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1. 发明授权

US08295963B2 Methods for performing data management for a recipe-and-component control module 有权
标题翻译：用于执行配方和组件控制模块的数据管理的方法
公开(公告)号：US08295963B2
公开(公告)日：2012-10-23
申请号：US12693267
申请日：2010-01-25
申请人： Chung-Ho Huang , Andrew Lui
发明人： Chung-Ho Huang , Andrew Lui
IPC分类号： G06F19/00 , G06F15/173
CPC分类号： G05B19/4183 , G05B2219/32097 , G05B2219/33063 , G05B2219/33068 , G05B2219/45031 , Y02P90/08 , Y02P90/10 , Y02P90/18 , Y02P90/20
摘要： A computer-implemented method for performing data management in a plasma processing system is provided. The method includes providing a recipe-and component control module (RACCM). The RACCM is a server that includes a plurality of intelligent agents, which are configured to interact with the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents. The RACCM further includes a set of provisional agents, which is configured to perform recipe management by distributing at least part of a recipe to at least one of the plurality of intelligent agents and the coordinating agent.
摘要翻译：提供了一种用于在等离子体处理系统中执行数据管理的计算机实现的方法。该方法包括提供配方和组件控制模块（RACCM）。 RACCM是包括多个智能代理的服务器，其被配置为与多个组件交互。 RACCM还包括协调代理，其被配置为从多个智能代理接收处理的数据。 RACCM还包括一组临时代理，其被配置为通过向至少一个智能代理和协调代理分配至少一部分食谱来执行配方管理。

2. 发明授权

US08010483B2 Component-tracking system and methods therefor 有权
标题翻译：组件跟踪系统及其方法
公开(公告)号：US08010483B2
公开(公告)日：2011-08-30
申请号：US12869016
申请日：2010-08-26
申请人： Chung-Ho Huang , Hae-Pyng Jea , Tung Hsu , Jackie Seto
发明人： Chung-Ho Huang , Hae-Pyng Jea , Tung Hsu , Jackie Seto
IPC分类号： G06F17/00
CPC分类号： G05B19/418 , Y02P90/02 , Y02P90/205 , Y02P90/86 , Y10S707/99943 , Y10S707/99945
摘要： A system for facilitating plasma processing tool component management across plurality of tools is provided. The system includes means for receiving first component data for first plurality of components, including identification and usage history for a first plurality of components, at first database associated with first tool. The system also includes means for receiving second component data for second plurality of components at second database associated with second tool, which is different from first tool. The system further includes means for synchronizing first and second component data with third database. The synchronizing includes synchronizing between third database and at least one of first and second database rules that govern usage of at least one component of first and second plurality of components. The third database is coupled to exchange data with plurality of tools. The system yet also includes means for obtaining information, using rules and usage history data about given component prior to performing one of replacement, analysis, and maintenance.
摘要翻译：提供了一种用于促进跨多个工具的等离子体处理工具部件管理的系统。该系统包括用于在与第一工具相关联的第一数据库处接收用于第一多个组件的第一组件数据的装置，包括用于第一多个组件的标识和使用历史。该系统还包括用于在与第二工具相关联的第二数据库处接收与第一工具不同的第二数据组件的第二组件数据的装置。该系统还包括用于将第一和第二组件数据与第三数据库同步的装置。同步包括在第三数据库与管理第一和第二多个组件的至少一个组件的使用的第一和第二数据库规则中的至少一个之间进行同步。第三数据库被耦合以与多个工具交换数据。该系统还包括在执行替换，分析和维护之前获得信息，使用关于给定组件的规则和使用历史数据的装置。

3. 发明申请

US20100152879A1 PROCESSING INFORMATION MANAGEMENT SYSTEM IN A PLASMA PROCESSING TOOL 有权
标题翻译：一种等离子体加工工具中的处理信息管理系统
公开(公告)号：US20100152879A1
公开(公告)日：2010-06-17
申请号：US12711163
申请日：2010-02-23
申请人： Chad R. Weetman , Chung-Ho Huang , Jacqueline Seto , John Jensen
发明人： Chad R. Weetman , Chung-Ho Huang , Jacqueline Seto , John Jensen
IPC分类号： G06F19/00 , G06F17/30 , G06F3/048
CPC分类号： G05B19/4183 , G05B2219/31304 , G05B2219/35391 , G05B2219/45031 , Y02P90/10 , Y02P90/20
摘要： A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file.
摘要翻译：提供了一种用于使用至少第一处理配方和第二处理配方来处理衬底的等离子体处理工具。等离子体处理工具包括被配置为收集过程数据流的换能器，与在配方执行期间被监控的过程参数相关的每个过程数据流。该工具还包括配置用于接收一组元数据的逻辑电路，其中每个元数据包括关于衬底的识别数据和正在执行的工艺配方。逻辑电路还被配置为用于接收一组过程数据流，每个过程数据流与特定的处理配方相关联。逻辑电路还包括将与第一处理配方相关联的元数据和过程数据流存储为第一文件，将与第二处理配方关联的元数据和过程数据流存储为第二文件。

