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61. 发明申请

US20070181151A1 System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication 失效
标题翻译：在薄膜磁头晶片制造过程中清洗化学和加工的系统和方法
公开(公告)号：US20070181151A1
公开(公告)日：2007-08-09
申请号：US11350643
申请日：2006-02-09
申请人： Hung-Chin Guthrie , Ming Jiang , Nick Lara , John Yang
发明人： Hung-Chin Guthrie , Ming Jiang , Nick Lara , John Yang
IPC分类号： C23G1/00 , B08B7/00 , B08B3/00
CPC分类号： C23G1/26 , G11B5/3163 , G11B5/3169 , Y10S134/902
摘要： A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-mechanical polishing (CMP), without causing corrosion and roughness. This process may be used on all CMP layers in thin film magnetic head wafer fabrication.
摘要翻译：柠檬酸铵和苯并三唑（BTA）的溶液用于清洗薄膜磁头晶片。当与刷涂一起使用时，该溶液是用于去除颗粒的高效方法，例如在化学机械抛光（CMP）期间产生的颗粒，而不会引起腐蚀和粗糙度。该方法可用于薄膜磁头晶片制造中的所有CMP层。

62. 发明申请

US20060098337A1 Tungsten heat sink structures in a thin film magnetic head 审中-公开
标题翻译：钨散热器结构在薄膜磁头中
公开(公告)号：US20060098337A1
公开(公告)日：2006-05-11
申请号：US10985527
申请日：2004-11-10
申请人： Hung-Chin Guthrie , Ming Jiang , Samuel Yuan
发明人： Hung-Chin Guthrie , Ming Jiang , Samuel Yuan
IPC分类号： G11B5/147 , G11B5/127
CPC分类号： G11B5/3967 , G11B5/3106 , G11B5/3133 , G11B5/3136
摘要： A magnetic head having one or more tungsten heat sinks is disposed within the magnetic head to draw heat away from the components of the head to limit unwanted thermal expansion and protrusion of the components of the magnetic head into the air bearing gap. In a first embodiment, a tungsten heat sink is fabricated upon the magnetic head substrate, immediately prior to the fabrication of the first magnetic shield. In another embodiment, a tungsten heat sink is fabricated immediately following the fabrication of the second magnetic shield. In a further embodiment the tungsten heat sink is fabricated following the fabrication of the second magnetic pole of the write head portion of the magnetic head. An enhanced embodiment may contain two or all three of the heat sinks described above. In fabricating the heat sinks, photolithographic fabrication techniques, as are well known to those skilled in the art, are utilized.
摘要翻译：具有一个或多个钨散热器的磁头设置在磁头内以将热量从磁头的部件吸走，以限制磁头的不必要的热膨胀和突出到空气轴承间隙中。在第一实施例中，在制造第一磁屏蔽之前，在磁头基板上制造钨散热器。在另一个实施例中，在制造第二磁屏蔽之后立即制造钨散热器。在另一实施例中，在制造磁头的写入头部分的第二磁极之后制造钨散热器。增强的实施例可以包含上述两个或所有三个散热器。在制造散热器时，利用本领域技术人员公知的光刻制造技术。

63. 发明授权

US07551397B2 Magnetic write head having a first magnetic pole with a self aligned stepped notch 失效
标题翻译：磁写头，具有具有自对准阶梯式切口的第一磁极
公开(公告)号：US07551397B2
公开(公告)日：2009-06-23
申请号：US11218701
申请日：2005-09-02
申请人： Bin V. Cao , Hung-Chin Guthrie , Wen-Chien Hsiao , Jyh-Shuey Lo
发明人： Bin V. Cao , Hung-Chin Guthrie , Wen-Chien Hsiao , Jyh-Shuey Lo
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/3163
摘要： A magnetic write head and method of manufacture thereof that has a first pole structure having a step notched first pole structure. The step notched structure includes a bottom notched portion that is wider than the second notched portion formed thereover. The upper, or narrower, notched portion has a width that is substantially equal to and self aligned with a second pole structure (P2) formed thereover. The invention may also include first and second wing portions formed in the first pole that are recessed from the ABS and that extend laterally from the first notched portions of the first pole. The formation of the winged portions is assisted by an ion mill resistant bump (alumina bump) formed thereover, which acts as a mask during the ion milling operations that are used to form the first and second notches.
摘要翻译：一种磁写头及其制造方法，其具有第一极结构，具有阶切口第一极结构。台阶缺口结构包括比形成在其上的第二切口部分更宽的底部切口部分。上部或更窄的切口部分具有与形成在其上的第二极结构（P2）基本相等并自对准的宽度。本发明还可以包括形成在第一极中的从ABS凹入并从第一极的第一切口部横向延伸的第一和第二翼部。翼形部分的形成由在其上形成的离子磨耐磨凸起（氧化铝凸块）辅助，其在用于形成第一和第二凹口的离子铣削操作期间用作掩模。

