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1. 发明申请

US20100265516A1 INTERFEROMETER AND METHOD FOR MEASURING CHARACTERISTICS OF OPTICALLY UNRESOLVED SURFACE FEATURES 有权
标题翻译：用于测量光学非对称表面特征特征的干涉仪和方法
公开(公告)号：US20100265516A1
公开(公告)日：2010-10-21
申请号：US12701690
申请日：2010-02-08
申请人： Peter De Groot , Michael J. Darwin , Robert Stoner , Gregg M. Gallatin , Xavier Colonna De Lega
发明人： Peter De Groot , Michael J. Darwin , Robert Stoner , Gregg M. Gallatin , Xavier Colonna De Lega
IPC分类号： G01B11/02
CPC分类号： G01B11/0675 , G01B9/02057 , G01B9/02084 , G01B9/02088 , G01B9/0209 , G01B2290/50 , G01B2290/70 , G01N21/8422 , G03F7/70625
摘要： Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.
摘要翻译：公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

2. 发明授权

US07774737B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 失效
公开(公告)号：US07774737B2
公开(公告)日：2010-08-10
申请号：US11756883
申请日：2007-06-01
申请人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

3. 发明申请

US20080266574A1 INTERFEROMETER AND METHOD FOR MEASURING CHARACTERISTICS OF OPTICALLY UNRESOLVED SURFACE FEATURES 失效
标题翻译：用于测量光学非对称表面特征特征的干涉仪和方法
公开(公告)号：US20080266574A1
公开(公告)日：2008-10-30
申请号：US12017531
申请日：2008-01-22
申请人： Peter De Groot , Michael J. Darwin , Robert Stoner , Gregg M. Gallatin , Xavier Colonna De Lega
发明人： Peter De Groot , Michael J. Darwin , Robert Stoner , Gregg M. Gallatin , Xavier Colonna De Lega
IPC分类号： G01B11/02
CPC分类号： G01B11/0675 , G01B9/02057 , G01B9/02084 , G01B9/02088 , G01B9/0209 , G01B2290/50 , G01B2290/70 , G01N21/8422 , G03F7/70625
摘要： Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.
摘要翻译：公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

4. 发明授权

US5135307A Laser diode interferometer 失效
标题翻译：激光二极管干涉仪
公开(公告)号：US5135307A
公开(公告)日：1992-08-04
申请号：US530692
申请日：1990-05-30
申请人： Peter J. de Groot , Gregg M. Gallatin , George Gardopee
发明人： Peter J. de Groot , Gregg M. Gallatin , George Gardopee
IPC分类号： G01B11/24 , G01B11/30
CPC分类号： G01B11/303 , G01B11/2441
摘要： A laser system for measuring dimensional aberrations across a target surface includes a laser diode for producing a diverging beam of laser emission. A mask spaced from the diode in the beam has an aperture therein and can be moved so as to translate the aperture to selected locations laterally with respect to the beam. The mask blocks emission from impinging on the target except for emission transitting the aperture. Emission reflected from a segment to the target returns through the aperture back into the laser diode. An AC current is added to the driver current to modulate the emission. A lock-in amplifier of a photodetector signal adds feedback current to the driver current to lock in phase angle, so that the feedback current is a measure of the aberrations.
摘要翻译：用于测量目标表面上的尺寸像差的激光系统包括用于产生发散的激光发射束的激光二极管。与光束中的二极管间隔开的掩模在其中具有孔，并且可以移动以便将光圈相对于光束横向移动到所选位置。掩模阻挡发射物体撞击目标物体，除了排除光圈之外。通过光圈反射到激光二极管，从一个部分到目标反射的发射反射。将AC电流加到驱动器电流以调制发射。光电检测器信号的锁定放大器将反馈电流加到驱动器电流上以锁定相位角，使得反馈电流是像差的量度。

5. 发明授权

US07948636B2 Interferometer and method for measuring characteristics of optically unresolved surface features 有权
标题翻译：用于测量光学未解析表面特征的干涉仪和方法
公开(公告)号：US07948636B2
公开(公告)日：2011-05-24
申请号：US12701690
申请日：2010-02-08
申请人： Peter De Groot , Michael J Darwin , Robert Stoner , Gregg M. Gallatin , Xavier Colonna De Lega
发明人： Peter De Groot , Michael J Darwin , Robert Stoner , Gregg M. Gallatin , Xavier Colonna De Lega
IPC分类号： G01B11/02
CPC分类号： G01B11/0675 , G01B9/02057 , G01B9/02084 , G01B9/02088 , G01B9/0209 , G01B2290/50 , G01B2290/70 , G01N21/8422 , G03F7/70625
摘要： Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.
摘要翻译：公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

