专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明授权

US4578137A Chemical bath apparatus and support assembly 失效
标题翻译：化学浴装置和支撑组件
公开(公告)号：US4578137A
公开(公告)日：1986-03-25
申请号：US572940
申请日：1984-01-23
申请人： Charles J. Kring
发明人： Charles J. Kring
IPC分类号： C23F1/08 , C23F3/02
CPC分类号： C23F1/08 , Y10S220/917 , Y10S220/918
摘要： A chemical bath apparatus is disclosed in which an open topped beaker having a heater mounted to the exterior wall thereof is supported in an open topped surrounding housing or shell by a support assembly, the beaker being in spaced relation to the shell. The support assembly includes a sleeve mounted in sealed relation around the heater so as to isolate the same from corrosive fumes and a resilient pad extending over a substantial area of the bottom wall of the beaker for support of substantially the entire weight of the beaker and chemical substance through the bottom wall. Vent openings for convection cooling between the shell and sleeve are also provided.
摘要翻译：公开了一种化学浴装置，其中具有安装在其外壁上的加热器的开口顶部烧杯通过支撑组件支撑在敞开的顶部周围的壳体或壳体中，所述烧杯与壳体间隔开。支撑组件包括以围绕加热器的密封关系安装的套筒，以将其与腐蚀性烟雾隔离，并且弹性垫在烧杯的底壁的大部分区域上延伸，用于基本上支撑烧杯和化学品的整个重量物质通过底壁。还提供了用于壳体和套筒之间的对流冷却的通风口。

62. 发明授权

US4557785A Apparatus for wet processing 失效
标题翻译：湿法加工设备
公开(公告)号：US4557785A
公开(公告)日：1985-12-10
申请号：US625155
申请日：1984-06-27
申请人： Yuji Ohkuma
发明人： Yuji Ohkuma
IPC分类号： C23F1/08 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/00
CPC分类号： C23F1/08 , H01L21/306 , Y10S134/902
摘要： An apparatus and system for wet processing a substrate, which can be used for chemical processing such as etching or washing a semiconductor substrate are disclosed. The apparatus has a processing chamber in which the substrate is wet processed. Processing liquid is injected into the processing chamber through an opening and nozzles, and the substrate is floated in the injected liquid and rotated about its center axis by streams of the injected liquid. The wet processing system is composed from a processing apparatus as mentioned above, a water bearing system which transfers the substrate by means of a water stream, and a spin dryer. The water bearing system also serves as a washing apparatus. Shutters are provided between the water bearing and the processing chamber or the spin dryer, the shutters controlling the water levels between these elements.
摘要翻译：公开了一种用于湿处理基板的装置和系统，其可用于化学处理，例如蚀刻或洗涤半导体基板。该设备具有处理室，其中衬底被湿加工。处理液体通过开口和喷嘴注入到处理室中，并且基板浮在注入的液体中并且通过喷射液体的流围绕其中心轴线旋转。湿处理系统由上述处理装置，通过水流传送基板的水承载系统和旋转干燥机构成。水承载系统还用作洗涤装置。在水轴承和处理室或旋转干燥器之间提供百叶窗，百叶窗控制这些元件之间的水位。

63. 发明授权

US4552614A Demetallizing method and apparatus 失效
标题翻译：脱金属化方法和装置
公开(公告)号：US4552614A
公开(公告)日：1985-11-12
申请号：US621609
申请日：1984-06-18
申请人： Donald E. Beckett
发明人： Donald E. Beckett
IPC分类号： B44C3/00 , C23F1/02 , C23F1/08 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： B44C3/005 , C23F1/02 , C23F1/08
摘要： Demetallizing method and apparatus capable of high speed continuous production of selectively patterned metallized polymeric film useful in packaging products are disclosed. Aqueous etchant solution is spray applied to the metallized surface having a pattern of etchant-resistant material applied thereto, the spent etchant solution is spray washed from the surface, and the washed web is dried by hot air drying. Etchant removes metal from exposed areas of the surface of the film while leaving the pattern unaffected, so as to provide a desired visible pattern.
摘要翻译：公开了能够高速连续生产用于包装产品的选择性图案化金属化聚合物膜的脱金属化方法和装置。将水性蚀刻剂溶液喷涂到具有施加到其上的耐蚀刻材料图案的金属化表面上，将废蚀刻剂溶液从表面喷雾洗涤，并且通过热空气干燥干燥洗涤过的网。蚀刻剂从膜的表面的暴露区域去除金属，同时使图案不受影响，从而提供期望的可见图案。

