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    • 1. 发明授权
    • Electrolysis electrode plate flatness measuring apparatus
    • 电解电极板平面度测量仪
    • US5617643A
    • 1997-04-08
    • US360320
    • 1994-12-21
    • Yoshinobu KatoMitsuharu OonishiHideaki Kobayashi
    • Yoshinobu KatoMitsuharu OonishiHideaki Kobayashi
    • G01B11/30C25C7/00G01B5/28G01B21/30G01B11/06
    • G01B21/30G01B5/285Y10S33/21
    • An apparatus for continuously and automatically measuring deformation and warp of a shaped electrode plate for electrolysis before the electrode plate includes means for lifting shaped electrode plates 1 hanging from crossbars 2 one by one to a predetermined measurement position by a suspending apparatus having a hanger mechanism and adjusting it about a measurement vertical plane position; for so freely suspending the electrode plate 1 vertically about the underside of a crossbar 2 that the electrode plate is not subject to deformation caused by the influence of its own weight or external forces; and a computing device 23 for continuously scanning the flatness of the electrode plate 1 by a moving mechanism which moves sensors 11a, 11b which measure distances between the electrode plate 1 and planes parallel to and facing the front and rear sides of the electrode plate 1 respectively without making contact with the electrode plate horizontally and vertically over those planes and A/D converting and analyzing measurement data obtained by this scanning.
    • 一种用于在电极板之前连续且自动地测量用于电解的成形电极板的变形和翘曲的装置,包括用于通过具有悬挂机构的悬挂装置将成对的电极板1从横梁2悬挂到预定测量位置的装置, 调整测量垂直平面位置; 使电极板1自由地悬挂在横杆2的下侧,电极板不受其自身重量或外力的影响而不会变形; 以及用于通过移动机构连续地扫描电极板1的平坦度的计算装置23,该移动机构移动测量电极板1和平行于并面对电极板1的前后两侧的平面之间的距离的传感器11a,11b 而不会在这些平面上水平和垂直地与电极板接触,并且A / D转换和分析通过该扫描获得的测量数据。
    • 3. 发明授权
    • Method of manufacturing copper-polyimide substrate
    • 铜 - 聚酰亚胺基板的制造方法
    • US5246564A
    • 1993-09-21
    • US963739
    • 1992-10-20
    • Yukihiro TamiyaNoriyuki SaekiAkihiro MiyakeYoshiyasu Takenaka
    • Yukihiro TamiyaNoriyuki SaekiAkihiro MiyakeYoshiyasu Takenaka
    • C23C18/16C23C18/22H05K1/00H05K3/38
    • H05K3/381C23C18/1651C23C18/1653C23C18/1692C23C18/2086C23C18/22H05K1/0393H05K2201/0154H05K2201/0344H05K2203/1105
    • A method of manufacturing a copper-polyimide substrate, includes hydrophilicating the surface(s) of a polyimide film, applying a catalyst thereto, subjecting the film to electroless plating, heat-treating it in an inert atmosphere, and subjecting it to electroless copper plating or to electroless copper plating followed by electrolytic copper plating. The hydrophilication of the surface(s) of the polyimide film is effected with an aqueous solution containing a hydrazine hydrate and an alkali metal hydroxide or with an aqueous solution containing a permanganate and/or a hypochlorite, then a catalyst is applied to the surface(s) by an ordinary way, then the surface(s) is/are subjected to electroless plating with any one of nickel, cobalt nickel alloys or cobalt alloys to form a plated layer thereon having a thickness of from 0.01 to 0.1 .mu.m and having an impurity content of 10% by weight or less, and thereafter the resulting substrate is heat-treated in an inert atmosphere under the condition that the highest temperature that the substrate reaches falls within the range of from 350.degree. to 540.degree. C. and that the thermal load coefficient( D) to be obtained by the following numerical expression (1) falls within the range of from 0.3 to 3.5. ##EQU1## where ti indicates a desired time; and Ti indicates the temperature of the substrate itself at that time.
    • 一种制造铜 - 聚酰亚胺基板的方法包括使聚酰亚胺膜的表面亲水化,向其中加入催化剂,对膜进行化学镀,在惰性气氛中进行热处理,并对其进行化学镀铜 或化学镀铜,然后进行电解镀铜。 聚酰亚胺膜的表面的亲水化是用含有水合肼和碱金属氢氧化物的水溶液或含有高锰酸盐和/或次氯酸盐的水溶液进行的,然后将催化剂施加到表面 s),然后用镍,钴镍合金或钴合金中的任何一种对表面进行化学镀以在其上形成厚度为0.01至0.1μm的镀层,并且具有 杂质含量为10重量%以下,然后将所得到的基材在惰性气氛中,在基板达到的最高温度落在350〜540℃的范围内进行热处理, 由下式(1)得到的热负荷系数(D)在0.3〜3.5的范围内。 (1)其中ti表示期望的时间; Ti表示此时的基板本身的温度。
    • 4. 发明授权
    • Process for making a two-layer film carrier
    • 制备两层薄膜载体的方法
    • US5217849A
    • 1993-06-08
    • US837104
    • 1992-02-18
    • Takeshi ChonanYoshihiro HirotaYuko Kudo
    • Takeshi ChonanYoshihiro HirotaYuko Kudo
    • H01L21/48H01L23/495H05K1/03H05K3/00H05K3/10H05K3/40
    • H05K3/002H01L21/4846H01L23/49572H05K3/4092H01L2924/0002H01L2924/3011H05K1/0346H05K2201/0154H05K2201/0166H05K3/108
    • A two-layer film carrier for TAB is made from a substrate prepared by forming a copper layer on a polyimide film by additive plating. A photoresist layer is formed on the copper layer, and another photoresist layer on the polyimide film. Both of the photoresist layers are simultaneously exposed to light through a mask applied to each of them to define a desired pattern. The exposed portions of the photoresist layer on the copper layer are subjected to development and postbaking, whereby selected portions of the copper layer are exposed. The exposed portions of the copper layer are additive plated with copper, whereby leads are formed. The exposed portions of the photoresist layer on the polyimide film are subjected to development and postbaking, whereby selected portions of the polyimide film are exposed. The remaining portions of the photoresist layer are removed from the copper layer and the underlying copper layer is etched. The exposed portions of the polyimide film are etched, and the remaining portions of the photoresist layer are removed from the polyimide film.
