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    • 79. 发明授权
    • Nonvolatile memory cell and operating method
    • 非易失性存储单元和操作方法
    • US07057938B2
    • 2006-06-06
    • US10756777
    • 2004-01-14
    • Chih Chieh YehHung Yueh ChenYi Ying LiaoWen Jer TsaiTao Cheng Lu
    • Chih Chieh YehHung Yueh ChenYi Ying LiaoWen Jer TsaiTao Cheng Lu
    • G11C16/00
    • G11C16/10G11C16/0475H01L21/28282H01L29/66833H01L29/792H01L29/7923
    • One embodiment of the present invention provides a system having a nonvolatile memory comprising a p type semiconductor substrate, an oxide layer over the p type semiconductor substrate, a nitride layer over the oxide layer, an additional oxide layer over the nitride layer, a gate over the additional oxide layer, two N+ junctions in the p type semiconductor layer, a source and drain respectively formed in the two N+ junctions, a first bit and a second bit in the nonvolatile memory, and accordingly at least two states of operation (i.e., erase and program) therefor. That is, one bit in the nonvolatile memory can either be in an erase state or program state. For erasing a bit, electrons are injected at the gate of the nonvolatile memory. For programming a bit, electric holes are injected or electrons are reduced for that bit. The present invention also provides a method for sensing and reading at least one bit in a nonvolatile memory comprising applying a bias voltage to the memory, detecting a threshold voltage or read current, comparing the threshold voltage with a reference voltage or comparing the read current with a reference current, and identifying the at least one bit as erased or programmed.
    • 本发明的一个实施例提供一种具有非易失性存储器的系统,其包括ap型半导体衬底,p型半导体衬底上的氧化物层,氧化物层上方的氮化物层,氮化物层上的附加氧化物层, 分别形成在两个N +结中的源极和漏极,非易失性存储器中的第一位和第二位,以及相应地至少两个操作状态(即擦除)的附加氧化物层,p型半导体层中的两个N +结, 和程序)。 也就是说,非易失性存储器中的一位可以处于擦除状态或程序状态。 为了擦除一点,电子注入非易失性存储器的栅极。 为了编程一点,注入电孔或减少电子的位。 本发明还提供了一种用于感测和读取非易失性存储器中的至少一个位的方法,包括向存储器施加偏置电压,检测阈值电压或读取电流,将阈值电压与参考电压进行比较,或将读取的电流与 参考电流,并将所述至少一个位识别为擦除或编程。