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71. 发明授权

US08208127B2 Combination stop for catoptric projection arrangement 有权
标题翻译：组合停止投影安排
公开(公告)号：US08208127B2
公开(公告)日：2012-06-26
申请号：US12173595
申请日：2008-07-15
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

72. 发明申请

US20090021714A1 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT 有权
标题翻译：用于投影安排的组合停止
公开(公告)号：US20090021714A1
公开(公告)日：2009-01-22
申请号：US12173595
申请日：2008-07-15
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/54
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

73. 发明授权

US08436985B2 Combination stop for catoptric projection arrangement 有权
标题翻译：组合停止投影安排
公开(公告)号：US08436985B2
公开(公告)日：2013-05-07
申请号：US13479768
申请日：2012-05-24
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

74. 发明申请

US20120236272A1 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT 有权
标题翻译：用于投影安排的组合停止
公开(公告)号：US20120236272A1
公开(公告)日：2012-09-20
申请号：US13479768
申请日：2012-05-24
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/32
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

75. 发明申请

US20100208225A1 PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL 审中-公开
标题翻译：用于具有观察平板的微结构的投影目标
公开(公告)号：US20100208225A1
公开(公告)日：2010-08-19
申请号：US12723456
申请日：2010-03-12
申请人： Daniel Kraehmer , Aurelian Dodoc , Hans-Juergen Mann , Toralf Gruner
发明人： Daniel Kraehmer , Aurelian Dodoc , Hans-Juergen Mann , Toralf Gruner
IPC分类号： G03B27/54 , G02B9/00
CPC分类号： G02B5/003 , G02B5/005 , G02B17/0657 , G02B27/0018 , G03F7/70233
摘要： A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.
摘要翻译：具有用于微光刻的遮蔽光瞳的投影物镜具有第一光学表面，其具有提供用于施加有用光的第一区域和至少一个第二光学表面，该第二光学表面具有用于施加有用光的第二区域。有用光的束包络在第一区域和第二区域之间延伸。在光传播方向上的至少一个在输入侧和输出侧开口的管切断以屏蔽散射光。所述至少一个管在所述第一光学表面和所述第二光学表面之间。管的壁在有用光的波长范围内是不透明的。管在有用光的传播方向上延伸到束包络的至少一部分长度上并且周向地包围光束包络。

76. 发明申请

US20120224160A1 REFLECTIVE OPTICAL IMAGING SYSTEM 有权
标题翻译：反射光学成像系统
公开(公告)号：US20120224160A1
公开(公告)日：2012-09-06
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/70 , G03B27/32 , G02B23/00
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

77. 发明授权

US07712905B2 Imaging system with mirror group 有权
标题翻译：镜像组成像系统
公开(公告)号：US07712905B2
公开(公告)日：2010-05-11
申请号：US11578098
申请日：2005-03-22
申请人： David Shafer , Aurelian Dodoc , Alexander Epple , Hans-Juergen Mann
发明人： David Shafer , Aurelian Dodoc , Alexander Epple , Hans-Juergen Mann
IPC分类号： G02B5/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.
摘要翻译：用于将布置在成像系统的物体表面中的离轴对象场成像到设置在成像系统的图像表面中的离轴图像场同时创建至少一个中间图像的成像系统具有：光轴; 具有对象侧反射镜组入口的直列式反射镜组，横向于所述光轴排列的像侧反射镜组出射和反射镜组平面，并且几何地布置在所述反射镜组入口和所述镜子组出口之间，所述镜组包括：第一反射镜，具有第一反射镜表面，用于在与光轴不对称的第一反射区域中接收来自物体表面的辐射; 至少一个第二反射镜，具有面向第一镜面的第二镜面，用于在不对称于光轴的第二反射区域中接收来自第一反射镜的辐射; 所述第一和第二反射镜中的至少一个是凹面镜，所述凹面镜具有在光轴上限定反射镜轴的凹面镜面; 其中反射镜组的反射镜被布置成使得来自反射镜组入口的辐射通过镜组平面至少四次，并且在离开镜组之前在镜组的凹面镜表面上反射至少两次镜组退出。可以在轴向紧凑的设计中实现图像场曲率的强过度校正。

78. 发明授权

US09188771B2 Reflective optical imaging system 有权
标题翻译：反光光学成像系统
公开(公告)号：US09188771B2
公开(公告)日：2015-11-17
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/68 , G02B17/06
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

79. 发明申请

US20080037111A1 Catadioptric Projection Objective 有权
标题翻译：反射折射投影目标
公开(公告)号：US20080037111A1
公开(公告)日：2008-02-14
申请号：US10576265
申请日：2004-10-15
申请人： David Shafer , Alexander Epple , Aurelian Dodoc , Wilhelm Ulrich , Karl-Heinz Schuster
发明人： David Shafer , Alexander Epple , Aurelian Dodoc , Wilhelm Ulrich , Karl-Heinz Schuster
IPC分类号： G02B17/08
CPC分类号： G02B13/143 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要翻译：一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将物平面中的物场投影到第一实际中间像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

80. 发明授权

US07136220B2 Catadioptric reduction lens 失效
标题翻译：反射折射减少镜片
公开(公告)号：US07136220B2
公开(公告)日：2006-11-14
申请号：US10805393
申请日：2004-03-22
申请人： Wilhelm Ulrich , David R. Shafer , Alexander Epple , Helmut Beierl , Aurelian Dodoc
发明人： Wilhelm Ulrich , David R. Shafer , Alexander Epple , Helmut Beierl , Aurelian Dodoc
IPC分类号： G02B17/00 , G02B21/00 , G02B23/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.
摘要翻译：一种反折射投射透镜，用于将布置在物平面中的图案成像到图像平面上，优选地在创建实际中间图像的同时，包括具有凹面镜的反折射第一透镜部分和具有分束表面的物理分束器，以及第二透镜部分优选地折射并且在分束器之间，在其物平面和图像平面之间。物体平面的光学近场被布置在距离投影透镜的第一光学表面的工作距离处。分束器位于低边缘射线高度附近，这允许配置对纵向色差完全校正的投影透镜，同时使用少量材料，特别是制造其分光器所需的材料。

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