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1. 发明授权

US06600608B1 Catadioptric objective comprising two intermediate images 有权
标题翻译：反射折射物镜包括两个中间图像
公开(公告)号：US06600608B1
公开(公告)日：2003-07-29
申请号：US09434702
申请日：1999-11-05
申请人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Fürter , Rudolf von Bünau , Wilhelm Ulrich
发明人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Fürter , Rudolf von Bünau , Wilhelm Ulrich
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
摘要翻译：包括轴向对称的目标，至少一个曲面镜和至少一个透镜和两个中间图像。目标包括两个折射部分目标和一个反射折射部分目标。目标包括第一部分目标，第一中间图像，第二部分目标，第二中间图像和第三部分目标。部分目标中的至少一个纯粹是折射的。其中一个部分目标是纯粹的折射，一个纯粹是反射的。

2. 发明授权

US06784977B2 Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography 失效
标题翻译：投影曝光系统以及用于补偿投影曝光系统的投影光学元件中发生的图像缺陷的过程，特别是用于微光刻
公开(公告)号：US06784977B2
公开(公告)日：2004-08-31
申请号：US10133963
申请日：2002-04-25
申请人： Rudolf von Bünau , Christian Hembd-Söllner , Hubert Holderer
发明人： Rudolf von Bünau , Christian Hembd-Söllner , Hubert Holderer
IPC分类号： G03B2754
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system, in particular for microlithography, serves for the generation of an image in an image plane of an object arranged in an object plane. The system comprises a light source that emits a projection light bundle. The system also comprises a projection optics arranged in the optical path between the object plane and the image plane as well as at least one optical correction component arranged in the projection light optical path in front of the image plane. In order to change the optical image properties this component is coupled to at least one correction manipulator so that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally. In this connection the correction manipulator operates together with a correction sensor device. The correction sensor device comprises a light source that emits at least one measuring light bundle. This light bundle passes through at least a part of the projection optics and lie sin front of the entry point to and after the exit from the projection optics outside the projection light bundle. The correction sensory device also has a position-sensitive correction sensor element for the detection of the wave front of the at least one measuring light bundle. By means of the correction sensor device a correction of image defects of the projection optics is ensured without the loss of projection light.
摘要翻译：特别是用于微光刻的投影曝光系统用于在物平面中的物体的像平面中产生图像。该系统包括发射投影光束的光源。该系统还包括布置在物平面和图像平面之间的光路中的投影光学器件以及布置在图像平面前面的投影光学光路中的至少一个光学校正元件。为了改变光学图像特性，该部件耦合到至少一个校正操纵器，使得由投影光束照射的光学校正部件的光学表面至少在区域上移动。在这方面，校正操纵器与校正传感器装置一起操作。校正传感器装置包括发射至少一个测量光束的光源。该光束穿过投影光学元件的至少一部分，并且将入射点的前面位于投影光束外部的投影光学器件的出射之后和之后。校正感觉装置还具有用于检测至少一个测量光束的波前的位置敏感校正传感器元件。通过校正传感器装置，确保投影光学器件的图像缺陷的校正，而不损失投影光。

3. 发明授权

US06521877B1 Optical arrangement having improved temperature distribution within an optical element 有权
标题翻译：在光学元件内具有改善的温度分布的光学布置
公开(公告)号：US06521877B1
公开(公告)日：2003-02-18
申请号：US09721451
申请日：2000-11-22
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G01J120
CPC分类号： G03F7/70891
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated impingement (3) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface (3) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips (5 to 10). A heating current source (17 to 19) is additionally part of the heating element. By virtue of the combined heating of the optical element by the radiated impingement (3) and the resistance heating, a correction of imaging defects induced by illumination in the optical element is achieved by means of a symmetrical and/or homogeneous temperature and refractive index distribution.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。折射光学元件，例如透镜（2）被光源的旋转非对称辐射冲击（3）加热。至少一个电加热元件耦合到光学元件。所述加热元件包括由光学元件承载的电阻加热涂层。在由光源的辐射作用的光学元件的表面（3）的区域中，电阻加热涂层基本上是光学透明的。它包括多个平行的，电互相绝缘的涂层条（5至10）。加热电流源（17〜19）是加热元件的另外一部分。由于通过辐射冲击（3）和电阻加热对光学元件的组合加热，通过对称和/或均匀的温度和折射率分布来实现由光学元件中的照明引起的成像缺陷的校正。

