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1. 发明申请

US20120210289A1 WIDE PROCESS RANGE LIBRARY FOR METROLOGY 有权
标题翻译：广义的方程式范围图
公开(公告)号：US20120210289A1
公开(公告)日：2012-08-16
申请号：US13025654
申请日：2011-02-11
申请人： John J. Hench , Wen Jin , Junwei Bao
发明人： John J. Hench , Wen Jin , Junwei Bao
IPC分类号： G06F17/50
CPC分类号： G03F7/70491 , G03F7/70625 , H01L22/12
摘要： Methods of generating wide process range libraries for metrology are described. For example, a method includes generating a first library having a first process range for a first parameter. A second library is generated having a second process range for the first parameter. The second process range is overlapping with the first process range. The second library is stitched to the first library to generate a third library having a third process range for the first parameter. The third process range is wider than each of the first and second process ranges.
摘要翻译：描述了生成用于度量的广泛过程范围库的方法。例如，一种方法包括生成具有第一参数的第一处理范围的第一库。生成具有第一参数的第二处理范围的第二库。第二个处理范围与第一个处理范围重叠。第二个库缝合到第一个库以生成第三个库，该第三个库具有第一个参数的第三个处理范围。第三处理范围比第一和第二处理范围的宽。

2. 发明授权

US08381140B2 Wide process range library for metrology 有权
标题翻译：用于计量的宽工艺范围库
公开(公告)号：US08381140B2
公开(公告)日：2013-02-19
申请号：US13025654
申请日：2011-02-11
申请人： John J. Hench , Wen Jin , Junwei Bao
发明人： John J. Hench , Wen Jin , Junwei Bao
IPC分类号： G06F17/50
CPC分类号： G03F7/70491 , G03F7/70625 , H01L22/12
摘要： Methods of generating wide process range libraries for metrology are described. For example, a method includes generating a first library having a first process range for a first parameter. A second library is generated having a second process range for the first parameter. The second process range is overlapping with the first process range. The second library is stitched to the first library to generate a third library having a third process range for the first parameter. The third process range is wider than each of the first and second process ranges.
摘要翻译：描述了生成用于度量的广泛过程范围库的方法。例如，一种方法包括生成具有第一参数的第一处理范围的第一库。生成具有第一参数的第二处理范围的第二库。第二个处理范围与第一个处理范围重叠。第二个库缝合到第一个库以生成第三个库，该第三个库具有第一个参数的第三个处理范围。第三处理范围比第一和第二处理范围的宽。

3. 发明申请

US20120323356A1 METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANALYSIS USING OPTICAL CRITICAL DIMENSION (OCD) METROLOGY 有权
标题翻译：使用光学关键尺寸（OCD）方法优化结构分析的光学参数模型的方法
公开(公告)号：US20120323356A1
公开(公告)日：2012-12-20
申请号：US13164398
申请日：2011-06-20
申请人： Thaddeus G. Dziura , Yung-Ho Chuang , Bin-Ming Benjamin Tsai , Xuefeng Liu , John J. Hench
发明人： Thaddeus G. Dziura , Yung-Ho Chuang , Bin-Ming Benjamin Tsai , Xuefeng Liu , John J. Hench
IPC分类号： G06F19/00 , G06F17/50
CPC分类号： G01B11/24 , G01B2210/56 , G01N21/47 , G01N21/956 , G01N2021/95615 , G03F7/70625 , G06F17/5009
摘要： Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.
摘要翻译：描述了使用光学关键尺寸度量结构分析的光学参数模型的优化。一种方法包括确定适合结构参数的第一光学模型。第一个光学模型拟合是基于结构的第一个模型的数量域。对于第一量的量域确定第一近场光响应，并且针对量的第二个不同数量的量确定第二近场光响应。比较第一和第二近场光响应，以定位用于结构参数的高光场强度的公共区域。该结构的第一个模型被修改以提供第二个不同的结构模型。基于结构的第二个模型，确定结构参数的第二个不同的光学模型拟合。

4. 发明授权

US10325004B1 Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology 有权
公开(公告)号：US10325004B1
公开(公告)日：2019-06-18
申请号：US15058826
申请日：2016-03-02
申请人： Thaddeus G. Dziura , Yung-Ho Chuang , Bin-Ming Benjamin Tsai , Xuefeng Liu , John J. Hench
发明人： Thaddeus G. Dziura , Yung-Ho Chuang , Bin-Ming Benjamin Tsai , Xuefeng Liu , John J. Hench
IPC分类号： H01L21/66 , G01R31/26 , G01B11/14 , G01B11/27 , G06F17/11 , G01N21/47 , G01N21/956 , G01B11/06 , G06F17/50
摘要： Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.