64. 发明授权

US4540465A Process for continuous recovery of nitric acid/hydrofluoric acid titanium etchant 失效
标题翻译：连续回收硝酸/氢氟酸钛蚀刻剂的方法
公开(公告)号：US4540465A
公开(公告)日：1985-09-10
申请号：US619224
申请日：1984-06-11
申请人： Dolphus L. Coggins , Walter E. Lindner
发明人： Dolphus L. Coggins , Walter E. Lindner
IPC分类号： C23F1/00 , C23F1/08 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： C23F1/08 , C23F1/00
摘要： A process of continuously chemically milling refractory metals, e.g., titanium using a supersaturated milling solution which form a water soluble precipitate, milling at temperatures of 140.degree.-160.degree. F., and using two chemical milling tanks so that the milling solution is pumped from one to the other when the precipitate builds up in the first tank to a predetermined level. The water soluble precipitate is easily and inexpensively disposed of and the process makes more efficient use of chemicals.
摘要翻译：使用形成水溶性沉淀物的过饱和研磨溶液，在140°-116°F的温度下研磨难熔金属例如钛的方法，并使用两个化学研磨槽，从而将研磨溶液从当沉淀物在第一罐中积聚到预定水平时，一个接一个。水溶性沉淀物容易且廉价地处理，并且该方法更有效地使用化学品。

65. 发明授权

US4440594A Method and apparatus of chemical milling of chemical materials 失效
标题翻译：化学材料化学研磨的方法和装置
公开(公告)号：US4440594A
公开(公告)日：1984-04-03
申请号：US427734
申请日：1982-09-29
申请人： Llewelyn B. Stearns
发明人： Llewelyn B. Stearns
IPC分类号： C23F1/08 , C23F1/00
CPC分类号： C23F1/08
摘要： The field of this invention relates to an improved apparatus and method for chemical treatment or milling of materials that provides complete control of gases generated during the milling phase. The apparatus consists of a vapor-tight containment for all procedures before, during, and after treatment, i.e., milling which might result in the generation of noxious fumes.To facilitate the treatment of nitrogen oxide gases, air dilution of off-gases is minimized, thus enhancing the reaction transforming the gases to the water soluble form. Reaction kinetics are improved so that near-perfect scrubber efficiency can be achieved.The entire enclosure means is compartmentalized, yet substantially completely vapor-tight to provide a safe environment for personnel (i.e., during handling and inspection of workpieces) and to provide areas for other treatment of the workpieces (i.e., activation of workpiece surfaces by spraying with HCl acid). Workpieces can be transported from one compartment to the next while preserving the integrity of each compartment via a substantially vapor-tight track system between compartments. Each compartment is separated from adjacent compartments by substantially vapor-tight doors.The generation of the greater volume of noxious gases during immersion milling will take place at the immersion tank. The airspace over the tank is delimited by the cover attached to the workpiece holder. This airspace is connected through a venting means to a scrubber system which may separately or in combination treat fumes from the other compartments of the apparatus.
摘要翻译：本发明的领域涉及一种用于化学处理或研磨材料的改进的装置和方法，其提供在研磨阶段期间产生的气体的完全控制。该设备由处理之前，期间和之后的所有程序的蒸汽密封容器组成，即可能导致产生有害烟雾的研磨。为了促进氮氧化物气体的处理，废气的空气稀释最小化，从而增强将气体转化为水溶性形式的反应。反应动力学得到改善，从而可以实现接近完美的洗涤器效率。整个外壳装置是分隔的，但基本上完全是气密的，为人员提供安全的环境（即在工件的处理和检查期间），并为工件的其他处理提供区域（即通过喷涂来激活工件表面 HCl酸）。工件可以从一个隔间运输到下一个隔间，同时通过隔室之间的基本上气密的轨道系统保持每个隔室的完整性。每个隔室通过基本上气密的门与相邻的隔室分开。浸入式研磨过程中会产生较大量的有害气体，坦克上方的空域由附着在工件支架上的盖子界定。该空气空间通过排气装置连接到洗涤器系统，洗涤器系统可以单独地或组合地处理来自装置的其它隔室的烟雾。

