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    • 9. 发明授权
    • Infrared scanning interferometry apparatus and method
    • 红外扫描干涉测量装置及方法
    • US06195168B1
    • 2001-02-27
    • US09514215
    • 2000-02-25
    • Xavier Colonna De LegaPeter De GrootLeslie L. Deck
    • Xavier Colonna De LegaPeter De GrootLeslie L. Deck
    • G01B0902
    • G01B9/02039G01B9/02024G01B9/02082G01B9/0209G01B11/2441
    • The invention features an interferometry system for a measuring a surface profile or thickness of a measurement object. In one aspect, the interferometry system includes: a broadband infrared source which during operation generates broadband infrared radiation including central wavelengths greater than about 1 micron; a scanning interferometer which during operation directs a first infrared wavefront along a reference path and a second infrared wavefront along a measurement path contacting the measurement object, and, after the second wavefront contacts the measurement object, combines the wavefronts to produce an optical interference pattern, the first and second infrared wavefronts being derived from the broadband infrared radiation; a detector producing data in response to the optical interference pattern; and a controller which during operation causes the scanning interferometer to vary the optical path difference between the reference and measurement paths over a range larger than the coherence length of the broadband source and analyzes the data as a function of the varying optical path difference to determine the surface profile.
    • 本发明的特征在于用于测量测量对象的表面轮廓或厚度的干涉测量系统。 在一个方面,干涉测量系统包括:宽带红外光源,其在操作期间产生包括大于约1微米的中心波长的宽带红外辐射; 扫描干涉仪,其在操作期间沿着参考路径引导第一红外波前沿,并沿着与所述测量对象接触的测量路径引导第二红外波前,并且在所述第二波前接触所述测量对象之后,组合所述波前以产生光学干涉图案, 第一和第二红外波前是从宽带红外辐射得到的; 响应于光学干涉图案产生数据的检测器; 以及控制器,其在操作期间使得扫描干涉仪在大于宽带源的相干长度的范围上改变参考和测量路径之间的光程差,并且根据变化的光程差分析数据以确定 表面轮廓。