    • 用于TAB的双层膜载体由通过添加电镀在聚酰亚胺膜上形成铜层而制备的基板制成。 在铜层上形成光致抗蚀剂层,在聚酰亚胺膜上形成另一个光致抗蚀剂层。 通过施加到其中的每一个的掩模,两个光致抗蚀剂层同时暴露于光以限定期望的图案。 对铜层上的光致抗蚀剂层的暴露部分进行显影和后烘烤,由此露出铜层的选定部分。 铜层的露出部分用铜添加电镀,由此形成引线。 对聚酰亚胺膜上的光致抗蚀剂层的暴露部分进行显影和后烘烤,由此暴露聚酰亚胺膜的选定部分。 光致抗蚀剂层的其余部分从铜层去除并且下面的铜层被蚀刻。 蚀刻聚酰亚胺膜的露出部分,将光刻胶层的其余部分从聚酰亚胺膜中除去。
    • 7. 发明授权
    • Method for operation of flash smelting furnace
    • 闪电熔炼炉操作方法
    • US4824362A
    • 1989-04-25
    • US154355
    • 1988-02-11
    • Takayoshi KimuraYasuo OjimaYoshiaki Mori
    • Takayoshi KimuraYasuo OjimaYoshiaki Mori
    • C22B15/00C22B5/02C22B5/14C22B23/02F27D3/00F27B19/02
    • C22B5/02C22B5/14
    • A method of operating a flash smelting furnace which includes a reaction shaft, a concentrate burner disposed at the top of the reaction shaft, a settler disposed with one end thereof connected to the lower part of the reaction shaft, an uptake disposed as connected to the other end of the settler, and at least one lance pipe disposed through the ceiling of the settler between the reaction shaft and the uptake and adapted to permit forced supply of at least powdery raw materials and a reaction gas into the melt in the settler includes the steps of blowing the powdery raw materials containing only a small amount of incombustible substances and the reaction gas into the reaction shaft through the concentrate burner, blowing powdery raw materials containing at least incombustible substances through the lance pipe, and employing means capable of at least retaining the heat of the melt.
    • 一种操作闪蒸熔炼炉的方法,其包括反应轴,设置在反应轴顶部的浓缩燃烧器,设置在其一端连接到反应轴下部的沉淀器, 沉降器的另一端和至少一个穿过沉淀器的天花板的喷枪管在反应轴和吸收之间设置,并且适于允许至少粉状原料和反应气体强制供应到沉降器中的熔体中,包括 通过浓缩燃烧器将仅含有少量不燃物质的粉末原料和反应气体吹入反应轴的步骤,通过喷枪吹送至少含有不可燃物质的粉末状原料,并使用能够至少保持 熔体的热量。
    • 9. 发明授权
    • Optical branching element
    • 光分支元件
    • US4684208A
    • 1987-08-04
    • US704174
    • 1985-02-22
    • Haruo IshikawaYoshimasa Fujii
    • Haruo IshikawaYoshimasa Fujii
    • G02B6/28G02B27/10
    • G02B6/2817
    • An optical branching element mainly composed of a central linear optical transmission line and a plurality of peripheral linear optical transmission lines. They have circular sections of approximately the same diameters. The peripheral linear optical transmission lines are provided around the central linear optical transmission line such that their end surfaces are arranged on the same plane as the end surface of the central linear optical transmission line. A holder fixes these central and peripheral linear optical transmission lines on the end surface side. Semispheric reflecting concave surfaces having radii larger than the diameters of said peripheral linear optical transmission lines are formed around the contact points of the end surface of the central linear optical transmission line and the end surfaces of the linear optical transmission lines. A reflector which is provided in opposed contact with the contacting surface of the holder incorporates a plurality of semi-spherical reflecting concave surfaces as a reflecting concave surface.
    • 一种主要由中心线性光传输线和多条外围线性光传输线组成的光分路元件。 它们具有大致相同直径的圆形截面。 外围线性光传输线设置在中心线性光传输线周围,使得它们的端面布置在与中心线性光传输线的端表面相同的平面上。 支架将这些中心和外围的线性光传输线固定在端面侧。 在中心线状光传输线的端面和线状光传输线的端面的接触点的周围形成半径大于所述外围线性光传输线的直径的半球反射凹面。 与保持器的接触表面相对地设置的反射器包括多个半球形反射凹面作为反射凹面。