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1. 发明授权

US07235491B2 Method of manufacturing spacer 有权
标题翻译：垫片的制造方法
公开(公告)号：US07235491B2
公开(公告)日：2007-06-26
申请号：US10908240
申请日：2005-05-04
申请人： Chun-Jen Weng , Chia-Jui Liu
发明人： Chun-Jen Weng , Chia-Jui Liu
IPC分类号： H01L21/302
CPC分类号： H01L29/6656 , H01L21/31116 , H01L29/7833
摘要： A method of manufacturing a spacer for a substrate having a gate structure formed thereon. The method comprises steps of forming a first oxide layer over the substrate and forming a nitride layer on the first oxide layer. A first asymmetric etching process is performed to remove a portion of the nitride layer until a portion of a top surface of the first oxide layer is exposed. A second asymmetric etching process is performed to remove a portion of the first oxide layer by using the remaining nitride layer as a mask until about 50% to 90% portion of the first oxide layer is removed. A quick wet etching process is performed to remove a portion of the remaining first oxide located on the top of the gate structure and on the substrate.
摘要翻译：一种制造其上形成有栅极结构的衬底的间隔物的方法。该方法包括在衬底上形成第一氧化物层并在第一氧化物层上形成氮化物层的步骤。执行第一非对称蚀刻工艺以去除氮化物层的一部分，直到暴露第一氧化物层的顶表面的一部分。通过使用剩余的氮化物层作为掩模来执行第二非对称蚀刻工艺以去除第一氧化物层的一部分，直到除去第一氧化物层的约50％至90％的部分。执行快速湿蚀刻工艺以去除位于栅极结构的顶部上和衬底上的剩余第一氧化物的一部分。

2. 发明授权

US08462138B2 Optical touch module capable of increasing light emitting angle of light emitting unit 有权
标题翻译：能够增加发光单元的发光角度的光学触摸模块
公开(公告)号：US08462138B2
公开(公告)日：2013-06-11
申请号：US13048888
申请日：2011-03-16
申请人： Po-Liang Huang , Chia-Jui Liu
发明人： Po-Liang Huang , Chia-Jui Liu
IPC分类号： G06F3/042
CPC分类号： G06F3/0428 , G06F2203/04109
摘要： An optical touch module includes a screen and at least one optical positioning device disposed on the screen. The optical positioning device includes a case, at least one light emitting unit, a circuit board, a transparent diffusing part and an image capturing unit. The light emitting unit is disposed on case for emitting invisible light. The circuit board is electrically connected to the light emitting unit for controlling the light emitting unit. The transparent diffusing part is disposed at a light emitting side of the light emitting unit. A bar structure is formed on a light entrance surface of the transparent diffusing part for scattering the invisible light to be distributed over a touch surface of the screen. The image capturing unit is disposed on the case to capture an optical image for a touch object on the touch surface when the touch object is illuminated by the invisible light.
摘要翻译：光学触摸模块包括屏幕和设置在屏幕上的至少一个光学定位装置。光学定位装置包括壳体，至少一个发光单元，电路板，透明漫射部分和图像捕获单元。发光单元设置在用于发射不可见光的外壳上。电路板电连接到用于控制发光单元的发光单元。透明漫射部设置在发光单元的发光侧。在透明漫射部分的光入射表面上形成条形结构，用于将不可见光分散在屏幕的触摸表面上。当触摸物体被不可见的光照射时，图像捕获单元设置在壳体上以捕获触摸表面上的触摸对象的光学图像。

