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    • 2. 发明申请
    • SYNTHESIS OF HIGH-PERFORMANCE IRON OXIDE PARTICLE TRACERS FOR MAGNETIC PARTICLE IMAGING (MPI)
    • 用于磁性成像(MPI)的高性能氧化铁颗粒追踪器的合成
    • US20130095043A1
    • 2013-04-18
    • US13806864
    • 2011-06-21
    • Dirk BurdinskiCarmen BohlenderNicole P.M. Haex
    • Dirk BurdinskiCarmen BohlenderNicole P.M. Haex
    • A61J3/00
    • A61J3/00A61K49/1839B82Y30/00C01G49/08C01P2002/72C01P2002/89C01P2004/04C01P2004/64C09C1/24
    • The present invention relates to a method of forming iron oxide nanoparticles comprising the steps of (a) suspending iron oxide/hydroxide and oleic acid or a derivative thereof in a primary organic solvent; (b) increasing the temperature of the suspension by a defined rate up to a maximum of 340° C. to 500° C.; (c) aging the suspension at the maximum temperature of step (b) for about 0.5 to 6 h; (d) cooling the suspension; (e) adding a secondary organic solvent; (f) precipitating nanoparticles by adding a non-solvent and removing excess solvent; (g) dispersing said nanoparticles in said secondary organic solvent; (h) mixing the dispersion of step (g) with a solution of a polymer; and (i) optionally removing said secondary organic solvent. The present invention further relates to an iron oxide nanoparticle obtainable by the method, the additional modification, encapsulation and decoration of such nanoparticles, as well as the use of the nanoparticles as tracers for Magnetic Particle Imaging (MPI), Magnetic Particle Spectroscopy (MPS).
    • 本发明涉及一种形成氧化铁纳米颗粒的方法,包括以下步骤:(a)将氧化铁/氢氧化物和油酸或其衍生物悬浮在主有机溶剂中; (b)将悬浮液的温度提高至最高340℃至500℃; (c)在步骤(b)的最高温度下将悬浮液老化约0.5至6小时; (d)冷却悬浮液; (e)加入次级有机溶剂; (f)通过加入非溶剂并除去过量的溶剂使纳米颗粒沉淀; (g)将所述纳米颗粒分散在所述次级有机溶剂中; (h)将步骤(g)的分散体与聚合物溶液混合; 和(i)任选地除去所述二级有机溶剂。 本发明还涉及通过该纳米颗粒的方法,附加改性,包封和装饰获得的氧化铁纳米颗粒,以及使用纳米颗粒作为磁性粒子成像(MPI),磁性粒子光谱(MPS)的示踪剂, 。
    • 3. 发明申请
    • NANOFABRICATION BASED ON SAM GROWTH
    • 基于SAM生长的南非
    • US20090272715A1
    • 2009-11-05
    • US11722103
    • 2005-12-14
    • Dirk BurdinskiRuben Bernardus Alfred Sharpe
    • Dirk BurdinskiRuben Bernardus Alfred Sharpe
    • B05D5/12H01B13/00
    • G03F7/0002B82Y10/00B82Y40/00
    • The present invention relates to a process of nano fabrication based on nucleated SAM growth, to patterned substrates prepared thereby, to a nano wire or grid of nanowires prepared thereby and to electronic devices including the same. In particular, there is provided a process which comprises applying a first SAM-forming molecular species to a first surface region of the substrate surface, so as to provide a first SAM defining a scaffold pattern on the first surface region; and applying a second SAM-forming molecular species to at least a second surface region of said substrate surface which is not covered by the first SAM, whereby a second replica SAM comprising the second SAM-forming molecular species selectively forms on substrate surface adjacent to at least one edge of said first SAM.
