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61. 发明授权

US08171405B2 Information processing program, information processing method, and information processing device 有权
标题翻译：信息处理程序，信息处理方法和信息处理装置
公开(公告)号：US08171405B2
公开(公告)日：2012-05-01
申请号：US12543770
申请日：2009-08-19
申请人： Taro Yamamoto
发明人： Taro Yamamoto
IPC分类号： G06F17/00
CPC分类号： G06F17/211 , G06F17/24
摘要： The present invention is intended to improve operability in page-by-page editing operation of a document file having multiple pages using a computer. A display processor displays multiple pages of the document file in list form on a display unit, selects an item to be displayed from a plurality of items contained in attribute information allocated to each page, and displays the attribute information relating to the item that has been selected in association with each page. An editing processor receives page selection operation and editing operation, executes editing process on a selected page, and updates the attribute information by rewriting an item associated with the editing process of the attribute information allocated to the selected page. After the editing process by the editing processor, the display processor selects an item to be displayed from the plurality of items of the attribute information based on the substance of the editing process to update a display item list of the attribute information.
摘要翻译：本发明旨在通过使用计算机提高具有多个页面的文档文件的逐页编辑操作的可操作性。显示处理器以列表形式在显示单元上显示文档文件的多个页面，从分配给每个页面的属性信息中包含的多个项目中选择要显示的项目，并显示与已经被分配的项目相关的属性信息与每个页面相关联地选择。编辑处理器接收页面选择操作和编辑操作，对所选择的页面执行编辑处理，并通过重写与分配给所选页面的属性信息的编辑处理相关联的项目来更新属性信息。在通过编辑处理器的编辑处理之后，显示处理器基于编辑处理的实质从属性信息的多个项目中选择要显示的项目，以更新属性信息的显示项目列表。

62. 发明授权

US08111372B2 Coating film forming apparatus and coating film forming method for immersion light exposure 有权
标题翻译：涂膜成膜装置和浸渍曝光的涂膜成膜方法
公开(公告)号：US08111372B2
公开(公告)日：2012-02-07
申请号：US12515368
申请日：2007-11-19
申请人： Hideharu Kyouda , Junichi Kitano , Taro Yamamoto
发明人： Hideharu Kyouda , Junichi Kitano , Taro Yamamoto
IPC分类号： H01L21/66
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70991 , H01L21/6715
摘要： A coating film forming apparatus for immersion light exposure includes one or more coating units configured to apply a resist film or a resist film and an additional film onto a substrate, one or more thermally processing units configured to perform a thermal process, a defect eliciting unit configured to perform a process for eliciting a latent defect of a coating film at an edge portion of the substrate, a checking unit configured to check a state of the coating film after the process by the defect eliciting unit, a control section configured to use a check result obtained by the checking unit to make a judgment of the state of the coating film and permit transfer of the substrate to the light exposure apparatus, and a cleaning unit configured to perform cleaning on the substrate before the process by the defect eliciting unit.
摘要翻译：用于浸没曝光的涂膜形成装置包括一个或多个涂覆单元，其被配置为将抗蚀剂膜或抗蚀剂膜和附加膜施加到基板上，一个或多个热处理单元，被配置为执行热处理，缺陷引出单元被配置为执行用于在所述基板的边缘部分处引导涂膜的潜在缺陷的处理，所述检查单元被配置为在所述缺陷引出单元处理之后检查所述涂膜的状态;控制部，被配置为使用由检查单元获得的检查结果以判断涂膜的状态并允许将基板转移到曝光装置;以及清洁单元，被配置为在由缺陷引出单元进行处理之前在基板上进行清洁。

63. 发明授权

US08069816B2 Coating film processing method and apparatus 有权
标题翻译：涂膜处理方法和装置
公开(公告)号：US08069816B2
公开(公告)日：2011-12-06
申请号：US11950122
申请日：2007-12-04
申请人： Taro Yamamoto , Kousuke Yoshihara
发明人： Taro Yamamoto , Kousuke Yoshihara
IPC分类号： B05C11/02 , B05C11/00 , B05B7/06 , G03D5/00
CPC分类号： H01L21/6715 , G03F7/70341 , H01L21/67051
摘要： A coating film processing method is used for processing a coating film formed on a surface of a substrate to prepare for an immersion light exposure process arranged to perform light exposure through a liquid. The method includes supplying a solvent-containing liquid comprising a combination of a solvent and a solvent-ability decreasing agent for decreasing solvent ability, or a diluted solvent, onto an edge portion of the coating film, thereby performing edge portion cutting; and supplying a cleaning liquid onto the edge portion of the coating film, thereby performing edge portion cleaning, subsequently to the edge portion cutting.
摘要翻译：使用涂膜处理方法来处理形成在基板的表面上的涂膜，以准备用于通过液体进行曝光的浸没曝光处理。该方法包括将包含溶剂和溶剂能力降低剂的组合的含溶剂的液体或稀释的溶剂供应到涂膜的边缘部分上，从而进行边缘部分切割; 并将清洗液供给到涂膜的边缘部分上，从而进行边缘部分的清洁。

