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1. 发明申请

US20220363540A1 METHOD FOR PRETREATING AND RECOVERING A RARE GAS FROM A GAS CONTAMINANT STREAM EXITING AN ETCH CHAMBER 有权
公开(公告)号：US20220363540A1
公开(公告)日：2022-11-17
申请号：US17552869
申请日：2021-12-16
申请人： Jennifer Bugayong Luna , Atul M. Athalye , Ce Ma , Ashwini K. Sinha
发明人： Jennifer Bugayong Luna , Atul M. Athalye , Ce Ma , Ashwini K. Sinha
IPC分类号： C01B23/00 , B01D53/00 , B01D53/14 , B01D53/04
摘要： Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

2. 发明公开

US20230183068A1 NOVEL METHOD FOR PRETREATING AND RECOVERING A RARE GAS FROM A GAS CONTAMINANT STREAM EXITING AN ETCH CHAMBER 审中-公开
公开(公告)号：US20230183068A1
公开(公告)日：2023-06-15
申请号：US18165513
申请日：2023-02-07
申请人： Jennifer Bugayong Luna , Atul M. Athalye , Ce Ma , Ashwini K. Sinha
发明人： Jennifer Bugayong Luna , Atul M. Athalye , Ce Ma , Ashwini K. Sinha
IPC分类号： C01B23/00 , B01D53/00 , B01D53/04 , B01D53/14
CPC分类号： C01B23/0094 , B01D53/005 , B01D53/0462 , B01D53/1431 , B01D53/1456 , C01B23/0021 , C01B23/0057 , C01B23/0078 , C01B23/0089 , B01D2253/1122 , B01D2257/11 , B01D2257/2047 , B01D2257/2066 , B01D2257/502 , B01D2257/504 , B01D2257/80 , C01B2210/0004 , C01B2210/0021 , C01B2210/0025 , C01B2210/0035 , C01B2210/0037 , C01B2210/005 , C01B2210/0056 , C01B2210/0068 , C01B2210/0098
摘要： Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

3. 发明授权

US11603313B2 Method for pretreating and recovering a rare gas from a gas contaminant stream exiting an etch chamber 有权
公开(公告)号：US11603313B2
公开(公告)日：2023-03-14
申请号：US17552869
申请日：2021-12-16
申请人： Jennifer Bugayong Luna , Atul M. Athalye , Ce Ma , Ashwini K. Sinha
发明人： Jennifer Bugayong Luna , Atul M. Athalye , Ce Ma , Ashwini K. Sinha
IPC分类号： B01D53/00 , B01D53/04 , B01D53/14 , C01B23/00
摘要： Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

4. 发明授权

US06065306A Method and apparatus for purifying ammonia 失效
标题翻译：净化氨的方法和装置
公开(公告)号：US06065306A
公开(公告)日：2000-05-23
申请号：US81381
申请日：1998-05-19
申请人： Wenchang Ji , Arthur I. Shirley , Atul M. Athalye , Piotr J. Sadkowski
发明人： Wenchang Ji , Arthur I. Shirley , Atul M. Athalye , Piotr J. Sadkowski
IPC分类号： C01C1/02 , F25J1/00
CPC分类号： C01C1/024
摘要： Ammonia is purified by a membrane unit to concentrate ammonia and/or ammonia and moisture. Moisture is removed in a temperature-swing adsorption unit. The resultant product of such purification is then partially condensed to remove light components of other impurities and then partially vaporized to produce a pressurized ammonia product lean in heavy components. If the feed stream is processed through the membrane unit first, the permeate stream will be lean in such impurities as carbon dioxide, nitrogen and methane. Moisture and any carbon dioxide not removed in the membrane unit is then removed by the adsorption unit. The resultant stream produced by action of the membrane and adsorption units is then partially condensed to produce a liquid lean in light impurities. Such liquid is then partially vaporized within a product pressure vessel to produce ammonia vapor lean in heavy impurities and at a required operational pressure.
摘要翻译：氨通过膜单元纯化以浓缩氨和/或氨和水分。在变温吸附装置中除去水分。然后将得到的纯化产物部分冷凝以除去其它杂质的轻组分，然后部分蒸发，以产生稀重的组分中的加压氨产物。如果原料流首先通过膜单元进行处理，则渗透物流将如二氧化碳，氮气和甲烷这样的杂质贫化。然后通过吸附单元去除膜单元中未除去的水分和任何二氧化碳。然后通过膜和吸附单元的作用产生的所得料流被部分冷凝以产生轻质杂质的液体贫。然后将这样的液体在产品压力容器内部分蒸发，以产生贫重的杂质和所需操作压力的氨蒸气。

