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61. 发明申请

US20050030656A1 Facet mirror having a number of mirror facets 有权
标题翻译：面镜具有多个镜面
公开(公告)号：US20050030656A1
公开(公告)日：2005-02-10
申请号：US10841846
申请日：2004-05-07
申请人： Hubert Holderer , Andres Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
发明人： Hubert Holderer , Andres Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
IPC分类号： G02B5/09 , G02B7/182 , G02B7/198 , G02B26/08 , G03F7/20
CPC分类号： G03F7/70258 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B26/0816 , G03F7/70075 , G03F7/70141 , G03F7/702 , G03F7/70275
摘要： In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.
摘要翻译：在具有多个镜面的小平面镜中，其中镜面设置有反射面，镜面通过轴承装置联合地安装在基体内。镜面包括通过表面，线或点接触在外周与轴承装置接触的镜体。小平面镜的优选使用领域是用于制造半导体元件的微光刻中的投影曝光机的投影物镜。

62. 发明授权

US06836530B2 Illumination system with a plurality of individual gratings 有权
标题翻译：具有多个单独光栅的照明系统
公开(公告)号：US06836530B2
公开(公告)日：2004-12-28
申请号：US10163262
申请日：2002-06-05
申请人： Wolfgang Singer , Markus Weiss , Bernd Kleemann , Karlfried Osterried , Johannes Wangler , Frank Melzer , Andreas Heisler , Vadim Yevgenyevich Banine
发明人： Wolfgang Singer , Markus Weiss , Bernd Kleemann , Karlfried Osterried , Johannes Wangler , Frank Melzer , Andreas Heisler , Vadim Yevgenyevich Banine
IPC分类号： G21K500
CPC分类号： G03F7/70158 , G03F7/702 , G21K1/06
摘要： There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.
摘要翻译：提供了具有物体平面和场平面的<= 100nm波长的照明系统。照明系统包括具有多个光栅的光栅元件和隔膜。隔膜设置在从物体平面到场平面的光束路径中的光栅元件之后。

63. 发明授权

US06646718B2 Projection objective having adjacently mounted aspheric lens surfaces 有权
公开(公告)号：US06646718B2
公开(公告)日：2003-11-11
申请号：US10177580
申请日：2002-06-24
申请人： Karl-Heinz Schuster , David R. Shafer , Wilhelm Ulrich , Helmut Beierl , Wolfgang Singer
发明人： Karl-Heinz Schuster , David R. Shafer , Wilhelm Ulrich , Helmut Beierl , Wolfgang Singer
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B3/14 , G02B13/143 , G02B13/18 , G02B17/08 , G03F7/70225 , G03F7/70241 , G03F7/70883 , G03F7/70933
摘要： A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.

64. 发明授权

US08810927B2 Projection objective and projection exposure apparatus with negative back focus of the entry pupil 有权
标题翻译：投影目标和投影曝光装置，具有负入门瞳孔的后焦点
公开(公告)号：US08810927B2
公开(公告)日：2014-08-19
申请号：US13312196
申请日：2011-12-06
申请人： Hans-Juergen Mann , Wolfgang Singer
发明人： Hans-Juergen Mann , Wolfgang Singer
IPC分类号： G02B17/02
CPC分类号： G02B17/0615 , B82Y10/00 , G02B13/22 , G02B17/0657 , G03F7/70233 , G03F7/7025 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.
摘要翻译：本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE）平面，图像平面，光轴，至少第一反射镜和第二反射镜。投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

