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1. 发明申请

US20130216680A1 HOLLOW CONFECTIONERY AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：中空配方及其制造方法
公开(公告)号：US20130216680A1
公开(公告)日：2013-08-22
申请号：US13880300
申请日：2011-10-19
申请人： Kaoru Yamada
发明人： Kaoru Yamada
IPC分类号： A21D13/08
CPC分类号： A21D13/80 , A21D2/186 , A21D2/266 , A23G3/545 , A23L11/07 , A23L29/212
摘要： This invention provides a food product that allows intake of all of the nutritional components of soybeans, has no smell of raw soybeans, has good flavor, is easy to eat, can increase the soybean content, and can be eaten by children and adults. Provided is a hollow confectionery obtained by baking dough comprising soybeans, a starch, and a pregelatinized starch.
摘要翻译：本发明提供了一种能够摄取大豆营养成分的食品，没有生大豆的味道，味道好，易于食用，能增加大豆含量，可以被儿童和成人食用。提供了一种通过烘焙包含大豆，淀粉和预胶化淀粉的面团获得的中空糖果。

2. 外观设计

USD663098S1 Snack food 有权
公开(公告)号：USD663098S1
公开(公告)日：2012-07-10
申请号：US29384760
申请日：2011-02-03
申请人： Kaoru Yamada
设计人： Kaoru Yamada

3. 发明授权

US08035058B2 Apparatus for repairing circuit pattern and method for manufacturing display apparatus using the same 有权
标题翻译：用于修复电路图案的装置和使用该装置的显示装置的制造方法
公开(公告)号：US08035058B2
公开(公告)日：2011-10-11
申请号：US11143981
申请日：2005-06-03
申请人： Nobuaki Nakasu , Kaoru Yamada , Yuichiro Tanaka , Takeshi Arai , Hideyuki Honoki , Kazushi Yoshimura , Tetsuya Kawamura , Masanori Okawa
发明人： Nobuaki Nakasu , Kaoru Yamada , Yuichiro Tanaka , Takeshi Arai , Hideyuki Honoki , Kazushi Yoshimura , Tetsuya Kawamura , Masanori Okawa
IPC分类号： B23K26/36
CPC分类号： B23K26/34 , B23K26/32 , B23K2101/34 , B23K2101/36 , B23K2103/08 , B23K2103/50 , G02F1/1309 , H01L27/124 , H01L27/1259
摘要： A region surrounded by two gate wiring and two drain wiring includes pixels and when there is a defect of short-circuit in adjacent pixel electrodes, the short-circuited portion is removed by irradiating a laser via a mask having a transmission pattern, which corresponds to a pattern of the gate wiring, drain wiring and pixel electrodes in the short-circuited portion. The above short-circuited portion is identified and removed in comparison to a normal pattern, by use of information from an inspection apparatus, and the pattern defect formed on the substrate is automatically repaired. By applying the above method to a manufacturing process of display apparatus, in particular, to a resist pattern forming process, a display apparatus having a highly qualified display property may be achieved.
摘要翻译：由两个栅极布线和两个漏极布线包围的区域包括像素，并且当相邻像素电极中存在短路的缺陷时，通过经由具有透射图案的掩模照射激光来去除短路部分，该掩模对应于在短路部分中的栅极布线，漏极布线和像素电极的图案。通过使用来自检查装置的信息，与正常图案相比，识别和去除上述短路部分，并自动修复在基板上形成的图案缺陷。通过将上述方法应用于显示装置的制造工艺，特别是涉及抗蚀剂图案形成处理，可以实现具有高度合格的显示特性的显示装置。

