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1. 发明授权

US07045781B2 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US07045781B2
公开(公告)日：2006-05-16
申请号：US10759392
申请日：2004-01-16
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： H01J37/28
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的主束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主光束的准直之间切换适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度，用于聚集所述带电粒子的一次束的聚光透镜，用于偏转所述带电粒子的一次束的扫描装置用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

2. 发明授权

US07274018B2 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US07274018B2
公开(公告)日：2007-09-25
申请号：US11396751
申请日：2006-04-03
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： H01J37/28
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

3. 发明申请

US20060192145A1 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US20060192145A1
公开(公告)日：2006-08-31
申请号：US11396751
申请日：2006-04-03
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： G21G5/00
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

4. 发明授权

US06943349B2 Multi beam charged particle device 有权
标题翻译：多光束带电粒子装置
公开(公告)号：US06943349B2
公开(公告)日：2005-09-13
申请号：US10258869
申请日：2001-04-27
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： G01Q30/02 , H01J37/04 , H01J37/09 , H01J37/26 , G21K1/08 , G01N23/00 , H01J3/14 , H01J37/28
CPC分类号： H01J37/04 , H01J37/09 , H01J37/266
摘要： The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.
摘要翻译：本发明提供了一种用于带电粒子束装置的改进的柱。柱包括具有多个孔的孔板，以产生多个带电粒子束和偏转器，以影响带电粒子束，使得每个束似乎来自不同的源。此外，使用物镜以将带电粒子束聚焦到样本上。由于偏转器，在样品的表面上产生了源的多个图像，从而所有图像可以用于并行数据采集。因此，数据采集的速度增加。关于物镜的聚焦特性，带电粒子束基本上可以被视为不会相互影响的独立的粒子束。因此，每个光束基本上提供与常规带电粒子束装置的光束相同的分辨率。

5. 发明授权

US06576908B1 Beam column for charged particle beam device 有权
标题翻译：用于带电粒子束装置的梁柱
公开(公告)号：US06576908B1
公开(公告)日：2003-06-10
申请号：US09432543
申请日：1999-11-03
申请人： Dieter Winkler , Hans-Peter Feuerbaum , Ralf Degenhardt
发明人： Dieter Winkler , Hans-Peter Feuerbaum , Ralf Degenhardt
IPC分类号： H01J3730
CPC分类号： H01J37/301 , H01J37/1472 , H01J2237/188 , H01J2237/25
摘要： A charged particle beam column with a first vacuum chamber further comprises a particle source for providing a beam of charged particles and a multi aperture unit with at least two beam defining apertures for shaping the beam of charged particles. The particle source and the beam defining apertures are located within the first vacuum chamber. A separation unit for isolating a second vacuum chamber from the first vacuum chamber whereby the separation unit comprises a path aperture for the charged particle beam is arranged between the first and second vacuum chamber. A first deflecting unit directs the beam of charged particles through one of the beam defining apertures and a second deflecting unit directs the beam of charged particles through the path aperture.
摘要翻译：具有第一真空室的带电粒子束柱还包括用于提供带电粒子束的粒子源和具有用于成形带电粒子束的至少两个光束限定孔的多孔单元。颗粒源和光束限定孔位于第一真空室内。用于将第二真空室与第一真空室隔离的分离单元，由此分离单元包括用于带电粒子束的路径孔，设置在第一和第二真空室之间。第一偏转单元将带电粒子束引导通过光束限定孔中的一个，并且第二偏转单元将带电粒子束引导通过路径孔。

6. 发明授权

US06730907B1 Charged particle device 有权
标题翻译：带电粒子装置
公开(公告)号：US06730907B1
公开(公告)日：2004-05-04
申请号：US10031001
申请日：2002-07-16
申请人： Hans-Peter Feuerbaum , Dieter Winkler , Dror Kella
发明人： Hans-Peter Feuerbaum , Dieter Winkler , Dror Kella
IPC分类号： H01J37244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/0535
摘要： The invention provides a charged particle device (1) comprising: a particle source (2) for providing a charged particle beam (4), and objective lens (10) for directing the particle beam onto a specimen (8), said objective lens (10) having an optical axis (6); a particle mirror (14) located on the optical axis (6) of the objective lens (10), said particle mirror having a front surface, a back surface, a drift region (26) reaching from the back surface to the front surface for letting the charged particle beam pass from the back surface to the front surface, said drift region (26) being positioned away from the optical axis (6), and a deflecting region located on the front surface for deflecting charge particles coming from the specimen towards a detector (16).
摘要翻译：本发明提供了一种带电粒子装置（1），包括：用于提供带电粒子束（4）的粒子源（2）和用于将粒子束引导到样本（8）上的物镜（10），所述物镜 10）具有光轴（6）; 位于物镜（10）的光轴（6）上的粒子反射镜（14），所述粒子反射镜具有前表面，后表面，从后表面到前表面的漂移区（26）使带电粒子束从后表面传播到前表面，所述漂移区域（26）远离光轴（6）定位，偏转区域位于前表面上，用于使来自试样的电荷颗粒偏转检测器（16）。

