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    • 65. 发明授权
    • Charge transfer device with improved charge detection sensitivity
    • 电荷转移装置具有改进的电荷检测灵敏度
    • US06191440B1
    • 2001-02-20
    • US09108407
    • 1998-07-01
    • Nobuhiko MutohTakashi Nakano
    • Nobuhiko MutohTakashi Nakano
    • H01L29768
    • H01L29/42396H01L29/76816
    • In a charge transfer device, a floating gate is provided in an insulating film which is provided on a charge transfer channel layer. A buffer amplifier is connected with the floating gate, and detects signal charges in the charge transfer channel layer to generate a signal indicative of an output voltage corresponding to the signal charges. A bias gate is provided in the insulating film apart from the floating gate to cover at least a part of the floating gate. A bias applying unit applies a bias voltage to the bias gate in response to the output voltage signal such that an alternate current (AC) component of a voltage of the floating gate is substantially equal to an AC component of a voltage of the bias gate.
    • 在电荷转移装置中,浮置栅极设置在设置在电荷传输沟道层上的绝缘膜中。 缓冲放大器与浮动栅极连接,并检测电荷传输沟道层中的信号电荷,以产生指示对应于信号电荷的输出电压的信号。 偏置栅极设置在绝缘膜中,与浮动栅极分开以覆盖至少一部分浮动栅极。 偏置施加单元响应于输出电压信号将偏置电压施加到偏置栅极,使得浮置栅极的电压的交流电(AC)分量基本上等于偏置栅极的电压的AC分量。
    • 66. 发明授权
    • Charge transfer device with reduced parasitic capacitances for improved
charge transferring
    • 具有降低的寄生电容的电荷转移装置,用于改善电荷转移
    • US5640028A
    • 1997-06-17
    • US554344
    • 1995-11-06
    • Seiichi KawamotoYasuhito MakiTadakuni NarabuMasahide Hirama
    • Seiichi KawamotoYasuhito MakiTadakuni NarabuMasahide Hirama
    • H01L29/423H01L29/768H01L27/148
    • H01L29/42396H01L29/76816
    • A charge transfer device formed on a semiconductor substrate comprising: a charge transfer section formed on the semiconductor substrate for transferring charges, a floating gate having a floating gate diffusion layer formed on the semiconductor substrate for accumulating the charges transferred from the charge transfer section, an output gate section formed between the charge transfer section and the floating gate on the semiconductor substrate, and a charge detecting circuit electrically connected to the floating gate for outputting a voltage corresponding to the amount of the charges accumulated in the floating gate diffusion layer, the output gate section having a first output gate region adjacent to the charge transfer means and a second output gate region adjacent to the floating gate diffusion layer, the first output gate region having a first output gate electrode formed thereon with an insulating film therebetween, the second output gate region having a second output gate electrode formed thereon with an insulating film therebetween, a dc voltage being applied to the gate electrode, and an output voltage being applied to the second output gate electrode from the charging detecting circuit.
    • 一种形成在半导体衬底上的电荷转移装置,包括:形成在半导体衬底上用于转移电荷的电荷转移部分,形成在半导体衬底上的浮置栅极扩散层的浮动栅极,用于累积从电荷转移部分转移的电荷, 输出栅极部分,形成在半导体衬底上的电荷转移部分和浮置栅极之间;以及电荷检测电路,电连接到浮置栅极,用于输出与在浮动栅极扩散层中累积的电荷量相对应的电压, 栅极部分具有与电荷转移装置相邻的第一输出栅极区域和与浮置栅极扩散层相邻的第二输出栅极区域,第一输出栅极区域具有形成在其间的绝缘膜的第一输出栅电极,第二输出端 栅极区域具有第二输出栅极电极 在其间形成有绝缘膜,其中直流电压被施加到栅电极,并且输出电压从充电检测电路施加到第二输出栅电极。
    • 68. 发明授权
    • Charge transfer device with reduced parasitic capacitances for improved
charge transferring
    • 具有降低的寄生电容的电荷转移装置,用于改善电荷转移
    • US5536956A
    • 1996-07-16
    • US487887
    • 1995-06-07
    • Seiichi KawamotoYasuhito MakiTadakuni NarabuMasahide Hirama
    • Seiichi KawamotoYasuhito MakiTadakuni NarabuMasahide Hirama
    • H01L29/423H01L29/768H01L27/148
    • H01L29/42396H01L29/76816
    • A charge transfer device formed on a semiconductor substrate comprising: a charge transfer section formed on the semiconductor substrate for transferring charges, a floating gate having a floating gate diffusion layer formed on the semiconductor substrate for accumulating the charges transferred from the charge transfer section, an output gate section formed between the charge transfer section and the floating gate on the semiconductor substrate, and a charge detecting circuit electrically connected to the floating gate for outputting a voltage corresponding to the amount of the charges accumulated in the floating gate diffusion layer, the output gate section having a first output gate region adjacent to the charge transfer means and a second output gate region adjacent to the floating gate diffusion layer, the first output gate region having a first output gate electrode formed thereon with an insulating film therebetween, the second output gate region having a second output gate electrode formed thereon with an insulating film therebetween, a dc voltage being applied to the gate electrode, and an output voltage being applied to the second output gate electrode from the charging detecting circuit.