66. 发明授权

US4406160A Method of inspecting a resist layer on a gravure printing plate, and device for practicing same 失效
标题翻译：在凹版印刷版上检查抗蚀剂层的方法及其实施方法
公开(公告)号：US4406160A
公开(公告)日：1983-09-27
申请号：US173816
申请日：1980-07-30
申请人： Satoru Horiguchi , Shinichi Amemiya
发明人： Satoru Horiguchi , Shinichi Amemiya
IPC分类号： B41C1/02 , C23F1/08 , G01N33/22 , G01N33/44
CPC分类号： C23F1/08 , B41C1/025
摘要： An inspecting liquid is dropped onto a resist layer formed on a gravure printing plate and is allowed to permeate the resist layer to reach the printing plate so that a short circuit is formed between the inspecting liquid and the printing plate. The time required for forming the short circuit is measured to determine the conditions of the resist layer thereby to improve the quality of the finished printing plate.
摘要翻译：将检查液滴在形成于凹版印刷版上的抗蚀剂层上，使其透过抗蚀剂层到达印版，从而在检查液与印刷版之间形成短路。测量形成短路所需的时间，以确定抗蚀剂层的条件，从而提高成品印刷版的质量。

67. 发明授权

US4233108A Process for use in etching the outer surface of a metal member 失效
标题翻译：用于蚀刻金属构件的外表面的方法
公开(公告)号：US4233108A
公开(公告)日：1980-11-11
申请号：US17374
申请日：1979-03-05
申请人： Masamitu Tamura , Yukio Yasuhara , Shigeharu Nakamura , Masaru Sakai , Kazuo Akagi , Ryohei Kazihata , Norio Satohara
发明人： Masamitu Tamura , Yukio Yasuhara , Shigeharu Nakamura , Masaru Sakai , Kazuo Akagi , Ryohei Kazihata , Norio Satohara
IPC分类号： C23G3/00 , C23F1/00 , C23F1/08 , C23G3/04
CPC分类号： C23F1/08 , C23F1/00 , C23G3/04
摘要： A process and an apparatus within which there is provided at least one, or a plurality of tanks in series relation, depending upon the type of member being treated, each tank having one or more openings within its walls, respectively, which are provided in alignment with each other. With this apparatus, one or more metal members such as for example, a bar, rod, pipe, or tube, is rotatably fed through the aforenoted openings into the tank or tanks, thereby enabling a continuous automatic-etching process of the outer surface of the metal members to be performed. As an alternative, there is provided within each tank, a triple walled cylindrical body or solution flow guide, whereby a solution for etching may uniformly flow in the direction of the metal member being conducted through the tank or tanks, and along the outer surface thereof, so that a desired surface condition of the bar, rod, pipe or tube may be obtained in an efficient manner.
摘要翻译：根据待处理的构件的类型，分别设置有至少一个或多个串联的容器的过程和装置，每个罐在其壁内分别具有一个或多个开口，该开口以对齐的方式设置与彼此。利用这种装置，一个或多个金属构件，例如杆，杆，管或管，通过前述的开口可旋转地进入罐或罐中，从而使得能够连续自动蚀刻工艺的外表面要执行的金属构件。作为替代，在每个罐内设置有三壁圆柱体或溶液流动引导件，由此用于蚀刻的溶液可以均匀地沿着穿过罐或罐的金属构件的方向流动，并且沿着其外表面，从而可以以有效的方式获得棒，棒，管或管的期望的表面状态。