4. 发明授权

US07542820B2 Methods and arrangement for creating recipes using best-known methods 有权
标题翻译：使用最着名的方法创建配方的方法和安排
公开(公告)号：US07542820B2
公开(公告)日：2009-06-02
申请号：US11536582
申请日：2006-09-28
申请人： Chung-Ho Huang , Shih-Jeun Fan , Chin Chuan Chang , Nicolas Bright
发明人： Chung-Ho Huang , Shih-Jeun Fan , Chin Chuan Chang , Nicolas Bright
IPC分类号： G06F19/00
CPC分类号： G06N5/022 , G05B2219/32097 , G05B2219/45031
摘要： A method for affecting a creation of a recipe for processing a substrate in a processing system. The method includes providing a best-known method driven recipe editor. The best-known method driven recipe editor incorporates best-known methods (BKMs), which are best practice specifications for the recipe. The method also includes creating a plurality of BKM modules based on the BKMs for the recipe. The method further includes defining rules for parameters in the plurality of BKM modules. The rules are propagated by the BKMs. The methods moreover includes creating a BKM driven recipe by employing the best-known method driven recipe editor to enter values for the parameters within the guidelines of BKM rules.
摘要翻译：一种用于影响在处理系统中处理衬底的配方的创建的方法。该方法包括提供最着名的方法驱动的食谱编辑器。最着名的方法驱动的食谱编辑器包含最着名的方法（BKM），这是方法的最佳实践规范。该方法还包括基于用于配方的BKM创建多个BKM模块。该方法还包括为多个BKM模块中的参数定义规则。规则由BKM传播。方法还包括通过采用最着名的方法驱动的配方编辑器来创建BKM驱动的配方，以便在BKM规则的指导下输入参数的值。

5. 发明申请

US20080243988A1 RECIPE-AND-COMPONENT CONTROL MODULE AND METHODS THEREOF 有权
标题翻译：配合组件控制模块及其方法
公开(公告)号：US20080243988A1
公开(公告)日：2008-10-02
申请号：US11693664
申请日：2007-03-29
申请人： Chung-Ho Huang , Andrew Lui
发明人： Chung-Ho Huang , Andrew Lui
IPC分类号： G06F15/173
CPC分类号： G05B19/4183 , G05B2219/32097 , G05B2219/33063 , G05B2219/33068 , G05B2219/45031 , Y02P90/08 , Y02P90/10 , Y02P90/18 , Y02P90/20
摘要： A recipe-and component control module (RACCM) is provided. The RACCM is a server for performing data management in a plasma processing system with a plurality of components. The RACCM includes a plurality of intelligent agents. Each intelligent agent of the intelligent agents is configured to interact with each component of the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents.
摘要翻译：提供配方和组件控制模块（RACCM）。 RACCM是用于在具有多个组件的等离子体处理系统中执行数据管理的服务器。 RACCM包括多个智能代理。智能代理的每个智能代理被配置为与多个组件的每个组件进行交互。 RACCM还包括协调代理，其被配置为从多个智能代理接收处理的数据。

