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    • 1. 发明授权
    • Solid-state imaging device which can expand dynamic range
    • 可扩展动态范围的固态成像装置
    • US08610186B2
    • 2013-12-17
    • US12883564
    • 2010-09-16
    • Nagataka Tanaka
    • Nagataka Tanaka
    • H01L31/062
    • H01L27/14645H01L27/14609H01L27/14621H04N5/35563H04N5/37457H04N9/045H04N2209/045
    • According to one embodiment, a solid-state imaging device includes an area and color filters. The area includes pixels. Each of the pixels includes a first photodiode, a first read transistor, a second photodiode, a second read transistor, a floating diffusion, a reset transistor, and an amplifying transistor. The first photodiode performs photoelectric conversion. The first read transistor reads a signal charge. The second photodiode has a photosensitivity lower than the first photodiode. The second read transistor reads a signal charge. The floating diffusion stores the signal charges. The reset transistor resets a potential of the floating diffusion. The amplifying transistor amplifies the potential of the floating diffusion. The color filters include a first and a second filters. The relationship QSAT1 > QSAT2 is satisfied. When a saturation level of the first filter is denoted by QSAT1 and a saturation level of the second filter is denoted by QSAT2.
    • 根据一个实施例,固态成像装置包括区域和滤色器。 该区域包括像素。 每个像素包括第一光电二极管,第一读晶体管,第二光电二极管,第二读晶体管,浮动扩散,复位晶体管和放大晶体管。 第一个光电二极管执行光电转换。 第一个读取晶体管读取一个信号电荷。 第二光电二极管的光敏性低于第一光电二极管。 第二个读取晶体管读取信号电荷。 浮动扩散存储信号电荷。 复位晶体管复位浮动扩散的电位。 放大晶体管放大浮动扩散的电位。 滤色器包括第一和第二滤光片。 满足QSAT1> QSAT2的关系。 当QSAT1表示第一滤波器的饱和电平,并且由QSAT2表示第二滤波器的饱和电平时。
    • 4. 发明授权
    • Solid-state image pickup device and method of manufacturing the same
    • 固体摄像装置及其制造方法
    • US07554141B2
    • 2009-06-30
    • US11392616
    • 2006-03-30
    • Tetsuya YamaguchiHiroshige GotoHirofumi YamashitaHisanori IharaIkuko InoueNagataka Tanaka
    • Tetsuya YamaguchiHiroshige GotoHirofumi YamashitaHisanori IharaIkuko InoueNagataka Tanaka
    • H01L31/00H01L31/062H01L31/113
    • H01L27/14689H01L27/1463
    • A solid-state image pickup device comprising a semiconductor substrate which comprises a substrate body containing P-type impurities and a first N-type semiconductor layer containing N-type impurities, the first N-type semiconductor layer being provided on the substrate body, and including a first P-type semiconductor layer which contains p-type impurities, and which is located on the substrate body, a plurality of optical/electrical conversion portions formed of second N-type semiconductor layers which are provided independently of each other in respective positions in a surface portion of the first N-type semiconductor layer, and a plurality of second P-type semiconductor layers which are formed to surround the optical/electrical conversion portions, which are provided along element isolation regions provided in respective positions in the surface portion of the first N-type semiconductor layer, and which continuously extend from the surface portion of the first N-type semiconductor layer to a surface portion of the first P-type semiconductor layer.
    • 一种固态摄像装置,包括:半导体衬底,其包括含有P型杂质的衬底主体和包含N型杂质的第一N型半导体层,所述第一N型半导体层设置在所述衬底主体上;以及 包括含有p型杂质的第一P型半导体层,其位于基板主体上,多个光电转换部分由第二N型半导体层形成,该第二N型半导体层在相应位置彼此独立地设置 在第一N型半导体层的表面部分和形成为围绕光/电转换部分的多个第二P型半导体层,其沿着设置在表面部分中的各个位置的元件隔离区域设置 的第一N型半导体层,并且从第一N型半导体的表面部分连续地延伸 层到第一P型半导体层的表面部分。
    • 7. 发明申请
    • Semiconductor device with burried semiconductor regions
    • 具有埋半导体区域的半导体器件
    • US20060046369A1
    • 2006-03-02
    • US11210681
    • 2005-08-25
    • Hisanori IharaNagataka TanakaHiroshige Goto
    • Hisanori IharaNagataka TanakaHiroshige Goto
    • H01L21/76H01L21/8238
    • H01L27/14609H01L27/14601H01L27/14689
    • A solid-state image sensor having a well of a first conductivity type; a photoelectric conversion region having a second conductivity type formed in the well storing charges obtained from a photoelectric conversion; a drain region having the second conductivity type formed in the well apart from a surface of the well; and a gate electrode formed on the surface of the well via a gate insulator, the gate electrode transferring the charges from the photoelectric conversion region to the drain region. Alternatively, a transistor includes a first semiconductor region having a first conductivity type; second and third semiconductor regions having a second conductivity type formed in the first semiconductor region, the second and third semiconductor regions being separated from each other by a portion of the first semiconductor region serving as a channel region; an insulator layer provided on a surface of the first semiconductor region in contact with the channel region; a gate electrode provided on the insulator layer; and the first semiconductor region includes a shield semiconductor region of the first conductivity type disposed between the surface of the first semiconductor region and at least one of the second and third semiconductor regions such that the at least one of the second and third semiconductor regions is sandwiched between the shield region and the first semiconductor region.