68. 发明授权

US4137118A Chemical milling apparatus 失效
公开(公告)号：US4137118A
公开(公告)日：1979-01-30
申请号：US837304
申请日：1977-09-27
申请人： Daniel J. Brimm
发明人： Daniel J. Brimm
IPC分类号： C23F1/02 , C23F1/04 , C23F1/08
CPC分类号： C23F1/04 , C23F1/02 , C23F1/08 , Y10T428/24174
摘要： Chemical milling processes which employ a series of masking and metal removal steps. Apparatus for orbiting the workpiece in a prescribed manner about mutually perpendicular axes during the metal removal steps.

69. 发明授权

US4069085A Apparatus for forming apertures in a thin metal tape such as a shadow mask for a color television display tube 失效
标题翻译：用于在诸如彩色电视显示管的荫罩的薄金属带中形成孔的装置
公开(公告)号：US4069085A
公开(公告)日：1978-01-17
申请号：US617524
申请日：1975-09-29
申请人： Petrus Johannes Buysman , Gerardus Antonius Wilhelmus Vermeulen , Cornelis Arie Bos
发明人： Petrus Johannes Buysman , Gerardus Antonius Wilhelmus Vermeulen , Cornelis Arie Bos
IPC分类号： C23F1/08 , H01J9/14 , C23F1/02
CPC分类号： H01J9/142 , C23F1/08
摘要： A method of forming apertures in a thin metal tape. Cavities having a depth of at least half of the tape thickness are first etched from one side. Etching is then carried out mainly from the other side until apertures having the desired profile have been formed. During etching the first-mentioned side, the said other side is covered with a foil of synthetic resin. Shadow mask for a color television display tube manufactured according to a similar method.
摘要翻译：一种在薄金属带中形成孔的方法。首先从一侧蚀刻具有至少一半带厚度的深度的凹穴。然后主要从另一侧进行蚀刻，直到形成具有所需轮廓的孔。在蚀刻第一侧时，所述另一侧被合成树脂箔覆盖。用于根据类似方法制造的彩色电视显示管的阴影掩模。

70. 发明授权

US4015706A Connecting modules for an etching system 失效
标题翻译：连接蚀刻系统的模块
公开(公告)号：US4015706A
公开(公告)日：1977-04-05
申请号：US433482
申请日：1974-01-15
申请人： Daniel L. Goffredo , Conrad Dale Shakley
发明人： Daniel L. Goffredo , Conrad Dale Shakley
IPC分类号： B65G13/02 , C23F1/08 , H05K3/00
CPC分类号： B65G13/04 , C23F1/08 , H05K3/0085 , B65G2207/30
摘要： An etching system is disclosed, whereby individual and discrete modules are provided, each for performing its own function, with the modules being longitudinally connected in serial arrangement, and being aligned by suitable pin-in-hole arrangement, and with a common drive for all of the modules, by the use of drive rods carried by each of the modules that are coupled together with the connecton of adjacent modules. Individual features of the various drive means are also disclosed.
摘要翻译：公开了一种蚀刻系统，由此提供单独和分立的模块，每个模块用于执行其自身的功能，其中模块以串联方式纵向连接，并且通过合适的销孔安排对齐，并具有用于所有的公共驱动通过使用与相邻模块的连接件联接在一起的每个模块所携带的驱动杆来实现。还公开了各种驱动装置的各个特征。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式