4. 发明申请

US20100286363A1 CYCLIC HEPTAPEPTIDE AND USE OF THE SAME 失效
标题翻译：循环肝素及其使用
公开(公告)号：US20100286363A1
公开(公告)日：2010-11-11
申请号：US12675485
申请日：2008-06-06
申请人： Daisuke Uemura , Kenichiro Shimokawa , Yoshiaki Iwase , Kaoru Yamada
发明人： Daisuke Uemura , Kenichiro Shimokawa , Yoshiaki Iwase , Kaoru Yamada
IPC分类号： C07K7/64
CPC分类号： A61K8/64 , A61K38/00 , A61Q19/06 , C07K7/64
摘要： A novel cyclic heptapeptide that is useful as a preadipocyte differentiation-inhibitory agent or an adipocyte fat accumulation-inhibitory agent, and the use of such agents, are provided. A novel cyclic heptapeptide represented by the following formula is provided. wherein R is CH3, CH2CH(CH3)2, CH2OCH2C6H5, CH(OH)CH3, or CH2OH.
摘要翻译：提供了可用作前脂肪细胞分化抑制剂或脂肪细胞脂肪蓄积抑制剂的新型环状七肽，以及这些药剂的用途。提供由下式表示的新型环状七肽。其中R是CH 3，CH 2 CH（CH 3）2，CH 2 OCH 2 C 6 H 5，CH（OH）CH 3或CH 2 OH。

5. 发明授权

US06937296B2 Flat panel display unit and method of repairing defects in its line pattern 失效
标题翻译：平板显示单元及修补其线条缺陷的方法
公开(公告)号：US06937296B2
公开(公告)日：2005-08-30
申请号：US09944866
申请日：2001-08-31
申请人： Michinobu Mizumura , Mikio Hongo , Masaaki Okunaka , Kaoru Yamada
发明人： Michinobu Mizumura , Mikio Hongo , Masaaki Okunaka , Kaoru Yamada
IPC分类号： G02F1/13 , G02F1/1333 , G02F1/1337 , G02F1/1343 , G02F1/1362 , G09F9/00 , H01L29/786
CPC分类号： G02F1/136259 , G02F2001/136263
摘要： Shorting defects between the scan lines and signal lines are repaired during the manufacture of a TFT or other flat panel display unit without causing liquid crystal orientation defects and production yield is thereby improved. In a TFT panel in which scan line 2 bifurcates where scan line 2 and signal line 3 intersect, the lines having a protective insulation film 8 therebetween, one leg of the scan line 2 bifurcation is cut by a laser 9 where a short 7 has been found between lines at the intersection, thereby electrically separating the short. An insulation film material 13 dispensed from a glass pipette 12 is then applied locally to the cut part and surrounding area and cured to form a new insulation film.
摘要翻译：在TFT或其他平板显示单元的制造期间，在扫描线和信号线之间的短路缺陷被修复，而不引起液晶取向缺陷，从而提高了生产成本。在其中扫描线2在扫描线2和信号线3相交处分叉的TFT面板中，其间具有保护绝缘膜8的线，扫描线2分支的一条腿被短路7已经被激光9切断在交叉点的线之间发现，从而电短路。然后将从玻璃吸管12分配的绝缘膜材料13局部施加到切割部分和周围区域并固化以形成新的绝缘膜。

6. 外观设计

USD670886S1 Snack food 有权
公开(公告)号：USD670886S1
公开(公告)日：2012-11-20
申请号：US29384761
申请日：2011-02-03
申请人： Kaoru Yamada
设计人： Kaoru Yamada

7. 发明授权

US07638030B2 Electrolytic processing apparatus and electrolytic processing method 有权
标题翻译：电解处理装置及电解处理方法
公开(公告)号：US07638030B2
公开(公告)日：2009-12-29
申请号：US10669468
申请日：2003-09-25
申请人： Osamu Nabeya , Masayuki Kumekawa , Hozumi Yasuda , Itsuki Kobata , Takeshi Iizumi , Nobuyuki Takada , Koichi Fukaya , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Tsukuru Suzuki , Kaoru Yamada , Yuji Makita
发明人： Osamu Nabeya , Masayuki Kumekawa , Hozumi Yasuda , Itsuki Kobata , Takeshi Iizumi , Nobuyuki Takada , Koichi Fukaya , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Tsukuru Suzuki , Kaoru Yamada , Yuji Makita
IPC分类号： C25F7/00 , B23H5/06
CPC分类号： C25F7/00
摘要： An electrolytic processing apparatus which, while eliminating a CMP processing entirely or reducing a load on a CMP processing to the least possible extent, can process and flatten a conductive material formed in the surface of a substrate, or can remove (clean) extraneous matter adhering to the surface of a workpiece such as a substrate. The present invention includes an electrode section including a plurality of electrode members disposed in parallel, each electrode member including an electrode and an ion exchanger covering the surface of the electrode, a holder for holding a workpiece, which is capable of bringing the workpiece close to or into contact with the ion exchanger of the electrode member, and a power source to be connected to the electrode of each electrode member of the electrode section. The ion exchanger of the electrode member includes an ion exchanger having an excellent surface smoothness and an ion exchanger having a large ion exchange capacity.
摘要翻译：一种在完全消除CMP处理或者尽可能减少CMP处理负荷的电解处理装置可以处理和平坦化形成在基板表面上的导电材料，或者可以除去（清洁）附着的附着物到工件（例如基板）的表面。本发明包括一个电极部分，它包括平行设置的多个电极部件，每个电极部件包括一个电极和一个覆盖电极表面的离子交换器，一个用于保持工件的保持器，它能使工件靠近或与电极部件的离子交换器接触，以及要连接到电极部分的每个电极部件的电极的电源。电极构件的离子交换器包括具有优异表面平滑度的离子交换器和离子交换容量大的离子交换器。