64. 发明授权

US07823534B2 Development device and development method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US07823534B2
公开(公告)日：2010-11-02
申请号：US10584264
申请日：2004-12-24
申请人： Atsushi Ookouchi , Taro Yamamoto , Hirofumi Takeguchi , Hideharu Kyouda , Kousuke Yoshihara
发明人： Atsushi Ookouchi , Taro Yamamoto , Hirofumi Takeguchi , Hideharu Kyouda , Kousuke Yoshihara
IPC分类号： B05C5/02 , B05D1/36
CPC分类号： H01L21/67051 , G03F7/3021 , H01L21/6708 , H01L21/6715 , H01L21/6719 , Y10S134/902
摘要： A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.
摘要翻译：显影剂喷嘴从晶片的周边朝向中心部分移动，同时保持在旋转卡盘处的暴露的基板围绕垂直轴线旋转并且显影液从显影剂喷嘴排出，并且以这种方式，显影液被提供到晶片的表面，显影剂喷嘴具有狭缝状喷射口，其纵向方向定向为垂直于晶片的径向的方向。喷嘴的移动速度高于使用具有小直径圆形喷嘴的喷嘴的情况，这使得能够减少显影时间。此外，可以减少基板上的显影液的厚度，从而可以节省显影液。

65. 发明申请

US20100233637A1 DEVELOPING APPARATUS, DEVELOPING METHOD, AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20100233637A1
公开(公告)日：2010-09-16
申请号：US12718104
申请日：2010-03-05
申请人： Hiroshi ARIMA , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
发明人： Hiroshi ARIMA , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
IPC分类号： G03F7/20 , G03B27/52 , G06F17/00
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
摘要翻译：一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。

66. 发明申请

US20100154834A1 CLEANING APPARATUS, COATING AND DEVELOPING APPARATUS, AND CLEANING METHOD 有权
标题翻译：清洁装置，涂装和开发设备和清洁方法
公开(公告)号：US20100154834A1
公开(公告)日：2010-06-24
申请号：US12716981
申请日：2010-03-03
申请人： Masahiro Fukuda , Taro Yamamoto
发明人： Masahiro Fukuda , Taro Yamamoto
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , H01L21/68742
摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44.This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.
摘要翻译：通过真空吸盘42在晶片W与密封容器41的内表面之间形成小间隙，将晶片W保持在气密容器41内的水平位置。向玻璃W的中心部分供给清洗液通过作为流体供给路径5的端部的流体供给口40将晶片W的前表面通过布置在气密容器41的底部的流体排出部44排出，形成为沿着其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部朝向周边部分流动，同时除去附着在晶片W上的微粒，并通过流体排出部这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

67. 发明申请

US20100050073A1 INFORMATION PROCESSING PROGRAM, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING DEVICE 有权
标题翻译：信息处理程序，信息处理方法和信息处理装置
公开(公告)号：US20100050073A1
公开(公告)日：2010-02-25
申请号：US12543770
申请日：2009-08-19
申请人： Taro Yamamoto
发明人： Taro Yamamoto
IPC分类号： G06F17/20
CPC分类号： G06F17/211 , G06F17/24
摘要： The present invention is intended to improve operability in page-by-page editing operation of a document file having multiple pages using a computer. A display processor displays multiple pages of the document file in list form on a display unit, selects an item to be displayed from a plurality of items contained in attribute information allocated to each page, and displays the attribute information relating to the item that has been selected in association with each page. An editing processor receives page selection operation and editing operation, executes editing process on a selected page, and updates the attribute information by rewriting an item associated with the editing process of the attribute information allocated to the selected page. After the editing process by the editing processor, the display processor selects an item to be displayed from the plurality of items of the attribute information based on the substance of the editing process to update a display item list of the attribute information.
摘要翻译：本发明旨在通过使用计算机提高具有多个页面的文档文件的逐页编辑操作的可操作性。显示处理器以列表形式在显示单元上显示文档文件的多个页面，从分配给每个页面的属性信息中包含的多个项目中选择要显示的项目，并显示与已经被分配的项目相关的属性信息与每个页面相关联地选择。编辑处理器接收页面选择操作和编辑操作，对所选择的页面执行编辑处理，并通过重写与分配给所选页面的属性信息的编辑处理相关联的项目来更新属性信息。在通过编辑处理器的编辑处理之后，显示处理器基于编辑处理的实质从属性信息的多个项目中选择要显示的项目，以更新属性信息的显示项目列表。