4. 发明授权

US06466382B2 Optical arrangement 有权
标题翻译：光学布置
公开(公告)号：US06466382B2
公开(公告)日：2002-10-15
申请号：US09751132
申请日：2000-12-29
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G02B702
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891 , G03F7/70958
摘要： An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.
摘要翻译：光学装置，特别是用于微光刻的投影曝光系统，特别是狭缝状图像场或非旋转对称照明。结果，光学元件（101）以非旋转对称的方式暴露于光源（110,111,112）的辐射。光学元件（101）具有吸收涂层（104,105）。涂层（104,105）的吸收以这样的方式分布，使得其以与辐射（107,108,109）的曝光的强度分布至少近似互补的方式是非旋转对称的，的光源（110,111,112）。由于在涂层（104,105）中吸收的能量的结果，发生光学元件（101）的附加加热，其导致更好的非旋转对称的温度分布，并且因此补偿光诱导的成像错误。

5. 发明授权

US06583850B2 Optical system 有权
标题翻译：光学系统
公开(公告)号：US06583850B2
公开(公告)日：2003-06-24
申请号：US09755401
申请日：2001-01-05
申请人： Wolfgang Hummel , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter
发明人： Wolfgang Hummel , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical element (1) of an optical system has at least one chamber (5) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber (5) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber (5) results in a change in non-rotational-symmetric imaging properties of the optical element (1) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line (17). Furthermore, a control device is provided for the pressure in the fluid filling.
摘要翻译：光学系统的光学元件（1）具有至少一个室（5），其被密封以抵抗大气压并被边界表面包围并具有流体填充。室（5）的至少一个边界表面至少部分地暴露于照明光。其构造使得室（5）内的流体压力的变化导致具有n倍对称性的光学元件（1）的非旋转对称成像特性的变化。为此，流体源经由流体供应管线（17）与腔室流体连接。此外，为流体填充中的压力提供控制装置。

6. 发明授权

US06522392B1 Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system 失效
标题翻译：在光学系统中补偿旋转非对称图像缺陷的光学系统和方法
公开(公告)号：US06522392B1
公开(公告)日：2003-02-18
申请号：US09721452
申请日：2000-11-22
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2768
CPC分类号： G03F7/70241 , G03F7/70258 , G03F7/70825
摘要： An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.
摘要翻译：光学系统，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。该系统包括光源（30）以及至少一个光学元件，特别是透镜或反射镜。在由光源（30）的辐射（1）作用的至少一个表面的区域中，光学元件相对于旋转对称轴线（5）基本上是对称的。光学元件或其壳体（6）通过至少一个轴承（8,9,10）可旋转地连接到框架（7）。致动器（18）将光学元件（25）或其壳体（6）围绕旋转对称轴线（5）旋转。致动与控制装置（23）配合。当光学元件暴露于照明时，后者激活用于光学元件的致动器（18），以在光学元件暴露于照明期间的至少暂时的旋转。以这种方式，可以补偿旋转非对称的图像缺陷。

7. 发明授权

US06781668B2 Optical arrangement 失效
标题翻译：光学布置
公开(公告)号：US06781668B2
公开(公告)日：2004-08-24
申请号：US09752282
申请日：2000-12-29
申请人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter having at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。因此，光学元件（5）通过光源的辐射以旋转非对称的方式作用。为了回火光学元件（5），使用用于气体的供给装置（11,19〜23）。后者具有至少一个供应管线（21）和至少一个气体引导装置（11）。后者相对于光学元件（5）对准并且可以以气体被气体引导装置（11）引向光学元件（5）的方式控制。因此，出口气体的体积流量具有适于辐射的强度分布（6）的大小和空间分布（17）。由于这种回火，避免或补偿光学元件（5）中的旋转非对称的光诱导图像缺陷。

