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    • 73. 发明授权
    • Semiconductor integrated circuit device
    • 半导体集成电路器件
    • US07245521B2
    • 2007-07-17
    • US11169800
    • 2005-06-30
    • Ryo MoriToshio YamadaTetsuya Muraya
    • Ryo MoriToshio YamadaTetsuya Muraya
    • G11C11/00G11C5/14
    • G11C11/412
    • The present invention provides a semiconductor integrated circuit device having an SRAM in which leak current is reduced. In an SRAM comprising a plurality of memory cells each constructed by a storage in which input and output terminals of two inverter circuits are cross-connected and a selection MOSFET provided between the storage and complementary bit lines and whose gate is connected to a word line, a substrate bias switching circuit is provided. In normal operation, the substrate bias switching circuit supplies a power source voltage to an N-type well in which a P-channel MOSFET of a memory cell is formed and supplies a ground potential of the circuit to a P-type well in which an N-channel MOSFET is formed. In the standby state, the substrate bias switching circuit supplies a predetermined voltage which is lower than the power source voltage and by which a PN junction between the N-type well and the source of the P-channel MOSFET is not forward biased to the N-type well, and supplies a predetermined voltage which is higher than the ground potential and by which a PN junction between the P-type well and the source of the N-channel MOSFET is not forward biased to the P-type well.
    • 本发明提供一种半导体集成电路器件,其具有泄漏电流降低的SRAM。 在包括多个存储单元的SRAM中,每个存储单元由两个反相器电路的输入和输出端子交叉存储的存储器构成,以及设置在存储和互补位线之间并且其栅极连接到字线的选择MOSFET, 提供了衬底偏置开关电路。 在正常操作中,衬底偏置开关电路将电源电压提供给形成存储单元的P沟道MOSFET的N型阱,并将电路的接地电位提供给P型阱,其中, 形成N沟道MOSFET。 在待机状态下,衬底偏置开关电路提供低于电源电压的预定电压,并且N型阱和P沟道MOSFET的源极之间的PN结不被正向偏置到N 并且提供比地电位高的预定电压,并且P型阱和N沟道MOSFET的源极之间的PN结未被正向偏置到P型阱。
    • 74. 发明授权
    • Crystals of diuridine tetraphosphate or salt thereof, process for producing the crystals, and process for producing the compounds
    • 二氢吖啶四磷酸的晶体或其盐,晶体的制造方法,以及该化合物的制造方法
    • US06458946B1
    • 2002-10-01
    • US09582642
    • 2000-07-28
    • Hideaki MaedaToshio YamadaHiroshi SatoYutaka Noda
    • Hideaki MaedaToshio YamadaHiroshi SatoYutaka Noda
    • C07H1904
    • C07H19/10C07H21/02
    • The invention provides crystals of p1,P4-di(uridine 5′-) tetraphosphate or a salt thereof; a process for producing the crystals; and a process for producing P1,P4-di(uridine 5′-) tetraphosphate (U2P4) or a salt thereof from UMP serving as a starting material and by use of DPC and PPi, which process comprises at least one of the following treatment steps: (a) adding UMP diphenylphosphate (UMP-DPP) in divided portions during a step of reaction of UMP-DPP with a PPi-organic alkali salt; (b) carrying out reaction of UMP-DPP with a PPi-organic alkali salt in the presence of a base; and (c) further treating the synthesized U2P4 with an alkali. The crystals of U2P4 or a salt thereof obtained through the process according to the invention have high purity and stability and a less hygroscopicity as compared with a lyophilized product, to thereby serve as a useful raw material for preparing a pharmaceutical. The process for producing U2P4 or a salt thereof according to the invention realizes high yield and enables large-scale synthesis.
    • 本发明提供了p1,P4-二(尿苷5'-)四磷酸盐或其盐的晶体; 制造晶体的方法; 以及由作为起始原料的UMP生产P1,P4-二(尿苷5'-)四磷酸(U2P4)或其盐的方法,并且使用DPC和PPi,该方法包括以下处理步骤中的至少一个 :(a)在UMP-DPP与PPi-有机碱盐反应的步骤期间,分份加入UMP二苯基磷酸酯(UMP-DPP); (b)在碱的存在下进行UMP-DPP与PPi-有机碱盐的反应; 和(c)用碱进一步处理合成的U2P4。 通过本发明的方法获得的U2P4或其盐的结晶与冻干产品相比具有高纯度和稳定性以及较少的吸湿性,从而用作制备药物的有用原料。 根据本发明的制备U2P4或其盐的方法实现高产率并且能够进行大规模合成。
    • 75. 发明授权
    • Semiconductor memory
    • 半导体存储器
    • US06392953B2
    • 2002-05-21
    • US09875960
    • 2001-06-08
    • Toshio YamadaAkinori Shibayama
    • Toshio YamadaAkinori Shibayama
    • G11C800
    • G11C29/785G11C7/062G11C7/14G11C11/406G11C11/4091G11C11/4099H01L27/10808
    • A plurality of information memory cells and a single reference memory cell are coupled to a single word line. The reference memory cell stores reference information equivalent to a reference potential to information readout. Pieces of information, stored in the information memory cells, are fed, over respective bit lines, to first input terminals of sense amplifiers. The reference information, stored in the reference memory cell, is fed, over a bit line, to second input terminals of the sense amplifiers. When the potential of signal charges stored in the information memory cells falls due to leakage current, the potential of a signal charge stored in the reference memory cell correspondingly falls due to leakage current. This prolongs a length of time taken for a difference between these potentials to reach a sense limit, thereby achieving a longer data retention time. As a result of such arrangement, even when there occurs a small current leakage from memory cells, it is possible to secure a long data retention time thereby making it possible to obtain a long refresh cycle period.