8. 发明申请

US20060234503A1 Substrate processing apparatus, substrate processing method, and substrate holding apparatus 有权
标题翻译：基板处理装置，基板处理方法以及基板保持装置
公开(公告)号：US20060234503A1
公开(公告)日：2006-10-19
申请号：US10564980
申请日：2004-07-28
申请人： Kaoru Yamada , Takayuki Saito , Sumio Yabe , Kenya Ito , Masayuki Kamezawa , Masaya Seki , Ichiro Katakabe , Yuki Inoue
发明人： Kaoru Yamada , Takayuki Saito , Sumio Yabe , Kenya Ito , Masayuki Kamezawa , Masaya Seki , Ichiro Katakabe , Yuki Inoue
IPC分类号： H01L21/44 , B65G47/91
CPC分类号： H01L21/02052 , B08B1/04 , B08B3/02 , B08B2203/0229 , B08B2203/0288 , C23C18/1628 , C25D17/001 , H01L21/67028 , H01L21/67034 , H01L21/67051
摘要： The present invention relates to a substrate processing apparatus and a substrate processing method for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. The present invention also relates to a substrate holding apparatus for holding and rotating a substrate. The substrate processing apparatus (1) for processing a substrate (W) while supplying a fluid to the substrate (W) includes a substrate holder (11) for holding and rotating the substrate (W), and a holder suction unit (24) for sucking the fluid from the substrate holder (11). The substrate holding apparatus includes a plurality of rollers (20) which are brought into contact with an edge portion of a substrate (W) so as to hold and rotate the substrate (W), and at least one moving mechanism (303a) for moving the rollers (20).
摘要翻译：本发明涉及在旋转诸如半导体晶片或液晶基板的基板的同时进行化学液体处理，清洁处理，干燥处理等的基板处理装置和基板处理方法。本发明还涉及用于保持和旋转衬底的衬底保持装置。另外，在向基板（W）供给流体的同时，对基板（W）进行处理的基板处理装置（1）具备用于保持和旋转基板（W）的基板支架（11），以及用于从基板支架（11）吸入流体。基板保持装置包括与基板（W）的边缘部分接触以便保持和旋转基板（W）的多个辊（20），以及至少一个移动机构（303a），用于移动辊子（20）。