68. 发明申请

US20090145489A1 TEMPERATURE REGULATION METHOD AND SYSTEM FOR LOW FLOW RATE LIQUID 有权
标题翻译：低流量液体的温度调节方法和系统
公开(公告)号：US20090145489A1
公开(公告)日：2009-06-11
申请号：US11719347
申请日：2005-11-07
申请人： Hiroyasu Goto , Masahiro Fukuda , Taro Yamamoto
发明人： Hiroyasu Goto , Masahiro Fukuda , Taro Yamamoto
IPC分类号： F16L53/00 , F17D1/14
CPC分类号： G05D23/1919 , Y10T137/6416
摘要： ABSTRACT A method and a system for controlling temperature of a liquid in small flow amount, for supplying a liquid whose temperature is highly accurately controlled, as a flow of a small flow amount or an intermittent flow. A liquid supplied from a supply path is pressurized and introduced into a circulation path, and is temperature-controlled by a temperature control device in the circulation path, while being circulated in the circulation path by a pump in the pressurized condition. The liquid is supplied to an exterior device through a discharge path caused to branch from the circulation path, as a consecutive flow in a small amount or an intermittent flow in a small amount in a flow amount less than at least ½ times the flow amount in the circulation path, by adjusting a discharge valve provided in the discharge path.
摘要翻译：摘要：一种用于控制小流量的液体的温度的方法和系统，用于将温度高度精确控制的液体作为小流量或间歇流量的流动。从供给路径供给的液体被加压并引入循环路径，并且通过循环路径中的温度控制装置进行温度控制，同时在加压状态下通过泵在循环路径中循环。液体通过从循环路径分支的排出路径供给到外部装置，作为少量的连续流量或少量的少量的间歇流量，流量少于流量的至少1/2的流量循环路径，通过调节设置在排出路径中的排出阀。

69. 发明申请

US20090033898A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20090033898A1
公开(公告)日：2009-02-05
申请号：US12173262
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
发明人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
IPC分类号： G03B27/42 , G03F7/22
CPC分类号： G03B27/42 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.
摘要翻译：显影装置包括：处理各自涂覆有抗蚀剂并通过显影处理曝光处理的基板的显影装置包括：多个显影单元，每个显影单元设置有用于将显影剂稳定地浇注到基板上的基板保持装置，第一显影剂喷嘴通过多个显影单元共同使用将显影剂倾倒在由每个基板保持装置保持的基板上的带状流中，用于将第一显影剂喷嘴从另一个承载到显影单元的喷嘴驱动机构，并且移动第一显影剂喷嘴，其中一个带状区域的一端，显影剂将通过第一显影剂喷嘴注入到每个显影单元中的基板的中心，使得其中的部分在显影剂注入的基板从中心部分向周边部分移动，或从周边部分朝向表面的中心部分移动 e基板，其全部用显影剂膜涂覆基板的表面;以及第二显影剂喷嘴，用于将显影剂倾倒成比带状区域的短的短的短的长度的圆形区域或带状区域，第一显影剂喷嘴将显影剂倾倒在其上已由第一显影剂喷嘴形成有显影剂膜的基板的中心部分。喷嘴被选择性地用于显影步骤。

70. 发明申请

US20070215178A1 PROTECTIVE FILM REMOVING DEVICE, MIXED CHEMICAL SOLUTION RECOVERING METHOD AND PROGRAM STORAGE MEDIUM 有权
标题翻译：保护膜去除装置，混合化学溶液回收方法和程序存储介质
公开(公告)号：US20070215178A1
公开(公告)日：2007-09-20
申请号：US11681977
申请日：2007-03-05
申请人： Taro Yamamoto , Kousuke Yoshihara
发明人： Taro Yamamoto , Kousuke Yoshihara
IPC分类号： B08B7/04 , B08B3/04 , B08B3/00
CPC分类号： H01L21/6715 , H01L21/6708
摘要： The present invention improves recover percentage at which a mixed chemical solution discharged from a protective film removing device.The protective film removing device includes: a recovery line communicating with an atmosphere surrounding a substrate to recover a mixed chemical solution, an intermediate tank connected to the outlet end of the recovery line, a volatilization preventing liquid supply means for supplying a volatilization preventing liquid having a specific gravity smaller than that of the mixed chemical solution into the intermediate tank in advance, a transfer line having an inlet end connected to the intermediate tank and provided with a valve, a recovery tank connected to an outlet end of the transfer line, a liquid quantity monitoring means for monitoring a quantity of a liquid contained in the intermediate tank, and a control means for opening the valve of the transfer line to transfer the liquid contained in the intermediate tank to the recovery tank when it is decided that the quantity of the liquid contained in the intermediate tank reached a predetermined quantity on the basis of a signal provided by the liquid quantity monitoring means.
摘要翻译：本发明提高从保护膜去除装置排出的混合化学溶液的回收率。保护膜去除装置包括：与基板周围的气氛连通以回收混合化学溶液的回收管线，连接到回收管线出口端的中间罐，用于供应防挥发液体的挥发防止液体供应装置，预先将比重小于混合化学溶液的比重，具有连接到中间罐并具有阀的入口端的输送管线，连接到输送管线的出口端的回收罐，液体监测装置，用于监测包含在中间罐中的液体的量;以及控制装置，用于打开输送管线的阀门，以将包含在中间罐中的液体转移到回收罐中，当确定量包含在中间罐中的液体基于信号产生器达到预定量由液量监控装置维持。

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