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1. 发明授权

US08999851B2 Methods for formation of substrate elements 有权
标题翻译：形成基质元素的方法
公开(公告)号：US08999851B2
公开(公告)日：2015-04-07
申请号：US12331150
申请日：2008-12-09
申请人： Francisco Leon , Francesco Lemmi , Jeffrey Miller , David Dutton , David P. Stumbo
发明人： Francisco Leon , Francesco Lemmi , Jeffrey Miller , David Dutton , David P. Stumbo
IPC分类号： H01L21/302 , H01L29/06 , B81C1/00 , B82Y10/00 , H01L29/66 , H01L29/786
CPC分类号： H01L29/0665 , B81C1/00142 , B82Y10/00 , B82Y40/00 , H01L29/0673 , H01L29/42392 , H01L29/66439 , H01L29/66772 , H01L29/775 , H01L29/78603 , H01L29/78696
摘要： The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.
摘要翻译：本发明涉及形成衬底元件的方法，包括诸如纳米线，晶体管和其它结构的半导体元件，以及由这些方法形成的元件。

2. 发明申请

US20070170996A1 Plasma generating devices having alternative ground geometry and methods for using the same 审中-公开
标题翻译：具有替代地面几何形状的等离子体产生装置及其使用方法
公开(公告)号：US20070170996A1
公开(公告)日：2007-07-26
申请号：US11485051
申请日：2006-07-11
申请人： David Dutton , Robert Taber
发明人： David Dutton , Robert Taber
IPC分类号： H03B5/00
CPC分类号： H01J37/32192 , H01J37/32247 , H01J37/32825
摘要： Aspects of the invention include plasma generating devices having alternative ground geometries and systems thereof, as well as methods of using the same in plasma generation. The plasma generating devices of the invention include a resonator with a discharge gap disposed on a substrate and a ground element. Embodiments of the ground element of the plasma generating devices of the invention include those that are internal, external, coplanar or a combination thereof. The subject plasma generating devices, systems and methods find use in a variety of different applications.
摘要翻译：本发明的方面包括具有替代地面几何形状及其系统的等离子体产生装置，以及在等离子体产生中使用该等离子体产生装置的方法。本发明的等离子体产生装置包括具有设置在基板上的放电间隙的谐振器和接地元件。本发明的等离子体产生装置的接地元件的实施例包括内部，外部，共面或其组合的那些。主题等离子体产生装置，系统和方法可用于各种不同的应用。

3. 发明授权

US3979940A Wire drawing machinery 失效
标题翻译：拉丝机械
公开(公告)号：US3979940A
公开(公告)日：1976-09-14
申请号：US519287
申请日：1974-10-30
申请人： David Dutton , James Moss
发明人： David Dutton , James Moss
IPC分类号： B21C1/04 , B21C1/12
CPC分类号： B21C1/04 , B21C1/12
摘要： In a machine for reducing the cross-section of a number of wires by drawing each of them through a respective series of dies of decreasing diameter, a corresponding series of individual capstans is used for drawing each wire through its series of dies, and each one of several drive shafts supports at spaced positions along its length the capstans of a respective drawing stage of each series. Each capstan is driven by the shaft on which it is mounted, and the drive mechanism for the shafts can be adjusted, by presetting or otherwise, to give different peripheral speed ratios to the capstans, to suit different die sets and/or to compensate for wear. The capstans are mounted between bearings supporting the shafts, and the drive mechanism is located outside the bearing at the relevant end of the shaft. Preferably mechanism coupling adjacent shafts alternates between the two ends of the machine.
摘要翻译：在用于通过将它们中的每一个通过相应的直径减小的模具拉伸而减少多个电线的横截面的机器中，使用相应的一系列单独的绞盘来绘制每个电线通过其一系列模具，并且每个几个驱动轴沿其长度的间隔位置支撑每个系列的相应牵引级的绞盘。每个主导轴由安装在其上的轴驱动，并且可以通过预设或以其他方式调节轴的驱动机构，以向绞盘提供不同的圆周速度比，以适应不同的模具组和/或补偿穿。绞盘安装在支撑轴的轴承之间，驱动机构位于轴的相关端部处的轴承外部。优选地，相邻轴的机构联接在机器的两端之间交替。

