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1. 发明申请

US20080053614A1 Surface Processing Apparatus 审中-公开
标题翻译：表面处理设备
公开(公告)号：US20080053614A1
公开(公告)日：2008-03-06
申请号：US11845135
申请日：2007-08-27
申请人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
发明人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
IPC分类号： C23F1/00 , C23C16/00 , H01L21/306
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/45572 , C23C16/5096 , H01J37/3244
摘要： A surface processing apparatus includes a process chamber including a gas ejection mechanism; an exhaust for exhausting the inside of said process chamber; and a gas supply for supplying a gas to the gas ejection mechanism. The gas ejection mechanism includes a a first gas distribution mechanism for distributing the gas into a cooling or heating mechanism, including a gas distribution plate placed in the frame member, the gas distribution plate having a plurality of holes that extend therethrough, the cooling or heating mechanism having multiple gas passages that extend therethrough, the plate having a number of outlets to eject the gas into the process chamber, wherein there are more outlets in the plate than there are gas passages, and the plate is fixed to a second gas distribution mechanism with a clamping member.
摘要翻译：表面处理装置包括：处理室，包括气体喷射机构; 用于排出所述处理室内部的废气; 以及用于向气体喷射机构供给气体的气体供给。气体喷射机构包括：第一气体分配机构，用于将气体分配到冷却或加热机构中，包括布置在框架构件中的气体分配板，气体分配板具有多个穿过其延伸的孔，冷却或加热机构具有延伸穿过其中的多个气体通道，所述板具有多个出口以将气体喷射到处理室中，其中板中的出口多于具有气体通道的多个出口，并且板被固定到第二气体分配机构，其具有夹紧构件。

2. 发明申请

US20090173444A1 SURFACE PROCESSING APPARATUS 审中-公开
标题翻译：表面加工设备
公开(公告)号：US20090173444A1
公开(公告)日：2009-07-09
申请号：US12397150
申请日：2009-03-03
申请人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
发明人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
IPC分类号： C23F1/08 , C23C16/54
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/45572 , C23C16/5096 , H01J37/3244
摘要： The invention is to realize a gas ejection mechanism, which makes it possible to form a uniform gas flow and to control the temperature and its distribution over a gas plate, and thereby to provide a surface processing apparatus which can continuously carry out uniform processing. A surface processing apparatus of this invention comprises: a process chamber in which a substrate holding mechanism and a gas ejection mechanism are arranged to face each other; an exhaust means; and a gas supply means; wherein a gas distribution mechanism, a cooling or the heating mechanism provided with a coolant channel or a heater to cool or heat a gas plate and a number of gas passages, and the gas plate having a number of gas outlets communicated with the gas passages are arranged in that order from the upper stream to construct the gas ejection mechanism, and wherein the gas plate is fixed to the cooling or heating mechanism with a clamping member or with an electrostatic chucking mechanism. A second gas distribution mechanism may be installed between the gas plate and the cooling or heating mechanism so as to form gas outlets under the coolant channel.
摘要翻译：本发明是为了实现气体喷射机构，其能够形成均匀的气流并且控制温度及其在气板上的分布，从而提供能够连续进行均匀处理的表面处理装置。本发明的表面处理装置包括：处理室，其中基板保持机构和气体喷射机构彼此相对配置; 排气装置; 和气体供给装置; 其特征在于，具有冷却通道的冷却或加热机构，或用于冷却或加热气板和多个气体通道的加热机构以及具有与气体通路连通的多个气体出口的气体板的气体分配机构，从上游按顺序排列构成气体排出机构，其中，气板用夹紧构件或静电吸附机构固定在冷却或加热机构上。第二气体分配机构可以安装在气体板和冷却或加热机构之间，以在冷却剂通道下形成气体出口。

3. 发明申请

US20080156440A1 Surface processing apparatus 审中-公开
标题翻译：表面处理装置
公开(公告)号：US20080156440A1
公开(公告)日：2008-07-03
申请号：US12000624
申请日：2007-12-14
申请人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
发明人： Yasumi Sago , Masayoshi Ikeda , Kazuaki Kaneko , Daisuke Kondo , Osamu Morita
IPC分类号： H01L21/306 , C23F1/00 , C23C16/00
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/45572 , C23C16/5096 , H01J37/3244
摘要： A surface processing apparatus includes a process chamber including a gas ejection mechanism; an exhaust for exhausting the inside of said process chamber; and a gas supply for supplying a gas to the gas ejection mechanism. The gas ejection mechanism includes a first gas distribution mechanism for distributing the gas into a cooling or heating mechanism, including a gas distribution plate placed in the frame member, the gas distribution plate having a plurality of holes that extend therethrough, the cooling or heating mechanism having multiple gas passages that extend therethrough, the plate having a number of outlets to eject the gas into the process chamber, wherein there are more outlets in the plate than there are gas passages, and the plate is fixed to a second gas distribution mechanism with a clamping member.
摘要翻译：表面处理装置包括：处理室，包括气体喷射机构; 用于排出所述处理室内部的废气; 以及用于向气体喷射机构供给气体的气体供给。气体喷射机构包括用于将气体分配到冷却或加热机构中的第一气体分配机构，包括设置在框架构件中的气体分配板，气体分配板具有穿过其延伸的多个孔，冷却或加热机构具有延伸穿过其中的多个气体通道，所述板具有多个出口以将气体喷射到处理室中，其中板中的出口多于具有气体通道的多个出口，并且板被固定到第二气体分配机构，其具有夹紧构件。

