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81. 发明授权

US07280229B2 Examining a structure formed on a semiconductor wafer using machine learning systems 失效
标题翻译：使用机器学习系统检查在半导体晶片上形成的结构
公开(公告)号：US07280229B2
公开(公告)日：2007-10-09
申请号：US11003961
申请日：2004-12-03
申请人： Shifang Li , Junwei Bao
发明人： Shifang Li , Junwei Bao
IPC分类号： G01B11/14 , G01B11/24 , G01B7/00
CPC分类号： G03F7/70625
摘要： A structure formed on a semiconductor wafer is examined by obtaining a first diffraction signal measured from the structure using an optical metrology device. A first profile is obtained from a first machine learning system using the first diffraction signal obtained as an input to the first machine learning system. The first machine learning system is configured to generate a profile as an output for a diffraction signal received as an input. A second profile is obtained from a second machine learning system using the first profile obtained from the first machine learning system as an input to the second machine learning system. The second machine learning system is configured to generate a diffraction signal as an output for a profile received as an input. The first and second profiles include one or more parameters that characterize one or more features of the structure.
摘要翻译：通过使用光学测量装置获得从该结构测量的第一衍射信号来检查形成在半导体晶片上的结构。使用作为第一机器学习系统的输入获得的第一衍射信号从第一机器学习系统获得第一轮廓。第一机器学习系统被配置为生成作为作为输入接收的衍射信号的输出的轮廓。使用从第一机器学习系统获得的第一轮廓作为第二机器学习系统的输入，从第二机器学习系统获得第二轮廓。第二机器学习系统被配置为产生衍射信号作为作为输入接收的轮廓的输出。第一和第二简档包括表征结构的一个或多个特征的一个或多个参数。

82. 发明授权

US07064829B2 Generic interface for an optical metrology system 失效
标题翻译：光学测量系统的通用接口
公开(公告)号：US07064829B2
公开(公告)日：2006-06-20
申请号：US10394327
申请日：2003-03-20
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01B11/14 , G01B15/00 , G01N21/86
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter that characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，其表征当在结构上反射时光的强度变化，以及偏振参数，其表征当在结构上反射时光的偏振状态的变化。

83. 发明授权

US06833914B1 System and method for efficient simulation of reflectometry response from two-dimensional grating structures 有权
标题翻译：用于有效模拟来自二维光栅结构的反射测量响应的系统和方法
公开(公告)号：US06833914B1
公开(公告)日：2004-12-21
申请号：US10004495
申请日：2001-10-23
申请人： Junwei Bao , Xinhui Niu , Nickhil Jakatdar
发明人： Junwei Bao , Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01N2188
CPC分类号： G01N21/956 , G01N21/47 , G01N21/9501
摘要： The present invention relates to an efficient method for accurately simulating the integrated reflectometry response from two-dimensional grating structures using a few points. First a first and a second point are determined within an aperture located in an optical system. Next, the reflectance response of light incident at the first point and the second point are simulated. The approximated integrated reflectance response of the aperture is then determined based on the reflectance response at the first point and the second point and the weighted average of the reflectance response at the first point and the second point.
摘要翻译：本发明涉及一种用于使用几点精确地模拟来自二维光栅结构的积分反射测量响应的有效方法。首先，在位于光学系统中的孔内确定第一和第二点。接下来，模拟在第一点和第二点入射的光的反射响应。然后基于第一点和第二点处的反射响应和第一点和第二点处的反射响应的加权平均值来确定孔径的近似积分反射响应。

84. 发明授权

US06775015B2 Optical metrology of single features 有权
标题翻译：光学计量单功能
公开(公告)号：US06775015B2
公开(公告)日：2004-08-10
申请号：US10175207
申请日：2002-06-18
申请人： Joerg Bischoff , Xinhui Niu , Junwei Bao
发明人： Joerg Bischoff , Xinhui Niu , Junwei Bao
IPC分类号： G01B1102
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
摘要翻译：可以通过使用聚焦在单个特征上的光束获得单个特征的光学特征来确定形成在晶片上的单个特征的轮廓。所获得的光学特征随后可以与一组模拟的光学特征进行比较，其中每个模拟的光学特征对应于单个特征的假设轮廓，并且基于假设轮廓进行建模。

85. 发明授权

US08381140B2 Wide process range library for metrology 有权
标题翻译：用于计量的宽工艺范围库
公开(公告)号：US08381140B2
公开(公告)日：2013-02-19
申请号：US13025654
申请日：2011-02-11
申请人： John J. Hench , Wen Jin , Junwei Bao
发明人： John J. Hench , Wen Jin , Junwei Bao
IPC分类号： G06F17/50
CPC分类号： G03F7/70491 , G03F7/70625 , H01L22/12
摘要： Methods of generating wide process range libraries for metrology are described. For example, a method includes generating a first library having a first process range for a first parameter. A second library is generated having a second process range for the first parameter. The second process range is overlapping with the first process range. The second library is stitched to the first library to generate a third library having a third process range for the first parameter. The third process range is wider than each of the first and second process ranges.
摘要翻译：描述了生成用于度量的广泛过程范围库的方法。例如，一种方法包括生成具有第一参数的第一处理范围的第一库。生成具有第一参数的第二处理范围的第二库。第二个处理范围与第一个处理范围重叠。第二个库缝合到第一个库以生成第三个库，该第三个库具有第一个参数的第三个处理范围。第三处理范围比第一和第二处理范围的宽。