    • 一种具有第一导电类型的阱的固态图像传感器; 在由光电转换得到的储存电荷中形成的具有第二导电类型的光电转换区; 具有第二导电类型的漏极区域形成在与阱的表面分离的井中; 以及通过栅极绝缘体在阱的表面上形成的栅电极,栅电极将电荷从光电转换区域传送到漏区。 或者,晶体管包括具有第一导电类型的第一半导体区域; 具有形成在第一半导体区域中的第二导电类型的第二和第三半导体区域,第二和第三半导体区域被用作沟道区域的第一半导体区域的一部分彼此分离; 设置在与所述沟道区域接触的所述第一半导体区域的表面上的绝缘体层; 设置在所述绝缘体层上的栅电极; 并且第一半导体区域包括设置在第一半导体区域的表面和第二和第三半导体区域中的至少一个之间的第一导电类型的屏蔽半导体区域,使得第二和第三半导体区域中的至少一个被夹在 在所述屏蔽区域和所述第一半导体区域之间。
    • 8. 发明授权
    • CCD image sensor with stacked charge transfer gate structure
    • CCD图像传感器具有堆叠的电荷转移门结构
    • US5506429A
    • 1996-04-09
    • US208750
    • 1994-03-11
    • Nagataka TanakaNobuo NakamuraYoshiyuki MatsunagaShinji OhsawaMichio SasakiHirofumi YamashitaRyohei Miyagawa
    • Nagataka TanakaNobuo NakamuraYoshiyuki MatsunagaShinji OhsawaMichio SasakiHirofumi YamashitaRyohei Miyagawa
    • H01L27/148H04N5/335H04N5/341H04N5/357H04N5/3728H01L29/765
    • H01L27/14831
    • A CCD imager has an array of rows and columns of picture elements on a semiconductor substrate. A vertical charge transfer gate section extends in a first direction on the substrate to be associated with the columns. The transfer gate section includes CCD channels in the substrate, and insulated transfer gate electrodes overlying these CCD channels. A plurality of buffer electrodes are formed at a first level over the substrate surface to overlie the transfer gate electrodes. A plurality of shunt wires are formed at a second level over the substrate surface to overlie the buffer electrodes. The charge transfer gate electrodes and the buffer electrodes are connected with each other by first contact holes. The buffer electrodes and the shunt wires are coupled together by second contact holes. The second contact holes are distributed so that the repeat period thereof as defined at least in a second direction transverse to the first direction on the substrate is equal to or less than two picture elements, whereby their spatial frequency at least in the second direction is half the sampling frequency of photoconversion in the CCD imager, or more.
    • CCD成像器在半导体衬底上具有一列行和列的像素。 垂直电荷转移栅极部分在衬底上的第一方向上延伸以与柱相关联。 传输门部分包括衬底中的CCD通道,以及覆盖这些CCD通道的绝缘传输栅电极。 多个缓冲电极形成在衬底表面上的第一层上以覆盖传输栅电极。 在衬底表面上的第二层上形成多个分流电线以覆盖缓冲电极。 电荷转移栅电极和缓冲电极通过第一接触孔相互连接。 缓冲电极和并联线通过第二接触孔耦合在一起。 分布第二接触孔,使得其至少沿与衬底上的第一方向横切的第二方向限定的重复周期等于或小于两个图像元素,由此其至少在第二方向上的空间频率为一半 CCD成像仪中光电转换的采样频率,或更多。
    • 10. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US08542304B2
    • 2013-09-24
    • US13052145
    • 2011-03-21
    • Motohiro MaedaHirofumi YamashitaNagataka Tanaka
    • Motohiro MaedaHirofumi YamashitaNagataka Tanaka
    • H04N9/083H04N3/14H04N5/335H04N9/04
    • H04N5/37457H01L27/14603H01L27/14609H01L27/1463H01L27/14641H04N9/045
    • According to one embodiment, a solid-state imaging device includes first and second pixel portions, first and second transfer transistors, first and second accumulation portions, an element isolation region, first and second amplifier transistors, and a first and second signal lines. The first and second pixel portions include photoelectric conversion elements, respectively. The first and second transfer transistors transfer first and second charges photoelectrically converted by the first and second pixel portions, respectively. The first and second accumulation portions are interposed between the first and second pixel portions, and accumulate the first and second charges, respectively. The element isolation region is interposed between the first and second accumulation portions. The first and second amplifier transistors amplify voltages generated in accordance with the first and second charges accumulated in the first and second accumulation portions, respectively. The first and second signal lines output signal voltages amplify by the amplifier transistors, respectively.
    • 根据一个实施例,固态成像装置包括第一和第二像素部分,第一和第二转移晶体管,第一和第二累积部分,元件隔离区域,第一和第二放大器晶体管以及第一和第二信号线。 第一和第二像素部分分别包括光电转换元件。 第一和第二转移晶体管分别转移由第一和第二像素部分光电转换的第一和第二电荷。 第一和第二累积部分被插入在第一和第二像素部分之间,分别积累第一和第二电荷。 元件隔离区域介于第一和第二累积部分之间。 第一和第二放大器晶体管分别放大根据积累在第一和第二累积部分中的第一和第二电荷产生的电压。 第一和第二信号线输出信号电压分别由放大器晶体管放大。