4. 发明授权

US08596998B2 Piezoelectric micro-blower 有权
标题翻译：压电式微型鼓风机
公开(公告)号：US08596998B2
公开(公告)日：2013-12-03
申请号：US12958573
申请日：2010-12-02
申请人： Masaaki Fujisaki , Kiyoshi Kurihara , Daisuke Kondo
发明人： Masaaki Fujisaki , Kiyoshi Kurihara , Daisuke Kondo
IPC分类号： F04B35/04
CPC分类号： F04B43/046 , F04B45/047 , F04F7/00
摘要： A piezoelectric micro-blower includes an inner case to which a peripheral portion of a vibrating plate including a piezoelectric element is fixed such that a blower chamber is defined between the inner case and the vibrating plate and an outer case arranged to cover an outer periphery of the inner case with a gap therebetween. The inner case is elastically retained in the outer case by a plurality of connecting portions. A first opening is provided in a top plate portion of the inner case that faces a central portion of the vibrating plate, and a second opening is provided in a top plate portion of the outer case that faces the first opening. A central space is provided between the top plate portions, and fluid introduced from the outside is guided to the central space through the gap between the inner and outer cases. The vibrating plate is driven in a bending mode so that air is sucked into the central space and is discharged through the second opening. The connecting portions prevent leakage of vibration of the vibrating plate from the inner case to the outer case, thereby reducing energy loss.
摘要翻译：一种压电微型鼓风机，包括内壳体，其中包括压电元件的振动板的周边部分固定在内壳体和振动板之间限定鼓风机室，外壳体设置成覆盖外壳内壳体之间具有间隙。内壳通过多个连接部分弹性地保持在外壳中。第一开口设置在内壳体的面对振动板的中心部分的顶板部分中，并且第二开口设置在外壳体的面向第一开口的顶板部分中。在顶板部之间设置中央空间，从外侧引入的流体通过内外壳之间的间隙被引导到中央空间。振动板以弯曲模式被驱动，使得空气被吸入中心空间并通过第二开口排出。连接部防止振动板从内侧壳体向外侧壳体的振动的泄漏，从而减少能量损失。

5. 发明授权

US07844934B2 Method for designing a semiconductor integrated circuit layout capable of reducing the processing time for optical proximity effect correction 有权
标题翻译：用于设计能够减少光学邻近效应校正的处理时间的半导体集成电路布局的方法
公开(公告)号：US07844934B2
公开(公告)日：2010-11-30
申请号：US11486107
申请日：2006-07-14
申请人： Yusaku Ono , Osamu Suga , Kazuyuki Sakata , Hirofumi Taguchi , Yushi Okuno , Toshiaki Sugioka , Daisuke Kondo
发明人： Yusaku Ono , Osamu Suga , Kazuyuki Sakata , Hirofumi Taguchi , Yushi Okuno , Toshiaki Sugioka , Daisuke Kondo
IPC分类号： G06F17/50 , G06F9/45
CPC分类号： G06F17/5072 , G06F17/5068
摘要： According to the present invention, a method for designing a semiconductor integrated circuit layout comprises the steps of: arranging basic logic cells which are circuit patterns corresponding to logic components of a semiconductor integrated circuit; arranging wiring between the basic logic cells; searching for a blank area in which none of the basic logic cells is arranged; extracting a rectangular region from the blank area; if the rectangular region is larger than a specified size, arranging fill cells in the rectangular region according to a predetermined rule and grouping the fill cells into pseudo-hierarchical cells according to a predetermined rule to form a hierarchy; arranging fill cells in the remaining blank areas; and performing optical proximity effect correction on the semiconductor integrated circuit pattern.
摘要翻译：根据本发明，一种用于设计半导体集成电路布局的方法包括以下步骤：布置基本逻辑单元，其是与半导体集成电路的逻辑组件对应的电路图案; 布置基本逻辑单元之间的布线; 搜索没有布置基本逻辑单元的空白区域; 从空白区域提取矩形区域; 如果矩形区域大于指定尺寸，则根据预定规则将填充单元布置在矩形区域中，并根据预定规则将填充单元分组成伪层级单元以形成层次; 将填充单元布置在剩余的空白区域中; 以及对半导体集成电路图案执行光学邻近效应校正。