64. 发明申请

US20070053102A1 Magnetic write head having a first magnetic pole with a self aligned stepped notch 失效
标题翻译：磁写头，具有具有自对准阶梯式切口的第一磁极
公开(公告)号：US20070053102A1
公开(公告)日：2007-03-08
申请号：US11218701
申请日：2005-09-02
申请人： Bin Cao , Hung-Chin Guthrie , Wen-Chien Hsiao , Jyh-Shuey Lo
发明人： Bin Cao , Hung-Chin Guthrie , Wen-Chien Hsiao , Jyh-Shuey Lo
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/3163
摘要： A magnetic write head and method of manufacture thereof that has a first pole structure having a step notched first pole structure. The step notched structure includes a bottom notched portion that is wider than the second notched portion formed thereover. The upper, or narrower, notched portion has a width that is substantially equal to and self aligned with a second pole structure (P2) formed thereover. The invention may also include first and second wing portions formed in the first pole that are recessed from the ABS and that extend laterally from the first notched portions of the first pole. The formation of the winged portions is assisted by an ion mill resistant bump (alumina bump) formed thereover, which acts as a mask during the ion milling operations that are used to form the first and second notches.
摘要翻译：一种磁写头及其制造方法，其具有第一极结构，具有阶切口第一极结构。台阶缺口结构包括比形成在其上的第二切口部分更宽的底部切口部分。上部或更窄的切口部分具有基本上等于并与其上形成的第二极结构（P 2）自对准的宽度。本发明还可以包括形成在第一极中的从ABS凹入并从第一极的第一切口部横向延伸的第一和第二翼部。翼形部分的形成由在其上形成的离子磨耐磨凸起（氧化铝凸块）辅助，其在用于形成第一和第二凹口的离子铣削操作期间用作掩模。

65. 发明申请

US20060223426A1 SYSTEM, METHOD, AND APPARATUS FOR WETTING SLURRY DELIVERY TUBES IN A CHEMICAL MECHANICAL POLISHING PROCESS TO PREVENT CLOGGING THEREOF 有权
标题翻译：用于在化学机械抛光过程中润湿浆液管的系统，方法和装置，以防止其结冰
公开(公告)号：US20060223426A1
公开(公告)日：2006-10-05
申请号：US11099397
申请日：2005-04-05
申请人： Hung-Chin Guthrie , James Nystrom
发明人： Hung-Chin Guthrie , James Nystrom
IPC分类号： B24B1/00
CPC分类号： B24B57/02
摘要： A moisturizing process for slurry delivery tubes in chemical mechanical polishing is disclosed. A mist of deionized water is dispensed directly into the tubes each time a high pressure spray bar automatically cycles. The tips of the tubes are kept wet enough to prevent the slurry from drying in and clogging the tubes. A fan-type spray nozzle is located in the bar and, when pressurized, dispenses a fine mist. A direction of the nozzle is modified to avoid overspraying the tool. Only the tips of the delivery tubes and part of the polishing pad receive the misted spray. The slurry is moisturized and never dries at the point of use as the mist is dispensed with each cycle of a pad rinse feature.
摘要翻译：公开了用于化学机械抛光中的浆料输送管的保湿方法。每当高压喷射杆自动循环时，去离子水的雾直接分配到管中。管的尖端保持足够湿，以防止浆料干燥并堵塞管。一个风扇式喷嘴位于酒吧中，加压时，会分散细雾。修改喷嘴的方向以避免过度喷涂工具。只有输送管的尖端和抛光垫的一部分接收到雾化的喷雾。浆料被润湿，并且在使用时不会干燥，因为在每次循环洗涤垫漂洗特征时不再喷雾。