4. 发明授权

US07799685B2 System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing 有权
标题翻译：用于集成电路制造的晶体管制造中去除光致抗蚀剂的系统和方法
公开(公告)号：US07799685B2
公开(公告)日：2010-09-21
申请号：US10958866
申请日：2004-10-04
申请人： Stephen E. Savas , Songlin Xu , David Dutton , Andreas Kadavanich , Rene George
发明人： Stephen E. Savas , Songlin Xu , David Dutton , Andreas Kadavanich , Rene George
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/31138 , H01L21/02063 , H01L21/02071 , H01L21/67207
摘要： In a technique for fabricating an integrated circuit to include an active device structure which supports an electrical interconnect structure, a photoresist layer is used prior to forming an electrical interconnect structure on the active device structure. The photoresist and related residues are removed by exposing the photoresist and exposed regions of the active device structure to one or more reactive species that are generated using a gas mixture including hydrogen gas, as a predominant source of the reactive species, in a plasma source such that the photoresist and residues are continuously exposed to hydrogen-based reactive species. An associated system architecture is described which provides for a substantial flow of hydrogen gas in the process chamber.
摘要翻译：在用于制造集成电路以包括支持电互连结构的有源器件结构的技术中，在有源器件结构上形成电互连结构之前，使用光致抗蚀剂层。通过将活性器件结构的光致抗蚀剂和暴露区域暴露于一种或多种使用包含作为反应性物质的主要来源的氢气的气体混合物在等离子体源中产生的反应性物质来除去光致抗蚀剂和相关残余物，例如光致抗蚀剂和残留物连续暴露于基于氢的反应物种。描述了相关联的系统架构，其提供了处理室中的大量氢气流。

5. 发明申请

US20080092083A1 Personal viewing device 审中-公开
标题翻译：个人观察设备
公开(公告)号：US20080092083A1
公开(公告)日：2008-04-17
申请号：US11546434
申请日：2006-10-12
申请人： David Dutton , Richard L. Baer
发明人： David Dutton , Richard L. Baer
IPC分类号： G06F9/00
CPC分类号： G06F3/04815 , G06F3/0346
摘要： A method of using a personal viewing device that has a display includes sensing a coordinate and an attitude of the personal viewing device and then calculating display data based on stored object data, the coordinate and the attitude. The method further includes displaying on the display a representation of the object in response to the display data.
摘要翻译：使用具有显示器的个人观看设备的方法包括感测个人观看设备的坐标和姿态，然后基于存储的对象数据，坐标和姿态来计算显示数据。该方法还包括响应于显示数据在显示器上显示对象的表示。

6. 发明申请

US20070229819A1 Surface contamination detection 失效
标题翻译：表面污染检测
公开(公告)号：US20070229819A1
公开(公告)日：2007-10-04
申请号：US11397064
申请日：2006-04-04
申请人： Karen Seaward , David Dutton
发明人： Karen Seaward , David Dutton
IPC分类号： G01J3/30 , G01N21/73
CPC分类号： G01J3/443 , G01J3/02 , G01J3/0272 , G01N21/67 , G01N21/94
摘要： A contamination detector in accordance with one embodiment of the invention includes a plasma generation system operable to direct an atmospheric plasma discharge towards a surface. The contamination detector further includes a light capture system to capture light generated by interaction of the atmospheric plasma discharge with the surface. The light capture system guides the captured light to an optical detection system configured to detect a contaminant.
摘要翻译：根据本发明的一个实施例的污染检测器包括等离子体产生系统，其可操作以将大气等离子体放电引向表面。污染检测器还包括光捕获系统，以捕获由大气等离子体放电与表面的相互作用产生的光。光捕获系统将捕获的光引导到被配置为检测污染物的光学检测系统。

7. 发明申请

US20060279297A1 Contactless area testing apparatus and method utilizing device switching 审中-公开
标题翻译：非接触式区域测试装置和方法利用设备切换
公开(公告)号：US20060279297A1
公开(公告)日：2006-12-14
申请号：US11150548
申请日：2005-06-10
申请人： Michael Nystrom , David Dutton , Gloria Hofler
发明人： Michael Nystrom , David Dutton , Gloria Hofler
IPC分类号： G01R31/02
CPC分类号： G01R19/0061 , G09G3/006 , G09G3/3225 , G09G2300/0842
摘要： A probe is locatable adjacent a selected region of a device under test (DUT), the selected region having a plurality of contacts. A generator is capable of establishing a plume of a ionized gas between the probe and the selected region of the DUT, the plume having sufficient cross-sectional area and electrical conductivity to complete an electrical connection between the probe and the plurality of contacts.
摘要翻译：探针可邻近待测器件（DUT）的选定区域定位，所选择的区域具有多个触点。发生器能够在探针和DUT的选定区域之间建立电离气体的羽流，羽流具有足够的横截面积和电导率，以完成探针与多个触点之间的电连接。