6. 发明申请

US20070298803A1 RADIO NETWORK SYSTEM, RADIO BASE STATION AND HANDOVER CONTROL METHOD USED FOR THE SAME 审中-公开
标题翻译：无线电网络系统，无线电台站和用于其的切换控制方法
公开(公告)号：US20070298803A1
公开(公告)日：2007-12-27
申请号：US11765251
申请日：2007-06-19
申请人： HISASHI KAWABATA , Kengo Oketani , Yukio Haseba , Daisuke Kondo , Osami Nishimura
发明人： HISASHI KAWABATA , Kengo Oketani , Yukio Haseba , Daisuke Kondo , Osami Nishimura
IPC分类号： H04Q7/20
CPC分类号： H04W36/0055 , H04W28/26
摘要： The present invention provides a radio network system including a mobile station that leads in determining whether handover can be executed or not, wherein the handover is for switching a handover origin radio base station to a handover destination radio base station, wherein the handover destination radio base station reserves resources required for the handover based on a handover request from the mobile station and information on the mobile station required for the handover, and establishes a user plane path for transferring user information between itself and the handover origin node B.
摘要翻译：本发明提供了一种无线网络系统，包括移动台，其确定是否可以执行切换，其中切换用于将切换起始无线电基站切换到切换目的地无线电基站，其中切换目的地无线电基站根据来自移动台的切换请求，切换请求所需的资源以及切换所需的移动台的信息，建立用于在其自身与切换源节点B之间传送用户信息的用户平面路径。

7. 发明申请

US20070124714A1 Method for designing semiconductor integrated circuit layout 有权
标题翻译：设计半导体集成电路布局的方法
公开(公告)号：US20070124714A1
公开(公告)日：2007-05-31
申请号：US11486107
申请日：2006-07-14
申请人： Yusaku Ono , Osamu Suga , Kazuyuki Sakata , Hirofumi Taguchi , Yushi Okuno , Toshiaki Sugioka , Daisuke Kondo
发明人： Yusaku Ono , Osamu Suga , Kazuyuki Sakata , Hirofumi Taguchi , Yushi Okuno , Toshiaki Sugioka , Daisuke Kondo
IPC分类号： G06F17/50
CPC分类号： G06F17/5072 , G06F17/5068
摘要： According to the present invention, a method for designing a semiconductor integrated circuit layout comprises the steps of: arranging basic logic cells which are circuit patterns corresponding to logic components of a semiconductor integrated circuit; arranging wiring between the basic logic cells; searching for a blank area in which none of the basic logic cells is arranged; extracting a rectangular region from the blank area; if the rectangular region is larger than a specified size, arranging fill cells in the rectangular region according to a predetermined rule and grouping the fill cells into pseudo-hierarchical cells according to a predetermined rule to form a hierarchy; arranging fill cells in the remaining blank areas; and performing optical proximity effect correction on the semiconductor integrated circuit pattern.
摘要翻译：根据本发明，一种用于设计半导体集成电路布局的方法包括以下步骤：布置基本逻辑单元，其是与半导体集成电路的逻辑组件对应的电路图案; 布置基本逻辑单元之间的布线; 搜索没有布置基本逻辑单元的空白区域; 从空白区域提取矩形区域; 如果矩形区域大于指定尺寸，则根据预定规则将填充单元布置在矩形区域中，并根据预定规则将填充单元分组成伪分层单元以形成层次; 将填充单元布置在剩余的空白区域中; 以及对半导体集成电路图案执行光学邻近效应校正。