5. 发明授权

US09523800B2 Computation efficiency by iterative spatial harmonics order truncation 有权
标题翻译：通过迭代空间谐波顺序截断计算效率
公开(公告)号：US09523800B2
公开(公告)日：2016-12-20
申请号：US12785310
申请日：2010-05-21
申请人： Andrei Veldman , John J. Hench
发明人： Andrei Veldman , John J. Hench
IPC分类号： G06F7/60 , G06G7/48 , G02B5/18
CPC分类号： G02B5/1847
摘要： A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of spatial harmonics orders for a grating structure. The set of spatial harmonics orders is truncated to provide a first truncated set of spatial harmonics orders based on a first pattern. The first truncated set of spatial harmonics orders is modified by an iterative process to provide a second truncated set of spatial harmonics orders based on a second pattern, the second pattern different from the first pattern. Finally, a simulated spectrum is provided based on the second truncated set of spatial harmonics orders.
摘要翻译：描述了一种提高光学测量中衍射信号的计算效率的方法。该方法包括模拟光栅结构的一组空间谐波阶数。空间谐波阶的集合被截断以提供基于第一模式的第一截断的空间谐波级的集合。通过迭代过程修改第一个截断的空间谐波级组，以提供基于第二模式的第二截距空间谐波级的集合，第二模式不同于第一模式。最后，基于空间谐波次序的第二截断组提供了模拟频谱。

6. 发明授权

US08760649B1 Model-based metrology using tesselation-based discretization 失效
标题翻译：基于模型的计量采用基于镶嵌的离散化方法
公开(公告)号：US08760649B1
公开(公告)日：2014-06-24
申请号：US12074761
申请日：2008-03-05
申请人： Andrei Veldman , John J. Hench
发明人： Andrei Veldman , John J. Hench
IPC分类号： G01N21/00 , G01N15/02 , G01N15/14 , G01N21/53
CPC分类号： G01N15/0205 , G01N15/1459 , G01N21/53 , G03F7/70625 , G06T17/20
摘要： A novel technique for model-based metrology. A geometry of structure to be measured on a surface of a substrate is received. A tessellation of the geometry of the structure is produced. The tessellation is used to determine a vertical discretization and a horizontal discretization so as to generate a discrete model for the geometry, and scatterometry computations are performed using the discrete model. Other embodiments, aspects and features are also disclosed.
摘要翻译：一种基于模型的计量技术。接收在基板的表面上要测量的结构的几何形状。产生了结构几何形状的细分。镶嵌用于确定垂直离散化和水平离散化，以便为几何生成离散模型，并使用离散模型进行散点计算。还公开了其它实施例，方面和特征。

7. 发明申请

US20120022836A1 METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SCATTEROMETRY MODEL 有权
标题翻译：自动确定最佳参数化模型的方法
公开(公告)号：US20120022836A1
公开(公告)日：2012-01-26
申请号：US12841932
申请日：2010-07-22
申请人： Jason Ferns , John J. Hench , Serguei Komarov , Thaddeus Dziura
发明人： Jason Ferns , John J. Hench , Serguei Komarov , Thaddeus Dziura
IPC分类号： G06F17/16
CPC分类号： G03F7/70616 , G03F7/70625
摘要： Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.
摘要翻译：提供了用于分析具有未知参数的样本衍射结构的散射测量模型的优化参数化的自动确定。预处理器根据多个浮动模型参数确定一组模型参数，该模型参数可以基于从相对于每个参数的测量光谱信息的雅可比确定的每个参数的相对精度，在散射仪模型中合理地浮动。以考虑组合的参数之间的相关性的方式确定每个参数的相对精度。

8. 发明申请

US20110288822A1 COMPUTATION EFFICIENCY BY ITERATIVE SPATIAL HARMONICS ORDER TRUNCATION 有权
标题翻译：通过迭代空间和谐秩序调整的计算效率
公开(公告)号：US20110288822A1
公开(公告)日：2011-11-24
申请号：US12785310
申请日：2010-05-21
申请人： Andrei Veldman , John J. Hench
发明人： Andrei Veldman , John J. Hench
IPC分类号： G06F15/00
CPC分类号： G02B5/1847
摘要： A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of spatial harmonics orders for a grating structure. The set of spatial harmonics orders is truncated to provide a first truncated set of spatial harmonics orders based on a first pattern. The first truncated set of spatial harmonics orders is modified by an iterative process to provide a second truncated set of spatial harmonics orders based on a second pattern, the second pattern different from the first pattern. Finally, a simulated spectrum is provided based on the second truncated set of spatial harmonics orders.
摘要翻译：描述了一种提高光学测量中衍射信号的计算效率的方法。该方法包括模拟光栅结构的一组空间谐波阶数。空间谐波阶的集合被截断以提供基于第一模式的第一截断的空间谐波级的集合。通过迭代过程修改第一个截断的空间谐波级组，以提供基于第二模式的第二截距空间谐波级的集合，第二模式不同于第一模式。最后，基于空间谐波次序的第二截断组提供了模拟频谱。