8. 发明申请

US20060139039A1 Systems and methods for a contactless electrical probe 审中-公开
标题翻译：非接触式电探头的系统和方法
公开(公告)号：US20060139039A1
公开(公告)日：2006-06-29
申请号：US11020337
申请日：2004-12-23
申请人： David Dutton , Gloria Hofler , Michael Nystrom
发明人： David Dutton , Gloria Hofler , Michael Nystrom
IPC分类号： G01R31/02
CPC分类号： G01R1/072 , G01R31/305 , G09G3/006 , G09G3/3208
摘要： There is disclosed a contactless test probe using an ionized gas discharge for making electrical contact with the device under test (DUT). In one embodiment the ionized gas discharge is at or below atmospheric pressure thereby reducing the complexity of the control environment. In one embodiment, the atmospheric gas discharge, i.e. the electrical probing medium, is created and controlled by a micro-hollow cathode. In a further embodiment an extension gate is used to extend/retard the range of the high-density discharge.
摘要翻译：公开了一种使用电离气体放电与被测器件（DUT）进行电接触的非接触式测试探针。在一个实施例中，电离气体放电处于或低于大气压，从而降低了控制环境的复杂性。在一个实施例中，大气气体放电，即电探测介质，由微空心阴极产生和控制。在另一实施例中，延伸门用于延伸/延迟高密度放电的范围。

9. 发明申请

US20050112883A1 System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing 有权
标题翻译：用于集成电路制造的晶体管制造中去除光致抗蚀剂的系统和方法
公开(公告)号：US20050112883A1
公开(公告)日：2005-05-26
申请号：US10958866
申请日：2004-10-04
申请人： Stephen Savas , Songlin Xu , David Dutton , Andreas Kadavanich , Rene George
发明人： Stephen Savas , Songlin Xu , David Dutton , Andreas Kadavanich , Rene George
IPC分类号： H01L20060101 , H01L21/00 , H01L21/02 , H01L21/302 , H01L21/311 , H01L21/461
CPC分类号： H01L21/31138 , H01L21/02063 , H01L21/02071 , H01L21/67207
摘要： In a technique for fabricating an integrated circuit to include an active device structure which supports an electrical interconnect structure, a photoresist layer is used prior to forming an electrical interconnect structure on the active device structure. The photoresist and related residues are removed by exposing the photoresist and exposed regions of the active device structure to one or more reactive species that are generated using a gas mixture including hydrogen gas, as a predominant source of the reactive species, in a plasma source such that the photoresist and residues are continuously exposed to hydrogen-based reactive species. An associated system architecture is described which provides for a substantial flow of hydrogen gas in the process chamber.
摘要翻译：在用于制造集成电路以包括支持电互连结构的有源器件结构的技术中，在有源器件结构上形成电互连结构之前，使用光致抗蚀剂层。通过将活性器件结构的光致抗蚀剂和暴露区域暴露于一种或多种使用包含作为反应性物质的主要来源的氢气的气体混合物在等离子体源中产生的反应性物质来除去光致抗蚀剂和相关残余物，例如光致抗蚀剂和残留物连续暴露于基于氢的反应物种。描述了相关联的系统架构，其提供了处理室中的大量氢气流。

10. 发明授权

US08445314B2 Method of creating reusable template for detachable thin film substrate 有权
标题翻译：为可拆卸薄膜基板制作可重复使用的模板的方法
公开(公告)号：US08445314B2
公开(公告)日：2013-05-21
申请号：US12786262
申请日：2010-05-24
申请人： Suketu Parikh , David Dutton , Pawan Kapur , Somnath Nag , Mehrdad Moslehi , Joe Kramer , Nevran Ozguven , Asli Buccu Ucok
发明人： Suketu Parikh , David Dutton , Pawan Kapur , Somnath Nag , Mehrdad Moslehi , Joe Kramer , Nevran Ozguven , Asli Buccu Ucok
IPC分类号： H01L21/00
CPC分类号： H01L29/0692 , H01L21/02381 , H01L21/0243 , H01L21/0245 , H01L21/02513 , H01L21/02532 , H01L21/02664 , H01L31/0236 , H01L31/02363 , H01L31/1804 , Y02E10/547 , Y02P70/521 , Y10T29/53265
摘要： A structure and method operable to create a reusable template for detachable thin semiconductor substrates is provided. The template has a shape such that the 3-D shape is substantially retained after each substrate release. Prior art reusable templates may have a tendency to change shape after each subsequent reuse; the present disclosure aims to address this and other deficiencies from the prior art, therefore increasing the reuse life of the template.
摘要翻译：提供了一种用于为可分离的薄半导体衬底创建可重用模板的结构和方法。模板具有使得在每个基底释放之后基本保持3-D形状的形状。现有技术的可再利用模板可能在每次后续重用之后具有改变形状的趋势; 本公开旨在解决现有技术的这种和其他缺陷，因此增加了模板的重用寿命。

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