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61. 发明授权

US06636413B2 Electrostatic chucks and process for producing the same 有权
公开(公告)号：US06636413B2
公开(公告)日：2003-10-21
申请号：US10004736
申请日：2001-12-04
申请人： Hideyoshi Tsuruta
发明人： Hideyoshi Tsuruta
IPC分类号： H01T2300
CPC分类号： G03F7/70708 , B23Q3/154 , C23C16/4581 , G03F7/707 , H01L21/6831 , H01L21/6833 , H02N13/00 , Y10T29/49 , Y10T279/23
摘要： An electrostatic chuck including a dielectric layer made of aluminum nitride, an inner electrode buried in the dielectric layer, and a surface layer covering a surface of the dielectric layer. The surface layer is made of a material harder than the aluminum nitride constituting the dielectric layer and having a thickness of not less than 200 nm, and the surface of the dielectric layer has a center-line average surface roughness of not more than 25 nm. The electrostatic chuck is adapted to adsorb a wafer onto the dielectric layer through the surface layer.

62. 发明申请

US20030179353A1 Alignment device 失效
标题翻译：对准装置
公开(公告)号：US20030179353A1
公开(公告)日：2003-09-25
申请号：US10362461
申请日：2003-02-25
发明人： Akira Yamauchi , Yoshiyuki Arai , Chisa Inaka , Eiji Shamoto , Toshimichi Moriwaki
IPC分类号： G03B027/42
CPC分类号： H01L21/67294 , B23Q1/34 , G03F7/707 , G03F7/70708 , H01L21/67259 , H01L21/68
摘要： An alignment device comprising a movable table, a plurality of movable support means for movably supporting the movable table, means for reading a recognition mark, and a control means for controlling the drive of the movable support means based on information from the recognition means, wherein each movable support means comprises means having a pair of support blocks each provided to be able to contact/separate with/from the movable table and a pair of piezoelectric actuators each provided with expansible first, second and third piezoelectric elements connected to a support block and extending in each direction, and being capable of walking operation relative to the movable table by the operations of the respective piezoelectric actuators. An alignment accuracy up to a nanometer level can be attained, and the alignment device itself and therefore the entire apparatus incorporating the alignment device can be significantly reduced in thickness and size.
摘要翻译：一种对准装置，包括可移动台，用于可移动地支撑可移动台的多个可移动支撑装置，用于读取识别标记的装置，以及用于基于来自识别装置的信息来控制可移动支撑装置的驱动的控制装置，其中每个可移动支撑装置包括具有一对支撑块的装置，每个支撑块设置成能够与可移动工作台接触/分离;以及一对压电致动器，每个压电致动器设置有连接到支撑块的可膨胀的第一，第二和第三压电元件，在每个方向上延伸，并且能够通过各个压电致动器的操作相对于可移动工作台行走操作。可以达到高达纳米级的对准精度，并且对准装置本身以及因此整合对准装置的整个装置的厚度和尺寸可以显着减小。

63. 发明授权

US06590633B1 Stage apparatus and method for producing circuit device utilizing the same 失效
标题翻译：使用该电路装置的电路装置的制造装置及其制造方法
公开(公告)号：US06590633B1
公开(公告)日：2003-07-08
申请号：US09047222
申请日：1998-03-25
申请人： Kenji Nishi , Toru Kiuchi
发明人： Kenji Nishi , Toru Kiuchi
IPC分类号： G03B2742
CPC分类号： G03F7/70708 , G03F7/70358 , G03F7/707 , G03F7/70716 , G03F7/70991 , H01L21/68
摘要： The stage apparatus can improve static and dynamic features by reducing the number of electrical wiring or tubes for air pressure disposed in a movable main stage member of a movable stage apparatus. The movable stage apparatus has a base structure body and a movable stage structure body. When the movable stage structure body is transferred on the base structure body to a position in which to exchange wafers, a receiving terminal part disposed on the movable stage structure body comes into contact with a feed terminal part disposed on the base structure body and a battery loaded on the movable stage structure body is charged with electric current supplied from the feed terminal part. When the stage structure body is apart from the position in which to exchange wafers, adsorption of the wafer loaded on the stage structure body is sustained electrically by utilizing the electricity of the battery. A control over the start of adsorption or the release thereof upon the action for exchanging wafers is effected in a wireless or wire coupler system.
摘要翻译：舞台装置可以通过减少设置在可移动舞台装置的可移动主舞台构件中的空气压力的电线或管道的数量来改善静态和动态特征。可动平台装置具有基座结构体和可动平台结构体。当可移动平台结构体在基础结构体上转移到交换晶片的位置时，设置在可移动平台结构体上的接收端子部分与设置在基座结构体上的馈电端子部分接触，并且电池装载在可动台结构体上的从馈电端子部分提供的电流充电。当舞台结构体离开交换晶片的位置时，通过利用电池的电力，负载在舞台结构体上的晶片的吸附被电力维持。在无线或线耦合系统中进行用于交换晶片的动作的控制开始吸附或其释放。

