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1. 发明授权

US07450232B2 Generic interface for an optical metrology system 失效
标题翻译：光学测量系统的通用接口
公开(公告)号：US07450232B2
公开(公告)日：2008-11-11
申请号：US11856651
申请日：2007-09-17
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01B11/30 , G01B11/14 , G01B7/00 , G01B15/00 , G01N21/86 , G01V8/00 , G06F15/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter, a first polarization parameter, a second polarization parameter, and a third polarization parameter.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，第一偏振参数，第二偏振参数和第三偏振参数。

2. 发明申请

US20080037017A1 GENERIC INTERFACE FOR AN OPTICAL METROLOGY SYSTEM 失效
标题翻译：光学计量系统的通用接口
公开(公告)号：US20080037017A1
公开(公告)日：2008-02-14
申请号：US11856651
申请日：2007-09-17
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01N21/86 , G06F15/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter, a first polarization parameter, a second polarization parameter, and a third polarization parameter.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，第一偏振参数，第二偏振参数和第三偏振参数。

3. 发明授权

US07064829B2 Generic interface for an optical metrology system 失效
标题翻译：光学测量系统的通用接口
公开(公告)号：US07064829B2
公开(公告)日：2006-06-20
申请号：US10394327
申请日：2003-03-20
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01B11/14 , G01B15/00 , G01N21/86
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter that characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，其表征当在结构上反射时光的强度变化，以及偏振参数，其表征当在结构上反射时光的偏振状态的变化。

4. 发明申请

US20060244966A1 Generic interface for an optical metrology system 有权
标题翻译：光学测量系统的通用接口
公开(公告)号：US20060244966A1
公开(公告)日：2006-11-02
申请号：US11471892
申请日：2006-06-20
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the generic interface and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter that characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在通用接口和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，其表征当在结构上反射时光的强度变化，以及偏振参数，其表征当在结构上反射时光的偏振状态的变化。

5. 发明授权

US07271902B2 Generic interface for an optical metrology system 有权
标题翻译：光学测量系统的通用接口
公开(公告)号：US07271902B2
公开(公告)日：2007-09-18
申请号：US11471892
申请日：2006-06-20
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01B11/30 , G01B11/14 , G01B7/00 , G01B15/00 , G01N21/86 , G01V8/00 , G06F15/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter chat characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，其表征在结构上反射时光的强度变化，以及偏振参数，其表征当在结构上反射时光的偏振状态的变化。

6. 发明授权

US06833914B1 System and method for efficient simulation of reflectometry response from two-dimensional grating structures 有权
标题翻译：用于有效模拟来自二维光栅结构的反射测量响应的系统和方法
公开(公告)号：US06833914B1
公开(公告)日：2004-12-21
申请号：US10004495
申请日：2001-10-23
申请人： Junwei Bao , Xinhui Niu , Nickhil Jakatdar
发明人： Junwei Bao , Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01N2188
CPC分类号： G01N21/956 , G01N21/47 , G01N21/9501
摘要： The present invention relates to an efficient method for accurately simulating the integrated reflectometry response from two-dimensional grating structures using a few points. First a first and a second point are determined within an aperture located in an optical system. Next, the reflectance response of light incident at the first point and the second point are simulated. The approximated integrated reflectance response of the aperture is then determined based on the reflectance response at the first point and the second point and the weighted average of the reflectance response at the first point and the second point.
摘要翻译：本发明涉及一种用于使用几点精确地模拟来自二维光栅结构的积分反射测量响应的有效方法。首先，在位于光学系统中的孔内确定第一和第二点。接下来，模拟在第一点和第二点入射的光的反射响应。然后基于第一点和第二点处的反射响应和第一点和第二点处的反射响应的加权平均值来确定孔径的近似积分反射响应。

7. 发明授权

US07505153B2 Model and parameter selection for optical metrology 有权
标题翻译：光学计量学的模型和参数选择
公开(公告)号：US07505153B2
公开(公告)日：2009-03-17
申请号：US12030166
申请日：2008-02-12
申请人： Vi Vuong , Emmanuel Drege , Junwei Bao , Srinivas Doddi , Xinhui Niu , Nickhil Jakatdar
发明人： Vi Vuong , Emmanuel Drege , Junwei Bao , Srinivas Doddi , Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01B11/14 , G01B15/00 , G01B7/00 , G01N21/86 , G01V8/00 , G06F15/00 , G01R31/26 , H01L21/66
CPC分类号： G03F7/70616 , G03F7/705 , G03F7/70625
摘要： A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of geometric parameters is selected to a set of optimization parameters. The number of optimization parameters within the set of optimization parameters is less than the number of geometric parameters within the set of geometric parameters. A set of selected optimization parameters is selected from the set of optimization parameters. The parameters of the set of selected geometric parameters are used as parameters of the selected profile model. The selected profile model is tested against one or more termination criteria.
摘要翻译：选择用于晶片中结构的光学测量的轮廓模型，轮廓模型具有与结构的尺寸相关联的一组几何参数。选择几组参数集合到一组优化参数中。该组优化参数内的优化参数的数量小于该组几何参数内的几何参数的数量。从一组优化参数中选择一组选定的优化参数。所选择的几何参数集合中的参数被用作所选轮廓模型的参数。根据一个或多个终止标准测试所选的配置文件模型。