3. 发明申请

US20070054458A1 Method of fabricating spacers and cleaning method of post-etching and semiconductor device 有权
标题翻译：制造间隔物的方法和后蚀刻和半导体器件的清洗方法
公开(公告)号：US20070054458A1
公开(公告)日：2007-03-08
申请号：US11221611
申请日：2005-09-07
申请人： Chuan-Kai Wang , Yi-Hsing Chen , Chia-Jui Liu , Juan-Yi Chen , Ming-Yi Lin
发明人： Chuan-Kai Wang , Yi-Hsing Chen , Chia-Jui Liu , Juan-Yi Chen , Ming-Yi Lin
IPC分类号： H01L21/336
CPC分类号： H01L21/31116 , H01L21/0206 , H01L29/6656 , Y10S438/976
摘要： A method of fabricating spacers is provided. The method includes providing a substrate with a device structure formed thereon. The device structure comprises a gate structure and a pair of source/drain regions. Then, a spacer material layer is formed over the substrate to cover the substrate and the device structure. Thereafter, an etching process is performed to remove a portion of the spacer material layer so that spacers are formed on the respective sidewalls of the gate structure. After that, a plasma treatment step is performed to form a spacer protection layer on the surface of the substrate, the spacers and the gate structure.
摘要翻译：提供了制造间隔物的方法。该方法包括提供其上形成有器件结构的衬底。器件结构包括栅极结构和一对源极/漏极区域。然后，在衬底上形成间隔材料层以覆盖衬底和器件结构。此后，进行蚀刻处理以去除间隔材料层的一部分，使得在栅极结构的相应侧壁上形成间隔物。之后，执行等离子体处理步骤，以在衬底的表面，间隔物和栅极结构上形成间隔保护层。

4. 发明申请

US20080036018A1 METHOD OF FABRICATING SPACERS AND CLEANING METHOD OF POST-ETCHING AND SEMICONDUCTOR DEVICE 审中-公开
标题翻译：隔离层的制造方法和后处理和半导体器件的清洗方法
公开(公告)号：US20080036018A1
公开(公告)日：2008-02-14
申请号：US11874683
申请日：2007-10-18
申请人： Chuan-Kai Wang , Yi-Hsing Chen , Chia-Jui Liu , Juan-Yi Chen , Ming-Yi Lin
发明人： Chuan-Kai Wang , Yi-Hsing Chen , Chia-Jui Liu , Juan-Yi Chen , Ming-Yi Lin
IPC分类号： H01L29/76
CPC分类号： H01L21/31116 , H01L21/0206 , H01L29/6656 , Y10S438/976
摘要： A method of fabricating spacers is provided. The method includes providing a substrate with a device structure formed thereon. The device structure comprises a gate structure and a pair of source/drain regions. Then, a spacer material layer is formed over the substrate to cover the substrate and the device structure. Thereafter, an etching process is performed to remove a portion of the spacer material layer so that spacers are formed on the respective sidewalls of the gate structure. After that, a plasma treatment step is performed to form a spacer protection layer on the surface of the substrate, the spacers and the gate structure.
摘要翻译：提供了制造间隔物的方法。该方法包括提供其上形成有器件结构的衬底。器件结构包括栅极结构和一对源极/漏极区域。然后，在衬底上形成间隔材料层以覆盖衬底和器件结构。此后，进行蚀刻处理以去除间隔材料层的一部分，使得在栅极结构的相应侧壁上形成间隔物。之后，执行等离子体处理步骤，以在衬底的表面，间隔物和栅极结构上形成间隔保护层。

5. 发明申请

US20060252190A1 METHOD OF MANUFACTURING SPACER 有权
标题翻译：制造间隔的方法
公开(公告)号：US20060252190A1
公开(公告)日：2006-11-09
申请号：US10908240
申请日：2005-05-04
申请人： Chun-Jen Weng , Chia-Jui Liu
发明人： Chun-Jen Weng , Chia-Jui Liu
IPC分类号： H01L21/8234
CPC分类号： H01L29/6656 , H01L21/31116 , H01L29/7833
摘要： A method of manufacturing a spacer for a substrate having a gate structure formed thereon. The method comprises steps of forming a first oxide layer over the substrate and forming a nitride layer on the first oxide layer. A first asymmetric etching process is performed to remove a portion of the nitride layer until a portion of a top surface of the first oxide layer is exposed. A second asymmetric etching process is performed to remove a portion of the first oxide layer by using the remaining nitride layer as a mask until about 50% to 90% portion of the first oxide layer is removed. A quick wet etching process is performed to remove a portion of the remaining first oxide located on the top of the gate structure and on the substrate.
摘要翻译：一种制造其上形成有栅极结构的衬底的间隔物的方法。该方法包括在衬底上形成第一氧化物层并在第一氧化物层上形成氮化物层的步骤。执行第一非对称蚀刻工艺以去除氮化物层的一部分，直到暴露第一氧化物层的顶表面的一部分。通过使用剩余的氮化物层作为掩模来执行第二非对称蚀刻工艺以去除第一氧化物层的一部分，直到除去第一氧化物层的约50％至90％的部分。执行快速湿蚀刻工艺以去除位于栅极结构的顶部上和衬底上的剩余第一氧化物的一部分。