8. 发明授权

US06593998B2 Projection exposure system 有权
标题翻译：投影曝光系统
公开(公告)号：US06593998B2
公开(公告)日：2003-07-15
申请号：US09934252
申请日：2001-08-21
申请人： Toralf Gruner , Rudolf Von Bünau , Erwin Gaber
发明人： Toralf Gruner , Rudolf Von Bünau , Erwin Gaber
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70891 , G03F7/70958
摘要： A projection exposure system for microlithography that has a catadioptric projection objective and a light source is claimed. The projection objective has at least one mirror and at least one lens that are composed of specified materials. Also the positions of the mirror and of the lens within the projection objective are also specified. The material and position are specified in such a way that imaging changes in the projection objective that are due to illumination-induced change in the reflecting surface of the mirror counteract illumination-induced imaging changes in the lens. Illumination-induced imaging changes in the entire projection objective are reduced in this way.
摘要翻译：要求具有反射折射投影物镜和光源的用于微光刻的投影曝光系统。投影物镜具有至少一个镜子和至少一个由特定材料组成的透镜。还规定了投影物镜内的镜子和透镜的位置。材料和位置被指定为使得投影物镜中由于镜的反射表面中的照明引起的变化的成像变化抵消照明诱导的成像在透镜中变化的方式。以这种方式减少整个投影物镜中的照明诱导成像变化。

9. 发明授权

US06504597B2 Optical arrangement 有权
标题翻译：光学布置
公开(公告)号：US06504597B2
公开(公告)日：2003-01-07
申请号：US09755423
申请日：2001-01-05
申请人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2754
CPC分类号： G03F7/70891 , G02B7/028 , G03F7/70825 , G03F7/70983
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。因此，光学元件（1）通过光源的辐射以旋转非对称的方式作用。补偿光供给装置（11,14〜19）经由光学元件（1）的周面（13）光耦合到光学元件（1）。它以这样的方式向光学元件（1）供应补偿光（16,12），使得由于用投影光累积加热光学元件（1）而导致的光学元件（1）中的温度分布（2）和补偿光（12）至少部分均匀化。以所述方式校正由投影光引起的图像缺陷。

10. 发明授权

US06445442B2 Projection-microlithographic device 失效
标题翻译：投影微光刻装置
公开(公告)号：US06445442B2
公开(公告)日：2002-09-03
申请号：US09932355
申请日：2001-08-20
申请人： Rudolf Von Bünau , Jörg Schultz , Johannes Wangler
发明人： Rudolf Von Bünau , Jörg Schultz , Johannes Wangler
IPC分类号： G03B2754
CPC分类号： G03F7/70066 , G03F7/70358
摘要： An illuminating device of a projection-microlithographic device includes a light source, an objective, and a device which produces a particular image field configuration. The device has fields which, in the direction of scanning movement, are separated at least in parts by a free zone, and are located in a peripheral region of the circular image field of a downstream projection objective in a manner at least approximating rotation symmetry. The integral of the quantity of light passing through the fields in the scanning direction are constant over the entire extent of the image field configuration in the direction at right angles to the scanning direction. Such an image field configuration replaces a conventional rectangular scanner slot formation whose width in the scanning direction corresponds to the forementioned integral of the image field configuration. The design of the image field configuration permits an approximately rotationally symmetric illumination of the projection objective.
摘要翻译：投影微光刻装置的照明装置包括光源，物镜和产生特定图像场配置的装置。该装置具有在扫描方向上至少部分地通过自由区域分离的区域，并且以至少近似于旋转对称的方式位于下游投影物镜的圆形图像场的周边区域中。在扫描方向上通过场的光量的积分在与扫描方向成直角的方向上的图像场构造的整个范围内是恒定的。这样的图像场配置取代了扫描方向上的宽度对应于图像场配置的前述积分的常规矩形扫描器狭缝形状。图像场配置的设计允许投影物镜的大致旋转对称的照明。

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