    • 多个信息存储单元和单个参考存储单元耦合到单个字线。 参考存储单元存储与参考电位等同于信息读出的参考信息。 存储在信息存储单元中的信息块通过各自的位线被馈送到读出放大器的第一输入端。 存储在参考存储单元中的参考信息通过位线被馈送到读出放大器的第二输入端。 当存储在信息存储单元中的信号电荷的电位由于泄漏电流而下降时,存储在参考存储单元中的信号电荷的电位由于泄漏电流而相应地下降。 这延长了这些电位之间的差异达到感测极限所需的时间长度,从而实现更长的数据保留时间。 作为这种安排的结果,即使当从存储器单元发生小的电流泄漏时,也可以确保长的数据保持时间,从而可以获得长的刷新周期。
    • 77. 发明授权
    • Semiconductor storage device
    • 半导体存储设备
    • US06181620B2
    • 2001-01-30
    • US09484023
    • 2000-01-18
    • Masashi AgataKazunari TakahashiTsutomu FujitaNaoki KurodaToshio Yamada
    • Masashi AgataKazunari TakahashiTsutomu FujitaNaoki KurodaToshio Yamada
    • G11C1124
    • G11C11/405G11C7/1042G11C7/12G11C7/22G11C11/4091G11C11/4094
    • The semiconductor storage device of this invention includes memory cells each having two transistors and one storage capacitor. Each memory cell is connected with a first word line and a first bit line for a first port and a second word line and a second bit line for a second port. The first and second bit lines are alternately disposed in an open bit line configuration. In the operation of the semiconductor storage device, in a period when a first precharge signal for precharging each first bit line or a first sense amplifier activating signal for activating a first sense amplifier is kept in an active state, a second precharge signal for precharging each second bit line and a second sense amplifier activating signal for activating a second sense amplifier are both placed in an inactive state.
    • 本发明的半导体存储装置包括具有两个晶体管和一个存储电容器的存储单元。 每个存储单元与第一字线和用于第一端口的第一位线和用于第二端口的第二字线和第二位线连接。 第一位线和第二位线以开放位线配置交替布置。 在半导体存储装置的动作中,在对第一读出放大器的第一预定电荷进行预充电的第一预充电信号或激活第一读出放大器的第一读出放大器的激活信号保持为有效状态的期间内, 第二位线和用于激活第二读出放大器的第二读出放大器激活信号都处于非活动状态。
    • 79. 发明授权
    • Internal reduced-voltage generator for semiconductor integrated circuit
    • 用于半导体集成电路的内部降压发生器
    • US6005436A
    • 1999-12-21
    • US857648
    • 1997-05-16
    • Akinori ShibayamaToshio Yamada
    • Akinori ShibayamaToshio Yamada
    • G05F1/46G11C7/00
    • G05F1/465
    • A reference voltage generator is composed of a first constant-voltage generator consisting of three p-type MOS transistors for generating a first reference voltage Vref for use in the normal operation, which is independent of an external power-supply voltage VCC and of a second constant-voltage generator consisting of two p-type MOS transistors and one n-type MOS transistor for generating a second reference voltage Vrefbi for use in a burn-in acceleration test, which is dependent on VCC. The output of each of the constant-voltage generators is feedbacked to the other constant-voltage generator as its input. Two differential amplifiers and two output drivers output, as an internal reduced voltage Vint, the higher one of Vref and Vrefbi which are outputted from the reference voltage generator. Since Vint is generated based on the two outputs Vref and Vrefbi which are outputted from the single reference voltage generator and which are related to each other, the power consumption and layout area of an internal reduced-voltage generator, which is suitable for the burn-in, can be reduced.
    • 一个参考电压发生器由一个由三个p型MOS晶体管组成的第一恒压发生器组成,这三个p型MOS晶体管用于产生用于正常工作的第一参考电压Vref,其独立于外部电源电压VCC和第二恒定电压发生器 由两个p型MOS晶体管和一个n型MOS晶体管组成的恒压发生器,用于产生依赖于VCC的老化加速度测试中使用的第二参考电压Vrefbi。 每个恒压发生器的输出作为其输入被反馈到另一恒压发生器。 两个差分放大器和两个输出驱动器作为内部降低电压Vint输出从参考电压发生器输出的Vref和Vrefbi中较高的一个。 由于Vint基于从单个参考电压发生器输出并且彼此相关的两个输出Vref和Vrefbi产生,所以内部降压发生器的功耗和布局面积适合于燃烧 - 在,可以减少。