86. 发明授权

US07586623B2 Optical metrology of single features 失效
标题翻译：光学计量单功能
公开(公告)号：US07586623B2
公开(公告)日：2009-09-08
申请号：US12127640
申请日：2008-05-27
申请人： Joerg Bischoff , Xinhui Niu , Junwei Bao
发明人： Joerg Bischoff , Xinhui Niu , Junwei Bao
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
摘要翻译：可以通过使用聚焦在单个特征上的光束获得单个特征的光学特征来确定形成在晶片上的单个特征的轮廓。所获得的光学特征随后可以与一组模拟的光学特征进行比较，其中每个模拟的光学特征对应于单个特征的假设轮廓，并且基于假设轮廓进行建模。

87. 发明授权

US07469192B2 Parallel profile determination for an optical metrology system 失效
标题翻译：光学测量系统的平行轮廓确定
公开(公告)号：US07469192B2
公开(公告)日：2008-12-23
申请号：US11485046
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G06F19/00 , G01B11/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：包括衍射信号处理器，衍射信号分配器和多个轮廓搜索服务器，用于处理从一个或多个晶片上形成的多个结构的光学测量测量的晶圆结构轮廓确定的请求的系统。衍射信号处理器被配置为获得多个结构的多个测量的衍射信号。衍射信号分配器耦合到衍射信号处理器。衍射信号处理器被配置为将多个测量的衍射信号传输到衍射信号分配器。多个轮廓搜索服务器耦合到衍射信号分配器。衍射信号分配器被配置为将多个测量的衍射信号分布到多个简档搜索服务器。轮廓搜索服务器被配置为并行处理多个测量的衍射信号，以确定与多个测量的衍射信号相对应的多个结构的轮廓。

88. 发明申请

US20080255801A1 Optical metrology using a support vector machine with simulated diffraction signal inputs 失效
$Optical metrology using a support vector machine with simulated diffraction signal inputs$
标题翻译：光学计量学使用带有模拟衍射信号输入的支持向量机
公开(公告)号：US20080255801A1
公开(公告)日：2008-10-16
申请号：US11786870
申请日：2007-04-12
申请人： Wen Jin , Junwei Bao , Shifang Li
发明人： Wen Jin , Junwei Bao , Shifang Li
IPC分类号： G06F17/18 , G01B11/30
CPC分类号： G01B11/24 , G03F7/70625
摘要： A structure formed on a semiconductor wafer can be examined using a support vector machine. A profile model of the structure is obtained. The profile model is defined by profile parameters that characterize the geometric shape of the structure. A set of values for the profile parameters is obtained. A set of simulated diffraction signals is generated using the set of values for the profile parameters, each simulated diffraction signal characterizing the behavior of light diffracted from the structure. The support vector machine is trained using the set of simulated diffraction signals as inputs to the support vector machine and the set of values for the profile parameters as expected outputs of the support vector machine. A measured diffraction signal off the structure is obtained. The measured diffraction signal is inputted into the trained support vector machine. Values of profile parameters of the structure are obtained as an output from the trained support vector machine.
摘要翻译：可以使用支持向量机来检查形成在半导体晶片上的结构。获得结构的轮廓模型。轮廓模型由表征结构几何形状的轮廓参数定义。获得一组轮廓参数的值。使用一组轮廓参数的值来生成一组模拟衍射信号，每个模拟衍射信号表征从结构衍射的光的行为。使用一组模拟衍射信号作为支持向量机的输入和用于轮廓参数的值的集合来支持支持向量机作为支持向量机的预期输出。获得离开结构的测量的衍射信号。测量的衍射信号被输入到经过训练的支持向量机中。获得结构的轮廓参数的值作为训练支持向量机的输出。

89. 发明授权

US07355728B2 Optical metrology model optimization for repetitive structures 有权
标题翻译：重复结构的光学计量学模型优化
公开(公告)号：US07355728B2
公开(公告)日：2008-04-08
申请号：US11155406
申请日：2005-06-16
申请人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G01B11/14
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

90. 发明申请

US20080007738A1 Evaluating a profile model to characterize a structure to be examined using optical metrology 失效
标题翻译：评估轮廓模型以表征使用光学计量学检查的结构
公开(公告)号：US20080007738A1
公开(公告)日：2008-01-10
申请号：US11484459
申请日：2006-07-10
申请人： Jeffrey A. Chard , Junwei Bao , Youxian Wen , Sanjay Yedur
发明人： Jeffrey A. Chard , Junwei Bao , Youxian Wen , Sanjay Yedur
IPC分类号： G01B11/14
CPC分类号： G01B11/24
摘要： A profile model to characterize a structure to be examined using optical metrology is evaluated by displaying a set of profile parameters that characterizes the profile model. Each profile parameter has a range of values for the profile parameter. For each profile parameter having a range of values, an adjustment tool is displayed for selecting a value for the profile parameter within the range of values. A measured diffraction signal, which was measured using an optical metrology tool, is displayed. A simulated diffraction signal, which was generated based on the values of the profile parameters selected using the adjustment tools for the profile parameters, is displayed. The simulated diffraction signal is overlaid with the measured diffraction signal.
摘要翻译：通过显示表征轮廓模型的一组轮廓参数来评估使用光学计量学来表征待检查结构的轮廓模型。每个配置文件参数都有一个范围的配置文件参数的值。对于具有值范围的每个轮廓参数，显示调整工具，用于在值范围内选择轮廓参数的值。显示使用光学测量工具测量的测量的衍射信号。显示基于使用用于轮廓参数的调整工具选择的轮廓参数的值而产生的模拟衍射信号。模拟衍射信号与测得的衍射信号重叠。

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