5. 发明授权

US6017382A Method of processing semiconductor manufacturing exhaust gases 失效
标题翻译：半导体制造废气的处理方法
公开(公告)号：US6017382A
公开(公告)日：2000-01-25
申请号：US50259
申请日：1998-03-30
申请人： Wenchang Ji , Dongmin Shen , Ravi Jain , Arthur I. Shirley , Atul M. Athalye , Piotr J. Sadkowski
发明人： Wenchang Ji , Dongmin Shen , Ravi Jain , Arthur I. Shirley , Atul M. Athalye , Piotr J. Sadkowski
IPC分类号： B01D53/047
CPC分类号： B01D53/02 , B01D53/047 , B01D2253/104 , B01D2253/106 , B01D2253/108 , B01D2253/308 , B01D2256/26 , B01D2257/102 , B01D2257/104 , B01D2257/80 , B01D2258/0216 , B01D2259/404 , B01D2259/4146
摘要： A method of processing semiconductor manufacturing exhaust gases for recovering at least hexafluoroethane in which a feed stream composed of the exhaust gases is passed through an adsorbent bed selected to adsorb oxygen, and also nitrogen if present, but not to appreciably adsorb the hexafluoroethane. As a result, a product stream, discharged from the adsorbent bed, has a higher concentration of hexafluoroethane than in the feed stream. In one embodiment, only a single adsorbent such as carbon molecular sieve is provided to adsorb the oxygen or a modified 4A zeolite could be used to adsorb both oxygen and nitrogen. When nitrogen is a potential constituent, layers of carbon molecular sieve and zeolite are provided to adsorb the oxygen and then the nitrogen, respectively. A third adsorbent, preferably 5A zeolite may be provided in addition to the foregoing two adsorbents to also adsorb any carbon tetrafluoride produced as a by-product.
摘要翻译：一种处理半导体制造废气的方法，用于回收至少六氟乙烷，其中由排气组成的进料流通过选择吸附氧的吸附剂床，以及氮气（如果存在），但不显着吸附六氟乙烷。结果，从吸附床排出的产物流具有比进料流中更高浓度的六氟乙烷。在一个实施方案中，仅提供单一吸附剂例如碳分子筛以吸附氧，或者可以使用改性的4A沸石吸附氧和氮。当氮是潜在的成分时，分别提供碳分子筛和沸石层以分别吸附氧气和氮气。除了上述两种吸附剂之外，还可以提供第三吸附剂，优选5A沸石，以吸附作为副产物生产的任何四氟化碳。

6. 发明授权

US5799509A Multi-component recovery apparatus and method 失效
标题翻译：多组分回收装置及方法
公开(公告)号：US5799509A
公开(公告)日：1998-09-01
申请号：US916454
申请日：1997-08-22
申请人： Steven J. Finley , Piotr J. Sadkowski , Atul M. Athalye
发明人： Steven J. Finley , Piotr J. Sadkowski , Atul M. Athalye
IPC分类号： B01D8/00 , F25J1/00
CPC分类号： B01D8/00 , Y10S62/909
摘要： An apparatus and method for recovering one or more components from the vapor feed in which the component is recovered from the vapor feed at a lower pressure within a lower pressure cold trap. Thereafter, a higher pressure cold trap is connected to the lower pressure cold trap and the component revaporizes in the lower pressure cold trap and resolidifies in the higher pressure cold trap. The higher pressure cold trap is then isolated and the component is allowed to thaw to build up a vapor pressure such that the component can be delivered for recovery at a high pressure. Two or more components having higher and lower boiling points can be recovered by low pressure cold traps set in series. Low pressure cold traps can be provided to operate in an out of phase relationship so that components are frozen on one set of lower pressure cold traps while being vaporized from the other set of cold traps. In the case of two component recovery, two high pressure cold traps are provided to allow two components to vaporize and thus develop a sufficient vapor pressure to be delivered at the requisite delivery pressure.
摘要翻译：一种用于从蒸汽进料中回收一种或多种组分的装置和方法，其中在低压冷阱内以更低的压力从蒸气进料中回收组分。此后，将较高压力的冷阱与低压冷阱连接，并将组件在低压冷阱中汽化，并在较高压力的冷阱中重新凝固。然后隔离较高压力的冷阱，并使组分解冻以形成蒸气压，使得组分可以在高压下被输送回收。具有较高沸点和低沸点的两种或更多种组分可以通过串联设置的低压冷阱来回收。可以提供低压冷阱来以异相关系运行，使得部件在一组低压冷阱中冷冻，同时从另一组冷阱中蒸发。在双组分回收的情况下，提供两个高压冷阱以允许两个组分蒸发并因此产生足够的蒸汽压力以在必要的输送压力下输送。