    • 一种形成在半导体衬底上的电荷转移装置,包括:形成在半导体衬底上用于转移电荷的电荷转移部分,形成在半导体衬底上的浮置栅极扩散层的浮动栅极,用于累积从电荷转移部分转移的电荷, 输出栅极部分,形成在半导体衬底上的电荷转移部分和浮置栅极之间;以及电荷检测电路,电连接到浮置栅极,用于输出与在浮动栅极扩散层中累积的电荷量相对应的电压, 栅极部分具有与电荷转移装置相邻的第一输出栅极区域和与浮置栅极扩散层相邻的第二输出栅极区域,第一输出栅极区域具有形成在其间的绝缘膜的第一输出栅电极,第二输出端 栅极区域具有第二输出栅极电极 在其间形成有绝缘膜,其中直流电压被施加到栅电极,并且输出电压从充电检测电路施加到第二输出栅电极。
    • 69. 发明授权
    • Charge coupled device
    • 电荷耦合器件
    • US5442207A
    • 1995-08-15
    • US250757
    • 1994-05-26
    • Jae H. Jeong
    • Jae H. Jeong
    • H01L29/762H01L21/339H01L27/148H01L29/423H01L29/78
    • H01L29/42396H01L27/14831
    • A charge coupled device including a first electrode consisting of a first region and a second region having lower resistance than the first region, and a second electrode consisting of a first region and a second region having lower resistance than this first region. The first region of the first electrode is adjacent to the first region of the second region at an interval of an insulating film. Capable of utilizing the force of electrical field, the device is superior in charge transfer efficiency as well as charge transfer velocity. It also has the capability to improve the performances of high picture quality solid state image sensing devices and time delay devices, which both necessitate a charge coupled device and operate at high frequencies. Additionally, a solid state image sensing device employing this device is not degraded in a dark state by generating a few pulse charges.
    • 一种电荷耦合器件,包括由第一区域和第二区域构成的第一电极,第一区域和第二区域具有比第一区域低的电阻,第二电极由第一区域和第二区域组成,该第二区域具有比该第一区域低的电阻。 第一电极的第一区域以绝缘膜的间隔与第二区域的第一区域相邻。 能够利用电场的力,该装置的电荷转移效率以及电荷转移速度是优异的。 它还具有提高高画质固态摄像装置和延时装置性能的能力,这两者都需要电荷耦合器件并在高频下工作。 此外,采用该装置的固态图像感测装置在黑暗状态下不会通过产生几个脉冲电荷而劣化。
    • 70. 发明授权
    • Solid-state image device including charge-coupled devices having
improved electrode structure
    • 固态图像器件包括具有改进的电极结构的电荷耦合器件
    • US5428231A
    • 1995-06-27
    • US269349
    • 1994-06-30
    • Nagataka TanakaYoshiyuki MatsunagaMichio SasakiHirofumi YamashitaNobuo Nakamura
    • Nagataka TanakaYoshiyuki MatsunagaMichio SasakiHirofumi YamashitaNobuo Nakamura
    • H01L21/28H01L27/148H01L29/423H01L29/78H01L27/14H01L31/00
    • H01L29/42396H01L27/14831
    • A solid-state imaging device comprises a plurality of photoelectric conversion accumulation sections arranged two-dimensionally on a semiconductor substrate, a plurality of vertical CCDs for vertically transferring signal charges read out from the photoelectric conversion accumulation sections, and a horizontal CCD for receiving and horizontally transferring the signal charges transferred by the vertical CCDs. A gap between transfer electrodes of the horizontal CCD is less than a gap between transfer electrodes of the vertical CCDs. The transfer electrodes of the vertical CCDs have a single-layer electrode structure formed by patterning a first polysilicon film. The transfer electrodes of the horizontal CCD have an overlapping double-layer electrode structure comprising alternately arranged electrodes formed by patterning the first polysilicon film and electrodes intervening between the alternately arranged electrodes which are formed by patterning a second polysilicon film. The gap between the electrodes of the horizontal CCD is determined by a silicon oxide film obtained by subjecting the alternately arranged electrodes of the first polysilicon film to thermal oxidation.
    • 固态成像装置包括在半导体基板上二维布置的多个光电转换累积部分,用于垂直转移从光电转换累积部分读出的信号电荷的多个垂直CCD以及用于接收和水平的水平CCD 传输由垂直CCD传输的信号电荷。 水平CCD的转印电极之间的间隙小于垂直CCD的转印电极之间的间隙。 垂直CCD的转印电极具有通过图案化第一多晶硅膜形成的单层电极结构。 水平CCD的转移电极具有重叠的双层电极结构,其包括交替排列的电极,其通过对第一多晶硅膜进行构图而形成,并且通过图案化第二多晶硅膜而形成交替排列的电极之间的电极。 水平CCD的电极之间的间隙由通过对第一多晶硅膜的交替排列的电极进行热氧化而获得的氧化硅膜确定。