6. 发明申请

US20080147668A1 PRIMARY SERVER ARCHITECTURAL NETWORKING ARRANGEMENT AND METHODS THEREFOR 有权
标题翻译：主要服务器架构网络布局及其方法
公开(公告)号：US20080147668A1
公开(公告)日：2008-06-19
申请号：US11610687
申请日：2006-12-14
申请人： Chad R. Weetman , Chung-Ho Huang
发明人： Chad R. Weetman , Chung-Ho Huang
IPC分类号： G06F17/30 , G06F15/16 , G06F7/00 , G06F3/048
CPC分类号： G06F17/30067
摘要： An arrangement for performing at least one of collecting and analyzing data from a tool cluster configured to process a set of substrates is provided. The arrangement includes a plurality of tools from which at least one tool of the plurality of tools has a chamber for processing at least one of the set of substrates. The arrangement also includes a plurality of secondary servers configured to collect sensor data from the plurality of tools. The arrangement further includes a primary server communicably coupled with the plurality of secondary servers and configured to execute a database management system. The sensor data is indexed using a plurality of indexing applications on the plurality of secondary servers prior to being forwarded to the primary server for use by the database management system. Indexing includes associating a sensor data item with an identity of a server where the sensor data item is stored.
摘要翻译：提供了一种用于执行从被配置为处理一组基板的工具集群收集和分析数据中的至少一个的布置。该装置包括多个工具，多个工具中的至少一个工具具有用于处理该组衬底中的至少一个的腔室的多个工具。该装置还包括被配置为从多个工具收集传感器数据的多个辅助服务器。该装置还包括与多个辅助服务器可通信地耦合并被配置为执行数据库管理系统的主服务器。传感器数据在被转发到主服务器以供数据库管理系统使用之前，使用多个辅助服务器上的多个索引应用进行索引。索引包括将传感器数据项与存储传感器数据项的服务器的标识相关联。

7. 发明申请

US20080082653A1 TARGETED DATA COLLECTION ARCHITECTURE 有权
标题翻译：目标数据收集架构
公开(公告)号：US20080082653A1
公开(公告)日：2008-04-03
申请号：US11536585
申请日：2006-09-28
申请人： Chung-Ho Huang , Shih-Jeun Fan
发明人： Chung-Ho Huang , Shih-Jeun Fan
IPC分类号： G06F15/173
CPC分类号： G05B23/0221 , H01J37/32935 , H04L67/12
摘要： A targeted data collection system configured to collect processing data in a plasma processing system is provided. The system includes a data collection host and a plurality of plasma processing components having a plurality of sensors such that each of the plurality of plasma processing components having at least one sensor. Each of the sensors implements at least one intelligent targeted data agent that governs sensor data collection behavior. The system further includes a communication network coupling data collection host and plurality of sensors for bi-directional communication such that a given sensor of plurality of sensors receive information from data collection host pertaining to plasma processing system conditions occurring elsewhere from given sensor. Information received from data collection host causes the given processor to collect sensor in a first manner different from a second manner employed by sensor prior to receiving e information from the data collection host.
摘要翻译：提供了一种被配置为收集等离子体处理系统中的处理数据的目标数据收集系统。该系统包括数据收集主机和具有多个传感器的多个等离子体处理部件，使得多个等离子体处理部件中的每一个具有至少一个传感器。每个传感器实现至少一个控制传感器数据收集行为的智能目标数据代理。该系统还包括耦合数据收集主机和用于双向通信的多个传感器的通信网络，使得多个传感器的给定传感器从与来自给定传感器的别处发生的等离子体处理系统状况相关的数据收集主机接收信息。从数据收集主机接收到的信息使得给定的处理器在从数据收集主机接收到e信息之前以与传感器采用的第二种方式不同的第一种方式收集传感器。

8. 发明授权

US07353379B2 Methods for configuring a plasma cluster tool 有权
标题翻译：配置等离子体簇工具的方法
公开(公告)号：US07353379B2
公开(公告)日：2008-04-01
申请号：US11097839
申请日：2005-03-31
申请人： Chung-Ho Huang , Shih-Jeun Fan , Chin-Chuan Chang
发明人： Chung-Ho Huang , Shih-Jeun Fan , Chin-Chuan Chang
IPC分类号： G06F15/177
CPC分类号： G05B19/0426 , G05B2219/23195 , G05B2219/23255 , G05B2219/24167 , G05B2219/25066 , G05B2219/25076 , G05B2219/25314 , G05B2219/2602 , Y10S438/907 , Y10S438/908
摘要： A method for configuring a plasma cluster tool is disclosed. The method includes generating a key file from option specifications, the key file encapsulating configuration restrictions specifically imposed on the plasma cluster tool. The method also includes generating at least one system-wide configuration file and at least one component-level configuration file using the key file. The method additionally includes generating run-time executable objects from a database of option definition files, the at least one system-wide configuration file and the at least one component-level configuration file. Furthermore, the method includes employing the run-time executable objects to configure the plasma cluster tool.
摘要翻译：公开了一种用于配置等离子体簇工具的方法。该方法包括从选项规范生成密钥文件，密钥文件封装特别强加于等离子体集群工具的配置限制。该方法还包括使用密钥文件生成至少一个系统范围的配置文件和至少一个组件级配置文件。该方法还包括从选项定义文件的数据库，至少一个系统范围的配置文件和至少一个组件级配置文件生成运行时可执行对象。此外，该方法包括采用运行时可执行对象来配置等离子体簇工具。

