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    • 81. 发明授权
    • Beam column for charged particle beam device
    • 用于带电粒子束装置的梁柱
    • US06576908B1
    • 2003-06-10
    • US09432543
    • 1999-11-03
    • Dieter WinklerHans-Peter FeuerbaumRalf Degenhardt
    • Dieter WinklerHans-Peter FeuerbaumRalf Degenhardt
    • H01J3730
    • H01J37/301H01J37/1472H01J2237/188H01J2237/25
    • A charged particle beam column with a first vacuum chamber further comprises a particle source for providing a beam of charged particles and a multi aperture unit with at least two beam defining apertures for shaping the beam of charged particles. The particle source and the beam defining apertures are located within the first vacuum chamber. A separation unit for isolating a second vacuum chamber from the first vacuum chamber whereby the separation unit comprises a path aperture for the charged particle beam is arranged between the first and second vacuum chamber. A first deflecting unit directs the beam of charged particles through one of the beam defining apertures and a second deflecting unit directs the beam of charged particles through the path aperture.
    • 具有第一真空室的带电粒子束柱还包括用于提供带电粒子束的粒子源和具有用于成形带电粒子束的至少两个光束限定孔的多孔单元。 颗粒源和光束限定孔位于第一真空室内。 用于将第二真空室与第一真空室隔离的分离单元,由此分离单元包括用于带电粒子束的路径孔,设置在第一和第二真空室之间。 第一偏转单元将带电粒子束引导通过光束限定孔中的一个,并且第二偏转单元将带电粒子束引导通过路径孔。