形成有多个突起，用于在上表面上支撑基板，围绕突起形成凹槽;形成在电介质板内部的电极;以及外部电源，电极。电介质板包括形成在每个突起的至少顶表面上的导体膜，并且具有三维结构，当将电压施加到基板和导体膜时，导致导体膜在基板和导体膜之间产生约翰逊 - 拉贝克力电极。

3. 发明授权

US5560586A Main valve 失效
标题翻译：主阀
公开(公告)号：US5560586A
公开(公告)日：1996-10-01
申请号：US442164
申请日：1995-05-16
申请人： Yoshiki Aruga , Naoyuki Suzuki
发明人： Yoshiki Aruga , Naoyuki Suzuki
IPC分类号： F16K31/04 , F16K31/50 , H01L21/67 , F16K1/16 , F16K31/02
CPC分类号： H01L21/67 , F16K31/04 , F16K31/50
摘要： A bridge-type main valve located at a connecting outlet between a vacuum chamber and a main vacuum pump, and having a rod of an electric cylinder driven by a stepper motor connected to a valve seat for opening and dosing the connecting outlet so that the driving direction and a closing surface of the valve seat form a right angle. A piston may be attached to the rod, and a cylindrical housing fitted in the piston so that the piston and the cylindrical housing form a pressurized air pumping chamber for moving the rod and the valve seat in the outlet closing direction. The valve can achieve fine pressure adjustment without any variable orifice by stopping a valve seat at an arbitrary (not stepwise) position.
摘要翻译：一种桥式主阀，位于真空室和主真空泵之间的连接出口处，并且具有由连接到阀座的步进电机驱动的电动缸的杆，用于打开和计量连接出口，使得驱动方向和阀座的关闭表面形成直角。活塞可以附接到杆上，并且圆柱形壳体装配在活塞中，使得活塞和圆柱形壳体形成用于沿着出口关闭方向移动杆和阀座的加压空气泵送室。通过将阀座停止在任意（不是逐步）的位置，该阀可实现精密的压力调节而无需任何可变孔。

4. 发明授权

US5846328A In-line film deposition system 失效
标题翻译：在线成膜系统
公开(公告)号：US5846328A
公开(公告)日：1998-12-08
申请号：US606038
申请日：1996-02-22
申请人： Yoshiki Aruga , Yo Kamikura
发明人： Yoshiki Aruga , Yo Kamikura
IPC分类号： C23C14/50 , C23C14/56 , F27B9/02 , F27B9/26 , G11B5/84 , G11B7/26 , H01L21/203 , H01L21/677 , C23C16/00
CPC分类号： C23C14/568 , Y10S414/135 , Y10S414/137 , Y10S414/139
摘要： An in-line film deposition system is adapted so that film deposition processing on a substrate is completed through a number of film deposition processes, while the length of the system is not excessive. A carrier 3 which holds two substrates 1, with their planar surfaces set parallel to a transfer direction, is sequentially transferred through a plurality of vacuum chambers 2 arranged along a polygonally-shaped transfer path 30. Film deposition processing is continuously carried out on the substrate 1 by processing means 4 that are arranged in the vacuum chambers 2 which form film deposition process chambers. A rotation mechanism for rotating the carrier 3 through a specified angle so as to direct the carrier 3 in a subsequent transferring direction is provided in those vacuum chambers which are located at turning points along the polygonal transfer path 30.
摘要翻译：适用于在线膜沉积系统中，通过多次膜沉积工艺完成基底上的成膜处理，同时系统的长度不过多。将其平面设置为平行于传送方向的两个基板1的载体3顺序地通过沿着多边形传送路径30布置的多个真空室2传送。在基板上连续进行薄膜沉积处理通过处理装置4布置在真空室2中，处理装置4形成成膜处理室。在位于沿着多边形传送路径30的转动点处的那些真空室中，设置有用于使托架3旋转规定角度以使托架3沿着传送方向引导的旋转机构。

5. 发明授权

US06251232B1 Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatus 有权
标题翻译：从膜沉积装置中的基板保持件的表面除去积聚的膜的方法以及成膜装置
公开(公告)号：US06251232B1
公开(公告)日：2001-06-26
申请号：US09453886
申请日：2000-02-22
申请人： Yoshiki Aruga , Koji Maeda
发明人： Yoshiki Aruga , Koji Maeda
IPC分类号： C23C1434
CPC分类号： C23C14/566 , C23C14/50 , C23C14/564
摘要： A substrate holder 90 where a thin film has accumulated on the surface of the holding claws 91 is transferred in a state where no substrate 9 is being held into a film removal chamber 70 which is established branching off in such a way that the vacuum is connected from the square transfer path 80 along which a plurality of vacuum chambers including the film deposition chambers 51, 52, 53, 54 and 50 is established. A high frequency power supply 73 is connected via the movable electrode 74 to the holder body 92 and a high frequency electric field is established within the film removal chamber 70. A plasma is formed by generating a high frequency discharge in the gas which is being delivered by means of the gas delivery system 72 and the accumulated film on the surface of the holding claws 91 is removed in a vacuum by sputter etching due to ion impacts.
摘要翻译：在保持爪91的表面上积聚有薄膜的基板保持件90被转移到没有将基板9保持在成膜分离室70中的状态下，该膜被除去室70以使真空连接的方式被分支从形成有包括成膜室51,52,53,54,50的多个真空室的方形传送路径80。高频电源73通过可动电极74连接到保持器主体92，并且在膜去除室70内建立高频电场。通过在被输送的气体中产生高频放电来形成等离子体通过气体输送系统72，并且通过由于离子冲击的溅射蚀刻在真空中去除保持爪91的表面上的累积膜。

6. 发明授权

US6027618A Compact in-line film deposition system 失效
标题翻译：紧凑的在线成膜系统
公开(公告)号：US6027618A
公开(公告)日：2000-02-22
申请号：US957767
申请日：1997-10-24
申请人： Yoshiki Aruga , Yo Kamikura
发明人： Yoshiki Aruga , Yo Kamikura
IPC分类号： C23C14/50 , C23C14/56 , F27B9/02 , F27B9/26 , G11B5/84 , G11B7/26 , H01L21/203 , H01L21/677 , C23C14/34 , C23C16/00
CPC分类号： C23C14/568 , Y10S414/135 , Y10S414/137 , Y10S414/139
摘要： An in-line film deposition system is adapted so that film deposition processing on a substrate is completed through a number of film deposition processes, while the length of the system is not excessive. A carrier 3 which holds two substrates 1, with their planar surfaces set parallel to a transfer direction, is sequentially transferred through a plurality of vacuum chambers 2 arranged along a polygonally-shaped transfer path 30. Film deposition processing is continuously carried out on the substrate 1 by processing means 4 that are arranged in the vacuum chambers 2 which form film deposition process chambers. A rotation mechanism for rotating the carrier 3 through a specified angle so as to direct the carrier 3 in a subsequent transferring direction is provided in those vacuum chambers which are located at turning points along the polygonal transfer path 30.
摘要翻译：适用于在线膜沉积系统中，通过多次膜沉积工艺完成基底上的成膜处理，同时系统的长度不过多。将其平面设置为平行于传送方向的两个基板1的载体3顺序地通过沿着多边形传送路径30布置的多个真空室2传送。在基板上连续进行薄膜沉积处理通过处理装置4布置在真空室2中，处理装置4形成成膜处理室。在位于沿着多边形传送路径30的转动点处的那些真空室中，设置有用于使托架3旋转规定角度以使托架3沿着传送方向引导的旋转机构。

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