66. 发明授权

US6131271A Method of planarizing first pole piece layer of write head by lapping without delamination of first pole piece layer from wafer substrate 失效
标题翻译：通过研磨而不使第一极片层与晶片衬底分层来平面化写入头的第一极片层的方法
公开(公告)号：US6131271A
公开(公告)日：2000-10-17
申请号：US344071
申请日：1999-06-25
申请人： Robert Edward Fontana, Jr. , Hung-Chin Guthrie , William Leslie Guthrie , Eric James Lee , Li-Chung Lee , Francisco Agustin Martin
发明人： Robert Edward Fontana, Jr. , Hung-Chin Guthrie , William Leslie Guthrie , Eric James Lee , Li-Chung Lee , Francisco Agustin Martin
IPC分类号： G11B5/31 , G11B5/42
CPC分类号： G11B5/3173 , G11B5/3116 , G11B5/3163 , G11B5/3109 , Y10T29/49044 , Y10T29/49046
摘要： A method planarizes a first pole piece layer of a write head by lapping without delaminating the first pole piece layer from an underlying second read gap layer on a wafer substrate. This is accomplished by separating or dicing the first pole piece material layer in a field region about rows and columns of first pole piece layers of magnetic head assemblies so as to reduce the stress of the first pole piece material layer in the field. Accordingly, when the wafer substrate is lapped, such as by chemical mechanical polishing (CMP), a reduced stress prevents the first pole piece material layer from delaminating from the second read gap layer during the lapping operation.
摘要翻译：方法通过研磨平面化写入头的第一极片层，而不使第一极片层与晶片衬底上的下面的第二读取间隙层分层。这是通过在围绕磁头组件的第一极片层的行和列的场区域中分离或切割第一极片材料层来实现的，以便减小现场中第一极片材料层的应力。因此，当通过化学机械抛光（CMP）研磨晶片衬底时，减小的应力在研磨操作期间防止第一极片材料层与第二读取间隙层分层。

67. 发明申请

US20060096612A1 System and method for aligning wafers within wafer processing equipment 失效
标题翻译：在晶片加工设备中对准晶片的系统和方法
公开(公告)号：US20060096612A1
公开(公告)日：2006-05-11
申请号：US10982029
申请日：2004-11-05
申请人： Jian-Huei Feng , Hung-Chin Guthrie , Quang Le , James Nystrom
发明人： Jian-Huei Feng , Hung-Chin Guthrie , Quang Le , James Nystrom
IPC分类号： C23G1/00 , B08B3/00
CPC分类号： B08B11/02 , B08B3/02 , H01L21/67051 , H01L21/68
摘要： Systems and methods for aligning wafers within wafer processing equipment. In a first embodiment, a wafer alignment nozzle comprises a fixed cylindrical member. A moveable cylindrical member is disposed with the fixed cylindrical member in a sliding fit. The moveable cylindrical member comprises a plurality of angled fluid orifices for directing a plurality of streams of the fluid onto a surface of the wafer.
摘要翻译：将晶片对准晶片加工设备的系统和方法。在第一实施例中，晶片对准喷嘴包括固定圆柱形构件。可移动的圆柱形构件以固定的圆柱形构件滑动配合设置。可移动圆柱形构件包括多个成角度的流体孔，用于将多个流体流引导到晶片的表面上。