9. 发明授权

US08906163B2 Methods and apparatus for integrating and controlling a plasma processing system 有权
标题翻译：用于集成和控制等离子体处理系统的方法和装置
公开(公告)号：US08906163B2
公开(公告)日：2014-12-09
申请号：US12962486
申请日：2010-12-07
申请人： Chung-Ho Huang , Cheng-Chieh Lin
发明人： Chung-Ho Huang , Cheng-Chieh Lin
IPC分类号： B08B6/00
CPC分类号： B08B6/00 , G05B19/4184 , G05B19/41865 , G05B2219/32226 , G05B2219/45031 , Y02P90/14 , Y02P90/20
摘要： A method of operating one or more back end circuits of a plasma processing system, comprising: prior to a front end module receiving one or more wafers to be processed, receiving preliminary data at a back end circuit, wherein the preliminary data indicates a recipe and a predetermined number, the predetermined number indicating a number of wafers to be processed; determining whether a plasma processing chamber is ready for processing; and if the chamber is ready for processing and via the back end circuit, selecting a load lock, based on the predetermined number, instructing the front end module to pull the one or more wafers into the load lock, enabling the chamber to process a first wafer of the one or more wafers according to the recipe, and subsequent to the processing of the first wafer, instructing the front end module to remove the first wafer from the chamber.
摘要翻译：一种操作等离子体处理系统的一个或多个后端电路的方法，包括：在前端模块接收待处理的一个或多个晶片之前，在后端电路处接收初始数据，其中所述初步数据指示配方，并且预定数量，表示要处理的晶片数量的预定数量; 确定等离子体处理室是否准备好进行处理; 并且如果所述腔室准备好进行处理并且经由后端电路，则基于预定数量选择负载锁定，指示前端模块将一个或多个晶片拉入负载锁定，使得腔室能够处理第一根据配方，在第一晶片的处理之后，指示前端模块从腔室中移除第一晶片，从而使一个或多个晶圆的晶圆。

10. 发明授权

US08185242B2 Dynamic alignment of wafers using compensation values obtained through a series of wafer movements 有权
标题翻译：使用通过一系列晶片移动获得的补偿值来动态地对准晶片
公开(公告)号：US08185242B2
公开(公告)日：2012-05-22
申请号：US12116897
申请日：2008-05-07
申请人： Scott Wong , Jeffrey Lin , Andrew D. Bailey, III , Jack Chen , Benjamin W. Mooring , Chung Ho Huang
发明人： Scott Wong , Jeffrey Lin , Andrew D. Bailey, III , Jack Chen , Benjamin W. Mooring , Chung Ho Huang
IPC分类号： G06F19/00 , G06F17/00 , G05B19/18 , G05B15/00 , G05B19/00
CPC分类号： H01L21/68
摘要： Methods and systems to optimize wafer placement repeatability in semiconductor manufacturing equipment using a controlled series of wafer movements are provided. In one embodiment, a preliminary station calibration is performed to teach a robot position for each station interfaced to facets of a vacuum transfer module used in semiconductor manufacturing. The method also calibrates the system to obtain compensation parameters that take into account the station where the wafer is to be placed, position of sensors in each facet, and offsets derived from performing extend and retract operations of a robot arm. In another embodiment where the robot includes two arms, the method calibrates the system to compensate for differences derived from using one arm or the other. During manufacturing, the wafers are placed in the different stations using the compensation parameters.
摘要翻译：提供了使用受控系列的晶片移动来优化半导体制造设备中的晶片布置重复性的方法和系统。在一个实施例中，执行初步站校准以教导与用于半导体制造中的真空传递模块的面连接的每个站的机器人位置。该方法还校准系统以获得考虑要放置晶片的工位的位置的补偿参数，每个面中的传感器的位置以及执行机器人臂的延伸和缩回操作导出的偏移。在机器人包括两个臂的另一实施例中，该方法校准系统以补偿从使用一个臂或另一个臂导出的差异。在制造期间，使用补偿参数将晶片放置在不同的台中。

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