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1. 发明申请

US20060290947A1 Optical metrology model optimization for repetitive structures 有权
标题翻译：重复结构的光学计量学模型优化
公开(公告)号：US20060290947A1
公开(公告)日：2006-12-28
申请号：US11155406
申请日：2005-06-16
申请人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G01B11/14
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

2. 发明申请

US20080195342A1 OPTICAL METROLOGY MODEL OPTIMIZATION FOR REPETITIVE STRUCTURES 审中-公开
标题翻译：用于重复结构的光学计量模型优化
公开(公告)号：US20080195342A1
公开(公告)日：2008-08-14
申请号：US12099735
申请日：2008-04-08
申请人： Shifang LI , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang LI , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G06F19/00
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

3. 发明申请

US20080015812A1 Parallel profile determination for an optical metrology system 失效
公开(公告)号：US20080015812A1
公开(公告)日：2008-01-17
申请号：US11485046
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qui
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qui
IPC分类号： G01B11/24 , G06F19/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

4. 发明授权

US07355728B2 Optical metrology model optimization for repetitive structures 有权
标题翻译：重复结构的光学计量学模型优化
公开(公告)号：US07355728B2
公开(公告)日：2008-04-08
申请号：US11155406
申请日：2005-06-16
申请人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
发明人： Shifang Li , Junwei Bao , Hong Qui , Victor Liu
IPC分类号： G01B11/14
CPC分类号： G03F7/70625 , G01B11/24 , G03F7/705
摘要： An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters. When the calculated values of the one or more termination criteria do not match the one or more set termination criteria, the selection of the one or more profile parameters and/or the characterization of the profile shape features of the repetitive structure are revised.
摘要翻译：通过使用一个或多个选择标准选择一个或多个轮廓参数来优化用于重复结构的光学计量学模型。设置一个或多个终止标准，所述一个或多个终止标准包括光学测量模型的稳定性的测量。使用一个或多个所选择的轮廓参数来表征重复结构的轮廓形状特征。光学测量模型使用一组或多个所选配置文件参数的值进行优化。使用优化的光学测量模型和一个或多个测量的衍射信号来确定重复结构的轮廓的一个或多个轮廓参数。使用一个或多个确定的简档参数来计算一个或多个终止标准的值。当一个或多个终止标准的计算值与一个或多个设定的终止标准不匹配时，修改重复结构的一个或多个简档参数的选择和/或轮廓形状特征的表征。

5. 外观设计

USD539951S1 Light for and attachment to a cell phone 有权
标题翻译：照明和附件到手机
公开(公告)号：USD539951S1
公开(公告)日：2007-04-03
申请号：US29256171
申请日：2006-03-16
申请人： Yun Hong Qui
设计人： Yun Hong Qui

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