7. 发明授权

US06555824B1 Method and device for focusing a charged particle beam 有权
标题翻译：用于聚焦带电粒子束的方法和装置
公开(公告)号：US06555824B1
公开(公告)日：2003-04-29
申请号：US09397803
申请日：1999-09-16
申请人： Hans-Peter Feuerbaum , Dieter Winkler
发明人： Hans-Peter Feuerbaum , Dieter Winkler
IPC分类号： H01J37145
CPC分类号： H01J37/145
摘要： The invention provides an objective lens 1 for focusing a charged particle beam 30 on a specimen. The objective lens comprises a first focusing lens 2 positioned between a charged particle source and the specimen for finely focusing the beam of charged particles on the specimen. The objective lens further comprises a second focusing electrostatic lens 20 positioned between the first focusing lens and the specimen for coarsely focusing the beam of charged particles on the specimen.
摘要翻译：本发明提供一种用于将带电粒子束30聚焦在样本上的物镜1。物镜包括位于带电粒子源和样本之间的第一聚焦透镜2，用于将带电粒子束精细聚焦在样本上。物镜还包括位于第一聚焦透镜和样本之间的第二聚焦静电透镜20，用于将带电粒子束粗调焦在样本上。

8. 发明授权

US06555815B2 Apparatus and method for examining specimen with a charged particle beam 有权
标题翻译：用带电粒子束检查样本的装置和方法
公开(公告)号：US06555815B2
公开(公告)日：2003-04-29
申请号：US09342802
申请日：1999-06-29
申请人： Hans-Peter Feuerbaum , Dieter Winkler
发明人： Hans-Peter Feuerbaum , Dieter Winkler
IPC分类号： H01J3700
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/006 , H01J2237/2002 , H01J2237/2608
摘要： An apparatus for examining a specimen with a beam of charged particles, where charging of the specimen is avoided or reduced by injecting inert gas onto the sample's surface. In order to avoid interactions with the electron optics, various embodiments are disclosed for providing a rotationally symmetrical nozzles and/or electrodes. Additionally, embodiments are disclosed wherein a plurality of gas conduits are arranged in a rotationally symmetrical manner. Alternatively, the conduit is incorporated into an element of the electron optics, such as the magnetic lens. Also, in order to reduce or eliminate interaction of the electrons with the gas molecules, embodiments are disclosed wherein the gas is pulsated, rather than continually injected.
摘要翻译：一种用带电粒子束检查样本的装置，其中通过将惰性气体注射到样品表面上来避免或减少样品的充电。为了避免与电子光学器件的相互作用，公开了用于提供旋转对称的喷嘴和/或电极的各种实施例。另外，公开了其中多个气体管道以旋转对称的方式布置的实施例。或者，导管结合到电子光学元件的元件中，例如磁性透镜。此外，为了减少或消除电子与气体分子的相互作用，公开了其中气体被脉动而不是连续喷射的实施例。

9. 发明授权

US07075092B2 Charged particle beam microscope with minicolumn 有权
标题翻译：小柱带电粒子束显微镜
公开(公告)号：US07075092B2
公开(公告)日：2006-07-11
申请号：US10823968
申请日：2004-04-13
申请人： Dieter Winkler , Hans-Peter Feuerbaum , Joseph Bach
发明人： Dieter Winkler , Hans-Peter Feuerbaum , Joseph Bach
IPC分类号： H01J37/26 , H01J37/285
CPC分类号： H01J37/18 , H01J37/28
摘要： One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a specimen into said main vacuum chamber; (c) a minicolumn non-translatably positioned inside said main chamber; and (d) a vacuum pump situated inside the main vacuum chamber and external to and connected to the minicolumn.
摘要翻译：本发明的一个实施例是一种电子显微镜，其包括：（a）主真空室，其容纳在其中并连接到真空泵的台; （b）用于将样本装载到所述主真空室中的装载锁; （c）不可平移地定位在所述主室内的小柱; 和（d）位于主真空室内的真空泵，在真空室外部并连接到小柱。

10. 发明授权

US07638777B2 Imaging system with multi source array 有权
标题翻译：具有多源阵列的成像系统
公开(公告)号：US07638777B2
公开(公告)日：2009-12-29
申请号：US10564752
申请日：2004-05-17
申请人： Hans-Peter Feuerbaum , Jürgen Frosien , Uli Hoffmann , Dieter Winkler , Pavel Adamec
发明人： Hans-Peter Feuerbaum , Jürgen Frosien , Uli Hoffmann , Dieter Winkler , Pavel Adamec
IPC分类号： H01J1/50
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/047 , H01J2237/0635
摘要： The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.
摘要翻译：本发明提供一种带电粒子束装置。该装置包括用于发射多个带电粒子束的发射极阵列。多个带电粒子束用透镜成像。提供电极单元用于加速多个带电粒子束。第一控制单元和第二控制单元控制发射极阵列的第一电位与电极单元的第二电位和第三电位之间的电位差。因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

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