64. 发明申请

US20030098965A1 System and method for supporting a device holder with separate components 审中-公开
标题翻译：用于支持具有单独组件的设备支架的系统和方法
公开(公告)号：US20030098965A1
公开(公告)日：2003-05-29
申请号：US10288075
申请日：2002-11-04
发明人： Mike Binnard , Mats Engwall
IPC分类号： G03B027/60
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70716
摘要： A stage assembly (224) for moving and positioning a device (300) includes a device table (308), a device holder (312) that retains the device (300), and a holder connector assembly (338). The holder connector assembly (338) includes a first assembly (320) that supports the device holder (312) relative to the device table (308) along a first axis, and a second assembly (322) that supports the device holder (312) relative to the device table (308) along a second axis, the second axis being orthogonal to the first axis.
摘要翻译：用于移动和定位装置（300）的台架组件（224）包括装置台（308），保持装置（300）的装置保持架（312）和保持器连接器组件（338）。保持器连接器组件（338）包括：第一组件（320），其沿着第一轴线相对于所述装置台（308）支撑所述装置保持器（312）;以及第二组件（322），其支撑所述装置保持器（312）相对于所述装置台（308）沿着第二轴线，所述第二轴线与所述第一轴线正交。

65. 发明申请

US20030043357A1 Vacuum chamber having instrument- mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same 审中-公开
标题翻译：具有仪表安装隔板的真空室响应于压力差而呈现出减小的变形，以及包括其的能量束系统
公开(公告)号：US20030043357A1
公开(公告)日：2003-03-06
申请号：US10209738
申请日：2002-07-31
申请人： Nikon Corporatoin
发明人： Toshimasa Shimoda
IPC分类号： G03B027/42
CPC分类号： G03F9/7096 , G03F7/707 , G03F7/70708 , G03F7/70808 , G03F7/70833 , G03F7/70841 , H01J37/16 , H01J2237/3175 , H01L21/67253
摘要： Reduced-pressure (nullvacuumnull) chambers, and microlithographic exposure systems including one or more of such chambers, are disclosed. The vacuum chamber exhibits reduced deformation of a bulkhead of the chamber during evacuation of the chamber or occurrence of a change in pressure differential across the bulkhead. A nullpannull (serving as a secondary wall) is situated at a gap distance from the bulkhead. A secondary reduced-pressure chamber is formed in the gap between the pan and the bulkhead. The secondary reduced-pressure chamber is isolated from atmospheric pressure outside the chamber and from the subatmospheric pressure inside the chamber. The differential between atmospheric pressure and the pressure inside the secondary reduced-pressure chamber is exerted on the pan, but the pressure differential has substantially no effect on the bulkhead, thereby reducing deformation of the bulkhead. Reducing deformation of the bulkhead prevents degradations of accuracy, otherwise caused by pressure-change-induced deformation of the bulkhead, of any instruments mounted to the bulkhead.
摘要翻译：公开了减压（“真空”）室和包括一个或多个这样的室的微光刻曝光系统。真空室在室内排空过程中表现出腔室隔板的变形减小或横跨舱壁的压力差发生变化。 “锅”（作为次级墙）位于与隔板间隙的距离处。二次减压室形成在锅和舱壁之间的间隙中。二次减压室与室外的大气压力以及室内的低于大气压的压力隔离。二次减压室内的压力与二次减压室内的压力之间的差值被施加在盘上，但压力差对隔板基本上没有影响，从而减小了舱壁的变形。减少舱壁的变形可以防止因安装在舱壁上的任何仪器而导致舱壁的压力变化引起的变形造成的精度降低。

66. 发明申请

US20030030402A1 Stage assembly and exposure apparatus including the same 失效
标题翻译：舞台组合和包括其的曝光装置
公开(公告)号：US20030030402A1
公开(公告)日：2003-02-13
申请号：US09925531
申请日：2001-08-10
申请人： Nikon Corporation.
发明人： Michael Binnard
IPC分类号： B64C017/06
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70758 , G03F7/70766
摘要： A stage assembly for an exposure apparatus is disclosed. The stage assembly comprises a guide assembly. The guide assembly includes a guide bar, a stage, a first actuator component, and a second actuator component. The guide bar is movable in a first direction and has a center of gravity and a guiding portion. The stage is movable along the guiding portion of the guide bar in a second direction substantially perpendicular to the first direction and exerts a reaction force on the guide bar. The stage has a center of gravity spaced apart from the center of gravity of the guide bar in the first direction. The first actuator component is positioned on the guide bar. The first actuator component is aligned with the center of gravity of the stage in the second direction to apply a compensating force on the guide bar to cancel the reaction force exerted by the stage. The second actuator component is positioned on the guide bar. The second actuator component is aligned with the center of gravity of the guide bar in the second direction to apply a force on the guide bar to control a position of the guide bar in the second direction.
摘要翻译：公开了一种用于曝光设备的舞台组件。台架组件包括导向组件。引导组件包括导杆，平台，第一致动器部件和第二致动器部件。引导杆可沿第一方向移动并具有重心和引导部分。台架沿导向杆的引导部分沿基本上垂直于第一方向的第二方向移动，并在导杆上施加反作用力。舞台具有在第一方向上与导杆重心间隔开的重心。第一致动器部件定位在导杆上。第一致动器部件在第二方向上与工作台的重心对准，以在引导杆上施加补偿力，以消除由工作台施加的反作用力。第二致动器部件定位在导杆上。第二致动器部件沿着第二方向与引导杆的重心对准，以在引导杆上施加力以控制导杆在第二方向上的位置。