    • 本发明涉及一种基于有核SAM生长的纳米制造方法,由其制备的图案化衬底,由其制备的纳米线或纳米线网格以及包括该纳米线的电子器件。 特别地,提供了一种方法,其包括将第一SAM形成分子物质施加到衬底表面的第一表面区域,以便在第一表面区域上提供限定支架图案的第一SAM; 以及将第二SAM形成分子物质施加到所述基底表面的至少第二表面区域,所述第二表面区域未被所述第一SAM覆盖,由此包含所述第二SAM形成分子种类的第二复制SAM选择性地形成在邻近于 所述第一SAM的至少一个边缘。
    • 5. 发明申请
    • Composition and Use Thereof
    • 其组成和用途
    • US20080311300A1
    • 2008-12-18
    • US11996606
    • 2006-07-21
    • Dirk BurdinskiMilan Saalmink
    • Dirk BurdinskiMilan Saalmink
    • B05D1/36
    • G03F7/0002B82Y10/00B82Y40/00C23F1/02C23F1/36C23F1/40G03F7/2049
    • The composition is suitable for the provision of monolayers on selected surfaces. Thereto, it comprises a first compound able to form a monolayer on a first surface, and a second compound able to form a monolayer on a second surface that is different from the first surface, which first and second compounds are chosen such as to be mutually at least substantially inert. The selected surfaces may be present on a single substrate, which allows homogenization, and the provision of masking surfaces covering part of the underlying surfaces. The selected surfaces may alternatively present on different substrates, allowing the use of a printer with a standardized printing pattern.
    • 该组合物适用于在所选表面上提供单层。 此外,它包括能够在第一表面上形成单层的第一化合物和能够在不同于第一表面的第二表面上形成单层的第二化合物,该第一和第二化合物被选择为相互 至少基本上是惰性的。 所选择的表面可以存在于单个衬底上,这允许均质化,并且提供覆盖下面表面的一部分的掩模表面。 所选择的表面可以替代地存在于不同的基底上,允许使用具有标准印刷图案的打印机。
    • 9. 发明申请
    • Elastomeric stamp, patterning method using such a stamp and method for producing such a stamp
    • 弹性印模,使用这种印模的图案化方法和制造这种印章的方法
    • US20070145632A1
    • 2007-06-28
    • US10575797
    • 2004-10-07
    • Emiel PeetersDirk BroerFredericus Van Den HeuvelDirk Burdinski
    • Emiel PeetersDirk BroerFredericus Van Den HeuvelDirk Burdinski
    • B29C33/40
    • G03F7/0002B41K1/50B82Y10/00B82Y30/00B82Y40/00H05K3/12
    • An elastomeric stamp (10) for printing a pattern on a substrate (500) with an ink (520) is at least partially formed from a first material such as PDMS. The stamp comprises a first surface (12) in a first plane, a second surface (14) in a second plane and a third surface (16) extending from the first surface (12) to the second surface (14). The first surface (12) typically forms to the contact surface of a protruding feature of the stamp (10), whereas the third surface (16) typically forms the edge of such a feature. The first surface (12) comprises a barrier layer (22) being substantially impermeable to the ink (520). Optionally, the second surface (14) may carry a further barrier layer (24) to suppress gas phase diffusion of the ink (520). In contrast, the third surface (16) is permeable to the ink (520). Consequently, a stamp (10) is obtained that is highly suitable for edge transfer lithography type patterning. The first material of the stamp serves as an ink reservoir, thus reducing the re-inking frequency of the stamp, and the layer (22) prevents unwanted diffusion of the ink (520) to the areas of the substrate (500) into contact with the stamp (10), thus 20 improving the feature definition on the substrate surface.
    • 用于用油墨(520)在基底(500)上印刷图案的弹性印模(10)至少部分地由诸如PDMS的第一材料形成。 印模包括在第一平面中的第一表面(12),在第二平面中的第二表面(14)和从第一表面(12)延伸到第二表面(14)的第三表面(16)。 第一表面(12)通常形成到印模(10)的突出特征的接触表面,而第三表面(16)通常形成这种特征的边缘。 第一表面(12)包括对油墨(520)基本不可渗透的阻挡层(22)。 可选地,第二表面(14)可携带另外的阻挡层(24)以抑制油墨(520)的气相扩散。 相比之下,第三表面(16)对墨水是可渗透的(520)。 因此,获得了非常适合于边缘转印光刻型图案化的印模(10)。 印模的第一材料用作墨水储存器,从而减小印模的再墨水频率,并且所述层(22)防止墨(520)对基板(500)的区域的不期望的扩散与基板(500)的区域接触 印模(10),从而改善了基板表面上的特征定义。