68. 发明申请

US20060066333A1 System and method for aligning wafers 审中-公开
标题翻译：用于对准晶片的系统和方法
公开(公告)号：US20060066333A1
公开(公告)日：2006-03-30
申请号：US10956801
申请日：2004-09-30
申请人： Jian-Huei Feng , Hung-Chin Guthrie , James Nystrom
发明人： Jian-Huei Feng , Hung-Chin Guthrie , James Nystrom
IPC分类号： G01R31/02
CPC分类号： G01R31/2831 , G01R31/2893
摘要： Systems and methods for aligning wafers. A first method provides for placing a wafer carrier comprising a mis-aligned wafer into an acceptance port. A wafer alignment fixture is moved relative to the wafer carrier and perpendicular to the plane of the mis-aligned wafer. The wafer alignment fixture comprises a spring action member. A force from said spring action member is exerted upon the mis-aligned wafer to achieve a desirable alignment of the mis-aligned wafer within the wafer carrier.
摘要翻译：用于对准晶片的系统和方法第一种方法提供将包含错误对准的晶片的晶片载体放置在接受端口中。晶片对准夹具相对于晶片载体移动并垂直于错误对准晶片的平面。晶片对准夹具包括弹簧作用构件。来自所述弹簧作用构件的力施加在错误对准的晶片上，以实现晶片载体内错误对准晶片的期望对准。

69. 发明授权

US08500916B2 Method for aligning wafers within wafer processing equipment 失效
标题翻译：在晶片处理设备内对准晶片的方法
公开(公告)号：US08500916B2
公开(公告)日：2013-08-06
申请号：US10982029
申请日：2004-11-05
申请人： Jian-Huei Feng , Hung-Chin Guthrie , Quang Le , James Nystrom
发明人： Jian-Huei Feng , Hung-Chin Guthrie , Quang Le , James Nystrom
IPC分类号： B08B3/00
CPC分类号： B08B11/02 , B08B3/02 , H01L21/67051 , H01L21/68
摘要： Systems and methods for aligning wafers within wafer processing equipment. In a first embodiment, a wafer alignment nozzle comprises a fixed cylindrical member. A moveable cylindrical member is disposed with the fixed cylindrical member in a sliding fit. The moveable cylindrical member comprises a plurality of angled fluid orifices for directing a plurality of streams of the fluid onto a surface of the wafer.
摘要翻译：将晶片对准晶片加工设备的系统和方法。在第一实施例中，晶片对准喷嘴包括固定圆柱形构件。可移动的圆柱形构件以固定的圆柱形构件滑动配合设置。可移动圆柱形构件包括多个成角度的流体孔，用于将多个流体流引导到晶片的表面上。

70. 发明授权

US07108588B1 System, method, and apparatus for wetting slurry delivery tubes in a chemical mechanical polishing process to prevent clogging thereof 有权
标题翻译：用于在化学机械抛光工艺中润湿浆料输送管的系统，方法和装置，以防止其堵塞
公开(公告)号：US07108588B1
公开(公告)日：2006-09-19
申请号：US11099397
申请日：2005-04-05
申请人： Hung-Chin Guthrie , James Craig Nystrom
发明人： Hung-Chin Guthrie , James Craig Nystrom
IPC分类号： B24B55/12
CPC分类号： B24B57/02
摘要： A moisturizing process for slurry delivery tubes in chemical mechanical polishing is disclosed. A mist of deionized water is dispensed directly into the tubes each time a high pressure spray bar automatically cycles. The tips of the tubes are kept wet enough to prevent the slurry from drying in and clogging the tubes. A fan-type spray nozzle is located in the bar and, when pressurized, dispenses a fine mist. A direction of the nozzle is modified to avoid overspraying the tool. Only the tips of the delivery tubes and part of the polishing pad receive the misted spray. The slurry is moisturized and never dries at the point of use as the mist is dispensed with each cycle of a pad rinse feature.
摘要翻译：公开了用于化学机械抛光中的浆料输送管的保湿方法。每当高压喷射杆自动循环时，去离子水的雾直接分配到管中。管的尖端保持足够湿，以防止浆料干燥并堵塞管。一个风扇式喷嘴位于酒吧中，加压时，会分散细雾。修改喷嘴的方向以避免过度喷涂工具。只有输送管的尖端和抛光垫的一部分接收到雾化的喷雾。浆料被润湿，并且在使用时不会干燥，因为在每次循环洗涤垫漂洗特征时不再喷雾。

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