9. 发明申请

US20060065645A1 Apparatus for repairing circuit pattern and method for manufacturing display apparatus using the same 有权
标题翻译：用于修复电路图案的装置和使用该装置的显示装置的制造方法
公开(公告)号：US20060065645A1
公开(公告)日：2006-03-30
申请号：US11143981
申请日：2005-06-03
申请人： Nobuaki Nakasu , Kaoru Yamada , Yuichiro Tanaka , Takeshi Arai , Hideyuki Honoki , Kazushi Yoshimura , Tetsuya Kawamura , Masanori Okawa
发明人： Nobuaki Nakasu , Kaoru Yamada , Yuichiro Tanaka , Takeshi Arai , Hideyuki Honoki , Kazushi Yoshimura , Tetsuya Kawamura , Masanori Okawa
IPC分类号： B23K26/36 , B23K26/03 , B23K26/06
CPC分类号： B23K26/34 , B23K26/32 , B23K2101/34 , B23K2101/36 , B23K2103/08 , B23K2103/50 , G02F1/1309 , H01L27/124 , H01L27/1259
摘要： A region surrounded by two gate wiring and two drain wiring includes pixels and when there is a defect of short-circuit in adjacent pixel electrodes, the short-circuited portion is removed by irradiating a laser via a mask having a transmission pattern, which corresponds to a pattern of the gate wiring, drain wiring and pixel electrodes in the short-circuited portion. The above short-circuited portion is identified and removed in comparison to a normal pattern, by use of information from an inspection apparatus, and the pattern defect formed on the substrate is automatically repaired. By applying the above method to a manufacturing process of display apparatus, in particular, to a resist pattern forming process, a display apparatus having a highly qualified display property may be achieved.
摘要翻译：由两个栅极布线和两个漏极布线包围的区域包括像素，并且当相邻像素电极中存在短路的缺陷时，通过经由具有透射图案的掩模照射激光来去除短路部分，该掩模对应于在短路部分中的栅极布线，漏极布线和像素电极的图案。通过使用来自检查装置的信息，与正常图案相比，识别和去除上述短路部分，并自动修复在基板上形成的图案缺陷。通过将上述方法应用于显示装置的制造工艺，特别是涉及抗蚀剂图案形成处理，可以实现具有高度合格的显示特性的显示装置。

10. 发明申请

US20050092351A1 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20050092351A1
公开(公告)日：2005-05-05
申请号：US10695826
申请日：2003-10-30
申请人： Takayuki Saito , Tsukuru Suzuki , Kaoru Yamada , Kenya Ito , Masayuki Kamezawa , Kenji Yamaguchi
发明人： Takayuki Saito , Tsukuru Suzuki , Kaoru Yamada , Kenya Ito , Masayuki Kamezawa , Kenji Yamaguchi
IPC分类号： B08B3/02 , H01L21/00
CPC分类号： H01L21/6708 , B08B3/02 , Y10S134/902
摘要： The present invention provides a substrate processing apparatus and a substrate processing method suitable for use in an etching apparatus which etches a thin film formed on a peripheral portion of a substrate. The present invention also provides a substrate processing apparatus and a substrate processing method suitable for use in a cleaning apparatus which performs a cleaning process on a substrate which has been etched. The substrate processing apparatus for use in etching includes a substrate holder 11 for holding a substrate W substantially horizontally and rotating the substrate W, and a processing liquid supply unit 15 for supplying a processing liquid onto a peripheral portion of the substrate W which is being rotated in such a manner that the processing liquid is stationary with respect to the substrate W. The substrate processing apparatus for use in cleaning a substrate includes a substrate holder 54 for holding a substrate W substantially horizontally and rotating the substrate W, and a cleaning liquid supply unit 53 having a cleaning liquid outlet 53a which is oriented from a center of the substrate W toward a peripheral portion of the substrate W with an elevation angle of not more than 45° from a surface of the substrate W. The cleaning liquid supply unit 53 supplies a cleaning liquid to the surface of the substrate W at a flow velocity of not less than 0.1 m/s.
摘要翻译：本发明提供一种适用于腐蚀形成在基板的周边部分上的薄膜的蚀刻装置中的基板处理装置和基板处理方法。本发明还提供一种适用于在已被蚀刻的基板上进行清洗处理的清洗装置的基板处理装置和基板处理方法。用于蚀刻的基板处理装置包括基板保持器11，用于基本上水平地保持基板W并旋转基板W;以及处理液体供应单元15，用于将处理液体供应到正在旋转的基板W的周边部分处理液体相对于基板W是静止的。用于清洗基板的基板处理装置包括：基板保持件54，用于基本上水平地保持基板W并旋转基板W;以及清洗液供给部单元53具有从基板W的中心朝向基板W的周边部分取向的清洗液出口53a，其与基板W的表面具有不大于45°的仰角。清洗液供给单元 53以不小于0.1m / s的流速向基板W的表面供给清洗液。

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