8. 发明申请

US20150026919A1 CYCLONE SEPARATION DEVICE AND ELECTRIC VACUUM CLEANER 有权
标题翻译：循环分离装置和电动真空清洁器
公开(公告)号：US20150026919A1
公开(公告)日：2015-01-29
申请号：US14377922
申请日：2012-07-03
申请人： Tsuyoshi Maeda , Marika Riku , Akihiro Iwahara , Daisuke Kondo
发明人： Tsuyoshi Maeda , Marika Riku , Akihiro Iwahara , Daisuke Kondo
IPC分类号： A47L9/16 , B01D45/16 , B04C5/185
CPC分类号： A47L9/1608 , A47L5/365 , A47L9/0081 , A47L9/165 , A47L9/1666 , A47L9/1683 , A47L9/22 , B01D45/16 , B04C5/04 , B04C5/185
摘要： A dust collection unit includes a swirl chamber, dust collection chambers, a discharge pipe, an inlet pipe, a bypass inlet, and a bypass inlet airflow passage. The swirl chamber swirls, along a side wall, dust-containing air having entered from a primary inlet and a secondary inlet having a smaller opening area than the primary inlet, and separates dust from the dust-containing air. The dust separated by the swirl chamber is collected by the dust collection chambers. A discharge pipe has a discharge opening. The inlet pipe allows the dust-containing air to flow from the primary inlet into the swirl chamber. A bypass inlet is formed in the inlet pipe. The bypass inlet airflow passage allows the dust-containing air in the inlet pipe having entered from the bypass inlet to flow from the secondary inlet into the swirl chamber.
摘要翻译：集尘单元包括旋流室，灰尘收集室，排放管，入口管，旁路入口和旁路入口气流通道。涡流室沿着侧壁涡旋从具有比主入口更小的开口面积的主入口和次级入口进入的含尘空气，并且将灰尘与含灰尘的空气分离。由涡流室分离的灰尘由灰尘收集室收集。排出管具有排出口。入口管允许含灰尘的空气从主入口流入涡流室。在入口管中形成旁路入口。旁通入口气流通道使得从旁路入口进入的入口管中的含尘空气从次级入口流入涡流室。

9. 发明申请

US20120212473A1 TEMPERATURE CONTROL FOR DISPLAY DEVICE 审中-公开
标题翻译：显示设备温度控制
公开(公告)号：US20120212473A1
公开(公告)日：2012-08-23
申请号：US13458197
申请日：2012-04-27
申请人： Hiroshi Hasegawa , Daisuke Kondo
发明人： Hiroshi Hasegawa , Daisuke Kondo
IPC分类号： G09G5/00
CPC分类号： G09G3/3233 , G09G3/3283 , G09G2320/041
摘要： A display device includes a display panel, light emitting elements, a temperature detector, and an image processing circuit. The light emitting elements are disposed in a matrix form on the display panel, a luminance of light emitting elements being controlled by a current value. The temperature detector detects a rise in temperature caused by a consumption power of a driverIC and outputs temperature information, the driver IC being configured for supplying current to the light emitting elements. The image processing circuit controls a supply current to the light emitting elements using the temperature information output from the temperature detector.
摘要翻译：显示装置包括显示面板，发光元件，温度检测器和图像处理电路。发光元件以矩阵形式设置在显示面板上，发光元件的亮度由电流值控制。温度检测器检测由驱动器IC的消耗功率引起的温度上升，并输出温度信息，驱动器IC被配置为向发光元件提供电流。图像处理电路使用从温度检测器输出的温度信息来控制对发光元件的供给电流。

10. 发明申请

US20120103262A1 APPARATUS OF MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL 审中-公开
标题翻译：制造碳化硅单晶的设备
公开(公告)号：US20120103262A1
公开(公告)日：2012-05-03
申请号：US13262516
申请日：2010-03-31
申请人： Wataru Seiki , Daisuke Kondo
发明人： Wataru Seiki , Daisuke Kondo
IPC分类号： C30B23/06
CPC分类号： C30B29/36 , C30B23/06
摘要： A apparatus (1) for manufacturing a silicon carbide single crystal comprises a graphite crucible (10) and configured so that the upper opening (11b) of a cylindrical crucible main body (11) has been blocked with a cover member (12), and a heating member comprising a single heating coil continuously wound around the outer periphery of the graphite crucible (10) and in which a sublimation material (50) is held on the bottom (11a) and a seed crystal (60) is attached to the inner surface (12a) of the crucible. The lower coil (31), which has wound around the bottom (11a) of the crucible main body (11), and the upper coil (32), which has wound around the cover member (12), have coil pitches (P1 and P3) which are smaller than the coil pitch (P2) of the central coil (33), which has wound around a center in the height-direction of the crucible main body (11).
摘要翻译：一种用于制造碳化硅单晶的设备（1）包括石墨坩埚（10）并且被构造成使得圆柱形坩埚主体（11）的上部开口（11b）已经被盖构件（12）阻挡，并且加热构件，包括连续缠绕在所述石墨坩埚（10）的外周的单个加热线圈，并且其中升华材料（50）保持在所述底部（11a）上，并且晶种（60）附接到所述内部坩埚的表面（12a）。缠绕在坩埚主体（11）的底部（11a）上的下部线圈（31）和缠绕在盖部件（12）上的上部线圈（32）具有线圈间距（P1和 P3），其小于在坩埚主体（11）的高度方向上的中心缠绕的中心线圈（33）的线圈间距（P2）。

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