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71. 发明申请

US20050207029A1 Catadioptric projection objective 失效
标题翻译：反射折射投影物镜
公开(公告)号：US20050207029A1
公开(公告)日：2005-09-22
申请号：US11036155
申请日：2005-01-18
申请人： Alexander Epple , Aurelian Dodoc
发明人： Alexander Epple , Aurelian Dodoc
IPC分类号： G02B5/00 , G02B17/00 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0892 , G02B5/005 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective while generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.
摘要翻译：将产生真实中间图像的布置在投影物镜的物平面中的图案成像到投影物镜的像平面内的反射折射投影物镜具有反射折射物镜部分，其具有至少一个凹面镜和光束偏转装置，并且还具有屈光客观部分。成像系统具有可变光阑直径的系统隔膜，用于可变地限制通过投影物镜的辐射的横截面。该系统隔膜布置在反折射物镜部分中，优选地直接靠近凹面镜。本发明能够实现具有简单结构的投影物镜。

72. 发明授权

US08107162B2 Catadioptric projection objective with intermediate images 有权
标题翻译：反射折射投影物镜与中间图像
公开(公告)号：US08107162B2
公开(公告)日：2012-01-31
申请号：US11596868
申请日：2005-05-13
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向上偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

73. 发明授权

US08064040B2 Projection objective, projection exposure apparatus and reflective reticle for microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射掩模版
公开(公告)号：US08064040B2
公开(公告)日：2011-11-22
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

74. 发明授权

US07551361B2 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type 有权
标题翻译：具有这种类型的至少一个光刻透镜系统的光刻透镜系统和投影曝光系统
公开(公告)号：US07551361B2
公开(公告)日：2009-06-23
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B3/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

75. 发明申请

US20090034061A1 Catadioptric projection objective with intermediate images 有权
标题翻译：反射折射投影物镜与中间图像
公开(公告)号：US20090034061A1
公开(公告)日：2009-02-05
申请号：US11596868
申请日：2005-05-13
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二目标部分是具有凹面镜的反射折射物镜部分。第一折叠镜，用于在凹面镜的方向上偏转来自物体平面的辐射;以及第二折叠镜，用于偏转来自凹面镜的辐射提供图像平面的方向。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

76. 发明申请

US20080198353A1 Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射光罩
公开(公告)号：US20080198353A1
公开(公告)日：2008-08-21
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/54 , G02B9/34
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

77. 发明申请

US20060132931A1 Catadioptric projection objective 审中-公开
标题翻译：反射折射投影物镜
公开(公告)号：US20060132931A1
公开(公告)日：2006-06-22
申请号：US11237749
申请日：2005-09-29
申请人： Alexander Epple , Aurelian Dodoc
发明人： Alexander Epple , Aurelian Dodoc
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging a pattern arranged in the object plane (102) of the projection objective into the image plane (104) of the projection objective has a catadioptric first objective part (105) having at least one concave mirror (106), and a dioptric second objective part (108) in which there is situated a pupil surface (111) near the image. At least one concave lens (140, 145) with a concave surface (140′, 145′) directed towards the pupil surface (111) is arranged in a near zone (160) of the pupil surface. There are no lenses with a strongly curved concave surface directed towards the image plane between the pupil surface and the image plane. Such projection objectives can be produced in a way which saves material in conjunction with good optical correction, and are relatively insensitive to production-induced deviations from the ideal design.
摘要翻译：用于将布置在投影物镜的物平面（102）中的图案成像到投影物镜的像平面（104）中的反射折射投射物镜具有反射折射的第一物镜部分（105），其具有至少一个凹面镜（106），以及其中在图像附近设置瞳孔表面（111）的屈光度第二目标部分（108）。具有指向瞳孔表面（111）的凹表面（140'，145'）的至少一个凹透镜（140,145）被布置在瞳孔表面的近区域（160）中。没有透镜具有朝向瞳孔表面和图像平面之间的图像平面的强弯曲凹面。这样的投影物镜可以以与良好的光学校正相结合的方式产生，并且对生产诱导的与理想设计的偏差相对不敏感。

78. 发明授权

US06995930B2 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US06995930B2
公开(公告)日：2006-02-07
申请号：US10734623
申请日：2003-12-15
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

79. 发明申请

US20050190455A1 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US20050190455A1
公开(公告)日：2005-09-01
申请号：US11011610
申请日：2004-12-15
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B13/14 , G02B13/18 , G02B17/08 , G03F7/20 , G02B3/00 , G02B9/00
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

80. 发明申请

US20050185269A1 Catadioptric projection objective with geometric beam splitting 审中-公开
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US20050185269A1
公开(公告)日：2005-08-25
申请号：US11014857
申请日：2004-12-20
申请人： Alexander Epple , Helmut Beierl , Aurelian Dodoc , Wilhelm Ulrich
发明人： Alexander Epple , Helmut Beierl , Aurelian Dodoc , Wilhelm Ulrich
IPC分类号： G02B1/00 , G02B17/00 , G02B17/08 , G02B21/00 , G02B23/00 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G02B17/0804 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern arranged on the object plane of the projection objective, on the image plane of the projection objective, comprising: a first objective part for imaging an object field in a first real intermediate image; a second objective part for producing a second real intermediate image with the radiation coming from the first objective part; and a third objective part for imaging the second real intermediate image on the image plane; wherein at least one of the objective parts is a catadioptric objective part with a concave mirror, and at least one of the objective parts is a refractive objective part and a folding mirror is arranged within this refractive objective part in such a way that a field lens is arranged between the folding mirror and an intermediate image which is closest to the folding mirror.
摘要翻译：一种反射折射投射物镜，用于对布置在投影物镜的物平面上的图案进行成像，在投影物镜的像平面上，包括：用于对第一实际中间图像中的物场进行成像的第一物镜部分; 用于产生具有来自第一目标部分的辐射的第二实际中间图像的第二目标部分; 以及第三目标部分，用于对所述图像平面上的所述第二实际中间图像进行成像; 其中所述目标部分中的至少一个是具有凹面镜的反射折射物镜部分，并且所述目标部分中的至少一个是折射目标部分，并且折射镜布置在所述折射目标部分内，使得场透镜布置在折叠镜和最靠近折叠镜的中间图像之间。

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