6. 发明授权

US07434196B2 Renesting interaction map into design for efficient long range calculations 有权
标题翻译：将交互图重新设计成有效的长距离计算
公开(公告)号：US07434196B2
公开(公告)日：2008-10-07
申请号：US11242723
申请日：2005-10-03
申请人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A Lavin , Maharaj Mukherjee , Dov Ramm , Alan E Rosenbluth , Shlomo Shlafman
发明人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A Lavin , Maharaj Mukherjee , Dov Ramm , Alan E Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68 , G06F17/5068
摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchical arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchical arrangement to ultimately correct for optical lithography.
摘要翻译：方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。该布局代表了所需的设计数据层次结构。然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。使用这些桶生成分层布置，并且使用分层布置强制执行所需的设计数据层级以最终校正光刻。

7. 发明申请

US20080127027A1 PRINTABILITY VERIFICATION BY PROGRESSIVE MODELING ACCURACY 失效
标题翻译：可靠性验证通过逐步建模精度
公开(公告)号：US20080127027A1
公开(公告)日：2008-05-29
申请号：US11555854
申请日：2006-11-02
申请人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.
摘要翻译：提供了一种验证光刻掩模设计的快速方法，其中通过使用逐渐更精确的图像模型（包括光学和抗蚀剂模型）迭代地模拟和验证用于掩模布局的图像来识别灾难性错误。逐步准确的光学模型包括提供连续影响较小的SOCS内核。构造相应的抗蚀剂模型，其可以仅包括对应于光学模型的SOCS核项，或者可以包括不同影响范围的图像特征项。优选用亮场模拟来识别与过多光线相关的错误，例如桥接，旁瓣或SRAF打印错误，而与光线不足相关的错误，例如颈缩或线端缩短覆盖误差，优选地用暗场模拟。

8. 发明授权

US07343271B2 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare 有权
标题翻译：将相位图并入基于快速模型的光学邻近校正模拟内核，以解决近距离和中等范围的闪光
公开(公告)号：US07343271B2
公开(公告)日：2008-03-11
申请号：US10694465
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F7/60 , G06F17/50 , G06F19/00 , G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/705
摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.
摘要翻译：计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。第二种方法使用来自光学工具的测量数据。通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。滤波函数要求阵列的每个元素的幅度乘以高斯函数。然后将幂律应用于阵列。数组的元素被洗牌，并从相量形式转换为实数/虚数形式。应用二维快速傅立叶变换。然后数组被清洗，并转换回到相量形式。

9. 发明授权

US08238644B2 Fast method to model photoresist images using focus blur and resist blur 有权
标题翻译：使用聚焦模糊和抵抗模糊来快速模拟光刻胶图像
公开(公告)号：US08238644B2
公开(公告)日：2012-08-07
申请号：US11378536
申请日：2006-03-17
申请人： Timothy A. Brunner , Gregg M. Gallatin , Ronald L. Gordon , Kafai Lai , Alan E. Rosenbluth , Nakgeuon Seong
发明人： Timothy A. Brunner , Gregg M. Gallatin , Ronald L. Gordon , Kafai Lai , Alan E. Rosenbluth , Nakgeuon Seong
IPC分类号： G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/70575
摘要： A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.
摘要翻译：一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应图片。该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定图形对象的图像与目标图案与显性多色2D内核的卷积。

10. 发明授权

US07366342B2 Simultaneous computation of multiple points on one or multiple cut lines 有权
标题翻译：在一条或多条切割线上同时计算多个点
公开(公告)号：US07366342B2
公开(公告)日：2008-04-29
申请号：US10694299
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06K9/00
CPC分类号： G03F1/36
摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.
摘要翻译：方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。确定角位置，并且切割线的切割线的第一和第二部分位于切割线和多边形的侧边缘之间的交叉点的相对侧上，随后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

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