65. 发明授权

US08705005B2 Microlithographic illumination system 有权
标题翻译：微光刻照明系统
公开(公告)号：US08705005B2
公开(公告)日：2014-04-22
申请号：US12190179
申请日：2008-08-12
申请人： Markus Deguenther , Michael Layh , Michael Gerhard , Bruno Thome , Wolfgang Singer
发明人： Markus Deguenther , Michael Layh , Michael Gerhard , Bruno Thome , Wolfgang Singer
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70191
摘要： A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.
摘要翻译：微光刻照明系统可以包括能够在第一照明平面中产生二维强度分布的配光装置。光栅元件的第一光栅阵列可以产生二次光源的光栅阵列。具有附加光学效果的装置可以被布置在与两个光栅阵列相邻的空间上。该装置可以被配置为照明角度变化装置。该装置可以影响照明光的强度和/或相位和/或光束方向。影响可以是使光栅元素对总照明强度的贡献度可以在整个照明场中变化。这可以使照明强度以相对于总照明强度和/或相对于来自不同照明方向的强度贡献的限定方式影响整个照明场。

66. 发明授权

US08345267B2 Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate 有权
标题翻译：用于微光刻投影曝光的装置和用于检查基板表面的装置
公开(公告)号：US08345267B2
公开(公告)日：2013-01-01
申请号：US12895747
申请日：2010-09-30
申请人： Hans-Juergen Mann , Wolfgang Singer
发明人： Hans-Juergen Mann , Wolfgang Singer
IPC分类号： G01B9/00 , G01B11/30 , G01B11/24 , G01B11/14
CPC分类号： G03F9/7026 , G03F7/70233 , G03F7/70666
摘要： An apparatus (10) for microlithographic projection exposure, which includes: an optical system (18) for imaging mask structures (16) onto a surface (21) of a substrate (20) by projecting the mask structures (16) with imaging radiation (13), the optical system (18) being configured to operate in the EUV and/or higher frequency wavelength range, and various structure defining a measurement beam path (36) for guiding measurement radiation (34), the measurement beam path (36) extending within the optical system (18) such that the measurement radiation (34) only partially passes through the optical system (18) during operation of the apparatus (10).
摘要翻译：一种用于微光刻投影曝光的装置（10），其包括：用于通过用掩模结构（16）投射成像辐射将掩模结构（16）成像到基板（20）的表面（21）上的光学系统（18） 13），所述光学系统（18）被配置为在EUV和/或更高频率波长范围内操作，以及限定用于引导测量辐射（34）的测量光束路径（36），测量光束路径（36）在光学系统（18）内延伸，使得测量辐射（34）在设备（10）的操作期间仅部分地通过光学系统（18）。

67. 发明申请

US20120250147A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20120250147A1
公开(公告)日：2012-10-04
申请号：US13470956
申请日：2012-05-14
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

68. 发明授权

US08268518B2 Method and lithography device with a mask reflecting light 有权
标题翻译：方法和光刻装置与掩模反射光
公开(公告)号：US08268518B2
公开(公告)日：2012-09-18
申请号：US13073629
申请日：2011-03-28
申请人： Hans-Juergen Mann , Martin Lowisch , Wolfgang Singer
发明人： Hans-Juergen Mann , Martin Lowisch , Wolfgang Singer
IPC分类号： G03F1/24
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70091 , G03F7/70191 , G21K2201/061
摘要： A method and lithography device addressing the problem in projection optics of pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to illuminate the mask inhomogeneously. As a result, inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted. This compensation not only makes the apodization over the pupil become more symmetric but also makes the intensity variation smaller overall.
摘要翻译：一种解决瞳孔变迹的投影光学问题的方法和光刻设备，导致成像缺陷。如这里提出的，照明系统被配置为不均匀地照亮掩模。结果，由掩模本身引起的反射率的不均匀性至少部分被抵消。这种补偿不仅使瞳孔变得更加对称，而且使得整体的强度变化更小。

69. 发明申请

US20120092637A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20120092637A1
公开(公告)日：2012-04-19
申请号：US13333350
申请日：2011-12-21
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

70. 发明授权

US08107054B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08107054B2
公开(公告)日：2012-01-31
申请号：US12210514
申请日：2008-09-15
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/72 , G03B27/68 , G03B27/42 , G03B27/52 , G03B27/54 , G03B27/32
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

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