67. 发明申请

US20030001107A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20030001107A1
公开(公告)日：2003-01-02
申请号：US10164706
申请日：2002-06-10
申请人： ASML NETHERLANDS B.V.
发明人： Mark Kroon , Jan Evert Van Der Werf , Haico Victor Kok
IPC分类号： G21K005/08
CPC分类号： G03F9/7088 , G03F7/706 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/7085
摘要： One example of a lithographic projection apparatus includes an image sensing device configured and arranged to measure a pattern in a patterned projection beam. The image sensing device includes a slab and a radiation-sensitive sensor that is sensitive to the radiation of the projection beam. The image sensing device also includes a film of a material that is non-transparent to the radiation of the projection beam. This film is provided over the sensor and includes one or more patterned segments to selectively pass radiation of the projection beam to the sensor. The apparatus also includes an intermediate plate made from a material having a thermal expansion coefficient below approximately 12null10null6Knull1 and having a slab-bearing surface.
摘要翻译：光刻投影设备的一个示例包括被配置和布置为测量图案化投影光束中的图案的图像感测装置。图像感测装置包括对投影光束的辐射敏感的平板和辐射敏感传感器。图像感测装置还包括对投影光束的辐射不透明的材料的膜。该膜设置在传感器上方并且包括一个或多个图案化区段以选择性地将投影光束的辐射传递到传感器。该装置还包括由热膨胀系数低于约12×10 -6 K -1的材料制成并具有板坯承载表面的中间板。

68. 发明申请

US20020196421A1 Stage device, exposure apparatus and method 失效
标题翻译：舞台装置，曝光装置和方法
公开(公告)号：US20020196421A1
公开(公告)日：2002-12-26
申请号：US10134607
申请日：2002-04-30
申请人： NIKON CORPORATION
发明人： Keiichi Tanaka , Michael Binnard , Robert Martinek , Daniel Martinek , Andrew J. Hazelton
IPC分类号： G03B027/58
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/70766 , G03F7/709
摘要： In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.
摘要翻译：在曝光装置的舞台装置中，第一级通过第一X轴电动机沿X轴方向驱动，同时由第一导杆一侧支撑，并且第二级在X轴上被驱动方向由第二X轴电机同时由第二引导杆一侧支撑。第一导杆和第二导杆通过Y轴线性电动机在Y轴方向上独立地驱动。在第一引导杆和第二引导杆彼此最靠近的状态下，与由第一引导杆支撑的一侧相对的第一级的端部设置在第二引导杆的上方，而第二引导杆的端部与由第二导杆支撑的一侧相对的台架放置在第一导杆的上方。第一和第二衬底台分别经由第一和第二微动驱动装置支撑在第一和第二级上方。舞台装置的上述构造允许并且抑制由于衬底台的驱动而引起的每一级的姿态变化。

69. 发明申请

US20020179867A1 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen 有权
标题翻译：用于确定平坦度，缺陷的存在和样品的薄膜特性的方法和系统
公开(公告)号：US20020179867A1
公开(公告)日：2002-12-05
申请号：US09956837
申请日：2001-09-20
发明人： John Fielden , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , Dan Wack
IPC分类号： G01N021/00 , G01N021/88 , G01B011/28
CPC分类号： G03F7/70708 , G01N21/211 , G01N21/47 , G01N21/55 , G01N21/636 , G01N21/64 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N21/956 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , Y10T117/1004 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, flatness, a presence of defects, and a thin film characteristic. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于平坦度，缺陷的存在和薄膜特性。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

70. 发明授权

US06485153B2 Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US06485153B2
公开(公告)日：2002-11-26
申请号：US09320710
申请日：1999-05-27
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G02B510
CPC分类号： G03F9/7026 , G03F7/70233 , G03F7/70358 , G03F7/707 , G03F7/70708 , G03F9/7003
摘要： An exposure apparatus is provided wherein an illumination beam emitted from a mask is projected onto a substrate, through a projection optical system having a reflecting optical element that includes a reflecting region for reflecting the illumination beam at a position spaced from an optical axis of the projection optical system, and a space portion that is provided on the side of the optical axis with respect to the reflecting region. The apparatus further includes a position detecting device for detecting position information of the substrate, at least part of which is located in the space of the reflecting optical element.
摘要翻译：提供了一种曝光装置，其中从掩模发射的照明光束通过具有反射光学元件的投影光学系统投射到基板上，所述投影光学系统包括反射区域，用于将照明光束反射在与投影的光轴间隔开的位置光学系统和设置在相对于反射区域的光轴侧的空间部分。该装置还包括位置检测装置，用于检测基板的位置信息，其中至少一部分位于反射光学元件的空间中。

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