7. 发明授权

US5645771A Gas injection apparatus and method having application to gold leaching 失效
标题翻译：用于金浸的气体注入装置和方法
公开(公告)号：US5645771A
公开(公告)日：1997-07-08
申请号：US531988
申请日：1995-09-21
申请人： Rustam H. Sethna , Atul M. Athalye , Michael K. Sahm
发明人： Rustam H. Sethna , Atul M. Athalye , Michael K. Sahm
IPC分类号： B01F3/04 , B01F3/08 , B01F5/04
CPC分类号： B01F3/0876 , B01F5/0401 , B01F3/04099
摘要： A gas injection apparatus for injecting a gas into a liquid comprising a baffle plate, a re-circulation chamber, and a discharge nozzle. The discharge nozzle is oriented normally to the baffle plate so that a liquid stream composed of the liquid is directed against the baffle plate and produces an oppositely directed flow towards the outer peripheral edge of the baffle plate. The oppositely directed flow has a sheet-like turbulent flow regime located adjacent to the plate and a circulating flow regime located above the turbulent flow regime and bounded by a re-circulation chamber. The gas is mixed into the liquid so that smaller bubbles are entrained in the turbulent flow regime and are discharged with the liquid flowing in the turbulent flow regime from the outer peripheral edge of the baffle plate. Larger bubbles flow into the circulating flow regime to break up into smaller bubbles which are entrained in the turbulent flow regime swept out of the apparatus. The apparatus is particularly useful in a gold leaching process in which the gold slurry is thickened to produce clarified water. Oxygen is injected into the clarified water and thereafter, the clarified water is injected into a leaching tank.
摘要翻译：一种用于将气体注入包括挡板，再循环室和排出喷嘴的液体中的气体注入装置。排放喷嘴通常定向到挡板，使得由液体组成的液体流被引向挡板并产生朝向挡板的外周边缘的相反方向的流动。相反方向的流动具有位于板附近的片状湍流状态，以及位于湍流状态上方并由再循环腔限定的循环流动状态。将气体混合到液体中，使得较小的气泡被夹带在湍流状态，并且随着流体流向湍流状态的液体从挡板的外周边边缘排出。较大的气泡流入循环流动状态以分解成较小的气泡，这些气泡被夹带在从设备中扫出的湍流状态。该设备在金浸出过程中特别有用，其中金浆增稠以产生澄清的水。将氧气注入澄清的水中，之后将澄清的水注入浸出池中。

8. 发明授权

US5547347A Gas injection apparatus and method 失效
标题翻译：注气装置及方法
公开(公告)号：US5547347A
公开(公告)日：1996-08-20
申请号：US531987
申请日：1995-09-21
申请人： Rustam H. Sethna , Atul M. Athalye
发明人： Rustam H. Sethna , Atul M. Athalye
IPC分类号： B01F5/04 , B01F13/06 , F04B19/06 , F04B23/14 , F04D31/00 , F04B25/00
CPC分类号： F04B23/14 , B01F13/06 , B01F5/04 , F04B19/06 , F04D31/00
摘要： An apparatus and method for dispersing a gas in a liquid and for increasing gas pressure of a gas from a supply pressure to a delivery pressure. A first pump pumps the liquid to produce a pressurized liquid stream. The gas is injected into the pressurized liquid stream through for instance, a piping tee. The gas injection produces a pressure drop within the gas and as a result, the first pump pumps the liquid stream so that it has a static pressure no greater than the injection pressure. A second pump pumps the resultant pressurized gas-liquid stream so that an outlet liquid stream is produced with the liquid having a greater head than that of the pressurized liquid stream and the gas having the increased delivery pressure.
摘要翻译：一种用于将气体分散在液体中并用于将气体从供给压力增加到输送压力的气体压力的装置和方法。第一泵泵送液体以产生加压液体流。气体通过例如管道三通注入加压液体流中。气体注入在气体内产生压降，结果，第一泵泵送液体流，使其具有不大于注射压力的静压力。第二泵泵送所得到的加压气液流，使得出口液体流被产生，其中液体的头部大于加压液体流和具有增加的输送压力的气体的头部。

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