9. 发明授权

US07796544B2 Method and system for providing an analog front end for multiline transmission in communication systems 有权
标题翻译：用于在通信系统中提供用于多线传输的模拟前端的方法和系统
公开(公告)号：US07796544B2
公开(公告)日：2010-09-14
申请号：US10517075
申请日：2003-06-06
申请人： John J. Hench
发明人： John J. Hench
IPC分类号： H04L5/14
CPC分类号： H04L27/0002 , H04L25/0248 , H04L25/03012 , H04L27/2607 , H04L2025/03414 , H04L2025/03445 , H04L2025/03598
摘要： A method and system for providing an analog front end for multiline transmission in communications systems are described. A transceiver circuit (1100) is configured to reduce line noise by providing a coupled transmitter (1106), receiver (1106), prebalance circuit (1110), and transformer (1220) further coupled to a communication line (1264) external to the transceiver circuit. A hybrid (HY) input stage (1204) coupled to the prebalance circuit provides high frequency compensation by including a first high pass circuit coupled to the HY stage inputs, wherein the high pass circuit includes two parallel passes, each with a capacitor (C1,C5) in series with a resistor (R9,R10). A receiver input stage (RX) (RX) (1206) further coupled to the prebalance circuit provides low frequency compensation by including a second high pass circuit coupled to the RX stage inputs, wherein the high pass circuit includes two parallel passes, one with a capacitor (C3) and one with a capacitor (C7) in series with a resistor (R13). Lastly, a summing junction (1208) coupled to the HY stage (1204) and RX stage (1206) subtracts the HY stage output from the RX stage output providing a filtered incoming analog signal for post processing.
摘要翻译：描述了一种在通信系统中提供用于多线传输的模拟前端的方法和系统。收发器电路（1100）被配置为通过提供还耦合到收发器外部的通信线路（1264）的耦合发射机（1106），接收机（1106），预保持电路（1110）和变压器（1220）来减少线路噪声电路。耦合到前置电路的混合（HY）输入级（1204）通过包括耦合到HY级输入的第一高通电路来提供高频补偿，其中高通电路包括两个并联通道，每个具有电容器（C1， C5）与电阻器（R9，R10）串联。进一步耦合到前置电路电路的接收器输入级（RX）（RX）（RX）（1206）通过包括耦合到RX级输入的第二高通电路来提供低频补偿，其中高通电路包括两个并行通路，电容器（C3）和一个与电阻器（R13）串联的电容器（C7）。最后，耦合到HY级（1204）和RX级（1206）的求和结（1208）从RX级输出中减去HY级输出，提供滤波的输入模拟信号用于后处理。

10. 发明授权

US09310296B2 Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology 有权
标题翻译：使用光学关键尺寸（OCD）计量优化用于结构分析的光学参数模型
公开(公告)号：US09310296B2
公开(公告)日：2016-04-12
申请号：US13164398
申请日：2011-06-20
申请人： Thaddeus G. Dziura , Yung-Ho Chuang , Bin-ming Benjamin Tsai , Xuefeng Liu , John J. Hench
发明人： Thaddeus G. Dziura , Yung-Ho Chuang , Bin-ming Benjamin Tsai , Xuefeng Liu , John J. Hench
IPC分类号： G05B13/00 , G01N21/47 , G01B11/24 , G03F7/20 , G01N21/956 , G06F17/50
CPC分类号： G01B11/24 , G01B2210/56 , G01N21/47 , G01N21/956 , G01N2021/95615 , G03F7/70625 , G06F17/5009
摘要： Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.
摘要翻译：描述了使用光学关键尺寸度量结构分析的光学参数模型的优化。一种方法包括确定适合结构参数的第一光学模型。第一个光学模型拟合是基于结构的第一个模型的数量域。对于第一量的量域确定第一近场光响应，并且针对量的第二个不同数量的量确定第二近场光响应。比较第一和第二近场光响应，以定位用于结构参数的高光场强度的公共区域。该结构的第一个模型被修改以提供第二个不同的结构模型。基于结构的第二个模型，确定结构参数的第二个不同的光学模型拟合。

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