8. 发明申请

US20080151269A1 MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY 有权
标题翻译：光学计量学的模型和参数选择
公开(公告)号：US20080151269A1
公开(公告)日：2008-06-26
申请号：US12030166
申请日：2008-02-12
申请人： Vi Vuong , Emmanuel Drege , Junwei Bao , Srinivas Doddi , Xinhui Niu , Nickhil Jakatdar
发明人： Vi Vuong , Emmanuel Drege , Junwei Bao , Srinivas Doddi , Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01B11/14
CPC分类号： G03F7/70616 , G03F7/705 , G03F7/70625
摘要： A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of geometric parameters is selected to a set of optimization parameters. The number of optimization parameters within the set of optimization parameters is less than the number of geometric parameters within the set of geometric parameters. A set of selected optimization parameters is selected from the set of optimization parameters. The parameters of the set of selected geometric parameters are used as parameters of the selected profile model. The selected profile model is tested against one or more termination criteria.
摘要翻译：选择用于晶片中结构的光学测量的轮廓模型，轮廓模型具有与结构的尺寸相关联的一组几何参数。选择几组参数集合到一组优化参数中。该组优化参数内的优化参数的数量小于该组几何参数内的几何参数的数量。从一组优化参数中选择一组选定的优化参数。所选择的几何参数集合中的参数被用作所选轮廓模型的参数。根据一个或多个终止标准测试所选的配置文件模型。

9. 发明授权

US07136796B2 Generation and use of integrated circuit profile-based simulation information 有权
标题翻译：基于集成电路配置文件的仿真信息的生成与使用
公开(公告)号：US07136796B2
公开(公告)日：2006-11-14
申请号：US10087069
申请日：2002-02-28
申请人： Nickhil Jakatdar , Xinhui Niu , Junwei Bao
发明人： Nickhil Jakatdar , Xinhui Niu , Junwei Bao
IPC分类号： G06G7/62
CPC分类号： G06F17/5009 , G06F2217/80
摘要： An exemplary method and system for generating integrated circuit (IC) simulation information regarding the effect of design and fabrication process decisionn includes creating and using a data store of profile-based information comprising metrology signal, structure profile data, process control parameters, and IC simulation attributes.An exemplary method and system for generating a simulation data store using signals off test gratings that model the effect of an IC design and/or fabrication process includes creating and using a simulation data store generated using test gratings that model the geometries of the IC interconnects. The interconnect simulation data store may be used in-line for monitoring electrical and thermal properties of an IC device during fabrication. Other embodiments include utilizing a metrology simulator and various combinations of a fabrication process simulator, a device simulator, and/or circuit simulator.
摘要翻译：用于生成关于设计和制造过程决定的影响的集成电路（IC）模拟信息的示例性方法和系统包括创建和使用基于简档的信息的数据存储，其包括计量信号，结构简档数据，过程控制参数和IC模拟属性用于使用模拟IC设计和/或制造过程的影响的测试光栅产生模拟数据存储的示例性方法和系统包括创建和使用使用对IC互连的几何形状进行建模的测试光栅产生的模拟数据存储。互连仿真数据存储器可以在线使用以监视IC器件在制造期间的电和热特性。其他实施例包括利用测量模拟器和制造工艺模拟器，装置模拟器和/或电路模拟器的各种组合。

10. 发明授权

US07580823B2 Generation and use of integrated circuit profile-based simulation information 有权
标题翻译：生成和使用基于集成电路配置文件的仿真信息
公开(公告)号：US07580823B2
公开(公告)日：2009-08-25
申请号：US11595358
申请日：2006-11-09
申请人： Nickhil Jakatdar , Xinhui Niu , Junwei Bao
发明人： Nickhil Jakatdar , Xinhui Niu , Junwei Bao
IPC分类号： G06G7/62
CPC分类号： G06F17/5009 , G06F2217/80
摘要： The invention includes a method and a system for generating integrated circuit (IC) simulation information regarding the effect of design and fabrication process decisions. One embodiment includes creating and using a data store of profile-based information comprising metrology signal, structure profile data, process control parameters, and IC simulation attributes. Another embodiment includes creation and use of a simulation data store generated using test gratings that model the geometries of the IC interconnects. The interconnect simulation data store may be used in-line for monitoring electrical and thermal properties of an IC device during fabrication. Other embodiments include methods and systems for generating and using simulation data stores utilizing a metrology simulator and various combinations of a fabrication process simulator, a device simulator, and/or circuit simulator. Information from the simulation data store may be used in-line in-situ during the design or fabrication process steps.
摘要翻译：本发明包括一种用于生成关于设计和制造过程决定的影响的集成电路（IC）模拟信息的方法和系统。一个实施例包括创建和使用基于简档的信息的数据存储，其包括测量信号，结构简档数据，过程控制参数和IC仿真属性。另一个实施例包括使用对IC互连的几何形状进行建模的测试光栅产生的模拟数据存储的创建和使用。互连仿真数据存储器可以在线使用以监视IC器件在制造期间的电和热特性。其他实施例包括利用计量学模拟器和制造过程模拟器，装置模拟器和/或电路模拟器的各种组合来生成和使用仿真数据存储器的方法和系统。来自仿真数据存储器的信息可以在设计或制造工艺步骤期间在线原位使用。

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