6. 发明申请

US20120139875A1 OPTICAL TOUCH MODULE CAPABLE OF INCREASING LIGHT EMITTING ANGLE OF LIGHT EMITTING UNIT 有权
标题翻译：增加发光单元的发光角的光学触摸模块
公开(公告)号：US20120139875A1
公开(公告)日：2012-06-07
申请号：US13048888
申请日：2011-03-16
申请人： Po-Liang Huang , Chia-Jui Liu
发明人： Po-Liang Huang , Chia-Jui Liu
IPC分类号： G06F3/042
CPC分类号： G06F3/0428 , G06F2203/04109
摘要： An optical touch module includes a screen and at least one optical positioning device disposed on the screen. The optical positioning device includes a case, at least one light emitting unit, a circuit board, a transparent diffusing part and an image capturing unit. The light emitting unit is disposed on case for emitting invisible light. The circuit board is electrically connected to the light emitting unit for controlling the light emitting unit. The transparent diffusing part is disposed at a light emitting side of the light emitting unit. A bar structure is formed on a light entrance surface of the transparent diffusing part for scattering the invisible light to be distributed over a touch surface of the screen. The image capturing unit is disposed on the case to capture an optical image for a touch object on the touch surface when the touch object is illuminated by the invisible light.
摘要翻译：光学触摸模块包括屏幕和设置在屏幕上的至少一个光学定位装置。光学定位装置包括壳体，至少一个发光单元，电路板，透明漫射部分和图像捕获单元。发光单元设置在用于发射不可见光的外壳上。电路板电连接到用于控制发光单元的发光单元。透明漫射部设置在发光单元的发光侧。在透明漫射部分的光入射表面上形成条形结构，用于将不可见光分散在屏幕的触摸表面上。当触摸物体被不可见的光照射时，图像捕获单元设置在壳体上以捕获触摸表面上的触摸对象的光学图像。

7. 发明授权

US07642152B2 Method of fabricating spacers and cleaning method of post-etching and semiconductor device 有权
标题翻译：制造间隔物的方法和后蚀刻和半导体器件的清洁方法
公开(公告)号：US07642152B2
公开(公告)日：2010-01-05
申请号：US11221611
申请日：2005-09-07
申请人： Chuan-Kai Wang , Yi-Hsing Chen , Chia-Jui Liu , Juan-Yi Chen , Ming-Yi Lin
发明人： Chuan-Kai Wang , Yi-Hsing Chen , Chia-Jui Liu , Juan-Yi Chen , Ming-Yi Lin
IPC分类号： H01L21/8238 , H01L21/336 , H01L21/31
CPC分类号： H01L21/31116 , H01L21/0206 , H01L29/6656 , Y10S438/976
摘要： A method of fabricating spacers is provided. The method includes providing a substrate with a device structure formed thereon. The device structure comprises a gate structure and a pair of source/drain regions. Then, a spacer material layer is formed over the substrate to cover the substrate and the device structure. Thereafter, an etching process is performed to remove a portion of the spacer material layer so that spacers are formed on the respective sidewalls of the gate structure. After that, a plasma treatment step is performed to form a spacer protection layer on the surface of the substrate, the spacers and the gate structure.
摘要翻译：提供了制造间隔物的方法。该方法包括提供其上形成有器件结构的衬底。器件结构包括栅极结构和一对源极/漏极区域。然后，在衬底上形成间隔材料层以覆盖衬底和器件结构。此后，进行蚀刻处理以去除间隔材料层的一部分，使得在栅极结构的相应侧壁上形成间隔物。之后，执行等离子体处理步骤，以在衬底的表面，间隔物和栅极结构上形成间隔保护层。

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